Last Updated: 2024/11/04

ルテニウム (JP Patent Analysis Report) (JP SDGs Patent Report)

The Technical Field "ルテニウム" had 63 patent application filings in the most recent period (2023-01-01 to 2023-02-28). This is a significantly decreased of -39 filings (-38.2%) over 102 they had in the same period of the previous year (2022-01-01 to 2022-02-28). This report also includes technical terms related to " Ru " in the search set.

The highest number of filings in 2014 with 1,119 cases, and their lowest number in 2022 with 743 cases.

The mean of the number of filings over the last 5 years (2018 to 2023, 4,752 cases in total) is 792, and the median is 873. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 792 patents
Std Dev 265
COV 0.3

The number of filings has been decreasing for the last 3 years (2020 to 2023).

Filing trends for the last 3 years
Year Cases YOY
2022 year 743 cases -18.44 %
2021 year 911 cases +9.10 %
2020 year 835 cases -16.16 %

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for ルテニウム for the period of the last 10 years (2014-01-01 to 2024-10-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of ルテニウム, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.

Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

Foreign Patent Analysis Report

By clicking, you can check the patent application trends in each country of ルテニウム.

Patent Filing Trends in Each Country

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for ルテニウム. The trends of patent filings of ルテニウム for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder

ルテニウム, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of ルテニウム over the last 20 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.

Counting of the Number of Cases using the Patent Mapping Function

By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Search Set (Analysis Patents)

This patent analysis report was created for a patent search set of 8,903 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Technical Field:
ルテニウム
Patent Analysis Period
2014-01-01〜2024-10-31
Number of Patents
8,903 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Same industry / competition company information (JP)

The number of patents and changes in the number of patents of other companies (competitors) in the same industry as ルテニウム are shown below.

Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.

It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.

If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.

Introduction of patent search function

Competitive analysis can be performed in a short time by using various search functions such as applicant, filing date, and similar patent search.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Comparing the number of applications of each company, 株式会社東芝 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 22 cases, followed by 国立研究開発法人産業技術総合研究所 with 14 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).

Comparing the number of applications of each company, 株式会社東芝 has the highest number of joint applications in the last for the target period (2014 to 2024) with 167 cases, followed by 住友金属鉱山株式会社 with 167 cases.

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company information (JP)

The number of patents and changes in the number of patents of other companies (competitors) in the same industry as ルテニウム are shown below.

Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.

It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.

If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.

Search for Coapplicants

Patent integration allows you to find coapplicants in a short amount of time.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Among the top coapplicants, 株式会社東芝 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 22 cases, followed by 国立研究開発法人産業技術総合研究所 with 14 cases.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Name Cases
株式会社東芝 22 cases
国立研究開発法人産業技術総合研究所 14 cases
住友化学株式会社 3 cases
TDK株式会社 3 cases
株式会社半導体エネルギー研究所 1 cases

Trends in filing of joint patent applications for the target period (2014 to 2024).

Among the top coapplicants, 株式会社東芝 has the highest number of joint applications in the last for the target period (2014 to 2024) with 167 cases, followed by 国立研究開発法人産業技術総合研究所 with 136 cases.

Top company, Change in the Number of JP Patents

Below is a ranking of the number of JP patent applications by ルテニウム’s top 7 coapplicants over the last 20 years.

Below is a patent map showing the changes in the numbers of JP patent filings by ルテニウム’s top 7 coapplicants over the last 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company Details (JP)

Trends in filing of joint patent applications with 株式会社東芝

ルテニウム filed 167 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 72 cases in total) is 12.0, and the median is 12.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 34 cases, and their lowest number in 2021 with 6 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 12.0 patents
Std Dev 4.5
COV 0.4
Filing trends for the last 3 years
Year Cases YOY
2022 year 15 cases +150 %
2021 year 6 cases -53.8 %
2020 year 13 cases +8.33 %

Trends in filing of joint patent applications with パナソニックホールディングス株式会社

ルテニウム filed 3 joint applications with パナソニックホールディングス株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 2 cases in total) is 0.3, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.2, and there have been very big fluctuations in the number of filings from year to year.

The highest number of filings in 2020 with 2 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 0.3 patents
Std Dev 0.7
COV 2.2
Filing trends for the last 3 years
Year Cases YOY
2020 year 2 cases -
2019 year 0 cases -
2018 year 0 cases -

Trends in filing of joint patent applications with 株式会社日立製作所

ルテニウム filed 7 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 6 cases in total) is 1.0, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.

The highest number of filings in 2020 with 2 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 1.0 patents
Std Dev 0.8
COV 0.8
Filing trends for the last 3 years
Year Cases YOY
2021 year 2 cases 0
2020 year 2 cases +100 %
2019 year 1 cases 0

Trends in filing of joint patent applications with 住友化学株式会社

ルテニウム filed 118 joint applications with 住友化学株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 55 cases in total) is 9.2, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 1.0, and there have been very big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2018 with 27 cases, and their lowest number in 2022 with 2 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 9.2 patents
Std Dev 9.2
COV 1.0
Filing trends for the last 3 years
Year Cases YOY
2022 year 2 cases -60.0 %
2021 year 5 cases 0
2020 year 5 cases -66.7 %

Trends in filing of joint patent applications with 株式会社半導体エネルギー研究所

ルテニウム filed 96 joint applications with 株式会社半導体エネルギー研究所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 42 cases in total) is 7.0, and the median is 2.5. The coefficient of variation (standard deviation/mean) is 1.6, and there have been very big fluctuations in the number of filings from year to year.

The highest number of filings in 2018 with 31 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 7.0 patents
Std Dev 11.0
COV 1.6
Filing trends for the last 3 years
Year Cases YOY
2022 year 0 cases -
2021 year 0 cases -100 %
2020 year 4 cases -33.3 %

Information on important patents (JP)

The following shows JP patents held by ルテニウム that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and ルテニウム’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.

By noting the most important patents, you can obtain knowledge of the competitive business environment in which ルテニウム is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.

If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.

Search for Information on Important Patents

You can quickly search for important patents/patent applications, such as patents/patent applications that were cited many times and patents that have had invalidation trials demanded against them many times.

Glossary

Cited
Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
Request for invalidation trial
Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
Opposition
Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
Information provision
Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
Browsing request
Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.

Invalidationed Trial cases

List of latest Invalidationed Trial patents

In the last 3 years (2021-11-01 ~ 2024-10-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 2.0 times. The most recently Invalidation Trial patent is 特許3196076 "原動機付車両" (Invalidation Trial day 2022-06-15) .

Most recent Invalidation Trial (2021-11-01 to 2024-10-31)
- No. Title Invalidation Trial days
1 特許3196076 原動機付車両 2022-06-15

Top Patents/Patent Applications with the Highest Number of Invalidationed Trial

Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 1 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許6320582 "半導体発光素子" (1 times) .

Top Patents/Patent Applications with the Highest Number of Invalidation Trial over a Period of 10 Years (2014-11-01 ~ 2024-10-31)
- No. Title
1 特許6320582 半導体発光素子 1 times

Oppositioned cases

List of latest Oppositioned patents

In the last 3 years (2021-11-01 ~ 2024-10-31), there were 7 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7448953 "眼疾患のための細胞モデル及び治療関連出願への相互参照" (Opposition day 2024-04-17) , next is 特許7301055 "薬液、基板の処理方法" (Opposition day 2023-12-27) .

Most recent Opposition (2021-11-01 to 2024-10-31)
- No. Title Opposition days
1 特許7448953 眼疾患のための細胞モデル及び治療関連出願への相互参照 2024-04-17
2 特許7301055 薬液、基板の処理方法 2023-12-27
3 特許7208194 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 2023-07-06
4 特許7175477 金属部材 2023-05-09
5 特許7008076 積層造形用銅合金粉末、積層造形物の製造方法及び積層造形物 2022-08-09
6 特許6960477 薬液、薬液の製造方法、基板の処理方法 2022-04-22
7 特許6916306 薬液、基板の処理方法 2022-01-26

Show 2 patents  

Protested cases

List of latest Protested patents

In the last 3 years (2021-11-01 ~ 2024-10-31), there were 26 patents Protest from third parties. The average number of Protest is 1.2 times. The most recently Protest patent is 特開2024-025224 "チタン製釘およびチタン素材" (Protest day 2024-08-19) , next is 特開2022-103588 "湿式酸化処理用触媒、湿式酸化処理方法及び湿式酸化処理用触媒の製造方法" (Protest day 2024-08-06) .

Most recent Protest (2021-11-01 to 2024-10-31)
- No. Title Protest days
1 特開2024-025224 チタン製釘およびチタン素材 2024-08-19
2 特開2022-103588 湿式酸化処理用触媒、湿式酸化処理方法及び湿式酸化処理用触媒の製造方法 2024-08-06
3 特表2023-504011 金属-有機骨格押出物の製造方法 2024-06-18
4 特許7527658 膜構造体、圧電体膜及び超伝導体膜 2024-04-09
5 特表2023-542727 固体イオン伝導体化合物、それを含む固体電解質、それを含む電気化学セル、及びその製造方法 2024-03-01
6 特許5368741 遷移金属酸化膜を有する半導体素子およびその製造方法 2024-01-05
7 特開2022-172169 リチウム二次電池用正極活物質、その製造方法、及びこれを含むリチウム二次電池 2023-09-21
8 特表2022-528816 二環式エノールエーテルの製造方法 2023-06-15
9 特許7563843 載置台及び基板処理装置 2023-04-20
10 特表2021-504096 活性化表面に結合した接着層 2023-03-23
11 特許7443889 赤外線遮蔽膜形成用分散液 2023-03-13
12 特開2022-051945 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 2023-03-06
13 特許7489689 紫外線処理方法及びシステム 2022-11-28
14 特表2021-534566 充電式リチウムバッテリ向けの固体ポリマーマトリックス電解質(PME)及びこれで作られたバッテリ 2022-10-25
15 特許7301055 薬液、基板の処理方法 2022-07-28
16 特許7175477 金属部材 2022-06-28
17 特許7237585 ポリオールの調製方法 2022-06-13
18 特開2020-171928 プロセス流れから汚染物を除去する方法 2022-05-18
19 特開2020-062627 アンモニア浄化触媒 2022-04-26
20 特許7110986 導電性組成物 2022-04-25

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Protested

Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 64 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許6777405 "導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体" (5 times) , and the next most protest patent is 特許7036398 "液体中の含硫黄化合物の除去方法" (5 times) .

Top Patents/Patent Applications with the Highest Number of Protest over a Period of 10 Years (2014-11-01 ~ 2024-10-31)
- No. Title
1 特許6777405 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 5 times
2 特許7036398 液体中の含硫黄化合物の除去方法 5 times
3 特許7208194 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 4 times
4 特開2022-051945 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 2 times
5 特許6098689 蓄電デバイス 2 times

Inspectioned cases

List of latest Inspectioned patents

In the last 3 years (2021-11-01 ~ 2024-10-31), there were 51 patents Inspection from third parties. The average number of Inspection is 1.8 times. The most recently Inspection patent is 特開2024-076742 "金属回収装置、金属回収方法、元素分析装置、及び元素分析方法" (Inspection day 2024-09-12) , next is 特開2024-025224 "チタン製釘およびチタン素材" (Inspection day 2024-08-27) .

Most recent Inspection (2021-11-01 to 2024-10-31)
- No. Title Inspection days
1 特開2024-076742 金属回収装置、金属回収方法、元素分析装置、及び元素分析方法 2024-09-12
2 特開2024-025224 チタン製釘およびチタン素材 2024-08-27
3 特表2023-531165 金属基材に接合した前処理組成物及びその製造方法 2024-07-23
4 特開2020-078293 高純度酸化鉄ナノ粒子の細胞での生産 2024-07-17
5 特表2023-504011 金属-有機骨格押出物の製造方法 2024-07-11
6 特表2022-502450 原子量子クラスターの治療的使用 2024-05-16
7 特許7527658 膜構造体、圧電体膜及び超伝導体膜 2024-05-15
8 特許6342868 被コーティング物品およびそのコーティング方法 2024-03-22
9 特許6644831 被コーティング物品およびそのコーティング方法 2024-03-22
10 特表2012-532988 被コーティング物品およびそのコーティング方法 2024-03-22
11 特表2023-542727 固体イオン伝導体化合物、それを含む固体電解質、それを含む電気化学セル、及びその製造方法 2024-03-15
12 特許5947015 発泡性飲料の製造方法 2024-01-11
13 特開2024-074790 アンモニアを分解するためのプロセス及び装置 2023-12-20
14 特開2024-074792 アンモニアを分解するためのプロセス及び装置 2023-12-20
15 特開2024-074791 アンモニアを分解するためのプロセス及び装置 2023-12-20
16 特許7534042 1,1,1-トリフルオロ-2-クロロエタン(HCFC-133a)及び/又はトリフルオロエチルアミン(TFEA)の新しい製造方法 2023-11-06
17 特許5987197 水素分離膜及び水素分離方法 2023-08-08
18 特許6843320 セラミックヒータ 2023-06-29
19 特許7563843 載置台及び基板処理装置 2023-04-27
20 特許7343391 成膜装置及び成膜方法 2023-04-26

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Inspectioned

Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 132 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特許7343391 "成膜装置及び成膜方法" (17 times) , and the next most inspection patent is 特許7527658 "膜構造体、圧電体膜及び超伝導体膜" (10 times) .

Top Patents/Patent Applications with the Highest Number of Inspection over a Period of 10 Years (2014-11-01 ~ 2024-10-31)
- No. Title
1 特許7343391 成膜装置及び成膜方法 17 times
2 特許7527658 膜構造体、圧電体膜及び超伝導体膜 10 times
3 特許6777405 導電性粒子、導電性粒子の製造方法、導電材料及び接続構造体 6 times
4 特許6781864 ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 6 times
5 特許7387102 膜構造体及びその製造方法 5 times

Cited cases

Top Patents/Patent Applications with the Highest Number of Cited

Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 1,781 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.1. The most cited patent is 特許6608753 "PdRu合金電極材料およびその製造方法" (323 times) , and the next most cited patent is 特許6089081 "磁気メモリ" (91 times) .

Top Patents/Patent Applications with the Highest Number of Cited over a Period of 10 Years (2014-11-01 ~ 2024-10-31)
- No. Title
1 特許6608753 PdRu合金電極材料およびその製造方法 323 times
2 特許6089081 磁気メモリ 91 times
3 特許5985728 磁気メモリ 39 times
4 特許6651362 金属粒子を内包したゼオライト 29 times
5 特開2017-222928 表面処理による選択的堆積 26 times

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