The Technical Field "パターン形成" had 379 patent application filings in the most recent period (2022-01-01 to 2022-07-31). This is a significantly decreased of -131 filings (-25.7%) over 510 they had in the same period of the previous year (2021-01-01 to 2021-07-31). This report also includes technical terms related to " パタニング ", " パタンニング ", " パタン化 ", " パタン形成 ", " パターニング ", " パターンニング ", " パターン化 " in the search set.
The highest number of filings in 2014 with 2,002 cases, and their lowest number in 2022 with 551 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 5,299 cases in total) is 883, and the median is 979. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 883 patents |
Std Dev | 435 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 551 cases | -41.1 % |
2021 year | 936 cases | -8.41 % |
2020 year | 1,022 cases | -19.21 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for パターン形成 for the period of the last 10 years (2014-01-01 to 2024-03-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of パターン形成, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of パターン形成 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
This patent analysis report was created for a patent search set of 12,263 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as パターン形成 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 21 cases, followed by 富士フイルム株式会社 with 12 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 21 cases |
富士フイルム株式会社 | 12 cases |
セイコーエプソン株式会社 | 7 cases |
エーエスエムエルネザーランズビーブイ | 3 cases |
株式会社東芝 | 2 cases |
日本電気株式会社 | 2 cases |
株式会社日立製作所 | 2 cases |
富士通株式会社 | 1 cases |
Comparing the number of applications of each company, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 627 cases, followed by キヤノン株式会社 with 388 cases.
Name | Cases |
---|---|
富士フイルム株式会社 | 627 cases |
キヤノン株式会社 | 388 cases |
エーエスエムエルネザーランズビーブイ | 343 cases |
セイコーエプソン株式会社 | 166 cases |
株式会社東芝 | 77 cases |
シャープ株式会社 | 69 cases |
株式会社日立製作所 | 20 cases |
富士通株式会社 | 17 cases |
ソニーグループ株式会社 | 15 cases |
日本電気株式会社 | 13 cases |
パナソニックホールディングス株式会社 | 4 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as パターン形成 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Among the top coapplicants, 富士フイルム株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 12 cases, followed by セイコーエプソン株式会社 with 7 cases.
Name | Cases |
---|---|
富士フイルム株式会社 | 12 cases |
セイコーエプソン株式会社 | 7 cases |
株式会社東芝 | 2 cases |
日本電気株式会社 | 2 cases |
富士通株式会社 | 1 cases |
Among the top coapplicants, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 627 cases, followed by セイコーエプソン株式会社 with 166 cases.
Name | Cases |
---|---|
富士フイルム株式会社 | 627 cases |
セイコーエプソン株式会社 | 166 cases |
株式会社東芝 | 77 cases |
富士通株式会社 | 17 cases |
ソニーグループ株式会社 | 15 cases |
日本電気株式会社 | 13 cases |
パナソニックホールディングス株式会社 | 4 cases |
Below is a ranking of the number of JP patent applications by パターン形成’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by パターン形成’s top 7 coapplicants over the last 20 years.
パターン形成 filed 627 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 248 cases in total) is 41.3, and the median is 46.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 106 cases, and their lowest number in 2022 with 11 cases.
Index | Value |
---|---|
Average | 41.3 patents |
Std Dev | 28.2 |
COV | 0.7 |
Year | Cases | YOY |
---|---|---|
2022 year | 11 cases | -71.1 % |
2021 year | 38 cases | -37.7 % |
2020 year | 61 cases | -25.61 % |
パターン形成 filed 77 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 15 cases in total) is 2.5, and the median is 2.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 34 cases, and their lowest number in 2022 with 2 cases.
Index | Value |
---|---|
Average | 2.5 patents |
Std Dev | 1.4 |
COV | 0.6 |
Year | Cases | YOY |
---|---|---|
2022 year | 2 cases | -33.3 % |
2021 year | 3 cases | +50.0 % |
2020 year | 2 cases | -50.0 % |
パターン形成 filed 166 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 31 cases in total) is 5.2, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 53 cases, and their lowest number in 2020 with 1 cases.
Index | Value |
---|---|
Average | 5.2 patents |
Std Dev | 4.1 |
COV | 0.8 |
Year | Cases | YOY |
---|---|---|
2022 year | 7 cases | +133 % |
2021 year | 3 cases | +200 % |
2020 year | 1 cases | -88.9 % |
パターン形成 filed 17 joint applications with 富士通株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 4 cases in total) is 0.7, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 5 cases, and their lowest number in 2020 with 0 cases.
Index | Value |
---|---|
Average | 0.7 patents |
Std Dev | 0.7 |
COV | 1.1 |
Year | Cases | YOY |
---|---|---|
2022 year | 1 cases | -50.0 % |
2021 year | 2 cases | - |
2020 year | 0 cases | - |
パターン形成 filed 4 joint applications with パナソニックホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 10 years (2013 to 2023, 18 cases in total) is 1.6, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.4, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 2 cases, and their lowest number in 2022 with 0 cases.
Index | Value |
---|---|
Average | 1.6 patents |
Std Dev | 4.0 |
COV | 2.4 |
Year | Cases | YOY |
---|---|---|
2017 year | 2 cases | - |
2016 year | 0 cases | - |
2015 year | 0 cases | -100 % |
The following shows JP patents held by パターン形成 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and パターン形成’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which パターン形成 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.0 times. The most recently Invalidation Trial patent is 特許6172509 "凹凸状シボパターン補修用マスキングシート、及び、凹凸状シボパターン補修方法" (Invalidation Trial day 2021-12-16) .
- | No. | Title | Invalidation Trial days |
---|---|---|---|
1 | 特許6172509 | 凹凸状シボパターン補修用マスキングシート、及び、凹凸状シボパターン補修方法 | 2021-12-16 |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 20 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7263153 "感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法" (Opposition day 2023-10-24) , next is 特許7320554 "エッチング方法" (Opposition day 2023-10-02) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7263153 | 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法 | 2023-10-24 |
2 | 特許7320554 | エッチング方法 | 2023-10-02 |
3 | 特許7226336 | パターン形成方法 | 2023-08-21 |
4 | 特許7226459 | メタルマスク基材、および、メタルマスクの製造方法 | 2023-08-18 |
5 | 特許7173967 | ナノスケールパターンを有する液晶回折デバイスおよびそれを製造するための方法 | 2023-05-16 |
6 | 特許7168796 | セラミック基板、複合基板及び回路基板並びにセラミック基板の製造方法、複合基板の製造方法、回路基板の製造方法及び複数の回路基板の製造方法 | 2023-04-28 |
7 | 特許7168795 | セラミック基板、複合基板及び回路基板並びにセラミック基板の製造方法、複合基板の製造方法、回路基板の製造方法及び複数の回路基板の製造方法 | 2023-04-27 |
8 | 特許7108565 | 導電性高分子組成物、被覆品、及びパターン形成方法 | 2023-01-27 |
9 | 特許7032126 | プリント配線板用基材及びプリント配線板 | 2022-08-24 |
10 | 特許6974799 | 膜密度が向上したレジスト下層膜を形成するための組成物 | 2022-06-01 |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 34 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2022-092497 "光硬化性組成物及びパターン形成方法" (Protest day 2024-02-20) , next is 特開2022-048206 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (Protest day 2024-02-19) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特開2022-092497 | 光硬化性組成物及びパターン形成方法 | 2024-02-20 |
2 | 特開2022-048206 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 2024-02-19 |
3 | 特許7464494 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-02-07 |
4 | 特許7464493 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-02-07 |
5 | 特表2023-508199 | ウェハクランプの硬いバールの製造および改修 | 2024-01-31 |
6 | 特表2023-553379 | 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング | 2024-01-05 |
7 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2023-12-28 |
8 | 特開2023-104887 | 金属ベース回路基板、及び金属ベース回路基板の製造方法 | 2023-10-19 |
9 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-08-09 |
10 | 特表2023-511769 | 水溶性有機‐無機ハイブリッドマスク配合物及びその用途 | 2023-07-13 |
11 | 特表2022-525767 | 堆積マスク並びに堆積マスクを製造及び使用する方法 | 2023-06-14 |
12 | 特表2022-553335 | 自動停止研磨組成物及び方法 | 2023-05-12 |
13 | 特許7305946 | レジストパターン形成方法 | 2023-04-21 |
14 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むEUVリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2022-12-26 |
15 | 特許7391762 | 導電性ペースト、および、セラミック配線基板の製造方法 | 2022-11-18 |
16 | 特開2020-131552 | キャリアおよび半導体装置の製造方法 | 2022-10-25 |
17 | 特許7168795 | セラミック基板、複合基板及び回路基板並びにセラミック基板の製造方法、複合基板の製造方法、回路基板の製造方法及び複数の回路基板の製造方法 | 2022-10-21 |
18 | 特許7226459 | メタルマスク基材、および、メタルマスクの製造方法 | 2022-10-11 |
19 | 特許7171845 | 樹脂組成物 | 2022-10-07 |
20 | 特許7313136 | 感光性樹脂組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 | 2022-10-04 |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 78 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許7051818 "感光性樹脂組成物" (5 times) , and the next most protest patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (4 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許7051818 | 感光性樹脂組成物 | 5 times |
2 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 4 times |
3 | 特許6824195 | 着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 | 4 times |
4 | 特許6721578 | 赤外線吸収組成物、赤外線カットフィルタ、積層体、パターン形成方法、および固体撮像素子 | 3 times |
5 | 特許6432072 | メタルマスク基材、および、メタルマスクの製造方法 | 3 times |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 69 patents Inspection from third parties. The average number of Inspection is 1.4 times. The most recently Inspection patent is 特開2022-048206 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (Inspection day 2024-03-15) , next is 特開2022-092497 "光硬化性組成物及びパターン形成方法" (Inspection day 2024-03-13) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特開2022-048206 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 2024-03-15 |
2 | 特開2022-092497 | 光硬化性組成物及びパターン形成方法 | 2024-03-13 |
3 | 特開2023-166458 | 太陽電池及びその製造方法 | 2024-02-21 |
4 | 特許7455564 | 太陽電池の製造方法 | 2024-02-21 |
5 | 特開2023-168651 | 銅-亜鉛合金電気めっき液、銅-亜鉛合金バンプの形成方法、ナノポーラス銅バンプの形成方法、銅-亜鉛合金バンプ付き基材及びナノポーラス銅バンプ付き基材 | 2024-02-20 |
6 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2024-02-05 |
7 | 特表2023-553379 | 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング | 2024-01-26 |
8 | 特開2022-076014 | アンケージングステント | 2024-01-15 |
9 | 特許5085853 | 積層構造における電気的な交差を提供する方法 | 2024-01-09 |
10 | 特許7393573 | フォトマスクの製造方法 | 2023-11-28 |
11 | 特表2021-502331 | 視機能を強化するための組成物及び方法 | 2023-11-14 |
12 | 特開2023-104887 | 金属ベース回路基板、及び金属ベース回路基板の製造方法 | 2023-11-01 |
13 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-09-12 |
14 | 特表2023-511769 | 水溶性有機‐無機ハイブリッドマスク配合物及びその用途 | 2023-08-10 |
15 | 特許7461294 | 透過型メタサーフェスレンズ統合 | 2023-07-03 |
16 | 特許6708518 | 基板固定装置及びその製造方法 | 2023-06-29 |
17 | 特表2022-525767 | 堆積マスク並びに堆積マスクを製造及び使用する方法 | 2023-06-22 |
18 | 特許7419170 | ハイブリッド符号化を使用するチップレスRFIDタグ | 2023-06-16 |
19 | 特表2022-553335 | 自動停止研磨組成物及び方法 | 2023-06-08 |
20 | 特許7305946 | レジストパターン形成方法 | 2023-05-23 |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 183 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特許6860500 "感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置" (7 times) , and the next most inspection patent is 特許6824195 "着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置" (6 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6860500 | 感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置 | 7 times |
2 | 特許6824195 | 着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 | 6 times |
3 | 特許6432072 | メタルマスク基材、および、メタルマスクの製造方法 | 6 times |
4 | 特許6753669 | 埋設回路を備えるプリント配線板の製造方法及びその製造方法で得られるプリント配線板 | 6 times |
5 | 特許7051818 | 感光性樹脂組成物 | 6 times |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 3,153 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.0. The most cited patent is 特許6734933 "構造化光投影のためのホログラフィック導波管装置" (58 times) , and the next most cited patent is 特開2016-073922 "有機溶剤の精製装置" (50 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6734933 | 構造化光投影のためのホログラフィック導波管装置 | 58 times |
2 | 特開2016-073922 | 有機溶剤の精製装置 | 50 times |
3 | 特許7047046 | マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法 | 41 times |
4 | 特許6646659 | 仮想および拡張現実を作成する方法およびシステム | 39 times |
5 | 特開2014-225667 | BSI型CMOSイメージセンサ | 35 times |
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