半導体の露光技術 (JP Patent Analysis Report)
The Theme Code "半導体の露光技術" had 182 patent application filings in the most recent period (2022-01-01 to 2022-08-31). This is a significantly decreased of -47 filings (-20.5%) over 229 they had in the same period of the previous year (2021-01-01 to 2021-08-31).
The highest number of filings in 2014 with 1,295 cases, and their lowest number in 2022 with 243 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,103 cases in total) is 350, and the median is 372. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 350 patents |
| Std Dev | 179 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 243 cases | -31.7 % |
| 2021 year | 356 cases | -8.01 % |
| 2020 year | 387 cases | -24.56 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 半導体の露光技術[5F146] for the period of the last 10 years (2014-01-01 to 2024-04-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 半導体の露光技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 半導体の露光技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
半導体の露光技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 半導体の露光技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 半導体の露光技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 半導体の露光技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 5,597 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
半導体の露光技術[5F146]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 半導体の露光技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 86 cases, followed by 東京エレクトロン株式会社 with 46 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 86 cases |
| 東京エレクトロン株式会社 | 46 cases |
| 株式会社SCREENホールディングス | 35 cases |
| エーエスエムエルネザーランズビーブイ | 1 cases |
| 三菱電機株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,221 cases, followed by 東京エレクトロン株式会社 with 766 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 1,221 cases |
| 東京エレクトロン株式会社 | 766 cases |
| 株式会社SCREENホールディングス | 550 cases |
| 株式会社ニコン | 162 cases |
| エーエスエムエルネザーランズビーブイ | 67 cases |
| 株式会社東芝 | 49 cases |
| 三菱電機株式会社 | 20 cases |
| 株式会社日立製作所 | 1 cases |
| ソニーグループ株式会社 | 1 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 半導体の露光技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 86 cases, followed by 東京エレクトロン株式会社 with 46 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 86 cases |
| 東京エレクトロン株式会社 | 46 cases |
| 株式会社SCREENホールディングス | 35 cases |
| エーエスエムエルネザーランズビーブイ | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,221 cases, followed by 東京エレクトロン株式会社 with 766 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 1,221 cases |
| 東京エレクトロン株式会社 | 766 cases |
| 株式会社SCREENホールディングス | 550 cases |
| 株式会社ニコン | 162 cases |
| エーエスエムエルネザーランズビーブイ | 67 cases |
| 株式会社東芝 | 49 cases |
| 株式会社日立製作所 | 1 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 半導体の露光技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 半導体の露光技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社ニコン
半導体の露光技術 filed 162 joint applications with 株式会社ニコン for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 4 cases in total) is 0.7, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.7, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 111 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.7 patents |
| Std Dev | 1.1 |
| COV | 1.7 |
| Year | Cases | YOY |
|---|---|---|
| 2019 year | 1 cases | -66.7 % |
| 2018 year | 3 cases | -66.7 % |
| 2017 year | 9 cases | +12.50 % |
Trends in filing of joint patent applications with キヤノン株式会社
半導体の露光技術 filed 1,221 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 591 cases in total) is 98.5, and the median is 111. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 203 cases, and their lowest number in 2022 with 78 cases.
| Index | Value |
|---|---|
| Average | 98.5 patents |
| Std Dev | 46.2 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 78 cases | -33.9 % |
| 2021 year | 118 cases | +13.46 % |
| 2020 year | 104 cases | -22.39 % |
Trends in filing of joint patent applications with 東京エレクトロン株式会社
半導体の露光技術 filed 766 joint applications with 東京エレクトロン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 361 cases in total) is 60.2, and the median is 69.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 112 cases, and their lowest number in 2022 with 40 cases.
| Index | Value |
|---|---|
| Average | 60.2 patents |
| Std Dev | 29.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 40 cases | -35.5 % |
| 2021 year | 62 cases | -18.42 % |
| 2020 year | 76 cases | -14.61 % |
Trends in filing of joint patent applications with 株式会社東芝
半導体の露光技術 filed 49 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 10 years (2013 to 2023, 113 cases in total) is 10.3, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.9, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 35 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 10.3 patents |
| Std Dev | 19.7 |
| COV | 1.9 |
| Year | Cases | YOY |
|---|---|---|
| 2016 year | 4 cases | -60.0 % |
| 2015 year | 10 cases | -71.4 % |
| 2014 year | 35 cases | -45.3 % |
Trends in filing of joint patent applications with 株式会社SCREENホールディングス
半導体の露光技術 filed 550 joint applications with 株式会社SCREENホールディングス for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 262 cases in total) is 43.7, and the median is 44.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2018 with 91 cases, and their lowest number in 2022 with 34 cases.
| Index | Value |
|---|---|
| Average | 43.7 patents |
| Std Dev | 26.4 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 34 cases | -20.93 % |
| 2021 year | 43 cases | -4.44 % |
| 2020 year | 45 cases | -6.25 % |
Information on important patents (JP)
The following shows JP patents held by 半導体の露光技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 半導体の露光技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 半導体の露光技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 5 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許6974799 "膜密度が向上したレジスト下層膜を形成するための組成物" (Opposition day 2022-06-01) , next is 特許6875082 "インプリント用モールド" (Opposition day 2021-11-16) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許6974799 | 膜密度が向上したレジスト下層膜を形成するための組成物 | 2022-06-01 |
| 2 | 特許6875082 | インプリント用モールド | 2021-11-16 |
| 3 | 特許6860276 | 樹脂マスク剥離用洗浄剤組成物 | 2021-09-15 |
| 4 | 特許6833211 | インプリント成型用光硬化性樹脂組成物 | 2021-08-23 |
| 5 | 特許6818037 | 半導体チップの製造方法、キット | 2021-07-15 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 6 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特表2023-511307 "高屈折率インプリント組成物と材料及びそれを作製するためのプロセス" (Protest day 2024-03-12) , next is 特開2022-092497 "光硬化性組成物及びパターン形成方法" (Protest day 2024-02-20) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特表2023-511307 | 高屈折率インプリント組成物と材料及びそれを作製するためのプロセス | 2024-03-12 |
| 2 | 特開2022-092497 | 光硬化性組成物及びパターン形成方法 | 2024-02-20 |
| 3 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2022-12-26 |
| 4 | 特許7284820 | 光硬化性組成物、凹凸構造体の製造方法、微細凹凸パターンを形成する方法および凹凸構造体 | 2022-08-08 |
| 5 | 特許7171655 | 光酸発生剤を含む反射防止コーティング組成物を使用するパターンの形成方法 | 2022-07-27 |
| 6 | 特許6711104 | レジスト下層膜形成方法及びパターン形成方法 | 2021-07-07 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 16 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (4 times) , and the next most protest patent is 特許7357505 "ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 4 times |
| 2 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 3 times |
| 3 | 特許6712188 | レジスト下層膜形成用組成物及びこれを用いたパターン形成方法 | 1 times |
| 4 | 特許6703098 | 半導体製造用処理液、及び、パターン形成方法 | 1 times |
| 5 | 特許6704701 | 密着層形成組成物、密着層の製造方法、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、インプリント用モールドの製造方法、およびデバイス部品 | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 13 patents Inspection from third parties. The average number of Inspection is 1.3 times. The most recently Inspection patent is 特表2023-511307 "高屈折率インプリント組成物と材料及びそれを作製するためのプロセス" (Inspection day 2024-04-02) , next is 特開2022-092497 "光硬化性組成物及びパターン形成方法" (Inspection day 2024-03-13) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特表2023-511307 | 高屈折率インプリント組成物と材料及びそれを作製するためのプロセス | 2024-04-02 |
| 2 | 特開2022-092497 | 光硬化性組成物及びパターン形成方法 | 2024-03-13 |
| 3 | 特許4414866 | 紫外線露光機 | 2023-11-16 |
| 4 | 特許7461294 | 透過型メタサーフェスレンズ統合 | 2023-07-03 |
| 5 | 特許4244156 | 投影露光装置 | 2023-05-10 |
| 6 | 特許4450739 | 露光装置 | 2023-05-10 |
| 7 | 特開2020-203234 | 現像処理装置、及びそれを用いた表示装置の製造方法 | 2023-05-01 |
| 8 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2023-01-06 |
| 9 | 特許7284820 | 光硬化性組成物、凹凸構造体の製造方法、微細凹凸パターンを形成する方法および凹凸構造体 | 2022-08-19 |
| 10 | 特許7171655 | 光酸発生剤を含む反射防止コーティング組成物を使用するパターンの形成方法 | 2022-08-02 |
| 11 | 特許5598789 | 露光装置用光照射装置及び露光装置 | 2022-07-11 |
| 12 | 特許6833211 | インプリント成型用光硬化性樹脂組成物 | 2021-08-03 |
| 13 | 特許4995342 | 露光用光源およびこれを用いた露光装置 | 2021-05-18 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 46 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6786391 "ハードマスクおよび充填材料として安定な金属化合物、その組成物、およびその使用方法" (4 times) , and the next most inspection patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6786391 | ハードマスクおよび充填材料として安定な金属化合物、その組成物、およびその使用方法 | 4 times |
| 2 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 3 times |
| 3 | 特許6766266 | リソグラフィ組成物、レジストパターンの形成方法および半導体素子の製造方法 | 3 times |
| 4 | 特許6712188 | レジスト下層膜形成用組成物及びこれを用いたパターン形成方法 | 2 times |
| 5 | 特許6703098 | 半導体製造用処理液、及び、パターン形成方法 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 1,786 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.0. The most cited patent is 特許6632270 "インプリント装置、インプリント方法および物品の製造方法" (44 times) , and the next most cited patent is 特開2015-018228 "ペリクル膜及びペリクル" (40 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6632270 | インプリント装置、インプリント方法および物品の製造方法 | 44 times |
| 2 | 特開2015-018228 | ペリクル膜及びペリクル | 40 times |
| 3 | 特許6408790 | 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 | 33 times |
| 4 | 特許6141500 | ナノインプリントリソグラフィーにおける充填時間を短縮するための基板の前処理 | 30 times |
| 5 | 特許6135600 | 下層膜材料及びパターン形成方法 | 27 times |
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