5F058 絶縁膜の形成技術 Patent Trends
The Theme Code "絶縁膜の形成技術" had 198 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a significantly decreased of -60 filings (-23.3%) over 258 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 409 cases, and their lowest number in 2024 with 225 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 1,264 cases in total) is 316, and the median is 315. The coefficient of variation (standard deviation/mean) is 0.21, and filings have been moderate fluctuations.
| Index | Value |
|---|---|
| Average | 316 patents |
| Std Dev | 66.3 |
| COV | 0.21 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 63 cases | -72.0% |
| 2024 year | 225 cases | -24.24% |
| 2023 year | 297 cases | -10.81% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 絶縁膜の形成技術[5F058] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 絶縁膜の形成技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
絶縁膜の形成技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 絶縁膜の形成技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
絶縁膜の形成技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 409 |
| 2022 | 333 |
| 2023 | 297 |
| 2024 | 225 |
| 2025 | 63 |
Patent Landscape
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 絶縁膜の形成技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
Keywords (importance)
Top keywords frequently used in patent filings for 絶縁膜の形成技術 are shown below.
Top keywords for 絶縁膜の形成技術
| Keyword | Score |
|---|---|
| 膜 | 100.0 |
| 基板 | 90.76 |
| 酸化 | 60.22 |
| 絶縁 | 44.52 |
| 半導体 | 41.77 |
| 供給 | 34.61 |
| 誘電 | 32.56 |
| 表面 | 32.04 |
| 反応 | 29.25 |
| ゲート | 28.22 |
| 電極 | 24.32 |
| シリコン | 24.11 |
| 含有 | 21.39 |
| ガス | 19.95 |
| プラズマ | 19.35 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 1,327 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
絶縁膜の形成技術[5F058]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPP7923355 | シクロシラザン化合物およびこれを用いたシリコン含有薄膜の製造方法 | ・Applicant ディーエヌエフカンパニーリミテッド ・Filing date 2025-03-14 ・Publication date 2026-09-17 | 4H049, 4K030, 5F058 |
| 2. JPA2026-147833 | 感光性樹脂組成物及び半導体デバイス | ・Applicant 日油株式会社 ・Filing date 2025-03-07 ・Publication date 2026-09-17 | 2H225, 4J100, 5F058 |
| 3. JPA-HYO2026-531671 | 熱安定性及び光安定性が改善された分子内安定化モノアルキル金属化合物及びそれらの使用 | ・Applicant メルクパテントゲゼルシャフトミットベシュレンクテルハフツング ・Filing date 2024-09-11 ・Publication date 2026-09-17 | 4H049, 4K030, 5F058 |
| 4. JPP7923253 | ゲートオールアラウンドＦＥＴアーキテクチャ用の閾値電圧調節 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2021-11-17 ・Publication date 2026-09-17 | 5F045, 5F048, 5F058, 5F140 |
| 5. JPA-HYO2026-531397 | 低減された比誘電率と高い機械的強度とを有する低誘電率誘電体材料を形成するための方法 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-08-19 ・Publication date 2026-09-16 | 4K030, 5F045, 5F058 |
| 6. JPA-HYO2026-531456 | 窒化ケイ素膜を形成する方法 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-09-10 ・Publication date 2026-09-16 | 4K030, 5F045, 5F058 |
| 7. JPA2026-145503 | 強誘電体薄膜の製造方法 | ・Applicant 兵庫県公立大学法人, 株式会社SCREENホールディングス ・Filing date 2025-03-03 ・Publication date 2026-09-15 | 5F058, 5F083 |
| 8. JPA-HYO2026-531087 | カップリング剤、それを含むコーティングシステム、関連する方法及び使用 | ・Applicant ピコサンオーワイ ・Filing date 2024-08-21 ・Publication date 2026-09-14 | 4K030, 5F058 |
| 9. JPA-HYO2026-530683 | 周期的ＰＥＡＬＤ／ＰＥＣＶＤ薄膜カプセル化バリア | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-09-26 ・Publication date 2026-09-10 | 4K030, 5F045, 5F058 |
| 10. JPA-HYO2026-530567 | 誘電率を低減し、かつ密度を高めた低誘電率誘電材料を形成するための方法 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-08-08 ・Publication date 2026-09-09 | 4K030, 5F045, 5F058 |
| 11. JPA-HYO2026-530481 | ハイブリッド結合における高強度非対称誘電体のための方法及び構造 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-08-29 ・Publication date 2026-09-08 | 5F033, 5F058 |
| 12. JPA2026-143714 | 容量素子の作製方法 | ・Applicant 株式会社半導体エネルギー研究所 ・Filing date 2021-08-24 ・Publication date 2026-09-08 | 5F038, 5F048, 5F058, 5F083, 5F110 |
| 13. JPA2026-141170 | 半導体基板の製造方法、基板のエッチング方法、及び表面改質用組成物 | ・Applicant 東京応化工業株式会社 ・Filing date 2025-02-25 ・Publication date 2026-09-04 | 5F004, 5F058 |
| 14. JPA2026-141041 | 成膜方法 | ・Applicant 東京エレクトロン株式会社 ・Filing date 2022-08-30 ・Publication date 2026-09-03 | 4K030, 5F045, 5F058 |
| 15. JPA-HYO2026-529970 | 間隙充填のためのヒドロキシル化を使用したシーム性能の向上 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2024-08-20 ・Publication date 2026-09-03 | 4K030, 5F045, 5F058 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「絶縁膜の形成技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 絶縁膜の形成技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 120 cases, followed by アプライドマテリアルズインコーポレイテッド with 67 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 120 cases |
| アプライドマテリアルズインコーポレイテッド | 67 cases |
| 株式会社KOKUSAIELECTRIC | 53 cases |
| キオクシア株式会社 | 18 cases |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 12 cases |
| ラムリサーチコーポレーション | 9 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 355 cases, followed by アプライドマテリアルズインコーポレイテッド with 214 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 355 cases |
| アプライドマテリアルズインコーポレイテッド | 214 cases |
| 株式会社KOKUSAIELECTRIC | 214 cases |
| ラムリサーチコーポレーション | 67 cases |
| キオクシア株式会社 | 45 cases |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 45 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 355 |
| アプライドマテリアルズインコーポレイテッド | 214 |
| 株式会社KOKUSAIELECTRIC | 214 |
| ラムリサーチコーポレーション | 67 |
| キオクシア株式会社 | 45 |
| バーサムマテリアルズユーエスリミティドライアビリティカンパニー | 45 |
Top company information (JP)
{'ja': '技術テーマ「絶縁膜の形成技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 絶縁膜の形成技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 120 cases, followed by アプライドマテリアルズインコーポレイテッド with 67 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 120 cases |
| アプライドマテリアルズインコーポレイテッド | 67 cases |
| 株式会社KOKUSAIELECTRIC | 53 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 355 cases, followed by アプライドマテリアルズインコーポレイテッド with 214 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 355 cases |
| アプライドマテリアルズインコーポレイテッド | 214 cases |
| 株式会社KOKUSAIELECTRIC | 214 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by 絶縁膜の形成技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 355 |
| アプライドマテリアルズインコーポレイテッド | 214 |
| 株式会社KOKUSAIELECTRIC | 214 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by 絶縁膜の形成技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 355 |
| アプライドマテリアルズインコーポレイテッド | 214 |
| 株式会社KOKUSAIELECTRIC | 214 |
Top company details
Trends in filing of joint patent applications with 東京エレクトロン株式会社
絶縁膜の形成技術 filed 355 joint applications with 東京エレクトロン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 347 cases in total) is 69.4, and the median is 67.0. The coefficient of variation (standard deviation/mean) is 0.21, and filings have been moderate fluctuations.
The highest number of filings in 2022 with 93 cases, and their lowest number in 2024 with 48 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 69.4 patents |
| Std Dev | 14.7 |
| COV | 0.21 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 8 cases | -83.3% |
| 2024 year | 48 cases | -25.00% |
| 2023 year | 64 cases | -31.2% |
Trends in filing of joint patent applications with アプライドマテリアルズインコーポレイテッド
絶縁膜の形成技術 filed 214 joint applications with アプライドマテリアルズインコーポレイテッド for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 214 cases in total) is 42.8, and the median is 42.0. The coefficient of variation (standard deviation/mean) is 0.28, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2021 with 63 cases, and their lowest number in 2023 with 26 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 42.8 patents |
| Std Dev | 11.8 |
| COV | 0.28 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 41 cases | +57.7% |
| 2023 year | 26 cases | -38.1% |
Trends in filing of joint patent applications with 株式会社KOKUSAIELECTRIC
絶縁膜の形成技術 filed 214 joint applications with 株式会社KOKUSAIELECTRIC for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 209 cases in total) is 41.8, and the median is 36.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
The highest number of filings in 2021 with 70 cases, and their lowest number in 2024 with 18 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 41.8 patents |
| Std Dev | 18.5 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 5 cases | -72.2% |
| 2024 year | 18 cases | -40.0% |
| 2023 year | 30 cases | -16.67% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む