はんだ付 (JP Patent Analysis Report)
The Technical Field "はんだ付" had 28 patent application filings in the most recent period (2023-01-01 to 2023-02-28). This is a significantly decreased of -20 filings (-41.7%) over 48 they had in the same period of the previous year (2022-01-01 to 2022-02-28). This report also includes technical terms related to " はんだづけ ", " はんだ付け ", " はんだ接合 ", " ソルダリング ", " ソルダーリング ", " ソルダー付 ", " ソルダー付け ", " ソルダ付 ", " ソルダ付け ", " ハンダづけ ", " ハンダ付 ", " ハンダ付け ", " ハンダ接合 ", " 半田づけ ", " 半田付 ", " 半田付け ", " 半田接合 ", " 軟ろう付 ", " 軟ろう付け ", " 軟ろう接 ", " 軟ロウ付 ", " 軟ロウ付け ", " 軟鑞付 ", " 軟鑞付け ", " 軟鑞接 " in the search set.
The highest number of filings in 2014 with 682 cases, and their lowest number in 2022 with 362 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,297 cases in total) is 383, and the median is 388. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 383 patents |
| Std Dev | 144 |
| COV | 0.4 |
The number of filings has been decreasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 362 cases | -7.89 % |
| 2021 year | 393 cases | +2.88 % |
| 2020 year | 382 cases | -22.67 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for はんだ付 for the period of the last 10 years (2014-01-01 to 2024-10-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of はんだ付, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
はんだ付, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of はんだ付 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 4,821 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
はんだ付
Related Patent Analysis Report
A patent aanlysis report on the following synonyms was found in the technical term "はんだ付".
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as はんだ付 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 住友電装株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 11 cases, followed by 三菱電機株式会社 with 9 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 三菱電機株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 200 cases, followed by 株式会社デンソー with 111 cases.
| Name | Cases |
|---|---|
| 三菱電機株式会社 | 200 cases |
| 株式会社デンソー | 111 cases |
| 住友電装株式会社 | 110 cases |
| 株式会社村田製作所 | 32 cases |
| 富士通株式会社 | 22 cases |
| 株式会社東芝 | 18 cases |
| 日本電気株式会社 | 17 cases |
| 株式会社日立製作所 | 9 cases |
| ソニーグループ株式会社 | 5 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as はんだ付 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Among the top coapplicants, 三菱電機株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 9 cases, followed by 株式会社東芝 with 3 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, 三菱電機株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 200 cases, followed by 富士通株式会社 with 22 cases.
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by はんだ付’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by はんだ付’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 三菱電機株式会社
はんだ付 filed 200 joint applications with 三菱電機株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 95 cases in total) is 15.8, and the median is 17.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 30 cases, and their lowest number in 2022 with 8 cases.
| Index | Value |
|---|---|
| Average | 15.8 patents |
| Std Dev | 9.2 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 8 cases | -46.7 % |
| 2021 year | 15 cases | -25.00 % |
| 2020 year | 20 cases | -9.09 % |
Trends in filing of joint patent applications with 株式会社日立製作所
はんだ付 filed 9 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 3 cases in total) is 0.5, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.0, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 3 cases, and their lowest number in 2019 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.5 |
| COV | 1.0 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | 0 |
| 2021 year | 1 cases | 0 |
| 2020 year | 1 cases | - |
Trends in filing of joint patent applications with 株式会社東芝
はんだ付 filed 18 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 11 cases in total) is 1.8, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2018 with 4 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.8 patents |
| Std Dev | 1.6 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 0 cases | -100 % |
| 2021 year | 3 cases | +200 % |
| 2020 year | 1 cases | - |
Trends in filing of joint patent applications with 富士通株式会社
はんだ付 filed 22 joint applications with 富士通株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 4 cases in total) is 0.7, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.4, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 7 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.7 patents |
| Std Dev | 0.9 |
| COV | 1.4 |
| Year | Cases | YOY |
|---|---|---|
| 2019 year | 2 cases | 0 |
| 2018 year | 2 cases | -60.0 % |
| 2017 year | 5 cases | -28.57 % |
Trends in filing of joint patent applications with 日本電気株式会社
はんだ付 filed 17 joint applications with 日本電気株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 3 cases in total) is 0.5, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.5, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 7 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.8 |
| COV | 1.5 |
| Year | Cases | YOY |
|---|---|---|
| 2019 year | 2 cases | +100 % |
| 2018 year | 1 cases | -66.7 % |
| 2017 year | 3 cases | -57.1 % |
Information on important patents (JP)
The following shows JP patents held by はんだ付 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and はんだ付’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which はんだ付 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 2 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許6138324 "半田付け装置、半田付け方法、プリント基板の製造方法、および製品の製造方法" (1 times) , and the next most invalidation trial patent is 特許5723056 "はんだ合金、ソルダペーストおよび電子回路基板" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6138324 | 半田付け装置、半田付け方法、プリント基板の製造方法、および製品の製造方法 | 1 times |
| 2 | 特許5723056 | はんだ合金、ソルダペーストおよび電子回路基板 | 1 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 5 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7377719 "光射出装置、及び、光射出装置の製造方法" (Opposition day 2024-05-01) , next is 特許7089491 "フラックス組成物、ソルダペースト及び電子回路基板" (Opposition day 2022-12-19) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7377719 | 光射出装置、及び、光射出装置の製造方法 | 2024-05-01 |
| 2 | 特許7089491 | フラックス組成物、ソルダペースト及び電子回路基板 | 2022-12-19 |
| 3 | 特許7037047 | 車両用窓ガラス | 2022-09-16 |
| 4 | 特許7033660 | 金属セラミック基板および金属セラミック基板の製造方法 | 2022-09-09 |
| 5 | 特許6918298 | 携帯機器用のマイクロブレーカ及び携帯機器用のマイクロブレーカの製造方法 | 2022-02-10 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 25 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2024-035412 "はんだ組成物および電子基板" (Protest day 2024-07-24) , next is 特開2024-009991 "鉛フリーはんだ組成物" (Protest day 2024-07-19) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2024-035412 | はんだ組成物および電子基板 | 2024-07-24 |
| 2 | 特開2024-009991 | 鉛フリーはんだ組成物 | 2024-07-19 |
| 3 | 特開2021-053703 | 局所はんだ付けノズル及び局所はんだ付け装置 | 2024-07-04 |
| 4 | 特許7503604 | はんだ組成物および電子基板の製造方法 | 2024-05-30 |
| 5 | 特開2024-001726 | はんだ組成物および電子基板 | 2024-04-25 |
| 6 | 特許7450318 | はんだ組成物およびフレキシブル回路基板の製造方法 | 2024-02-13 |
| 7 | 特許7478173 | フラックス組成物、およびはんだ組成物 | 2023-12-25 |
| 8 | 特表2022-549450 | 電子アセンブリのための工学材料 | 2023-11-06 |
| 9 | 特許7377719 | 光射出装置、及び、光射出装置の製造方法 | 2023-10-26 |
| 10 | 特許7554218 | はんだ組成物および電子基板 | 2023-10-25 |
| 11 | 特許7381644 | 銅合金の製造方法 | 2023-06-15 |
| 12 | 特許7383388 | 硬化性組成物、ドライフィルム、硬化物および電子部品 | 2023-06-12 |
| 13 | 特開2020-202012 | 端子及びコネクタ | 2023-04-12 |
| 14 | 特許7473216 | レーザ半田付け装置 | 2023-03-29 |
| 15 | 特許7572008 | ＳｎＺｎ半田およびその製造方法 | 2023-03-24 |
| 16 | 特許7528194 | 高温超高信頼性合金 | 2022-12-09 |
| 17 | 特許7348222 | はんだ組成物 | 2022-10-14 |
| 18 | 特許7375787 | ポリアリーレンスルフィド樹脂組成物及びその成形品、並びに表面実装電子部品 | 2022-06-17 |
| 19 | 特開2022-041869 | 電力変換装置及び部品間接続構造 | 2022-06-07 |
| 20 | 特許7183313 | 半田合金及び半田粉 | 2022-04-18 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 61 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許7503604 "はんだ組成物および電子基板の製造方法" (4 times) , and the next most protest patent is 特許7478173 "フラックス組成物、およびはんだ組成物" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7503604 | はんだ組成物および電子基板の製造方法 | 4 times |
| 2 | 特許7478173 | フラックス組成物、およびはんだ組成物 | 3 times |
| 3 | 特許6560279 | 局所はんだ付け用フラックス組成物およびはんだ付け方法 | 3 times |
| 4 | 特許7450318 | はんだ組成物およびフレキシブル回路基板の製造方法 | 2 times |
| 5 | 特許6826059 | フラックス組成物、はんだ組成物および電子基板 | 2 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 31 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2024-001726 "はんだ組成物および電子基板" (Inspection day 2024-07-26) , next is 特開2022-007121 "鉛フリーはんだ合金とその接合体" (Inspection day 2024-07-17) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2024-001726 | はんだ組成物および電子基板 | 2024-07-26 |
| 2 | 特開2022-007121 | 鉛フリーはんだ合金とその接合体 | 2024-07-17 |
| 3 | 特開2021-053703 | 局所はんだ付けノズル及び局所はんだ付け装置 | 2024-07-11 |
| 4 | 特表2022-537665 | フラックスを有するアルミニウム表面を不動態化するための方法 | 2024-05-01 |
| 5 | 特開2023-137985 | メモリシステム | 2024-03-18 |
| 6 | 特許7450318 | はんだ組成物およびフレキシブル回路基板の製造方法 | 2024-03-06 |
| 7 | 特許7478173 | フラックス組成物、およびはんだ組成物 | 2024-01-25 |
| 8 | 特開2024-079630 | 多目的スペーサ | 2023-12-28 |
| 9 | 特表2022-549450 | 電子アセンブリのための工学材料 | 2023-12-01 |
| 10 | 特許7377719 | 光射出装置、及び、光射出装置の製造方法 | 2023-11-21 |
| 11 | 特許7513552 | 気密端子の接続具および気密端子 | 2023-10-10 |
| 12 | 特許6374977 | ＳＳＤ部品及びＳＳＤ | 2023-09-07 |
| 13 | 特表2022-536902 | 導電性水性媒体中で機能停止する電池及びその製造方法 | 2023-08-31 |
| 14 | 特許7503604 | はんだ組成物および電子基板の製造方法 | 2023-08-29 |
| 15 | 特開2024-019148 | エヌエフシーの機能を有する無線充電装置 | 2023-08-28 |
| 16 | 特許7357186 | 電極接続素子、これを備える発光装置及び発光装置の製造方法 | 2023-08-02 |
| 17 | 特許7383388 | 硬化性組成物、ドライフィルム、硬化物および電子部品 | 2023-07-06 |
| 18 | 特開2020-202012 | 端子及びコネクタ | 2023-06-01 |
| 19 | 特許7572008 | ＳｎＺｎ半田およびその製造方法 | 2023-04-19 |
| 20 | 特許7473216 | レーザ半田付け装置 | 2023-03-31 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 72 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許7450318 "はんだ組成物およびフレキシブル回路基板の製造方法" (3 times) , and the next most inspection patent is 特許7011892 "はんだ接合材料及び接続構造体の製造方法" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7450318 | はんだ組成物およびフレキシブル回路基板の製造方法 | 3 times |
| 2 | 特許7011892 | はんだ接合材料及び接続構造体の製造方法 | 3 times |
| 3 | 特許6945135 | フラックス及びはんだ材料 | 3 times |
| 4 | 特許7377719 | 光射出装置、及び、光射出装置の製造方法 | 2 times |
| 5 | 特開2022-007121 | 鉛フリーはんだ合金とその接合体 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 1,021 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.6. The most cited patent is 特開2017-070140 "折り曲げにより形成された円筒形状のコイル体、該コイル体の製造方法、及び該コイル体を用いた回転電機" (62 times) , and the next most cited patent is 特許6200534 "鉛フリーはんだ合金、電子回路基板および電子制御装置" (30 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2017-070140 | 折り曲げにより形成された円筒形状のコイル体、該コイル体の製造方法、及び該コイル体を用いた回転電機 | 62 times |
| 2 | 特許6200534 | 鉛フリーはんだ合金、電子回路基板および電子制御装置 | 30 times |
| 3 | 特開2017-192987 | 半田組成物及び半田付け製品の製造方法 | 29 times |
| 4 | 特許6310894 | はんだ組成物および電子基板の製造方法 | 29 times |
| 5 | 特許6729003 | 半導体装置および半導体装置の製造方法 | 27 times |
Providing patent information to the media (newspapers, magazines, etc.)
"Patent Integration Report" is a web service provided by "Patent Integration Co., Ltd." operated by patent attorneys who are experts in intellectual property rights. Based on the latest patent data, this is one of the largest patent report services in Japan that provides information on technology trends in various companies and technology fields.
The purpose of this web service is to make intellectual property information familiar to many people, regardless of whether they have an interest in intellectual property rights, and to make use of it.
We actively provide various types of patent information that can be used in various media articles such as newspapers, magazines, and web media. Please feel free to contact us from "Inquiry form for details on the content of patent information that can be provided, conditions for provision, etc. Please contact us.
About this Site
All rights related to the data, documents and charts belong to "an integrated patent search/analysis service provider, Patent Integration". Please specify the source “Patent Integration Report, URL: https://patent-i.com/report/en/" when inserting them into in-house materials, external report materials, etc., regardless of whether they are paid or free of charge.
Patent data is obtained by aggregating and analyzing the latest patent data issued by the Patent Offices of respective countries and jurisdictions and by WIPO. Although we take great care in publishing and analyzing the results, we do not guarantee the correctness of the data. We appreciate your understanding.
If you have any concerns about this service, please feel free to contact us.
All rights to the data, documents, figures and tables are reserved by e-Patent. When publishing internal documents, external reports, etc. (whether paid or free of charge), please use the following URL: https://e-patent.co.jp/.
Please note the following points for use.
e-Patent will not be liable for any damages or losses arising from the use of the global patent application status, ranking information, or population search formula in the "SDGs Global Company Ranking from a Patent Perspective". Items with ● in front of the target are not supported at this time (judged to be difficult to approach from the patent information analysis).
Citation of patent application status and ranking information
There is no problem to cite patent application status and ranking information, but please clearly indicate "Source: e-Patent Co.
Graphs are image data.
Please note that the various graphs are image data, but we cannot provide them in text data.Scope of coverage for each goal/target
- Based on the description of each goal and target of the SDGs, we have set the scope of technologies to be covered based on our and e-Patent's past experience, etc. (in some cases, the search is based on social issues themselves). Therefore, please note that there is a possibility that this "SDGs Global Company Ranking from Patent Perspective" may not cover 100%.
- A population search formula is clearly indicated for each goal/target (database: Patent Integration). You may use the population search formula as it is, or you may improve it by yourself.
- This search covers patents and utility models, including both published and registered patents (design and design patents are excluded). The unit of count is the number of applications, not the number of patent families.
About the name collation and name control of applicants and right holders
- Company rankings are based on the results calculated by "Patent Integration", with Japanese organizations in Japanese and other companies in English (some are in Japanese).
- Company names may be the names of the companies at the time of application, but the results calculated by Patent Integration are used as is. Company names are used as they were at the time of application.
- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
Credit notation
・MeCab user dictionary for science technology term © National Bioscience Database Center licensed under CC Attribution-Share Alike 4.0 International
Our Commitment to Safety and Security
Patent Integration Co., Ltd. is committed to providing high-quality patent information based on the latest patent data on more than 45 million cases collected from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publication. 
Patent Integration Co., Ltd. collects the patent data from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publications to provide it widely in the form of reports so that anyone can check patent information and patent trends with confidence. 
Patent Integration Co., Ltd. is committed to various efforts to enhance the reliability of the information and to allow users to search patent information with confidence.