散乱 (JP Patent Analysis Report)
The Technical Field "散乱" had 285 patent application filings in the most recent period (2023-01-01 to 2023-04-30). This is a significantly decreased of -112 filings (-28.2%) over 397 they had in the same period of the previous year (2022-01-01 to 2022-04-30).
The highest number of filings in 2015 with 1,897 cases, and their lowest number in 2023 with 458 cases.
The mean of the number of filings over the last 5 years (2019 to 2024, 6,359 cases in total) is 1,060, and the median is 1,301. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 1,060 patents |
| Std Dev | 598 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 458 cases | -60.2 % |
| 2022 year | 1,152 cases | -20.55 % |
| 2021 year | 1,450 cases | -1.29 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 散乱 for the period of the last 10 years (2015-01-01 to 2024-12-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 散乱, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
散乱, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 散乱 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 13,783 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
散乱
Related Patent Analysis Report
A patent aanlysis report on the following synonyms was found in the technical term "散乱".
- 散乱 (Main page / Including the following synonyms)
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 散乱 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, TOPPANホールディングス株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 11 cases, followed by キヤノン株式会社 with 10 cases.
| Name | Cases |
|---|---|
| TOPPANホールディングス株式会社 | 11 cases |
| キヤノン株式会社 | 10 cases |
| セイコーエプソン株式会社 | 7 cases |
| 三菱電機株式会社 | 6 cases |
| 日本電信電話株式会社 | 6 cases |
| 株式会社東芝 | 4 cases |
| 株式会社日立製作所 | 3 cases |
| シャープ株式会社 | 1 cases |
| 富士フイルム株式会社 | 1 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 320 cases, followed by 富士フイルム株式会社 with 210 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 320 cases |
| 富士フイルム株式会社 | 210 cases |
| TOPPANホールディングス株式会社 | 175 cases |
| 三菱電機株式会社 | 159 cases |
| 日本電信電話株式会社 | 130 cases |
| 株式会社東芝 | 118 cases |
| シャープ株式会社 | 107 cases |
| セイコーエプソン株式会社 | 88 cases |
| ソニーグループ株式会社 | 87 cases |
| 株式会社日立製作所 | 72 cases |
| パナソニックホールディングス株式会社 | 10 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 散乱 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 10 cases, followed by セイコーエプソン株式会社 with 7 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 10 cases |
| セイコーエプソン株式会社 | 7 cases |
| 三菱電機株式会社 | 6 cases |
| 株式会社東芝 | 4 cases |
| 株式会社日立製作所 | 3 cases |
| シャープ株式会社 | 1 cases |
| 富士フイルム株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 320 cases, followed by 富士フイルム株式会社 with 210 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 320 cases |
| 富士フイルム株式会社 | 210 cases |
| 三菱電機株式会社 | 159 cases |
| 株式会社東芝 | 118 cases |
| シャープ株式会社 | 107 cases |
| セイコーエプソン株式会社 | 88 cases |
| 株式会社日立製作所 | 72 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 散乱’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 散乱’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with キヤノン株式会社
散乱 filed 320 joint applications with キヤノン株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 119 cases in total) is 19.8, and the median is 23.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2015 with 73 cases, and their lowest number in 2023 with 8 cases.
| Index | Value |
|---|---|
| Average | 19.8 patents |
| Std Dev | 11.2 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 8 cases | -73.3 % |
| 2022 year | 30 cases | +30.4 % |
| 2021 year | 23 cases | 0 |
Trends in filing of joint patent applications with 株式会社日立製作所
散乱 filed 72 joint applications with 株式会社日立製作所 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 31 cases in total) is 5.2, and the median is 6.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2016 with 14 cases, and their lowest number in 2023 with 3 cases.
| Index | Value |
|---|---|
| Average | 5.2 patents |
| Std Dev | 2.9 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 3 cases | -62.5 % |
| 2022 year | 8 cases | 0 |
| 2021 year | 8 cases | +33.3 % |
Trends in filing of joint patent applications with 株式会社東芝
散乱 filed 118 joint applications with 株式会社東芝 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 51 cases in total) is 8.5, and the median is 8.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2015 with 25 cases, and their lowest number in 2022 with 3 cases.
| Index | Value |
|---|---|
| Average | 8.5 patents |
| Std Dev | 6.8 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 4 cases | +33.3 % |
| 2022 year | 3 cases | -75.0 % |
| 2021 year | 12 cases | -40.0 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
散乱 filed 88 joint applications with セイコーエプソン株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 39 cases in total) is 6.5, and the median is 7.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2015 with 16 cases, and their lowest number in 2019 with 5 cases.
| Index | Value |
|---|---|
| Average | 6.5 patents |
| Std Dev | 3.6 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 7 cases | 0 |
| 2022 year | 7 cases | -41.7 % |
| 2021 year | 12 cases | +50.0 % |
Trends in filing of joint patent applications with 三菱電機株式会社
散乱 filed 159 joint applications with 三菱電機株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 75 cases in total) is 12.5, and the median is 13.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2018 with 29 cases, and their lowest number in 2023 with 6 cases.
| Index | Value |
|---|---|
| Average | 12.5 patents |
| Std Dev | 7.7 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 6 cases | -60.0 % |
| 2022 year | 15 cases | -31.8 % |
| 2021 year | 22 cases | +83.3 % |
Information on important patents (JP)
The following shows JP patents held by 散乱 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 散乱’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 散乱 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.0 times. The most recently Invalidation Trial patent is 特許7032817 "三次元画像化可能な顕微鏡及び画像化方法" (Invalidation Trial day 2023-05-25) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許7032817 | 三次元画像化可能な顕微鏡及び画像化方法 | 2023-05-25 |
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 2 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許7032817 "三次元画像化可能な顕微鏡及び画像化方法" (1 times) , and the next most invalidation trial patent is 特許6320582 "半導体発光素子" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7032817 | 三次元画像化可能な顕微鏡及び画像化方法 | 1 times |
| 2 | 特許6320582 | 半導体発光素子 | 1 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 31 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7473725 "シリカ粉末" (Opposition day 2024-10-23) , next is 特許7473726 "シリカ粉末" (Opposition day 2024-10-23) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7473725 | シリカ粉末 | 2024-10-23 |
| 2 | 特許7473726 | シリカ粉末 | 2024-10-23 |
| 3 | 特許7478632 | 酸化マグネシウム粉末、フィラー組成物、樹脂組成物、及び放熱部品 | 2024-10-09 |
| 4 | 特許7426520 | ヨウ化物イオンに非選択的な無機系凝集剤で処理したリサイクル水溶液 | 2024-07-26 |
| 5 | 特許7408884 | 窒化ケイ素焼結体及び焼結助剤粉末 | 2024-07-05 |
| 6 | 特許7401718 | 窒化ケイ素焼結体及び焼結助剤粉末 | 2024-06-19 |
| 7 | 特許7374932 | 金属粒子、それを用いた磁性体ペースト、圧粉磁心及びインダクタ、並びに金属粒子の製造方法 | 2024-04-30 |
| 8 | 特許7367165 | Ｘ線発生管、Ｘ線発生装置およびＸ線撮影システム | 2024-04-22 |
| 9 | 特許7326514 | フレーク状銀粉およびその製造方法、ならびに導電性ペースト | 2024-02-14 |
| 10 | 特許7321818 | シンチレータユニット、及び放射線検出器 | 2024-01-30 |
Protested cases
List of latest Protested patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 111 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2022-000709 "ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法" (Protest day 2024-12-27) , next is 特開2023-128125 "ガーネット型透明セラミックス及び磁気光学デバイス" (Protest day 2024-12-24) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-000709 | ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法 | 2024-12-27 |
| 2 | 特開2023-128125 | ガーネット型透明セラミックス及び磁気光学デバイス | 2024-12-24 |
| 3 | 特表2024-534885 | 白色の自動車コーティング組成物 | 2024-12-11 |
| 4 | 特開2022-063613 | 水中油型乳化化粧料 | 2024-12-09 |
| 5 | 特開2022-072074 | 油中水型乳化日焼け止め化粧料 | 2024-11-07 |
| 6 | 特開2022-063234 | カーボンナノチューブ分散液およびその利用 | 2024-11-01 |
| 7 | 特開2022-154083 | 銀焼結体、半導体装置、銀含有組成物、及び銀焼結体の製造方法 | 2024-11-01 |
| 8 | 特開2024-137811 | 撥剤 | 2024-10-31 |
| 9 | 特開2024-137808 | 撥剤 | 2024-10-31 |
| 10 | 特開2023-090208 | ラマン顕微鏡 | 2024-10-25 |
| 11 | 特開2023-090228 | ラマン顕微鏡 | 2024-10-25 |
| 12 | 特開2021-161381 | 二軸延伸フィルム、多層フィルム、包装袋、および二軸延伸フィルムの製造方法 | 2024-10-07 |
| 13 | 特表2022-507821 | 溶媒フリーの製剤およびナノコンポジット | 2024-10-07 |
| 14 | 特開2024-110953 | 金属酸化合物含有液 | 2024-09-19 |
| 15 | 特開2022-161378 | シリカ含有樹脂組成物及びその製造方法、並びにそのシリカ含有樹脂組成物を用いて行う射出成形方法 | 2024-09-13 |
| 16 | 特開2023-034764 | 可食性植物粉体組成物、及びその製造方法 | 2024-08-23 |
| 17 | 特開2021-172607 | 紫外線波長変換物質、炭化水素油及び／又は直鎖シリコーン油、並びに粉末を含有する肌用組成物 | 2024-08-23 |
| 18 | 特開2023-069017 | カーボンナノチューブ分散組成物、およびそれを用いた樹脂組成物、電極膜、二次電池、車両 | 2024-08-09 |
| 19 | 特許7573574 | 粒状酸化マグネシウム | 2024-06-25 |
| 20 | 特開2021-172528 | カーボンナノチューブ膜、分散液及びカーボンナノチューブ膜の製造方法 | 2024-06-14 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 229 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許6523349 "掃引信号源光学コヒーレンスドメイン反射率測定用の装置" (7 times) , and the next most protest patent is 特許6073406 "掃引信号源光学コヒーレンスドメイン反射率測定用の装置" (5 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6523349 | 掃引信号源光学コヒーレンスドメイン反射率測定用の装置 | 7 times |
| 2 | 特許6073406 | 掃引信号源光学コヒーレンスドメイン反射率測定用の装置 | 5 times |
| 3 | 特許6564849 | 自動分析装置及び自動分析方法 | 4 times |
| 4 | 特許7500276 | 電極材料、電極、二次電池、電池パック、及び車両 | 4 times |
| 5 | 特許6871673 | 血液検体を判定するための方法、装置及びコンピュータプログラム、並びに血液検体分析装置 | 4 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 172 patents Inspection from third parties. The average number of Inspection is 1.5 times. The most recently Inspection patent is 特開2022-063613 "水中油型乳化化粧料" (Inspection day 2024-12-10) , next is 特許5199917 "粘着シートとその製造方法および粘着型機能性フィルム" (Inspection day 2024-12-03) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-063613 | 水中油型乳化化粧料 | 2024-12-10 |
| 2 | 特許5199917 | 粘着シートとその製造方法および粘着型機能性フィルム | 2024-12-03 |
| 3 | 特開2022-154083 | 銀焼結体、半導体装置、銀含有組成物、及び銀焼結体の製造方法 | 2024-11-20 |
| 4 | 特開2022-063234 | カーボンナノチューブ分散液およびその利用 | 2024-11-14 |
| 5 | 特開2024-137811 | 撥剤 | 2024-11-12 |
| 6 | 特開2024-137808 | 撥剤 | 2024-11-12 |
| 7 | 特表2024-517410 | 動的光散乱アセンブリを有する装置 | 2024-11-06 |
| 8 | 特表2022-507821 | 溶媒フリーの製剤およびナノコンポジット | 2024-10-31 |
| 9 | 特開2023-090208 | ラマン顕微鏡 | 2024-10-30 |
| 10 | 特開2023-090228 | ラマン顕微鏡 | 2024-10-30 |
| 11 | 特開2021-172607 | 紫外線波長変換物質、炭化水素油及び／又は直鎖シリコーン油、並びに粉末を含有する肌用組成物 | 2024-10-30 |
| 12 | 特許7331436 | シリカ粒子、シリカゾル、研磨組成物、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 | 2024-10-28 |
| 13 | 特表2023-547920 | ナノ粒子堆積層を有する光電子デバイス | 2024-10-24 |
| 14 | 特開2021-161381 | 二軸延伸フィルム、多層フィルム、包装袋、および二軸延伸フィルムの製造方法 | 2024-10-23 |
| 15 | 特開2024-116129 | 細胞選別装置及び方法 | 2024-10-07 |
| 16 | 特許7524114 | リチウム二次電池用活物質、リチウム二次電池用電極、リチウム二次電池、電池パック、及び車両 | 2024-10-03 |
| 17 | 特開2024-110953 | 金属酸化合物含有液 | 2024-09-24 |
| 18 | 特許7557354 | 改質中空粒子及びその製造方法 | 2024-09-18 |
| 19 | 特開2023-069017 | カーボンナノチューブ分散組成物、およびそれを用いた樹脂組成物、電極膜、二次電池、車両 | 2024-08-28 |
| 20 | 特許7509542 | 紫外線波長変換物質を含有する組成物 | 2024-08-27 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 338 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.5. The most inspection patent is 特許6095725 "ベンゾチオフェン類、それを含む製剤、および方法" (15 times) , and the next most inspection patent is 特許6523349 "掃引信号源光学コヒーレンスドメイン反射率測定用の装置" (8 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6095725 | ベンゾチオフェン類、それを含む製剤、および方法 | 15 times |
| 2 | 特許6523349 | 掃引信号源光学コヒーレンスドメイン反射率測定用の装置 | 8 times |
| 3 | 特許7500276 | 電極材料、電極、二次電池、電池パック、及び車両 | 7 times |
| 4 | 特許6095821 | ベンゾチオフェン類、それを含む製剤、および方法 | 6 times |
| 5 | 特許7102436 | セキュリティエレメント及びセキュリティエレメントの形成方法 | 6 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 3,403 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.9. The most cited patent is 特許7270518 "破片内蔵合わせガラス及びその製造方法" (93 times) , and the next most cited patent is 特許6598269 "導波管ディスプレイ" (90 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7270518 | 破片内蔵合わせガラス及びその製造方法 | 93 times |
| 2 | 特許6598269 | 導波管ディスプレイ | 90 times |
| 3 | 特許6984993 | 自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置 | 53 times |
| 4 | 特許6766795 | 発光モジュールの製造方法及び発光モジュール | 50 times |
| 5 | 特開2016-201558 | 加工装置 | 40 times |
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