2H197 ホトレジスト感材への露光・位置合せ技術 Patent Trends
The Theme Code "ホトレジスト感材への露光・位置合せ技術" had 799 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a slightly decreased of -11 filings (-1.4%) over 810 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 985 cases, and their lowest number in 2024 with 925 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 3,859 cases in total) is 965, and the median is 974. The coefficient of variation (standard deviation/mean) is 0.02, and filings have been stable.
| Index | Value |
|---|---|
| Average | 965 patents |
| Std Dev | 23.5 |
| COV | 0.02 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 374 cases | -59.6% |
| 2024 year | 925 cases | -4.74% |
| 2023 year | 971 cases | -0.72% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for ホトレジスト感材への露光・位置合せ技術[2H197] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of ホトレジスト感材への露光・位置合せ技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
ホトレジスト感材への露光・位置合せ技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of ホトレジスト感材への露光・位置合せ技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
ホトレジスト感材への露光・位置合せ技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 985 |
| 2022 | 978 |
| 2023 | 971 |
| 2024 | 925 |
| 2025 | 374 |
Patent Landscape
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for ホトレジスト感材への露光・位置合せ技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
Keywords (importance)
Top keywords frequently used in patent filings for ホトレジスト感材への露光・位置合せ技術 are shown below.
Top keywords for ホトレジスト感材への露光・位置合せ技術
| Keyword | Score |
|---|---|
| 露光 | 100.0 |
| 基板 | 96.3 |
| 組成 | 87.47 |
| 含有 | 77.62 |
| 基 | 71.34 |
| 樹脂 | 70.57 |
| 配置 | 69.5 |
| 位置 | 67.09 |
| 光学 | 66.05 |
| 光 | 63.94 |
| レジスト | 63.65 |
| 酸 | 58.3 |
| 方向 | 55.43 |
| 現像 | 47.13 |
| 間 | 46.34 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 4,233 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
ホトレジスト感材への露光・位置合せ技術[2H197]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPP7923743 | ポジ型レジスト材料、及びパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2023-09-22 ・Publication date 2026-09-18 | 2H197, 2H225, 4J100 |
| 2. JPP7923792 | 制御装置、光源装置、制御方法及びプログラム | ・Applicant レーザーテック株式会社 ・Filing date 2024-06-27 ・Publication date 2026-09-18 | 2G051, 2H197, 4C092 |
| 3. JPP7923861 | レジストパターン間置換液、およびそれを用いたレジストパターンの製造方法 | ・Applicant メルクパテントゲゼルシャフトミットベシュレンクテルハフツング ・Filing date 2020-11-16 ・Publication date 2026-09-18 | 2H196, 2H197 |
| 4. JPP7923742 | ポジ型レジスト材料及びパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2023-09-22 ・Publication date 2026-09-18 | 2H197, 2H225, 4C063, 4H006, 4J100 |
| 5. JPA2026-148395 | クラスター化合物またはその塩およびそれを含むフォトレジスト組成物 | ・Applicant インダストリーファウンデーションオブチョンナムナショナルユニバーシティー, コリアリサーチインスティテュートオブケミカルテクノロジー ・Filing date 2025-08-07 ・Publication date 2026-09-17 | 2H197, 2H225, 4H049 |
| 6. JPA2026-148471 | 着色硬化性樹脂組成物、カラーフィルタ、それを含む表示装置、及び前記カラーフィルタの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2026-02-10 ・Publication date 2026-09-17 | 2H148, 2H197, 2H225, 3K107, 4J002, +5 more |
| 7. JPA2026-148496 | 樹脂組成物、樹脂複合体、塗膜、樹脂組成物の使用及び再配線層 | ・Applicant 三菱ケミカル株式会社 ・Filing date 2026-02-27 ・Publication date 2026-09-17 | 2H197, 4G073 |
| 8. JPA2026-147187 | 感光性樹脂組成物、パターン硬化物の製造方法、パターン硬化物、及び電子部品 | ・Applicant HDマイクロシステムズ株式会社 ・Filing date 2025-03-05 ・Publication date 2026-09-17 | 2H197, 2H225, 4J043 |
| 9. JPA2026-148518 | 位置合わせ方法、位置合わせ装置、及びプログラム | ・Applicant デクセリアルズ株式会社, 国立大学法人東北大学 ・Filing date 2026-03-04 ・Publication date 2026-09-17 | 2H197, 5F131, 5F246 |
| 10. JPA2026-148442 | 塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2025-12-22 ・Publication date 2026-09-17 | 2H197, 2H225, 4H006, 4J100 |
| 11. JPA2026-147987 | 積層構造、パターン形成方法、当該パターン形成方法により得られる半導体用基板の製造方法および半導体用基板 | ・Applicant 三菱ケミカル株式会社 ・Filing date 2025-03-07 ・Publication date 2026-09-17 | 2H197, 2H225 |
| 12. JPA2026-148170 | レジスト組成物、積層体、及びパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2025-03-07 ・Publication date 2026-09-17 | 2H197, 2H225 |
| 13. JPA2026-146780 | 酸発生剤、塩、レジスト組成物及びレジストパターンの製造方法 | ・Applicant 住友化学株式会社 ・Filing date 2026-03-02 ・Publication date 2026-09-16 | 2H197, 2H225, 4H006, 4J100 |
| 14. JPA2026-146779 | レジスト組成物、レジストパターンの製造方法、化合物及び樹脂 | ・Applicant 住友化学株式会社 ・Filing date 2026-03-02 ・Publication date 2026-09-16 | 2H197, 2H225, 4H006, 4J100 |
| 15. JPP7921035 | レジスト材料及びパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2023-07-25 ・Publication date 2026-09-15 | 2H197, 2H225 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「ホトレジスト感材への露光・位置合せ技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme ホトレジスト感材への露光・位置合せ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 533 cases, followed by 信越化学工業株式会社 with 270 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 533 cases |
| 信越化学工業株式会社 | 270 cases |
| キヤノン株式会社 | 254 cases |
| エーエスエムエルネザーランズビーブイ | 200 cases |
| 東京応化工業株式会社 | 131 cases |
| 富士フイルム株式会社 | 21 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 925 cases, followed by キヤノン株式会社 with 615 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 925 cases |
| キヤノン株式会社 | 615 cases |
| 信越化学工業株式会社 | 455 cases |
| エーエスエムエルネザーランズビーブイ | 444 cases |
| 東京応化工業株式会社 | 262 cases |
| 富士フイルム株式会社 | 212 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 925 |
| キヤノン株式会社 | 615 |
| 信越化学工業株式会社 | 455 |
| エーエスエムエルネザーランズビーブイ | 444 |
| 東京応化工業株式会社 | 262 |
| 富士フイルム株式会社 | 212 |
Top company information (JP)
{'ja': '技術テーマ「ホトレジスト感材への露光・位置合せ技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme ホトレジスト感材への露光・位置合せ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 533 cases, followed by 信越化学工業株式会社 with 270 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 533 cases |
| 信越化学工業株式会社 | 270 cases |
| キヤノン株式会社 | 254 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 925 cases, followed by キヤノン株式会社 with 615 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 925 cases |
| キヤノン株式会社 | 615 cases |
| 信越化学工業株式会社 | 455 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by ホトレジスト感材への露光・位置合せ技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 925 |
| キヤノン株式会社 | 615 |
| 信越化学工業株式会社 | 455 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by ホトレジスト感材への露光・位置合せ技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 925 |
| キヤノン株式会社 | 615 |
| 信越化学工業株式会社 | 455 |
Top company details
Trends in filing of joint patent applications with 住友化学株式会社
ホトレジスト感材への露光・位置合せ技術 filed 925 joint applications with 住友化学株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 753 cases in total) is 151, and the median is 151. The coefficient of variation (standard deviation/mean) is 0.18, and filings have been moderate fluctuations.
The number of filings has been increasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 188 cases, and their lowest number in 2021 with 114 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 151 patents |
| Std Dev | 27.6 |
| COV | 0.18 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 172 cases | -8.51% |
| 2024 year | 188 cases | +8.67% |
| 2023 year | 173 cases | +14.57% |
Trends in filing of joint patent applications with 信越化学工業株式会社
ホトレジスト感材への露光・位置合せ技術 filed 455 joint applications with 信越化学工業株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 414 cases in total) is 82.8, and the median is 70.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
The number of filings has been increasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 152 cases, and their lowest number in 2021 with 51 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 82.8 patents |
| Std Dev | 35.6 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 41 cases | -73.0% |
| 2024 year | 152 cases | +97.4% |
| 2023 year | 77 cases | +10.00% |
Trends in filing of joint patent applications with キヤノン株式会社
ホトレジスト感材への露光・位置合せ技術 filed 615 joint applications with キヤノン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 591 cases in total) is 118, and the median is 112. The coefficient of variation (standard deviation/mean) is 0.11, and filings have been moderate fluctuations.
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2021 with 138 cases, and their lowest number in 2024 with 103 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 118 patents |
| Std Dev | 12.6 |
| COV | 0.11 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 24 cases | -76.7% |
| 2024 year | 103 cases | -18.90% |
| 2023 year | 127 cases | +13.39% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む