レジスト (JP Patent Analysis Report)
The Technical Field "レジスト" had 457 patent application filings in the most recent period (2022-01-01 to 2022-07-31). This is a slightly decreased of +0 filings (0.0%) over 457 they had in the same period of the previous year (2021-01-01 to 2021-07-31).
The highest number of filings in 2014 with 1,498 cases, and their lowest number in 2022 with 687 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,920 cases in total) is 820, and the median is 823. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 820 patents |
| Std Dev | 321 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 687 cases | -12.60 % |
| 2021 year | 786 cases | -8.60 % |
| 2020 year | 860 cases | -27.36 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for レジスト for the period of the last 10 years (2014-01-01 to 2024-03-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of レジスト, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
レジスト, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of レジスト over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,485 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
レジスト
Related Patent Analysis Report
A patent aanlysis report on the following synonyms was found in the technical term "レジスト".
- レジスト (Main page / Including the following synonyms)
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as レジスト are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 312 cases, followed by キヤノン株式会社 with 17 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,055 cases, followed by キヤノン株式会社 with 329 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,055 cases |
| キヤノン株式会社 | 329 cases |
| セイコーエプソン株式会社 | 102 cases |
| 三菱電機株式会社 | 101 cases |
| 株式会社リコー | 92 cases |
| 株式会社東芝 | 77 cases |
| 富士通株式会社 | 25 cases |
| ソニーグループ株式会社 | 10 cases |
| パナソニックホールディングス株式会社 | 7 cases |
| 株式会社日立製作所 | 4 cases |
| 日本電気株式会社 | 3 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as レジスト are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 17 cases, followed by 三菱電機株式会社 with 6 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 329 cases, followed by 三菱電機株式会社 with 101 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 329 cases |
| 三菱電機株式会社 | 101 cases |
| 株式会社東芝 | 77 cases |
| 富士通株式会社 | 25 cases |
| ソニーグループ株式会社 | 10 cases |
| パナソニックホールディングス株式会社 | 7 cases |
| 日本電気株式会社 | 3 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by レジスト’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by レジスト’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社東芝
レジスト filed 77 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 16 cases in total) is 2.7, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 31 cases, and their lowest number in 2021 with 1 cases.
| Index | Value |
|---|---|
| Average | 2.7 patents |
| Std Dev | 2.2 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 3 cases | +200 % |
| 2021 year | 1 cases | 0 |
| 2020 year | 1 cases | -80.0 % |
Trends in filing of joint patent applications with 富士通株式会社
レジスト filed 25 joint applications with 富士通株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 8 cases in total) is 1.3, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.3, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 6 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.3 patents |
| Std Dev | 1.8 |
| COV | 1.3 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 5 cases | - |
| 2020 year | 0 cases | -100 % |
| 2019 year | 1 cases | -50.0 % |
Trends in filing of joint patent applications with パナソニックホールディングス株式会社
レジスト filed 7 joint applications with パナソニックホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 3 cases in total) is 0.5, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.5, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 2 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.8 |
| COV | 1.5 |
| Year | Cases | YOY |
|---|---|---|
| 2019 year | 2 cases | +100 % |
| 2018 year | 1 cases | 0 |
| 2017 year | 1 cases | -50.0 % |
Trends in filing of joint patent applications with ソニーグループ株式会社
レジスト filed 10 joint applications with ソニーグループ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 3 cases in total) is 0.5, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.5, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 4 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.8 |
| COV | 1.5 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 1 cases | - |
| 2020 year | 0 cases | - |
| 2019 year | 0 cases | -100 % |
Trends in filing of joint patent applications with キヤノン株式会社
レジスト filed 329 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 145 cases in total) is 24.2, and the median is 23.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 53 cases, and their lowest number in 2022 with 16 cases.
| Index | Value |
|---|---|
| Average | 24.2 patents |
| Std Dev | 14.0 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 16 cases | -15.79 % |
| 2021 year | 19 cases | -32.1 % |
| 2020 year | 28 cases | -30.0 % |
Information on important patents (JP)
The following shows JP patents held by レジスト that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and レジスト’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which レジスト is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 3.0 times. The most recently Invalidation Trial patent is 特許4192197 "メタルマスク及びその製造方法" (Invalidation Trial day 2022-02-14) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許4192197 | メタルマスク及びその製造方法 | 2022-02-14 |
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 1 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許6302430 "ボール配列用マスクの製造方法" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6302430 | ボール配列用マスクの製造方法 | 1 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 24 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7290034 "ドライフィルムレジスト基材用ポリエステルフィルム" (Opposition day 2023-12-05) , next is 特許7266454 "配線基板、積層型配線基板、及び配線基板の製造方法" (Opposition day 2023-10-27) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7290034 | ドライフィルムレジスト基材用ポリエステルフィルム | 2023-12-05 |
| 2 | 特許7266454 | 配線基板、積層型配線基板、及び配線基板の製造方法 | 2023-10-27 |
| 3 | 特許7320554 | エッチング方法 | 2023-10-02 |
| 4 | 特許7226459 | メタルマスク基材、および、メタルマスクの製造方法 | 2023-08-18 |
| 5 | 特許7241695 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 2023-07-11 |
| 6 | 特許7196389 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 | 2023-06-27 |
| 7 | 特許7125533 | 印刷用メタルマスクの製造方法 | 2023-02-17 |
| 8 | 特許7125534 | 印刷用メタルマスク | 2023-01-30 |
| 9 | 特許7108565 | 導電性高分子組成物、被覆品、及びパターン形成方法 | 2023-01-27 |
| 10 | 特許7091519 | 配列用マスク | 2022-12-20 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 49 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2023-171548 "中空パッケージおよびその製造方法" (Protest day 2024-02-28) , next is 特開2023-081813 "精密メタルマスク及びその製造方法" (Protest day 2024-02-14) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-171548 | 中空パッケージおよびその製造方法 | 2024-02-28 |
| 2 | 特開2023-081813 | 精密メタルマスク及びその製造方法 | 2024-02-14 |
| 3 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2023-12-28 |
| 4 | 特開2020-166156 | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター | 2023-12-19 |
| 5 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-11 |
| 6 | 特開2023-104887 | 金属ベース回路基板、及び金属ベース回路基板の製造方法 | 2023-10-19 |
| 7 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-08-09 |
| 8 | 特許7432216 | 塗膜剥離剤及び塗膜の剥離方法 | 2023-06-14 |
| 9 | 特許7305671 | ポリアルキル汚染が少ないモノアルキルスズ化合物、それらの組成物及び方法 | 2023-05-10 |
| 10 | 特許7305946 | レジストパターン形成方法 | 2023-04-21 |
| 11 | 特許7375548 | 二軸配向熱可塑性樹脂フィルム | 2023-02-28 |
| 12 | 特許7290034 | ドライフィルムレジスト基材用ポリエステルフィルム | 2023-02-13 |
| 13 | 特許7299069 | カラーフィルター用顔料分散組成物及びカラーフィルター用顔料分散レジスト組成物 | 2023-02-06 |
| 14 | 特許7415443 | 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及び、プリント配線板の製造方法 | 2023-02-03 |
| 15 | 特許7241695 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 2023-01-20 |
| 16 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2022-12-26 |
| 17 | 特許7278215 | セラミックス回路基板の製造方法 | 2022-12-16 |
| 18 | 特許7360798 | 着色組成物、及び、それを含有する着色レジスト組成物 | 2022-12-15 |
| 19 | 特許7354742 | ドライフィルムレジスト基材用フィルム | 2022-12-14 |
| 20 | 特許7226459 | メタルマスク基材、および、メタルマスクの製造方法 | 2022-10-11 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 79 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.5. The most protest patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (4 times) , and the next most protest patent is 特許7241695 "感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 4 times |
| 2 | 特許7241695 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 4 times |
| 3 | 特許7278215 | セラミックス回路基板の製造方法 | 3 times |
| 4 | 特許7005898 | 積層フィルム | 3 times |
| 5 | 特許6432072 | メタルマスク基材、および、メタルマスクの製造方法 | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 60 patents Inspection from third parties. The average number of Inspection is 1.4 times. The most recently Inspection patent is 特開2023-171548 "中空パッケージおよびその製造方法" (Inspection day 2024-03-26) , next is 特開2023-168651 "銅－亜鉛合金電気めっき液、銅－亜鉛合金バンプの形成方法、ナノポーラス銅バンプの形成方法、銅－亜鉛合金バンプ付き基材及びナノポーラス銅バンプ付き基材" (Inspection day 2024-02-20) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2023-171548 | 中空パッケージおよびその製造方法 | 2024-03-26 |
| 2 | 特開2023-168651 | 銅－亜鉛合金電気めっき液、銅－亜鉛合金バンプの形成方法、ナノポーラス銅バンプの形成方法、銅－亜鉛合金バンプ付き基材及びナノポーラス銅バンプ付き基材 | 2024-02-20 |
| 3 | 特開2023-168652 | 電解金めっき液及びその製造方法並びに該めっき液を用いためっき方法 | 2024-02-20 |
| 4 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2024-02-05 |
| 5 | 特開2020-166156 | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター | 2024-01-16 |
| 6 | 特開2020-183512 | 導電性組成物、導電体及び積層体 | 2024-01-11 |
| 7 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-20 |
| 8 | 特許7393573 | フォトマスクの製造方法 | 2023-11-28 |
| 9 | 特開2023-104887 | 金属ベース回路基板、及び金属ベース回路基板の製造方法 | 2023-11-01 |
| 10 | 特開2021-128304 | カラーフィルタおよび表示装置 | 2023-09-14 |
| 11 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-09-12 |
| 12 | 特表2021-528697 | カラーフィルター用赤色顔料組成物 | 2023-08-24 |
| 13 | 特許7432216 | 塗膜剥離剤及び塗膜の剥離方法 | 2023-07-10 |
| 14 | 特開2018-123317 | 化合物、カラーフィルター用レジスト組成物、カラーフィルター、繊維染色物、および染色方法 | 2023-05-26 |
| 15 | 特許7305946 | レジストパターン形成方法 | 2023-05-23 |
| 16 | 特許7305671 | ポリアルキル汚染が少ないモノアルキルスズ化合物、それらの組成物及び方法 | 2023-05-22 |
| 17 | 特許7326812 | ブラックマトリクス、カラーフィルタ、表示装置およびブラックマトリクスの製造方法 | 2023-05-01 |
| 18 | 特許7001805 | シフトレジスタ及びその駆動方法、ゲート駆動回路と表示装置 | 2023-03-20 |
| 19 | 特許7375548 | 二軸配向熱可塑性樹脂フィルム | 2023-03-10 |
| 20 | 特許7196389 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 | 2023-03-03 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 129 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.5. The most inspection patent is 特許6432072 "メタルマスク基材、および、メタルマスクの製造方法" (6 times) , and the next most inspection patent is 特許7247585 "二軸配向熱可塑性樹脂フィルム" (6 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6432072 | メタルマスク基材、および、メタルマスクの製造方法 | 6 times |
| 2 | 特許7247585 | 二軸配向熱可塑性樹脂フィルム | 6 times |
| 3 | 特許6753669 | 埋設回路を備えるプリント配線板の製造方法及びその製造方法で得られるプリント配線板 | 6 times |
| 4 | 特許7305671 | ポリアルキル汚染が少ないモノアルキルスズ化合物、それらの組成物及び方法 | 4 times |
| 5 | 特許7375548 | 二軸配向熱可塑性樹脂フィルム | 4 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 2,742 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.0. The most cited patent is 特許6437021 "遊技機" (56 times) , and the next most cited patent is 特開2016-073922 "有機溶剤の精製装置" (50 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6437021 | 遊技機 | 56 times |
| 2 | 特開2016-073922 | 有機溶剤の精製装置 | 50 times |
| 3 | 特許6710480 | 遊技機 | 39 times |
| 4 | 特許5641462 | 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法 | 34 times |
| 5 | 特許6784670 | 有機金属溶液に基づいた高解像度パターニング組成物および対応する方法 | 33 times |
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