フォトリソグラフィー用材料技術 (JP Patent Analysis Report)
The Theme Code "フォトリソグラフィー用材料技術" had 452 patent application filings in the most recent period (2022-01-01 to 2022-08-31). This is a slightly decreased of -10 filings (-2.2%) over 462 they had in the same period of the previous year (2021-01-01 to 2021-08-31).
The highest number of filings in 2016 with 1,238 cases, and their lowest number in 2022 with 617 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,742 cases in total) is 790, and the median is 779. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 790 patents |
| Std Dev | 311 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 617 cases | -10.19 % |
| 2021 year | 687 cases | -21.13 % |
| 2020 year | 871 cases | -22.30 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for フォトリソグラフィー用材料技術[2H225] for the period of the last 10 years (2014-01-01 to 2024-04-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of フォトリソグラフィー用材料技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for フォトリソグラフィー用材料技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
フォトリソグラフィー用材料技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of フォトリソグラフィー用材料技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for フォトリソグラフィー用材料技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in フォトリソグラフィー用材料技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 9,450 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
フォトリソグラフィー用材料技術[2H225]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 324 cases, followed by 信越化学工業株式会社 with 101 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 324 cases |
| 信越化学工業株式会社 | 101 cases |
| 東京応化工業株式会社 | 48 cases |
| ARTIENCE株式会社 | 36 cases |
| 富士フイルム株式会社 | 34 cases |
| 東レ株式会社 | 30 cases |
| 住友ベークライト株式会社 | 25 cases |
| JSR株式会社 | 19 cases |
| 株式会社レゾナック | 9 cases |
| TOPPANホールディングス株式会社 | 5 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,179 cases, followed by 住友化学株式会社 with 1,168 cases.
| Name | Cases |
|---|---|
| 富士フイルム株式会社 | 1,179 cases |
| 住友化学株式会社 | 1,168 cases |
| JSR株式会社 | 547 cases |
| 信越化学工業株式会社 | 532 cases |
| 東京応化工業株式会社 | 508 cases |
| ARTIENCE株式会社 | 490 cases |
| 株式会社レゾナック | 411 cases |
| 東レ株式会社 | 319 cases |
| 住友ベークライト株式会社 | 214 cases |
| TOPPANホールディングス株式会社 | 79 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 324 cases, followed by 信越化学工業株式会社 with 101 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 324 cases |
| 信越化学工業株式会社 | 101 cases |
| 東京応化工業株式会社 | 48 cases |
| 富士フイルム株式会社 | 34 cases |
| JSR株式会社 | 19 cases |
| 株式会社レゾナック | 9 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,179 cases, followed by 住友化学株式会社 with 1,168 cases.
| Name | Cases |
|---|---|
| 富士フイルム株式会社 | 1,179 cases |
| 住友化学株式会社 | 1,168 cases |
| JSR株式会社 | 547 cases |
| 信越化学工業株式会社 | 532 cases |
| 東京応化工業株式会社 | 508 cases |
| 株式会社レゾナック | 411 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by フォトリソグラフィー用材料技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by フォトリソグラフィー用材料技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 富士フイルム株式会社
フォトリソグラフィー用材料技術 filed 1,179 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 607 cases in total) is 101, and the median is 116. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 197 cases, and their lowest number in 2022 with 32 cases.
| Index | Value |
|---|---|
| Average | 101 patents |
| Std Dev | 67.4 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 32 cases | -65.2 % |
| 2021 year | 92 cases | -34.3 % |
| 2020 year | 140 cases | -28.93 % |
Trends in filing of joint patent applications with JSR株式会社
フォトリソグラフィー用材料技術 filed 547 joint applications with JSR株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 166 cases in total) is 27.7, and the median is 23.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 129 cases, and their lowest number in 2022 with 11 cases.
| Index | Value |
|---|---|
| Average | 27.7 patents |
| Std Dev | 19.1 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 11 cases | -26.67 % |
| 2021 year | 15 cases | -53.1 % |
| 2020 year | 32 cases | -13.51 % |
Trends in filing of joint patent applications with 住友化学株式会社
フォトリソグラフィー用材料技術 filed 1,168 joint applications with 住友化学株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 816 cases in total) is 136, and the median is 136. The coefficient of variation (standard deviation/mean) is 0.18, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 179 cases, and their lowest number in 2014 with 56 cases.
| Index | Value |
|---|---|
| Average | 136 patents |
| Std Dev | 24.0 |
| COV | 0.18 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 179 cases | +28.78 % |
| 2021 year | 139 cases | +3.73 % |
| 2020 year | 134 cases | +14.53 % |
Trends in filing of joint patent applications with 東京応化工業株式会社
フォトリソグラフィー用材料技術 filed 508 joint applications with 東京応化工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 263 cases in total) is 43.8, and the median is 49.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 72 cases, and their lowest number in 2014 with 35 cases.
| Index | Value |
|---|---|
| Average | 43.8 patents |
| Std Dev | 20.8 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 46 cases | +21.05 % |
| 2021 year | 38 cases | -26.92 % |
| 2020 year | 52 cases | -22.39 % |
Trends in filing of joint patent applications with 信越化学工業株式会社
フォトリソグラフィー用材料技術 filed 532 joint applications with 信越化学工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 320 cases in total) is 53.3, and the median is 55.5. The coefficient of variation (standard deviation/mean) is 0.29, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 75 cases, and their lowest number in 2016 with 43 cases.
| Index | Value |
|---|---|
| Average | 53.3 patents |
| Std Dev | 15.3 |
| COV | 0.29 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 75 cases | +44.2 % |
| 2021 year | 52 cases | -17.46 % |
| 2020 year | 63 cases | +6.78 % |
Information on important patents (JP)
The following shows JP patents held by フォトリソグラフィー用材料技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and フォトリソグラフィー用材料技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which フォトリソグラフィー用材料技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 29 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7366924 "フレキソ印刷版原版及びフレキソ印刷版" (Opposition day 2024-02-27) , next is 特許7306542 "樹脂組成物、半導体用配線層積層体及び半導体装置" (Opposition day 2023-12-27) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7366924 | フレキソ印刷版原版及びフレキソ印刷版 | 2024-02-27 |
| 2 | 特許7306542 | 樹脂組成物、半導体用配線層積層体及び半導体装置 | 2023-12-27 |
| 3 | 特許7294146 | 着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明 | 2023-12-20 |
| 4 | 特許7290034 | ドライフィルムレジスト基材用ポリエステルフィルム | 2023-12-05 |
| 5 | 特許7268700 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | 2023-11-08 |
| 6 | 特許7263153 | 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法 | 2023-10-24 |
| 7 | 特許7259317 | ネガ型感光性樹脂組成物、それを用いた半導体装置および電子機器 | 2023-10-16 |
| 8 | 特許7259907 | 樹脂組成物、半導体用配線層積層体及び半導体装置 | 2023-10-05 |
| 9 | 特許7241695 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 2023-07-11 |
| 10 | 特許7196389 | 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法 | 2023-06-27 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 97 patents Protest from third parties. The average number of Protest is 1.6 times. The most recently Protest patent is 特開2023-123378 "着色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよびこれを含む固体撮像素子または表示装置" (Protest day 2024-03-06) , next is 特開2019-172975 "樹脂組成物、樹脂シート、硬化膜" (Protest day 2024-03-05) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-123378 | 着色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよびこれを含む固体撮像素子または表示装置 | 2024-03-06 |
| 2 | 特開2019-172975 | 樹脂組成物、樹脂シート、硬化膜 | 2024-03-05 |
| 3 | 特開2022-048206 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 2024-02-19 |
| 4 | 特許7464494 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-02-07 |
| 5 | 特開2022-141747 | 着色組成物、着色硬化膜及び表示素子 | 2024-02-07 |
| 6 | 特許7464493 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-02-07 |
| 7 | 特開2022-121441 | 転写型感光性フィルム、硬化膜パターンの形成方法、硬化膜及びタッチパネル | 2024-01-18 |
| 8 | 特開2022-119359 | フレキソ印刷原版及びフレキソ印刷原版の製造方法 | 2024-01-18 |
| 9 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2023-12-28 |
| 10 | 特開2022-081108 | 感光性着色組成物、硬化膜、遮光フィルタ、カラーフィルタ、画像表示装置、固体撮像素子、及び赤外線センサ | 2023-12-27 |
| 11 | 特開2020-166156 | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター | 2023-12-19 |
| 12 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-11 |
| 13 | 特開2023-022061 | 感光性樹脂組成物の製造方法 | 2023-10-25 |
| 14 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-08-09 |
| 15 | 特開2022-103165 | カラーフィルタ用着色組成物、カラーフィルタ、および、液晶表示装置 | 2023-07-27 |
| 16 | 特許7429283 | 着色組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置 | 2023-07-27 |
| 17 | 特許7366927 | 着色感光性組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置 | 2023-07-18 |
| 18 | 特開2022-019609 | 感光性樹脂組成物、電子デバイスの製造方法、電子デバイスおよび感光性樹脂組成物の製造方法 | 2023-07-18 |
| 19 | 特開2021-076728 | 感光性樹脂組成物、電子デバイスの製造方法および電子デバイス | 2023-06-19 |
| 20 | 特許7366924 | フレキソ印刷版原版及びフレキソ印刷版 | 2023-06-13 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 182 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.5. The most protest patent is 特許6935982 "樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置" (6 times) , and the next most protest patent is 特許7067470 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (5 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6935982 | 樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置 | 6 times |
| 2 | 特許7067470 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 5 times |
| 3 | 特開2019-172975 | 樹脂組成物、樹脂シート、硬化膜 | 5 times |
| 4 | 特許7051818 | 感光性樹脂組成物 | 5 times |
| 5 | 特許6489008 | 感光性着色組成物、着色スペーサー及び画像表示装置 | 5 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 111 patents Inspection from third parties. The average number of Inspection is 2.0 times. The most recently Inspection patent is 特開2022-048206 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (Inspection day 2024-03-15) , next is 特開2019-172975 "樹脂組成物、樹脂シート、硬化膜" (Inspection day 2024-03-12) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-048206 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 2024-03-15 |
| 2 | 特開2019-172975 | 樹脂組成物、樹脂シート、硬化膜 | 2024-03-12 |
| 3 | 特開2022-121441 | 転写型感光性フィルム、硬化膜パターンの形成方法、硬化膜及びタッチパネル | 2024-02-19 |
| 4 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2024-02-05 |
| 5 | 特開2022-119359 | フレキソ印刷原版及びフレキソ印刷原版の製造方法 | 2024-01-26 |
| 6 | 特開2022-081108 | 感光性着色組成物、硬化膜、遮光フィルタ、カラーフィルタ、画像表示装置、固体撮像素子、及び赤外線センサ | 2024-01-17 |
| 7 | 特開2020-166156 | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター | 2024-01-16 |
| 8 | 再公表2019/188652 | 感光性組成物 | 2023-12-25 |
| 9 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-20 |
| 10 | 特許7259907 | 樹脂組成物、半導体用配線層積層体及び半導体装置 | 2023-10-31 |
| 11 | 特開2023-022061 | 感光性樹脂組成物の製造方法 | 2023-10-31 |
| 12 | 特開2021-124704 | 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置 | 2023-09-26 |
| 13 | 特許7443713 | 感光性樹脂組成物、硬化物、及び画像表示装置 | 2023-09-13 |
| 14 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-09-12 |
| 15 | 特許7429283 | 着色組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置 | 2023-08-29 |
| 16 | 特許7018168 | 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 | 2023-08-25 |
| 17 | 特表2021-528697 | カラーフィルター用赤色顔料組成物 | 2023-08-24 |
| 18 | 特開2021-110806 | 自発光型感光性樹脂組成物、カラーフィルタ、及び画像表示装置 | 2023-08-09 |
| 19 | 特開2022-019609 | 感光性樹脂組成物、電子デバイスの製造方法、電子デバイスおよび感光性樹脂組成物の製造方法 | 2023-08-08 |
| 20 | 特開2022-103165 | カラーフィルタ用着色組成物、カラーフィルタ、および、液晶表示装置 | 2023-08-02 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 213 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.8. The most inspection patent is 特許6935982 "樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置" (12 times) , and the next most inspection patent is 特許7067470 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (11 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6935982 | 樹脂組成物、硬化レリーフパターンの製造方法、及び半導体装置 | 12 times |
| 2 | 特許7067470 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 11 times |
| 3 | 特許7018168 | 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 | 9 times |
| 4 | 特開2015-146038 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜 | 7 times |
| 5 | 特許6860500 | 感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置 | 7 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 2,602 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.1. The most cited patent is 特許6984993 "自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置" (53 times) , and the next most cited patent is 特許6784670 "有機金属溶液に基づいた高解像度パターニング組成物および対応する方法" (33 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6984993 | 自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置 | 53 times |
| 2 | 特許6784670 | 有機金属溶液に基づいた高解像度パターニング組成物および対応する方法 | 33 times |
| 3 | 特許6702264 | レジスト材料及びパターン形成方法 | 30 times |
| 4 | 特許6135600 | 下層膜材料及びパターン形成方法 | 27 times |
| 5 | 特許6805244 | 有機スズオキシドヒドロキシドのパターン形成組成物、前駆体およびパターン形成 | 27 times |
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