2H225 フォトリソグラフィー用材料技術 Patent Trends
The Theme Code "フォトリソグラフィー用材料技術" had 714 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a small decreased of -37 filings (-4.9%) over 751 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 1,003 cases, and their lowest number in 2024 with 861 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 3,761 cases in total) is 940, and the median is 948. The coefficient of variation (standard deviation/mean) is 0.06, and filings have been stable.
| Index | Value |
|---|---|
| Average | 940 patents |
| Std Dev | 59.8 |
| COV | 0.06 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 408 cases | -52.6% |
| 2024 year | 861 cases | -4.76% |
| 2023 year | 904 cases | -8.96% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for フォトリソグラフィー用材料技術[2H225] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of フォトリソグラフィー用材料技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
フォトリソグラフィー用材料技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of フォトリソグラフィー用材料技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
フォトリソグラフィー用材料技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 1,003 |
| 2022 | 993 |
| 2023 | 904 |
| 2024 | 861 |
| 2025 | 408 |
Patent Landscape
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for フォトリソグラフィー用材料技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
Keywords (importance)
Top keywords frequently used in patent filings for フォトリソグラフィー用材料技術 are shown below.
Top keywords for フォトリソグラフィー用材料技術
| Keyword | Score |
|---|---|
| 含有 | 100.0 |
| 基 | 96.39 |
| 樹脂 | 94.05 |
| 酸 | 56.32 |
| 重合 | 52.95 |
| 感光 | 50.13 |
| 現像 | 48.77 |
| レジスト | 47.85 |
| 光 | 45.49 |
| 水素 | 35.28 |
| 開始 | 23.16 |
| 炭素 | 22.76 |
| アルキル | 22.44 |
| 下記 | 20.42 |
| 着色 | 19.57 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 4,169 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
フォトリソグラフィー用材料技術[2H225]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPP7920017 | カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-11-16 ・Publication date 2026-09-14 | 2H197, 2H225, 4H006, 4J100 |
| 2. JPP7920040 | 樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-12-27 ・Publication date 2026-09-14 | 2H225, 4J100 |
| 3. JPP7920041 | 樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-12-27 ・Publication date 2026-09-14 | 2H225, 4J100 |
| 4. JPP7919834 | 着色樹脂組成物 | ・Applicant 住友化学株式会社 ・Filing date 2020-07-17 ・Publication date 2026-09-14 | 2H148, 2H225, 4J037, 4J100 |
| 5. JPP7919913 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-06-14 ・Publication date 2026-09-14 | 2H197, 2H225, 4H006 |
| 6. JPP7919997 | 化合物、該化合物に由来する構造単位を含む樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-09-28 ・Publication date 2026-09-14 | 2H197, 2H225, 4J100 |
| 7. JPP7920018 | 塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2022-11-16 ・Publication date 2026-09-14 | 2H197, 2H225, 4H006, 4J100 |
| 8. JPP7920396 | 化合物及び樹脂 | ・Applicant 住友化学株式会社 ・Filing date 2021-10-26 ・Publication date 2026-09-14 | 2H225, 4H006, 4J100 |
| 9. JPA-HYO2026-530796 | アセタール官能基を含むリガンドを有する有機スズ組成物、有機スズブレンドを有するパターニング組成物、及びポジ型パターニング | ・Applicant インプリア・コーポレイション ・Filing date 2024-08-27 ・Publication date 2026-09-10 | 2H197, 2H225, 4H049 |
| 10. JPA2026-145016 | 酸発生剤、レジスト組成物及びレジストパターンの製造方法並びに塩 | ・Applicant 住友化学株式会社 ・Filing date 2026-02-24 ・Publication date 2026-09-09 | 2H197, 2H225, 4H006 |
| 11. JPA2026-144369 | 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2025-02-28 ・Publication date 2026-09-09 | 2H195, 2H197, 2H225, 4J100 |
| 12. JPA2026-143743 | 化合物 | ・Applicant 住友化学株式会社 ・Filing date 2022-05-02 ・Publication date 2026-09-08 | 2H225 |
| 13. JPA-HYO2026-530381 | フォトレジスト組成物及びパターン形成方法 | ・Applicant デュポンエレクトロニックマテリアルズインターナショナルエルエルシー ・Filing date 2024-08-16 ・Publication date 2026-09-08 | 2H197, 2H225 |
| 14. JPP7916910 | 樹脂組成物 | ・Applicant 日産化学株式会社 ・Filing date 2022-11-24 ・Publication date 2026-09-08 | 2H197, 2H225, 4J002, 4J043, 4J127 |
| 15. JPP7917740 | レジスト組成物の製造方法 | ・Applicant 東京応化工業株式会社 ・Filing date 2026-02-06 ・Publication date 2026-09-08 | 2H196, 2H225 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「フォトリソグラフィー用材料技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 573 cases, followed by 信越化学工業株式会社 with 325 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 573 cases |
| 信越化学工業株式会社 | 325 cases |
| 東京応化工業株式会社 | 173 cases |
| 三星エスディアイ株式会社 | 147 cases |
| ARTIENCE株式会社 | 71 cases |
| 富士フイルム株式会社 | 51 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 1,067 cases, followed by 信越化学工業株式会社 with 531 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,067 cases |
| 信越化学工業株式会社 | 531 cases |
| 富士フイルム株式会社 | 499 cases |
| 東京応化工業株式会社 | 352 cases |
| ARTIENCE株式会社 | 207 cases |
| 三星エスディアイ株式会社 | 191 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,067 |
| 信越化学工業株式会社 | 531 |
| 富士フイルム株式会社 | 499 |
| 東京応化工業株式会社 | 352 |
| ARTIENCE株式会社 | 207 |
| 三星エスディアイ株式会社 | 191 |
Top company information (JP)
{'ja': '技術テーマ「フォトリソグラフィー用材料技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 573 cases, followed by 信越化学工業株式会社 with 325 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 573 cases |
| 信越化学工業株式会社 | 325 cases |
| 東京応化工業株式会社 | 173 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 1,067 cases, followed by 信越化学工業株式会社 with 531 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,067 cases |
| 信越化学工業株式会社 | 531 cases |
| 東京応化工業株式会社 | 352 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by フォトリソグラフィー用材料技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,067 |
| 信越化学工業株式会社 | 531 |
| 富士フイルム株式会社 | 499 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by フォトリソグラフィー用材料技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,067 |
| 信越化学工業株式会社 | 531 |
| 富士フイルム株式会社 | 499 |
Top company details
Trends in filing of joint patent applications with 住友化学株式会社
フォトリソグラフィー用材料技術 filed 1,067 joint applications with 住友化学株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 890 cases in total) is 178, and the median is 188. The coefficient of variation (standard deviation/mean) is 0.12, and filings have been moderate fluctuations.
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 208 cases, and their lowest number in 2020 with 152 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 178 patents |
| Std Dev | 22.0 |
| COV | 0.12 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 177 cases | -14.90% |
| 2024 year | 208 cases | +10.64% |
| 2023 year | 188 cases | -0.53% |
Trends in filing of joint patent applications with 信越化学工業株式会社
フォトリソグラフィー用材料技術 filed 531 joint applications with 信越化学工業株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 487 cases in total) is 97.4, and the median is 87.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
The number of filings has been increasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 172 cases, and their lowest number in 2021 with 56 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 97.4 patents |
| Std Dev | 41.7 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 44 cases | -74.4% |
| 2024 year | 172 cases | +57.8% |
| 2023 year | 109 cases | +25.29% |
Trends in filing of joint patent applications with 東京応化工業株式会社
フォトリソグラフィー用材料技術 filed 352 joint applications with 東京応化工業株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 337 cases in total) is 67.4, and the median is 72.0. The coefficient of variation (standard deviation/mean) is 0.22, and filings have been moderate fluctuations.
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2023 with 86 cases, and their lowest number in 2021 with 44 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 67.4 patents |
| Std Dev | 15.1 |
| COV | 0.22 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 15 cases | -79.2% |
| 2024 year | 72 cases | -16.28% |
| 2023 year | 86 cases | +10.26% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む