The Technical Field "集光" had 421 patent application filings in the most recent period (2022-01-01 to 2022-08-31). This is a with an decreasing trend transition of -67 filings (-13.7%) over 488 they had in the same period of the previous year (2021-01-01 to 2021-08-31).
The highest number of filings in 2014 with 1,648 cases, and their lowest number in 2022 with 512 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,370 cases in total) is 728, and the median is 810. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 728 patents |
Std Dev | 368 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 512 cases | -30.9 % |
2021 year | 741 cases | -15.80 % |
2020 year | 880 cases | -14.56 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 集光 for the period of the last 10 years (2014-01-01 to 2024-04-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 集光, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of 集光 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
This patent analysis report was created for a patent search set of 10,144 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
A patent aanlysis report on the following synonyms was found in the technical term "集光".
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 集光 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Comparing the number of applications of each company, 三菱電機株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 20 cases, followed by キヤノン株式会社 with 16 cases.
Name | Cases |
---|---|
三菱電機株式会社 | 20 cases |
キヤノン株式会社 | 16 cases |
セイコーエプソン株式会社 | 12 cases |
株式会社リコー | 11 cases |
株式会社東芝 | 6 cases |
ソニーグループ株式会社 | 2 cases |
株式会社ニコン | 2 cases |
株式会社日立製作所 | 2 cases |
シャープ株式会社 | 2 cases |
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 463 cases, followed by 三菱電機株式会社 with 283 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 463 cases |
三菱電機株式会社 | 283 cases |
オリンパス株式会社 | 274 cases |
株式会社リコー | 239 cases |
セイコーエプソン株式会社 | 221 cases |
株式会社ニコン | 194 cases |
ソニーグループ株式会社 | 180 cases |
株式会社東芝 | 99 cases |
シャープ株式会社 | 75 cases |
株式会社日立製作所 | 38 cases |
パナソニックホールディングス株式会社 | 16 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 集光 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Among the top coapplicants, 三菱電機株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 20 cases, followed by キヤノン株式会社 with 16 cases.
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 463 cases, followed by 三菱電機株式会社 with 283 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 463 cases |
三菱電機株式会社 | 283 cases |
株式会社リコー | 239 cases |
株式会社ニコン | 194 cases |
ソニーグループ株式会社 | 180 cases |
株式会社東芝 | 99 cases |
パナソニックホールディングス株式会社 | 16 cases |
Below is a ranking of the number of JP patent applications by 集光’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 集光’s top 7 coapplicants over the last 20 years.
集光 filed 16 joint applications with パナソニックホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 11 cases in total) is 1.8, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2018 with 4 cases, and their lowest number in 2022 with 0 cases.
Index | Value |
---|---|
Average | 1.8 patents |
Std Dev | 1.5 |
COV | 0.8 |
Year | Cases | YOY |
---|---|---|
2021 year | 2 cases | -33.3 % |
2020 year | 3 cases | +50.0 % |
2019 year | 2 cases | -50.0 % |
集光 filed 239 joint applications with 株式会社リコー for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 71 cases in total) is 11.8, and the median is 9.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 61 cases, and their lowest number in 2022 with 9 cases.
Index | Value |
---|---|
Average | 11.8 patents |
Std Dev | 7.0 |
COV | 0.6 |
Year | Cases | YOY |
---|---|---|
2022 year | 9 cases | 0 |
2021 year | 9 cases | 0 |
2020 year | 9 cases | -52.6 % |
集光 filed 463 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 179 cases in total) is 29.8, and the median is 35.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 100 cases, and their lowest number in 2022 with 16 cases.
Index | Value |
---|---|
Average | 29.8 patents |
Std Dev | 16.9 |
COV | 0.6 |
Year | Cases | YOY |
---|---|---|
2022 year | 16 cases | -56.8 % |
2021 year | 37 cases | +12.12 % |
2020 year | 33 cases | -23.26 % |
集光 filed 180 joint applications with ソニーグループ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 48 cases in total) is 8.0, and the median is 6.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 47 cases, and their lowest number in 2022 with 2 cases.
Index | Value |
---|---|
Average | 8.0 patents |
Std Dev | 6.8 |
COV | 0.8 |
Year | Cases | YOY |
---|---|---|
2022 year | 2 cases | -33.3 % |
2021 year | 3 cases | -70.0 % |
2020 year | 10 cases | -37.5 % |
集光 filed 283 joint applications with 三菱電機株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 133 cases in total) is 22.2, and the median is 23.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 42 cases, and their lowest number in 2022 with 15 cases.
Index | Value |
---|---|
Average | 22.2 patents |
Std Dev | 10.0 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 15 cases | -31.8 % |
2021 year | 22 cases | -12.00 % |
2020 year | 25 cases | -28.57 % |
The following shows JP patents held by 集光 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 集光’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 集光 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 5 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 2.0 times. The most recently Invalidation Trial patent is 特許4601965 "レーザ加工方法及びレーザ加工装置" (Invalidation Trial day 2022-05-11) , next is 特許4509578 "レーザ加工方法及びレーザ加工装置" (Invalidation Trial day 2022-05-11) .
- | No. | Title | Invalidation Trial days |
---|---|---|---|
1 | 特許4601965 | レーザ加工方法及びレーザ加工装置 | 2022-05-11 |
2 | 特許4509578 | レーザ加工方法及びレーザ加工装置 | 2022-05-11 |
3 | 特許3935188 | レーザ加工装置 | 2021-09-09 |
4 | 特許3867108 | レーザ加工装置 | 2021-08-19 |
5 | 特許3990711 | レーザ加工装置 | 2021-08-06 |
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 7 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7315650 "光学コリメータ" (Opposition day 2024-01-24) , next is 特許7227604 "三次元形状測定方法および三次元形状測定装置" (Opposition day 2023-08-16) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7315650 | 光学コリメータ | 2024-01-24 |
2 | 特許7227604 | 三次元形状測定方法および三次元形状測定装置 | 2023-08-16 |
3 | 特許7136209 | クロマトグラフィー用検出器 | 2023-03-10 |
4 | 特許7047864 | 造形装置及び造形方法 | 2022-10-04 |
5 | 特許6982450 | 保護ガラス汚れ検知システム及び方法 | 2022-06-14 |
6 | 特許6918243 | 光パターン生成装置 | 2022-02-03 |
7 | 特許6860090 | 分光データ管理装置、測定装置および測定システム | 2021-09-28 |
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 15 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2023-076566 "消防用投光器" (Protest day 2024-01-18) , next is 特開2023-137889 "穀物成分センサ及び穀物成分分析装置" (Protest day 2023-11-17) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特開2023-076566 | 消防用投光器 | 2024-01-18 |
2 | 特開2023-137889 | 穀物成分センサ及び穀物成分分析装置 | 2023-11-17 |
3 | 特開2023-113602 | 積層体、証明証、および、積層体の製造方法 | 2023-11-07 |
4 | 特許7470028 | 光学ラインセンサ | 2023-06-13 |
5 | 特許7411868 | レーザ装置 | 2023-05-02 |
6 | 特許7473216 | レーザ半田付け装置 | 2023-03-29 |
7 | 特許7325383 | 物品検査装置 | 2022-11-22 |
8 | 特許7268605 | 積層体、証明証、および、積層体の製造方法 | 2022-08-31 |
9 | 特許7282021 | 色彩選別機 | 2022-06-06 |
10 | 特許7434100 | 測定装置及び成膜装置 | 2022-05-11 |
11 | 特開2021-007716 | 遊技機 | 2022-04-19 |
12 | 特開2020-183900 | 光学計測装置及び光学計測方法 | 2022-01-11 |
13 | 特許7054167 | 露光装置 | 2021-11-25 |
14 | 特許7149989 | 自動車用ナンバープレート用の再帰反射シート | 2021-09-27 |
15 | 特許6989303 | 表示装置 | 2021-07-26 |
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 38 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許6317296 "3次元形状の測定方法及び測定装置" (3 times) , and the next most protest patent is 特許7268605 "積層体、証明証、および、積層体の製造方法" (2 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6317296 | 3次元形状の測定方法及び測定装置 | 3 times |
2 | 特許7268605 | 積層体、証明証、および、積層体の製造方法 | 2 times |
3 | 特許7149989 | 自動車用ナンバープレート用の再帰反射シート | 2 times |
4 | 特開2015-232575 | 多重波長を用いた3次元形状の測定装置及び測定方法 | 2 times |
5 | 特開2023-076566 | 消防用投光器 | 2 times |
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 30 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2023-076566 "消防用投光器" (Inspection day 2024-02-13) , next is 特許6148319 "ポリシリコンドープ領域を有するバックコンタクト型太陽電池のトレンチプロセス及び構造" (Inspection day 2024-01-30) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特開2023-076566 | 消防用投光器 | 2024-02-13 |
2 | 特許6148319 | ポリシリコンドープ領域を有するバックコンタクト型太陽電池のトレンチプロセス及び構造 | 2024-01-30 |
3 | 特許5860101 | ポリシリコンドープ領域を有するバックコンタクト型太陽電池のトレンチプロセス及び構造 | 2024-01-30 |
4 | 特開2023-137889 | 穀物成分センサ及び穀物成分分析装置 | 2023-11-27 |
5 | 特許7452193 | レーザー溶接加工装置 | 2023-09-14 |
6 | 特許6575580 | 照明装置 | 2023-08-21 |
7 | 特許6575624 | 照明装置、及びレーザダイオード | 2023-08-21 |
8 | 特許7461294 | 透過型メタサーフェスレンズ統合 | 2023-07-03 |
9 | 特許7470028 | 光学ラインセンサ | 2023-06-22 |
10 | 特許7411868 | レーザ装置 | 2023-05-10 |
11 | 特許7325383 | 物品検査装置 | 2023-04-11 |
12 | 特許7473216 | レーザ半田付け装置 | 2023-03-31 |
13 | 特許6119963 | 自動焦点制御装置、半導体検査装置および顕微鏡 | 2023-01-12 |
14 | 特許7268605 | 積層体、証明証、および、積層体の製造方法 | 2022-10-11 |
15 | 特許7198457 | インテリアCT位相イメージングX線顕微鏡装置 | 2022-09-16 |
16 | 特開2022-184822 | カラー光学検査装置及びこれを含むシステム | 2022-06-30 |
17 | 特許7434100 | 測定装置及び成膜装置 | 2022-06-08 |
18 | 特開2014-112157 | マイクロレンズアレイおよびこれを用いた照明制御装置 | 2022-06-02 |
19 | 特開2020-183900 | 光学計測装置及び光学計測方法 | 2022-02-02 |
20 | 特許7054167 | 露光装置 | 2021-12-21 |
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 90 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6114449 "光装飾体" (6 times) , and the next most inspection patent is 特許7268605 "積層体、証明証、および、積層体の製造方法" (4 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6114449 | 光装飾体 | 6 times |
2 | 特許7268605 | 積層体、証明証、および、積層体の製造方法 | 4 times |
3 | 特許6317296 | 3次元形状の測定方法及び測定装置 | 4 times |
4 | 特許7199224 | 中空ナノジェットレンズによる近傍界フォーカシング | 2 times |
5 | 特開2020-182434 | ペットボトル等を使い安価に温度調節された空間等を利用する方法や食物やサービス等を適切に循環させ安定した社会を築き成長する方法。 | 2 times |
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 2,506 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.9. The most cited patent is 特許6546613 "異なる種類の撮像装置を有するモノリシックカメラアレイを用いた画像の撮像および処理" (84 times) , and the next most cited patent is 特開2017-138301 "レーザレーダ装置" (46 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6546613 | 異なる種類の撮像装置を有するモノリシックカメラアレイを用いた画像の撮像および処理 | 84 times |
2 | 特開2017-138301 | レーザレーダ装置 | 46 times |
3 | 特開2016-072965 | 撮像装置 | 43 times |
4 | 特開2016-201558 | 加工装置 | 38 times |
5 | 特許6554703 | システム | 36 times |
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