The Technical Field "単結晶" had 47 patent application filings in the most recent period (2023-01-01 to 2023-02-28). This is a significantly decreased of -27 filings (-36.5%) over 74 they had in the same period of the previous year (2022-01-01 to 2022-02-28). This report also includes technical terms related to " モノクリスタル " in the search set.
The highest number of filings in 2015 with 1,021 cases, and their lowest number in 2022 with 497 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 3,399 cases in total) is 566, and the median is 610. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 566 patents |
Std Dev | 216 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 497 cases | -12.19 % |
2021 year | 566 cases | -13.46 % |
2020 year | 654 cases | -8.91 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 単結晶 for the period of the last 10 years (2014-01-01 to 2024-10-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 単結晶, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of 単結晶 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
This patent analysis report was created for a patent search set of 7,226 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 単結晶 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Comparing the number of applications of each company, 信越半導体株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 42 cases, followed by 株式会社SUMCO with 36 cases.
Name | Cases |
---|---|
信越半導体株式会社 | 42 cases |
株式会社SUMCO | 36 cases |
キヤノン株式会社 | 13 cases |
セイコーエプソン株式会社 | 13 cases |
住友電気工業株式会社 | 7 cases |
株式会社東芝 | 2 cases |
富士通株式会社 | 2 cases |
パナソニックホールディングス株式会社 | 1 cases |
Comparing the number of applications of each company, 株式会社SUMCO has the highest number of joint applications in the last for the target period (2014 to 2024) with 417 cases, followed by 信越半導体株式会社 with 354 cases.
Name | Cases |
---|---|
株式会社SUMCO | 417 cases |
信越半導体株式会社 | 354 cases |
株式会社半導体エネルギー研究所 | 265 cases |
住友電気工業株式会社 | 237 cases |
セイコーエプソン株式会社 | 108 cases |
キヤノン株式会社 | 47 cases |
株式会社東芝 | 44 cases |
パナソニックホールディングス株式会社 | 24 cases |
富士通株式会社 | 21 cases |
株式会社日立製作所 | 17 cases |
日本電気株式会社 | 3 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 単結晶 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Among the top coapplicants, 信越半導体株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 42 cases, followed by キヤノン株式会社 with 13 cases.
Name | Cases |
---|---|
信越半導体株式会社 | 42 cases |
キヤノン株式会社 | 13 cases |
セイコーエプソン株式会社 | 13 cases |
住友電気工業株式会社 | 7 cases |
株式会社東芝 | 2 cases |
Among the top coapplicants, 信越半導体株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 354 cases, followed by 株式会社半導体エネルギー研究所 with 265 cases.
Name | Cases |
---|---|
信越半導体株式会社 | 354 cases |
株式会社半導体エネルギー研究所 | 265 cases |
住友電気工業株式会社 | 237 cases |
セイコーエプソン株式会社 | 108 cases |
キヤノン株式会社 | 47 cases |
株式会社東芝 | 44 cases |
株式会社日立製作所 | 17 cases |
Below is a ranking of the number of JP patent applications by 単結晶’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 単結晶’s top 7 coapplicants over the last 20 years.
単結晶 filed 44 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 11 cases in total) is 1.8, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 11 cases, and their lowest number in 2020 with 0 cases.
Index | Value |
---|---|
Average | 1.8 patents |
Std Dev | 1.7 |
COV | 0.9 |
Year | Cases | YOY |
---|---|---|
2022 year | 1 cases | -66.7 % |
2021 year | 3 cases | - |
2020 year | 0 cases | -100 % |
単結晶 filed 47 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 27 cases in total) is 4.5, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 7 cases, and their lowest number in 2017 with 1 cases.
Index | Value |
---|---|
Average | 4.5 patents |
Std Dev | 1.6 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 6 cases | +50.0 % |
2021 year | 4 cases | -33.3 % |
2020 year | 6 cases | +100 % |
単結晶 filed 108 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 53 cases in total) is 8.8, and the median is 8.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2017 with 23 cases, and their lowest number in 2016 with 2 cases.
Index | Value |
---|---|
Average | 8.8 patents |
Std Dev | 4.2 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 10 cases | +25.00 % |
2021 year | 8 cases | +14.29 % |
2020 year | 7 cases | -12.50 % |
単結晶 filed 354 joint applications with 信越半導体株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 189 cases in total) is 31.5, and the median is 36.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 51 cases, and their lowest number in 2017 with 26 cases.
Index | Value |
---|---|
Average | 31.5 patents |
Std Dev | 11.3 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 33 cases | -17.50 % |
2021 year | 40 cases | +2.56 % |
2020 year | 39 cases | +34.5 % |
単結晶 filed 237 joint applications with 住友電気工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 58 cases in total) is 9.7, and the median is 7.0. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 64 cases, and their lowest number in 2021 with 2 cases.
Index | Value |
---|---|
Average | 9.7 patents |
Std Dev | 10.5 |
COV | 1.1 |
Year | Cases | YOY |
---|---|---|
2022 year | 7 cases | +250 % |
2021 year | 2 cases | -71.4 % |
2020 year | 7 cases | -30.0 % |
The following shows JP patents held by 単結晶 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 単結晶’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 単結晶 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 10 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7264627 "セラミック板、半導体装置および半導体モジュール" (Opposition day 2023-10-23) , next is 特許7157356 "光学部品及び光学部品の製造方法" (Opposition day 2023-02-27) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7264627 | セラミック板、半導体装置および半導体モジュール | 2023-10-23 |
2 | 特許7157356 | 光学部品及び光学部品の製造方法 | 2023-02-27 |
3 | 特許7097480 | X線管、X線発生装置、及び窓部材の製造方法 | 2023-01-06 |
4 | 特許6996001 | エピタキシャル層を有する半導体ウェーハ | 2022-07-14 |
5 | 特許6992364 | 窒化ケイ素焼結基板 | 2022-07-08 |
6 | 特許6948441 | 低Co水素吸蔵合金粉末 | 2022-03-31 |
7 | 特許6905719 | 六方晶窒化ホウ素単結晶、該六方晶窒化ホウ素単結晶を配合した複合材組成物および該複合材組成物を成形してなる放熱部材 | 2022-01-20 |
8 | 特許6922054 | 電子ビーム生成用カソード部材およびその製造方法 | 2022-01-20 |
9 | 特許6905156 | 充電式リチウムイオン電池用の正極材料及びその製造方法 | 2022-01-14 |
10 | 特許6884898 | 研磨用組成物 | 2021-12-07 |
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 18 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2023-108425 "品質評価方法、評価用シリコンの製造システム、評価用シリコンの製造方法及び評価用シリコン" (Protest day 2024-09-09) , next is 特開2021-132209 "研磨用パッド、および導電性半導体基板の製造方法" (Protest day 2024-08-23) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特開2023-108425 | 品質評価方法、評価用シリコンの製造システム、評価用シリコンの製造方法及び評価用シリコン | 2024-09-09 |
2 | 特開2021-132209 | 研磨用パッド、および導電性半導体基板の製造方法 | 2024-08-23 |
3 | 特開2023-106715 | 単結晶シリコンの製造方法及び評価方法 | 2024-08-02 |
4 | 特表2023-513289 | 水和結晶性多核金属錯体、ゲスト化合物検体を含む水和結晶性多核金属錯体、及びゲスト化合物検体の分子構造を決定する方法におけるその使用 | 2024-06-12 |
5 | 特開2022-159501 | 多結晶シリコン棒、多結晶シリコンロッドおよびその製造方法 | 2024-05-29 |
6 | 特許7527658 | 膜構造体、圧電体膜及び超伝導体膜 | 2024-04-09 |
7 | 特開2022-147881 | Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法 | 2023-12-20 |
8 | 特開2023-093304 | HVPE法によるGa2O3結晶膜の蒸着方法、蒸着装置、および、これを用いて得られたGa2O3結晶膜蒸着基板 | 2023-12-20 |
9 | 特許7483240 | 単結晶成長装置およびIII-V族半導体単結晶の製造方法 | 2023-10-24 |
10 | 特開2023-093552 | 電子エミッタ及びそれを製作する方法 | 2023-09-25 |
11 | 特開2022-003004 | ポリシリコンロッド及びポリシリコンロッド製造方法 | 2023-07-25 |
12 | 特表2023-511769 | 水溶性有機‐無機ハイブリッドマスク配合物及びその用途 | 2023-07-13 |
13 | 特許7264627 | セラミック板、半導体装置および半導体モジュール | 2023-01-17 |
14 | 特許7283040 | 熱可塑性樹脂フィルム | 2022-10-27 |
15 | 特許7202393 | 充電式リチウムイオン電池用の正極材料を調製する方法 | 2022-07-26 |
16 | 特許7337339 | 膜厚センサ素子 | 2022-07-08 |
17 | 特許7190841 | SiCインゴットの製造方法及びSiCウェハの製造方法 | 2022-06-10 |
18 | 特許6762484 | SiCエピタキシャルウェハ及びその製造方法 | 2021-11-29 |
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 54 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許7264627 "セラミック板、半導体装置および半導体モジュール" (4 times) , and the next most protest patent is 特許6472732 "樹脂材料、ビニール製袋、多結晶シリコン棒、多結晶シリコン塊" (3 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許7264627 | セラミック板、半導体装置および半導体モジュール | 4 times |
2 | 特許6472732 | 樹脂材料、ビニール製袋、多結晶シリコン棒、多結晶シリコン塊 | 3 times |
3 | 特許7283040 | 熱可塑性樹脂フィルム | 3 times |
4 | 特開2017-122028 | 窒化アルミニウム単結晶 | 2 times |
5 | 特開2017-108179 | 炭化珪素単結晶基板、炭化珪素エピタキシャル基板および炭化珪素半導体装置の製造方法 | 2 times |
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 43 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2021-132209 "研磨用パッド、および導電性半導体基板の製造方法" (Inspection day 2024-09-19) , next is 特許7082235 "太陽電池及びその製造方法、太陽電池モジュール" (Inspection day 2024-09-03) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特開2021-132209 | 研磨用パッド、および導電性半導体基板の製造方法 | 2024-09-19 |
2 | 特許7082235 | 太陽電池及びその製造方法、太陽電池モジュール | 2024-09-03 |
3 | 特許7174188 | 太陽電池及びその製造方法、太陽電池モジュール | 2024-09-03 |
4 | 特開2023-106715 | 単結晶シリコンの製造方法及び評価方法 | 2024-08-14 |
5 | 特表2024-507509 | 複合リチウムニッケルマンガン酸化物の正極材料及びその製造方法ならびにリチウムイオン電池用正極シート | 2024-07-31 |
6 | 特開2021-191785 | 治療活性化合物の医薬組成物 | 2024-07-25 |
7 | 特許7489564 | 2-(5-シクロプロピル-3-(エチルスルホニル)ピリジン-2-イル)-5-((トリフルオロメチル)スルフィニル)ベンゾ[d]オキサゾールの結晶 | 2024-07-17 |
8 | 特開2022-159501 | 多結晶シリコン棒、多結晶シリコンロッドおよびその製造方法 | 2024-06-26 |
9 | 特許7527658 | 膜構造体、圧電体膜及び超伝導体膜 | 2024-05-15 |
10 | 特開2022-147881 | Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法 | 2024-01-25 |
11 | 特許4729766 | 超電導酸化物材料の製造方法 | 2024-01-17 |
12 | 特開2021-027358 | マイクロストラクチャ向上型吸収感光装置 | 2023-12-21 |
13 | 特許6054235 | SiC種結晶及びSiC単結晶の製造方法 | 2023-11-09 |
14 | 特許7364804 | イオン伝導性材料、イオン伝導性材料を含む電解質、およびその形成方法 | 2023-10-05 |
15 | 特許6575580 | 照明装置 | 2023-08-21 |
16 | 特許6728395 | ダイヤモンド工具ピース | 2023-08-21 |
17 | 特表2023-511769 | 水溶性有機‐無機ハイブリッドマスク配合物及びその用途 | 2023-08-10 |
18 | 特開2017-108179 | 炭化珪素単結晶基板、炭化珪素エピタキシャル基板および炭化珪素半導体装置の製造方法 | 2023-08-09 |
19 | 特許5554449 | ダイヤモンド工具 | 2023-08-04 |
20 | 特許5874932 | ダイヤモンド材料の処理方法及び得られた製品 | 2023-08-04 |
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 128 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 再公表2015/072494 "新規二酢酸ナトリウム結晶及び該結晶を含有する固形透析用製剤" (11 times) , and the next most inspection patent is 特許7527658 "膜構造体、圧電体膜及び超伝導体膜" (10 times) .
- | No. | Title | |
---|---|---|---|
1 | 再公表2015/072494 | 新規二酢酸ナトリウム結晶及び該結晶を含有する固形透析用製剤 | 11 times |
2 | 特許7527658 | 膜構造体、圧電体膜及び超伝導体膜 | 10 times |
3 | 特許6472732 | 樹脂材料、ビニール製袋、多結晶シリコン棒、多結晶シリコン塊 | 6 times |
4 | 特許7190841 | SiCインゴットの製造方法及びSiCウェハの製造方法 | 5 times |
5 | 特許7264627 | セラミック板、半導体装置および半導体モジュール | 5 times |
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 1,580 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.1. The most cited patent is 特許5910763 "弾性波装置" (35 times) , and the next most cited patent is 特許6399913 "ウエーハの生成方法" (35 times) .
"Patent Integration Report" is a web service provided by "Patent Integration Co., Ltd." operated by patent attorneys who are experts in intellectual property rights. Based on the latest patent data, this is one of the largest patent report services in Japan that provides information on technology trends in various companies and technology fields.
The purpose of this web service is to make intellectual property information familiar to many people, regardless of whether they have an interest in intellectual property rights, and to make use of it.
We actively provide various types of patent information that can be used in various media articles such as newspapers, magazines, and web media. Please feel free to contact us from "Inquiry form for details on the content of patent information that can be provided, conditions for provision, etc. Please contact us.
All rights related to the data, documents and charts belong to "an integrated patent search/analysis service provider, Patent Integration". Please specify the source “Patent Integration Report, URL: https://patent-i.com/report/en/" when inserting them into in-house materials, external report materials, etc., regardless of whether they are paid or free of charge.
Patent data is obtained by aggregating and analyzing the latest patent data issued by the Patent Offices of respective countries and jurisdictions and by WIPO. Although we take great care in publishing and analyzing the results, we do not guarantee the correctness of the data. We appreciate your understanding.
If you have any concerns about this service, please feel free to contact us.
All rights to the data, documents, figures and tables are reserved by e-Patent. When publishing internal documents, external reports, etc. (whether paid or free of charge), please use the following URL: https://e-patent.co.jp/.
e-Patent will not be liable for any damages or losses arising from the use of the global patent application status, ranking information, or population search formula in the "SDGs Global Company Ranking from a Patent Perspective". Items with ● in front of the target are not supported at this time (judged to be difficult to approach from the patent information analysis).
There is no problem to cite patent application status and ranking information, but please clearly indicate "Source: e-Patent Co.
Credit notation
・MeCab user dictionary for science technology term © National Bioscience Database Center licensed under CC Attribution-Share Alike 4.0 International