エレクトロルミネッセンス光源技術 (JP Patent Analysis Report)
The Theme Code "エレクトロルミネッセンス光源技術" had 231 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -83 filings (-26.4%) over 314 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2014 with 3,498 cases, and their lowest number in 2022 with 1,230 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 9,571 cases in total) is 1,595, and the median is 1,434. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 1,595 patents |
| Std Dev | 668 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1,230 cases | -8.00 % |
| 2021 year | 1,337 cases | -12.67 % |
| 2020 year | 1,531 cases | -27.41 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for エレクトロルミネッセンス光源技術[3K107] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of エレクトロルミネッセンス光源技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for エレクトロルミネッセンス光源技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
エレクトロルミネッセンス光源技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of エレクトロルミネッセンス光源技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for エレクトロルミネッセンス光源技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in エレクトロルミネッセンス光源技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 22,277 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
エレクトロルミネッセンス光源技術[3K107]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme エレクトロルミネッセンス光源技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 株式会社ジャパンディスプレイ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 177 cases, followed by 株式会社半導体エネルギー研究所 with 117 cases.
| Name | Cases |
|---|---|
| 株式会社ジャパンディスプレイ | 177 cases |
| 株式会社半導体エネルギー研究所 | 117 cases |
| キヤノン株式会社 | 108 cases |
| 住友化学株式会社 | 108 cases |
| 三星ディスプレイ株式會社 | 103 cases |
| 大日本印刷株式会社 | 47 cases |
| セイコーエプソン株式会社 | 29 cases |
| 富士フイルム株式会社 | 12 cases |
| コニカミノルタ株式会社 | 4 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 株式会社半導体エネルギー研究所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 4,151 cases, followed by 株式会社ジャパンディスプレイ with 1,255 cases.
| Name | Cases |
|---|---|
| 株式会社半導体エネルギー研究所 | 4,151 cases |
| 株式会社ジャパンディスプレイ | 1,255 cases |
| 住友化学株式会社 | 845 cases |
| 三星ディスプレイ株式會社 | 746 cases |
| コニカミノルタ株式会社 | 710 cases |
| 大日本印刷株式会社 | 519 cases |
| セイコーエプソン株式会社 | 423 cases |
| キヤノン株式会社 | 384 cases |
| 富士フイルム株式会社 | 379 cases |
| ソニーグループ株式会社 | 134 cases |
| パナソニックホールディングス株式会社 | 33 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme エレクトロルミネッセンス光源技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 株式会社ジャパンディスプレイ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 177 cases, followed by 株式会社半導体エネルギー研究所 with 117 cases.
| Name | Cases |
|---|---|
| 株式会社ジャパンディスプレイ | 177 cases |
| 株式会社半導体エネルギー研究所 | 117 cases |
| キヤノン株式会社 | 108 cases |
| 住友化学株式会社 | 108 cases |
| セイコーエプソン株式会社 | 29 cases |
| コニカミノルタ株式会社 | 4 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 株式会社半導体エネルギー研究所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 4,151 cases, followed by 株式会社ジャパンディスプレイ with 1,255 cases.
| Name | Cases |
|---|---|
| 株式会社半導体エネルギー研究所 | 4,151 cases |
| 株式会社ジャパンディスプレイ | 1,255 cases |
| 住友化学株式会社 | 845 cases |
| コニカミノルタ株式会社 | 710 cases |
| セイコーエプソン株式会社 | 423 cases |
| キヤノン株式会社 | 384 cases |
| ソニーグループ株式会社 | 134 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by エレクトロルミネッセンス光源技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by エレクトロルミネッセンス光源技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社半導体エネルギー研究所
エレクトロルミネッセンス光源技術 filed 4,151 joint applications with 株式会社半導体エネルギー研究所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 1,012 cases in total) is 169, and the median is 78.0. The coefficient of variation (standard deviation/mean) is 1.0, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 853 cases, and their lowest number in 2021 with 19 cases.
| Index | Value |
|---|---|
| Average | 169 patents |
| Std Dev | 164 |
| COV | 1.0 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 50 cases | +163 % |
| 2021 year | 19 cases | -81.7 % |
| 2020 year | 104 cases | -69.0 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
エレクトロルミネッセンス光源技術 filed 423 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 164 cases in total) is 27.3, and the median is 21.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 92 cases, and their lowest number in 2022 with 14 cases.
| Index | Value |
|---|---|
| Average | 27.3 patents |
| Std Dev | 14.0 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 14 cases | -17.65 % |
| 2021 year | 17 cases | -32.0 % |
| 2020 year | 25 cases | -47.9 % |
Trends in filing of joint patent applications with コニカミノルタ株式会社
エレクトロルミネッセンス光源技術 filed 710 joint applications with コニカミノルタ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 91 cases in total) is 15.2, and the median is 8.0. The coefficient of variation (standard deviation/mean) is 1.0, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 239 cases, and their lowest number in 2022 with 2 cases.
| Index | Value |
|---|---|
| Average | 15.2 patents |
| Std Dev | 14.8 |
| COV | 1.0 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 2 cases | -50.0 % |
| 2021 year | 4 cases | -66.7 % |
| 2020 year | 12 cases | -67.6 % |
Trends in filing of joint patent applications with ソニーグループ株式会社
エレクトロルミネッセンス光源技術 filed 134 joint applications with ソニーグループ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 43 cases in total) is 7.2, and the median is 8.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 44 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 7.2 patents |
| Std Dev | 5.8 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 5 cases | -64.3 % |
| 2020 year | 14 cases | +16.67 % |
| 2019 year | 12 cases | 0 |
Trends in filing of joint patent applications with キヤノン株式会社
エレクトロルミネッセンス光源技術 filed 384 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 293 cases in total) is 48.8, and the median is 47.5. The coefficient of variation (standard deviation/mean) is 0.12, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 59 cases, and their lowest number in 2016 with 11 cases.
| Index | Value |
|---|---|
| Average | 48.8 patents |
| Std Dev | 5.8 |
| COV | 0.12 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 59 cases | +11.32 % |
| 2021 year | 53 cases | +8.16 % |
| 2020 year | 49 cases | +6.52 % |
Information on important patents (JP)
The following shows JP patents held by エレクトロルミネッセンス光源技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and エレクトロルミネッセンス光源技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which エレクトロルミネッセンス光源技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 6 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.5 times. The most recently Invalidation Trial patent is 特許6672194 "有機発光表示装置の画素配列構造" (Invalidation Trial day 2024-07-12) , next is 特許7258741 "有機発光表示装置" (Invalidation Trial day 2024-07-12) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許6672194 | 有機発光表示装置の画素配列構造 | 2024-07-12 |
| 2 | 特許7258741 | 有機発光表示装置 | 2024-07-12 |
| 3 | 特許7203763 | 表示基板及びその製造方法、表示装置 | 2023-07-31 |
| 4 | 特許6748268 | 有機発光表示装置の画素配列構造 | 2023-04-28 |
| 5 | 特許6568156 | 発光素子、発光装置、照明装置および電子機器 | 2022-04-05 |
| 6 | 特許5420705 | 発光素子、発光装置、照明装置及び電子機器 | 2022-04-05 |
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 4 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.5. The most invalidation trial patent is 特許6568156 "発光素子、発光装置、照明装置および電子機器" (2 times) , and the next most invalidation trial patent is 特許6672194 "有機発光表示装置の画素配列構造" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6568156 | 発光素子、発光装置、照明装置および電子機器 | 2 times |
| 2 | 特許6672194 | 有機発光表示装置の画素配列構造 | 2 times |
| 3 | 特許5935199 | 多環芳香族化合物 | 1 times |
| 4 | 特許7203763 | 表示基板及びその製造方法、表示装置 | 1 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 45 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7476535 "蒸着マスク、蒸着マスクの製造方法、および、表示装置の製造方法" (Opposition day 2024-10-16) , next is 特許7464493 "黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス" (Opposition day 2024-09-30) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7476535 | 蒸着マスク、蒸着マスクの製造方法、および、表示装置の製造方法 | 2024-10-16 |
| 2 | 特許7464493 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-09-30 |
| 3 | 特許7449452 | 化合物、有機エレクトロルミネッセンス素子用材料、有機エレクトロルミネッセンス素子及び電子機器 | 2024-09-13 |
| 4 | 特許7441611 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2024-09-02 |
| 5 | 特許7441610 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2024-09-02 |
| 6 | 特許7438110 | 可撓性ハードコート | 2024-08-26 |
| 7 | 特許7419488 | 複合フィルムおよびそれを含むディスプレイ装置 | 2024-07-18 |
| 8 | 特許7381286 | 深いＨＯＭＯ（最高被占分子軌道）発光体デバイス構造 | 2024-05-15 |
| 9 | 特許7336412 | 有機光電子素子用有機アロイ、有機光電子素子および表示装置 | 2024-02-26 |
| 10 | 特許7334833 | 蒸着マスクを製造するための金属板の製造方法 | 2024-02-22 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 107 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2022-132157 "有機エレクトロルミネセンス材料及びデバイス" (Protest day 2024-11-21) , next is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Protest day 2024-11-07) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-132157 | 有機エレクトロルミネセンス材料及びデバイス | 2024-11-21 |
| 2 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-07 |
| 3 | 特表2024-529230 | 折り畳み性能に優れた光学フィルム及びこれを含む表示装置 | 2024-11-06 |
| 4 | 特表2024-530146 | 多層構造を有する光学フィルム及びそれを含む表示装置 | 2024-11-06 |
| 5 | 特開2023-169188 | 防眩フィルム並びにその製造方法及び用途 | 2024-10-17 |
| 6 | 特表2024-513427 | 有機光電子素子用化合物、有機光電子素子および表示装置 | 2024-10-07 |
| 7 | 特開2022-166114 | 電子素子のための材料 | 2024-10-07 |
| 8 | 特表2023-537800 | 有機電子素子用化合物、それを用いた有機電子素子及びその電子装置 | 2024-09-27 |
| 9 | 特許7594362 | 粘着剤層付き光学積層フィルム及び画像表示装置 | 2024-09-26 |
| 10 | 特開2022-175925 | 蒸着マスク、及び、有機電子デバイスの製造方法 | 2024-09-18 |
| 11 | 特表2022-551459 | 化合物、並びに有機半導体層、有機電子デバイス、表示デバイス及びそれを含む照明デバイス | 2024-09-05 |
| 12 | 特開2022-132158 | 有機エレクトロルミネセンス材料及びデバイス | 2024-09-02 |
| 13 | 再公表2019/066080 | 光学フィルムおよび画像表示装置 | 2024-08-23 |
| 14 | 特開2022-036073 | 有機エレクトロルミネッセント化合物、複数のホスト材料及びそれを含む有機エレクトロルミネッセントデバイス | 2024-07-29 |
| 15 | 特表2024-513911 | 有機光電子素子用組成物、有機光電子素子および表示装置 | 2024-07-26 |
| 16 | 特開2023-106457 | 有機光電子素子用有機アロイ、有機光電子素子および表示装置 | 2024-07-19 |
| 17 | 特開2023-029649 | 有機ＥＬ表示素子用封止剤 | 2024-07-11 |
| 18 | 特開2021-190428 | 有機発光素子封止用組成物およびこれにより製造された有機層を含む有機発光表示装置 | 2024-07-02 |
| 19 | 特開2024-037820 | 金属板、蒸着用マスクおよびその製造方法 | 2024-06-18 |
| 20 | 再公表2018/221363 | 有機ＥＬ表示素子用封止剤 | 2024-05-30 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 236 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許7051818 "感光性樹脂組成物" (5 times) , and the next most protest patent is 特許6932420 "フレキシブル画像表示装置用粘着剤組成物、フレキシブル画像表示装置用粘着剤層、フレキシブル画像表示装置用積層体、及び、フレキシブル画像表示装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7051818 | 感光性樹脂組成物 | 5 times |
| 2 | 特許6932420 | フレキシブル画像表示装置用粘着剤組成物、フレキシブル画像表示装置用粘着剤層、フレキシブル画像表示装置用積層体、及び、フレキシブル画像表示装置 | 4 times |
| 3 | 特開2022-087332 | 有機ＥＬ表示素子用封止剤 | 4 times |
| 4 | 特許7476535 | 蒸着マスク、蒸着マスクの製造方法、および、表示装置の製造方法 | 4 times |
| 5 | 特許6538637 | リン光発光ダイオード中の単一トリフェニレン発色団 | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 150 patents Inspection from third parties. The average number of Inspection is 1.5 times. The most recently Inspection patent is 特表2023-553379 "核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング" (Inspection day 2024-11-25) , next is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Inspection day 2024-11-14) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特表2023-553379 | 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング | 2024-11-25 |
| 2 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-14 |
| 3 | 特表2023-544281 | ＩＲ信号透過領域を組み込んだデバイス | 2024-11-05 |
| 4 | 特表2023-547920 | ナノ粒子堆積層を有する光電子デバイス | 2024-10-24 |
| 5 | 特開2022-175925 | 蒸着マスク、及び、有機電子デバイスの製造方法 | 2024-10-15 |
| 6 | 特開2022-166114 | 電子素子のための材料 | 2024-10-11 |
| 7 | 特表2023-545390 | 低い屈折率の被膜及び放射線修正層を含むデバイス | 2024-10-09 |
| 8 | 特表2023-548814 | パターン化コーティングを形成するためのシリコン含有化合物及びそれを組み込むデバイス | 2024-10-09 |
| 9 | 特開2022-132158 | 有機エレクトロルミネセンス材料及びデバイス | 2024-09-12 |
| 10 | 再公表2019/066080 | 光学フィルムおよび画像表示装置 | 2024-09-03 |
| 11 | 特開2022-114818 | 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置 | 2024-08-20 |
| 12 | 特開2024-035187 | 粘着剤組成物 | 2024-08-08 |
| 13 | 特開2023-029649 | 有機ＥＬ表示素子用封止剤 | 2024-08-06 |
| 14 | 特開2022-036073 | 有機エレクトロルミネッセント化合物、複数のホスト材料及びそれを含む有機エレクトロルミネッセントデバイス | 2024-07-30 |
| 15 | 特許7464494 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-07-24 |
| 16 | 特開2021-059528 | イリジウム錯体及び該化合物からなる発光材料 | 2024-07-16 |
| 17 | 特許7357665 | 有機発光化合物及びそれを含む有機発光素子 | 2024-07-09 |
| 18 | 特開2023-169188 | 防眩フィルム並びにその製造方法及び用途 | 2024-06-28 |
| 19 | 特許7325731 | 有機エレクトロルミネッセンス素子 | 2024-06-26 |
| 20 | 再公表2018/221363 | 有機ＥＬ表示素子用封止剤 | 2024-06-18 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 365 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特許6696669 "光学積層体及び表示装置" (7 times) , and the next most inspection patent is 特許6934299 "多成分ホスト材料及びそれを含む有機電界発光デバイス" (7 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6696669 | 光学積層体及び表示装置 | 7 times |
| 2 | 特許6934299 | 多成分ホスト材料及びそれを含む有機電界発光デバイス | 7 times |
| 3 | 特許6432072 | メタルマスク基材、および、メタルマスクの製造方法 | 6 times |
| 4 | 特許7051818 | 感光性樹脂組成物 | 6 times |
| 5 | 特許6782418 | 有機エレクトロニクス材料及びその利用 | 5 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 4,889 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.3. The most cited patent is 特開2017-102443 "光学積層体および該光学積層体を用いた有機エレクトロルミネセンス表示装置" (52 times) , and the next most cited patent is 特許6673671 "接合装置及びこれを利用した曲面表示装置の製造方法" (49 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2017-102443 | 光学積層体および該光学積層体を用いた有機エレクトロルミネセンス表示装置 | 52 times |
| 2 | 特許6673671 | 接合装置及びこれを利用した曲面表示装置の製造方法 | 49 times |
| 3 | 特許6478596 | 表示装置の作製方法 | 47 times |
| 4 | 特許5831654 | 芳香族複素環誘導体、それを用いた有機エレクトロルミネッセンス素子、照明装置及び表示装置 | 42 times |
| 5 | 特許6538460 | 有機エレクトロルミネッセンス材料及びデバイス | 41 times |
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