The Technical Field "偏光" had 533 patent application filings in the most recent period (2022-01-01 to 2022-07-31). This is a significantly decreased of -195 filings (-26.8%) over 728 they had in the same period of the previous year (2021-01-01 to 2021-07-31).
The highest number of filings in 2016 with 2,248 cases, and their lowest number in 2022 with 714 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 7,392 cases in total) is 1,232, and the median is 1,307. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 1,232 patents |
Std Dev | 680 |
COV | 0.6 |
Year | Cases | YOY |
---|---|---|
2022 year | 714 cases | -39.6 % |
2021 year | 1,183 cases | -17.33 % |
2020 year | 1,431 cases | -22.69 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 偏光 for the period of the last 10 years (2014-01-01 to 2024-03-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 偏光, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of 偏光 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
This patent analysis report was created for a patent search set of 16,086 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
A patent aanlysis report on the following synonyms was found in the technical term "偏光".
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 偏光 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 84 cases, followed by 住友化学株式会社 with 80 cases.
Name | Cases |
---|---|
日東電工株式会社 | 84 cases |
住友化学株式会社 | 80 cases |
キヤノン株式会社 | 27 cases |
セイコーエプソン株式会社 | 24 cases |
大日本印刷株式会社 | 18 cases |
富士フイルム株式会社 | 11 cases |
シャープ株式会社 | 3 cases |
株式会社リコー | 3 cases |
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,346 cases, followed by 住友化学株式会社 with 1,278 cases.
Name | Cases |
---|---|
日東電工株式会社 | 1,346 cases |
住友化学株式会社 | 1,278 cases |
富士フイルム株式会社 | 788 cases |
大日本印刷株式会社 | 527 cases |
セイコーエプソン株式会社 | 392 cases |
キヤノン株式会社 | 364 cases |
ソニーグループ株式会社 | 173 cases |
シャープ株式会社 | 132 cases |
株式会社リコー | 111 cases |
株式会社日立製作所 | 34 cases |
パナソニックホールディングス株式会社 | 3 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 偏光 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Among the top coapplicants, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 84 cases, followed by 住友化学株式会社 with 80 cases.
Name | Cases |
---|---|
日東電工株式会社 | 84 cases |
住友化学株式会社 | 80 cases |
キヤノン株式会社 | 27 cases |
セイコーエプソン株式会社 | 24 cases |
富士フイルム株式会社 | 11 cases |
シャープ株式会社 | 3 cases |
Among the top coapplicants, 日東電工株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,346 cases, followed by 住友化学株式会社 with 1,278 cases.
Name | Cases |
---|---|
日東電工株式会社 | 1,346 cases |
住友化学株式会社 | 1,278 cases |
富士フイルム株式会社 | 788 cases |
セイコーエプソン株式会社 | 392 cases |
キヤノン株式会社 | 364 cases |
ソニーグループ株式会社 | 173 cases |
シャープ株式会社 | 132 cases |
Below is a ranking of the number of JP patent applications by 偏光’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 偏光’s top 7 coapplicants over the last 20 years.
偏光 filed 788 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 296 cases in total) is 49.3, and the median is 56.0. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 164 cases, and their lowest number in 2022 with 9 cases.
Index | Value |
---|---|
Average | 49.3 patents |
Std Dev | 34.2 |
COV | 0.7 |
Year | Cases | YOY |
---|---|---|
2022 year | 9 cases | -80.0 % |
2021 year | 45 cases | -32.8 % |
2020 year | 67 cases | -26.37 % |
偏光 filed 392 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 181 cases in total) is 30.2, and the median is 31.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 57 cases, and their lowest number in 2022 with 24 cases.
Index | Value |
---|---|
Average | 30.2 patents |
Std Dev | 16.0 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 24 cases | -20.00 % |
2021 year | 30 cases | -9.09 % |
2020 year | 33 cases | -25.00 % |
偏光 filed 1,346 joint applications with 日東電工株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 776 cases in total) is 129, and the median is 143. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2019 with 225 cases, and their lowest number in 2022 with 73 cases.
Index | Value |
---|---|
Average | 129 patents |
Std Dev | 70.1 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 73 cases | -51.7 % |
2021 year | 151 cases | +11.85 % |
2020 year | 135 cases | -40.0 % |
偏光 filed 1,278 joint applications with 住友化学株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 707 cases in total) is 118, and the median is 130. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 198 cases, and their lowest number in 2022 with 66 cases.
Index | Value |
---|---|
Average | 118 patents |
Std Dev | 62.3 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 66 cases | -42.6 % |
2021 year | 115 cases | -20.14 % |
2020 year | 144 cases | -27.27 % |
偏光 filed 364 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 160 cases in total) is 26.7, and the median is 29.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 63 cases, and their lowest number in 2022 with 23 cases.
Index | Value |
---|---|
Average | 26.7 patents |
Std Dev | 11.3 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 23 cases | -14.81 % |
2021 year | 27 cases | -15.62 % |
2020 year | 32 cases | -13.51 % |
The following shows JP patents held by 偏光 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 偏光’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 偏光 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.0 times. The most recently Invalidation Trial patent is 特許4974971 "熱可塑性樹脂組成物とそれを用いた樹脂成形品および偏光子保護フィルムならびに樹脂成形品の製造方法" (Invalidation Trial day 2023-07-27) .
- | No. | Title | Invalidation Trial days |
---|---|---|---|
1 | 特許4974971 | 熱可塑性樹脂組成物とそれを用いた樹脂成形品および偏光子保護フィルムならびに樹脂成形品の製造方法 | 2023-07-27 |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 48 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7331832 "プラスチック製フィルム又はシート用活性エネルギー線硬化型接着剤組成物、積層体及び偏光板" (Opposition day 2024-01-04) , next is 特許7312448 "目視支援装置" (Opposition day 2023-12-26) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7331832 | プラスチック製フィルム又はシート用活性エネルギー線硬化型接着剤組成物、積層体及び偏光板 | 2024-01-04 |
2 | 特許7312448 | 目視支援装置 | 2023-12-26 |
3 | 特許7259452 | エレクトロルミネッセンス表示装置 | 2023-10-16 |
4 | 特許7259453 | 可撓性画像表示装置、及びそれに用いる円偏光板の製造方法 | 2023-10-16 |
5 | 特許7251941 | 光学フィルム | 2023-10-02 |
6 | 特許7241324 | 遮熱フィルム | 2023-09-13 |
7 | 特許7220311 | 表面処理フィルム | 2023-08-07 |
8 | 特許7203027 | フォルダブル円偏光板および表示装置 | 2023-07-11 |
9 | 特許7193526 | 浴室環境で使用するバイオモニタリング・デバイス、方法、及びシステム | 2023-06-20 |
10 | 特許7191970 | 光学素子および光偏向装置 | 2023-06-16 |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 118 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2022-146427 "光学積層体及び表示装置" (Protest day 2024-03-25) , next is 特開2022-149455 "光学フィルム" (Protest day 2024-02-26) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特開2022-146427 | 光学積層体及び表示装置 | 2024-03-25 |
2 | 特開2022-149455 | 光学フィルム | 2024-02-26 |
3 | 特表2022-500703 | 反射フィルムを含むガラスラミネート | 2024-02-26 |
4 | 特開2023-041698 | 光学積層体 | 2024-02-20 |
5 | 特開2021-105709 | 光透過を制御するデバイス | 2024-02-02 |
6 | 特開2020-160428 | 粘着剤層付偏光フィルム、画像表示パネル及び画像表示装置 | 2023-12-26 |
7 | 特開2023-087688 | 表面保護フィルム | 2023-12-08 |
8 | 特開2023-113602 | 積層体、証明証、および、積層体の製造方法 | 2023-11-07 |
9 | 特開2022-025942 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-25 |
10 | 特開2021-088667 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2023-10-24 |
11 | 特開2022-025943 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-18 |
12 | 特開2022-025941 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-18 |
13 | 特表2022-505589 | 偏光板の製造方法 | 2023-10-11 |
14 | 特表2021-534277 | 成形体用組成物 | 2023-09-27 |
15 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 2023-09-26 |
16 | 特開2021-195552 | フレキシブル画像表示装置内の積層体に用いる粘着シート、フレキシブル画像表示装置に用いる積層体、及びフレキシブル画像表示装置 | 2023-08-31 |
17 | 特開2019-206178 | 積層体、偏光子保護フィルム及び偏光板 | 2023-08-25 |
18 | 特許7441611 | 位相差層付き偏光板および有機EL表示装置 | 2023-08-24 |
19 | 特許7441610 | 位相差層付き偏光板および有機EL表示装置 | 2023-08-24 |
20 | 特開2022-021888 | 粘着シート、粘着剤付き偏光板、ならびに画像表示装置およびその製造方法 | 2023-08-10 |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 347 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許6612191 "偏光板" (8 times) , and the next most protest patent is 特開2016-011363 "粘着剤組成物、粘着シート、及び、光学部材" (5 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6612191 | 偏光板 | 8 times |
2 | 特開2016-011363 | 粘着剤組成物、粘着シート、及び、光学部材 | 5 times |
3 | 特許6478883 | 液晶表示装置 | 4 times |
4 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 4 times |
5 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 4 times |
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 180 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2023-041698 "光学積層体" (Inspection day 2024-03-12) , next is 特開2022-149455 "光学フィルム" (Inspection day 2024-03-06) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特開2023-041698 | 光学積層体 | 2024-03-12 |
2 | 特開2022-149455 | 光学フィルム | 2024-03-06 |
3 | 特表2022-500703 | 反射フィルムを含むガラスラミネート | 2024-03-06 |
4 | 特開2021-056137 | 皮膚の状態の推定装置 | 2024-02-21 |
5 | 特表2021-524120 | ディスプレイ検出装置、そのための方法、およびコンピュータ読み取り可能媒体 | 2024-02-20 |
6 | 特開2020-160428 | 粘着剤層付偏光フィルム、画像表示パネル及び画像表示装置 | 2024-01-23 |
7 | 特開2024-018516 | 偏光板及び画像表示装置 | 2023-12-26 |
8 | 特開2021-088667 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2023-10-31 |
9 | 特許7321463 | 反射防止フィルム、偏光板およびディスプレイ装置 | 2023-10-20 |
10 | 特許6261700 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
11 | 特開2009-292869 | アクリルフィルム、その製造方法、偏光板、光学補償フィルム、反射防止フィルムおよび液晶表示装置 | 2023-10-17 |
12 | 特許6025927 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
13 | 特許6021686 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
14 | 特表2021-534277 | 成形体用組成物 | 2023-10-11 |
15 | 特許7369038 | BTN1A1に免疫特異的に結合する抗体及び分子並びにその治療的使用 | 2023-10-10 |
16 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 2023-10-05 |
17 | 特許7441611 | 位相差層付き偏光板および有機EL表示装置 | 2023-09-27 |
18 | 特許7441610 | 位相差層付き偏光板および有機EL表示装置 | 2023-09-27 |
19 | 特許7395328 | 車両用表示装置 | 2023-09-21 |
20 | 特開2019-206178 | 積層体、偏光子保護フィルム及び偏光板 | 2023-08-29 |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 481 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特許6478883 "液晶表示装置" (12 times) , and the next most inspection patent is 特許6383755 "透明プラスチック基材及びプラスチックレンズ" (10 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6478883 | 液晶表示装置 | 12 times |
2 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 10 times |
3 | 特開2016-027405 | 光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法 | 10 times |
4 | 特許6612191 | 偏光板 | 9 times |
5 | 特許6025927 | アクリルフィルムおよびその製造方法 | 6 times |
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 4,309 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.4. The most cited patent is 特許6251130 "磁気メモリ素子" (83 times) , and the next most cited patent is 特許6680793 "導波路回折格子デバイス" (70 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6251130 | 磁気メモリ素子 | 83 times |
2 | 特許6680793 | 導波路回折格子デバイス | 70 times |
3 | 特許6734933 | 構造化光投影のためのホログラフィック導波管装置 | 58 times |
4 | 特許6895451 | 偏光選択ホログラフィー導波管デバイスを提供するための方法および装置 | 54 times |
5 | 特許6169530 | 液晶表示装置 | 52 times |
"Patent Integration Report" is a web service provided by "Patent Integration Co., Ltd." operated by patent attorneys who are experts in intellectual property rights. Based on the latest patent data, this is one of the largest patent report services in Japan that provides information on technology trends in various companies and technology fields.
The purpose of this web service is to make intellectual property information familiar to many people, regardless of whether they have an interest in intellectual property rights, and to make use of it.
We actively provide various types of patent information that can be used in various media articles such as newspapers, magazines, and web media. Please feel free to contact us from "Inquiry form for details on the content of patent information that can be provided, conditions for provision, etc. Please contact us.
All rights related to the data, documents and charts belong to "an integrated patent search/analysis service provider, Patent Integration". Please specify the source “Patent Integration Report, URL: https://patent-i.com/report/en/" when inserting them into in-house materials, external report materials, etc., regardless of whether they are paid or free of charge.
Patent data is obtained by aggregating and analyzing the latest patent data issued by the Patent Offices of respective countries and jurisdictions and by WIPO. Although we take great care in publishing and analyzing the results, we do not guarantee the correctness of the data. We appreciate your understanding.
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