5F246 半導体の露光処理技術 Patent Trends
The Theme Code "半導体の露光処理技術" had 199 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a significantly decreased of -59 filings (-22.9%) over 258 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 415 cases, and their lowest number in 2024 with 235 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 1,326 cases in total) is 332, and the median is 338. The coefficient of variation (standard deviation/mean) is 0.20, and filings have been moderate fluctuations.
| Index | Value |
|---|---|
| Average | 332 patents |
| Std Dev | 66.8 |
| COV | 0.20 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 55 cases | -76.6% |
| 2024 year | 235 cases | -24.44% |
| 2023 year | 311 cases | -14.79% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 半導体の露光処理技術[5F246] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 半導体の露光処理技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
半導体の露光処理技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 半導体の露光処理技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
半導体の露光処理技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 415 |
| 2022 | 365 |
| 2023 | 311 |
| 2024 | 235 |
| 2025 | 55 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 1,381 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
半導体の露光処理技術[5F246]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPP7919681 | 光接続構造及びその製造方法 | ・Applicant 国立研究開発法人産業技術総合研究所 ・Filing date 2022-04-27 ・Publication date 2026-09-14 | 2H137, 2H147, 4F213, 5F146, 5F246 |
| 2. JPA-HYO2026-530923 | 硬質スタンプを用いて軟質スタンプを製造する方法 | ・Applicant エーファウ・グループ・エー・タルナー・ゲーエムベーハー ・Filing date 2023-06-29 ・Publication date 2026-09-11 | 2H196, 5F246 |
| 3. JPA2026-143024 | 基板処理装置 | ・Applicant 芝浦メカトロニクス株式会社 ・Filing date 2025-02-27 ・Publication date 2026-09-08 | 5F043, 5F146, 5F157, 5F246 |
| 4. JPP7913517 | レジストパターン形成方法 | ・Applicant 日産化学株式会社 ・Filing date 2022-04-25 ・Publication date 2026-09-01 | 2H197, 2H225, 5F146, 5F246 |
| 5. JPA2026-138848 | 膜形成方法、膜形成装置及び物品の製造方法 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-19 ・Publication date 2026-08-31 | 4F209, 5F146, 5F246 |
| 6. JPA2026-138898 | 基板処理装置および基板処理方法 | ・Applicant 株式会社SCREENホールディングス ・Filing date 2025-02-19 ・Publication date 2026-08-31 | 5F043, 5F146, 5F246 |
| 7. JPA2026-138327 | 異物除去装置、異物除去方法、物品製造方法、インプリント装置およびモールド | ・Applicant キヤノン株式会社 ・Filing date 2025-02-18 ・Publication date 2026-08-28 | 4F209, 5F146, 5F246 |
| 8. JPA2026-138328 | パターン形成方法、および物品製造方法 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-18 ・Publication date 2026-08-28 | 5F058, 5F146, 5F246 |
| 9. JPA2026-137293 | 基板処理装置および基板処理装置の設置方法 | ・Applicant 株式会社SCREENホールディングス ・Filing date 2025-02-17 ・Publication date 2026-08-27 | 5F131, 5F146, 5F246 |
| 10. JPA2026-136746 | 作業支援方法および作業支援システム | ・Applicant 株式会社SCREENホールディングス ・Filing date 2025-02-14 ・Publication date 2026-08-26 | 5B050, 5F146, 5F246 |
| 11. JPA2026-137083 | チャンバーの流れ場安定化とチャンバーの清浄度向上のためのスピンコートチャンバー構造 | ・Applicant 大連理工大学 ・Filing date 2026-02-10 ・Publication date 2026-08-26 | 2H225, 4F042, 5F246 |
| 12. JPA2026-136659 | 基板処理装置 | ・Applicant 芝浦メカトロニクス株式会社 ・Filing date 2025-02-14 ・Publication date 2026-08-26 | 5F043, 5F146, 5F246 |
| 13. JPA2026-135588 | レジスト下層膜形成用組成物 | ・Applicant 日産化学株式会社 ・Filing date 2025-02-13 ・Publication date 2026-08-25 | 2H197, 2H225, 5F146, 5F246 |
| 14. JPA2026-134626 | 塗布装置および基板処理装置 | ・Applicant 株式会社SCREENホールディングス ・Filing date 2025-02-10 ・Publication date 2026-08-21 | 4F041, 4F042, 5F146, 5F246 |
| 15. JPA2026-133135 | 成形装置、および物品製造方法 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-06 ・Publication date 2026-08-19 | 4F209, 5F146, 5F246 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「半導体の露光処理技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 半導体の露光処理技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 195 cases, followed by 東京エレクトロン株式会社 with 117 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 195 cases |
| 東京エレクトロン株式会社 | 117 cases |
| 株式会社SCREENホールディングス | 62 cases |
| 信越化学工業株式会社 | 36 cases |
| キオクシア株式会社 | 17 cases |
| アプライドマテリアルズインコーポレイテッド | 14 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 525 cases, followed by 東京エレクトロン株式会社 with 342 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 525 cases |
| 東京エレクトロン株式会社 | 342 cases |
| 株式会社SCREENホールディングス | 195 cases |
| キオクシア株式会社 | 73 cases |
| 信越化学工業株式会社 | 66 cases |
| アプライドマテリアルズインコーポレイテッド | 45 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| キヤノン株式会社 | 525 |
| 東京エレクトロン株式会社 | 342 |
| 株式会社SCREENホールディングス | 195 |
| キオクシア株式会社 | 73 |
| 信越化学工業株式会社 | 66 |
| アプライドマテリアルズインコーポレイテッド | 45 |
Top company information (JP)
{'ja': '技術テーマ「半導体の露光処理技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 半導体の露光処理技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 195 cases, followed by 東京エレクトロン株式会社 with 117 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 195 cases |
| 東京エレクトロン株式会社 | 117 cases |
| 株式会社SCREENホールディングス | 62 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 525 cases, followed by 東京エレクトロン株式会社 with 342 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 525 cases |
| 東京エレクトロン株式会社 | 342 cases |
| 株式会社SCREENホールディングス | 195 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by 半導体の露光処理技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| キヤノン株式会社 | 525 |
| 東京エレクトロン株式会社 | 342 |
| 株式会社SCREENホールディングス | 195 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by 半導体の露光処理技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| キヤノン株式会社 | 525 |
| 東京エレクトロン株式会社 | 342 |
| 株式会社SCREENホールディングス | 195 |
Top company details
Trends in filing of joint patent applications with キヤノン株式会社
半導体の露光処理技術 filed 525 joint applications with キヤノン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 511 cases in total) is 102, and the median is 101. The coefficient of variation (standard deviation/mean) is 0.13, and filings have been moderate fluctuations.
The highest number of filings in 2021 with 121 cases, and their lowest number in 2024 with 81 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 102 patents |
| Std Dev | 13.0 |
| COV | 0.13 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 14 cases | -82.7% |
| 2024 year | 81 cases | -19.00% |
| 2023 year | 100 cases | -0.99% |
Trends in filing of joint patent applications with 東京エレクトロン株式会社
半導体の露光処理技術 filed 342 joint applications with 東京エレクトロン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 330 cases in total) is 66.0, and the median is 62.0. The coefficient of variation (standard deviation/mean) is 0.23, and filings have been moderate fluctuations.
The highest number of filings in 2020 with 91 cases, and their lowest number in 2024 with 45 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 66.0 patents |
| Std Dev | 15.2 |
| COV | 0.23 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 12 cases | -73.3% |
| 2024 year | 45 cases | -25.00% |
| 2023 year | 60 cases | -3.23% |
Trends in filing of joint patent applications with 株式会社SCREENホールディングス
半導体の露光処理技術 filed 195 joint applications with 株式会社SCREENホールディングス for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 188 cases in total) is 37.6, and the median is 37.0. The coefficient of variation (standard deviation/mean) is 0.26, and filings have been large fluctuations.
The highest number of filings in 2020 with 52 cases, and their lowest number in 2024 with 25 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 37.6 patents |
| Std Dev | 9.6 |
| COV | 0.26 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 7 cases | -72.0% |
| 2024 year | 25 cases | -16.67% |
| 2023 year | 30 cases | -18.92% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む