5F058 絶縁膜の形成技術 Patent Trends
The Theme Code "絶縁膜の形成技術" had 202 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a significantly decreased of -57 filings (-22.0%) over 259 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 410 cases, and their lowest number in 2024 with 229 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 1,272 cases in total) is 318, and the median is 316. The coefficient of variation (standard deviation/mean) is 0.21, and filings have been moderate fluctuations.
| Index | Value |
|---|---|
| Average | 318 patents |
| Std Dev | 65.3 |
| COV | 0.21 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 75 cases | -67.2% |
| 2024 year | 229 cases | -23.15% |
| 2023 year | 298 cases | -11.04% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 絶縁膜の形成技術[5F058] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 絶縁膜の形成技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
絶縁膜の形成技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 絶縁膜の形成技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
絶縁膜の形成技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 410 |
| 2022 | 335 |
| 2023 | 298 |
| 2024 | 229 |
| 2025 | 75 |
Patent Landscape
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 絶縁膜の形成技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
Keywords (importance)
Top keywords frequently used in patent filings for 絶縁膜の形成技術 are shown below.
Top keywords for 絶縁膜の形成技術
| Keyword | Score |
|---|---|
| 膜 | 100.0 |
| 基板 | 90.76 |
| 酸化 | 60.22 |
| 絶縁 | 44.52 |
| 半導体 | 41.77 |
| 供給 | 34.61 |
| 誘電 | 32.56 |
| 表面 | 32.04 |
| 反応 | 29.25 |
| ゲート | 28.22 |
| 電極 | 24.32 |
| シリコン | 24.11 |
| 含有 | 21.39 |
| ガス | 19.95 |
| プラズマ | 19.35 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 1,347 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
絶縁膜の形成技術[5F058]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA-HYO2026-534049 | 反応種表面吸着補助剤、薄膜、半導体基板及び半導体素子 | ・Applicant ソウルブレインシーオーエルティーディー ・Filing date 2024-09-09 ・Publication date 2026-10-14 | 4K030, 5F058 |
| 2. JPA2026-165977 | 絶縁充填フィルム、絶縁充填複合シート、及び電子部品の製造方法 | ・Applicant リンテック株式会社 ・Filing date 2025-03-31 ・Publication date 2026-10-14 | 5F058 |
| 3. JPA-HYO2026-533928 | 半導体構造及びその製造方法 | ・Applicant 長江存儲控股股分有限公司 ・Filing date 2024-08-30 ・Publication date 2026-10-14 | 5F033, 5F048, 5F058, 5F083, 5F110, +1 more |
| 4. JPA-HYO2026-534112 | 拡散バリアの接合強度を改善するための方法及びデバイス | ・Applicant トーキョーエレクトロンユーエスホールディングスインコーポレーテッド, 東京エレクトロン株式会社 ・Filing date 2024-07-22 ・Publication date 2026-10-14 | 5F033, 5F058 |
| 5. JPA2026-167293 | 無機膜付きＮ形酸化ガリウム単結晶ウェハの製造方法及び無機膜付きＮ形酸化ガリウム単結晶ウェハ | ・Applicant 新電元工業株式会社 ・Filing date 2025-04-01 ・Publication date 2026-10-14 | 4M104, 5F058 |
| 6. JPP7933861 | 誘電体薄膜堆積のための変換器結合プラズマ源設計 | ・Applicant ラムリサーチコーポレーション ・Filing date 2022-08-05 ・Publication date 2026-10-13 | 2G084, 4K030, 5F004, 5F045, 5F058 |
| 7. JPP7933892 | 低温酸化ケイ素間隙充填 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2023-05-23 ・Publication date 2026-10-13 | 4K030, 5F045, 5F058 |
| 8. JPP7934051 | 膜堆積及びエッジイオン注入を使用した基板の鞍型変形の緩和 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-02-06 ・Publication date 2026-10-13 | 4M106, 5C101, 5F058 |
| 9. JPP7933293 | 有機小分子阻害剤及び薄膜堆積におけるそれの使用方法 | ・Applicant 安徽安徳科銘半導体科技股フン有限公司 ・Filing date 2024-05-15 ・Publication date 2026-10-13 | 4K030, 5F058 |
| 10. JPA2026-164496 | 処理方法、半導体装置の製造方法、プログラム及び処理装置 | ・Applicant 株式会社KOKUSAIELECTRIC ・Filing date 2025-03-28 ・Publication date 2026-10-09 | 4K030, 5F045, 5F058 |
| 11. JPA2026-158932 | 成膜方法及び成膜装置 | ・Applicant 東京エレクトロン株式会社 ・Filing date 2025-03-25 ・Publication date 2026-10-07 | 4K030, 5F045, 5F058 |
| 12. JPA2026-158972 | 基板処理方法、半導体装置の製造方法、プログラム、及び基板処理装置 | ・Applicant 株式会社KOKUSAIELECTRIC ・Filing date 2025-03-25 ・Publication date 2026-10-07 | 4K030, 5F045, 5F058 |
| 13. JPP7763982 | シリコン酸化膜形成方法、シリコン酸化膜形成装置およびシリコン酸化膜, シリコン酸化膜形成方法、シリコン酸化膜形成装置およびシリコン酸化膜 | ・Applicant SPPテクノロジーズ株式会社 ・Filing date 2025-03-25 ・Publication date 2026-10-07 | 4K030, 5F058 |
| 14. JPA2026-157295 | 基板処理装置 | ・Applicant 株式会社SCREENホールディングス ・Filing date 2025-03-21 ・Publication date 2026-10-06 | 5F058, 5F131 |
| 15. JPA2026-154299 | 半導体装置、表示装置及び半導体装置の製造方法 | ・Applicant シャープディスプレイテクノロジー株式会社 ・Filing date 2025-03-18 ・Publication date 2026-10-05 | 5F058, 5F110 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「絶縁膜の形成技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 絶縁膜の形成技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 122 cases, followed by アプライドマテリアルズインコーポレイテッド with 67 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 122 cases |
| アプライドマテリアルズインコーポレイテッド | 67 cases |
| 株式会社KOKUSAIELECTRIC | 55 cases |
| キオクシア株式会社 | 19 cases |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 12 cases |
| ラムリサーチコーポレーション | 9 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 357 cases, followed by 株式会社KOKUSAIELECTRIC with 217 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 357 cases |
| 株式会社KOKUSAIELECTRIC | 217 cases |
| アプライドマテリアルズインコーポレイテッド | 215 cases |
| ラムリサーチコーポレーション | 67 cases |
| キオクシア株式会社 | 46 cases |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 45 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 357 |
| 株式会社KOKUSAIELECTRIC | 217 |
| アプライドマテリアルズインコーポレイテッド | 215 |
| ラムリサーチコーポレーション | 67 |
| キオクシア株式会社 | 46 |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 45 |
Top company information (JP)
{'ja': '技術テーマ「絶縁膜の形成技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 絶縁膜の形成技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 122 cases, followed by アプライドマテリアルズインコーポレイテッド with 67 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 122 cases |
| アプライドマテリアルズインコーポレイテッド | 67 cases |
| 株式会社KOKUSAIELECTRIC | 55 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 357 cases, followed by 株式会社KOKUSAIELECTRIC with 217 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 357 cases |
| 株式会社KOKUSAIELECTRIC | 217 cases |
| アプライドマテリアルズインコーポレイテッド | 215 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by 絶縁膜の形成技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 357 |
| 株式会社KOKUSAIELECTRIC | 217 |
| アプライドマテリアルズインコーポレイテッド | 215 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by 絶縁膜の形成技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 357 |
| 株式会社KOKUSAIELECTRIC | 217 |
| アプライドマテリアルズインコーポレイテッド | 215 |
Top company details
Trends in filing of joint patent applications with 東京エレクトロン株式会社
絶縁膜の形成技術 filed 357 joint applications with 東京エレクトロン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 348 cases in total) is 69.6, and the median is 67.0. The coefficient of variation (standard deviation/mean) is 0.21, and filings have been moderate fluctuations.
The highest number of filings in 2022 with 93 cases, and their lowest number in 2024 with 49 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 69.6 patents |
| Std Dev | 14.4 |
| COV | 0.21 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 9 cases | -81.6% |
| 2024 year | 49 cases | -23.44% |
| 2023 year | 64 cases | -31.2% |
Trends in filing of joint patent applications with アプライドマテリアルズインコーポレイテッド
絶縁膜の形成技術 filed 215 joint applications with アプライドマテリアルズインコーポレイテッド for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 215 cases in total) is 43.0, and the median is 42.0. The coefficient of variation (standard deviation/mean) is 0.28, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2021 with 64 cases, and their lowest number in 2023 with 26 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 43.0 patents |
| Std Dev | 12.1 |
| COV | 0.28 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 41 cases | +57.7% |
| 2023 year | 26 cases | -38.1% |
Trends in filing of joint patent applications with 株式会社KOKUSAIELECTRIC
絶縁膜の形成技術 filed 217 joint applications with 株式会社KOKUSAIELECTRIC for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 210 cases in total) is 42.0, and the median is 37.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
The highest number of filings in 2021 with 70 cases, and their lowest number in 2024 with 18 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 42.0 patents |
| Std Dev | 18.4 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 7 cases | -61.1% |
| 2024 year | 18 cases | -40.0% |
| 2023 year | 30 cases | -18.92% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む