The Theme Code "半導体レーザ技術" had 109 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a with an decreasing trend transition of -27 filings (-19.9%) over 136 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2017 with 825 cases, and their lowest number in 2022 with 390 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 3,268 cases in total) is 545, and the median is 570. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 545 patents |
Std Dev | 200 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 390 cases | -20.73 % |
2021 year | 492 cases | -24.19 % |
2020 year | 649 cases | -16.79 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 半導体レーザ技術[5F173] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 半導体レーザ技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of 半導体レーザ技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 半導体レーザ技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
The following is a list of words (characteristic terms) often used in 半導体レーザ技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
This patent analysis report was created for a patent search set of 6,434 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
The patent information of the higher applicant in the technical theme 半導体レーザ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Comparing the number of applications of each company, 三菱電機株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 56 cases, followed by 住友電気工業株式会社 with 30 cases.
Name | Cases |
---|---|
三菱電機株式会社 | 56 cases |
住友電気工業株式会社 | 30 cases |
株式会社リコー | 11 cases |
日本電気株式会社 | 10 cases |
ソニーグループ株式会社 | 10 cases |
パナソニックホールディングス株式会社 | 9 cases |
日本電信電話株式会社 | 6 cases |
株式会社東芝 | 6 cases |
シャープ株式会社 | 1 cases |
Comparing the number of applications of each company, 三菱電機株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 434 cases, followed by 住友電気工業株式会社 with 353 cases.
Name | Cases |
---|---|
三菱電機株式会社 | 434 cases |
住友電気工業株式会社 | 353 cases |
日本電信電話株式会社 | 257 cases |
株式会社リコー | 193 cases |
富士通株式会社 | 117 cases |
ソニーグループ株式会社 | 113 cases |
シャープ株式会社 | 87 cases |
パナソニックホールディングス株式会社 | 83 cases |
株式会社東芝 | 79 cases |
日本電気株式会社 | 44 cases |
株式会社日立製作所 | 7 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The patent information of the higher applicant in the technical theme 半導体レーザ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
among the top coapplicants, 三菱電機株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 56 cases, followed by 住友電気工業株式会社 with 30 cases.
Name | Cases |
---|---|
三菱電機株式会社 | 56 cases |
住友電気工業株式会社 | 30 cases |
日本電気株式会社 | 10 cases |
パナソニックホールディングス株式会社 | 9 cases |
日本電信電話株式会社 | 6 cases |
シャープ株式会社 | 1 cases |
among the top coapplicants, 三菱電機株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 434 cases, followed by 住友電気工業株式会社 with 353 cases.
Name | Cases |
---|---|
三菱電機株式会社 | 434 cases |
住友電気工業株式会社 | 353 cases |
日本電信電話株式会社 | 257 cases |
富士通株式会社 | 117 cases |
シャープ株式会社 | 87 cases |
パナソニックホールディングス株式会社 | 83 cases |
日本電気株式会社 | 44 cases |
Below is a ranking of the number of JP patent applications by 半導体レーザ技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 半導体レーザ技術’s top 7 coapplicants over the last 20 years.
半導体レーザ技術 filed 44 joint applications with 日本電気株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 19 cases in total) is 3.2, and the median is 3.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 10 cases, and their lowest number in 2021 with 0 cases.
Index | Value |
---|---|
Average | 3.2 patents |
Std Dev | 2.1 |
COV | 0.7 |
Year | Cases | YOY |
---|---|---|
2022 year | 4 cases | - |
2021 year | 0 cases | -100 % |
2020 year | 1 cases | -66.7 % |
半導体レーザ技術 filed 434 joint applications with 三菱電機株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 222 cases in total) is 37.0, and the median is 37.0. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2017 with 57 cases, and their lowest number in 2021 with 25 cases.
Index | Value |
---|---|
Average | 37.0 patents |
Std Dev | 12.4 |
COV | 0.3 |
Year | Cases | YOY |
---|---|---|
2022 year | 32 cases | +28.00 % |
2021 year | 25 cases | -40.5 % |
2020 year | 42 cases | -14.29 % |
半導体レーザ技術 filed 117 joint applications with 富士通株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 19 cases in total) is 3.2, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.7, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 29 cases, and their lowest number in 2022 with 0 cases.
Index | Value |
---|---|
Average | 3.2 patents |
Std Dev | 5.4 |
COV | 1.7 |
Year | Cases | YOY |
---|---|---|
2020 year | 1 cases | -66.7 % |
2019 year | 3 cases | -80.0 % |
2018 year | 15 cases | -48.3 % |
半導体レーザ技術 filed 87 joint applications with シャープ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 30 cases in total) is 5.0, and the median is 4.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 17 cases, and their lowest number in 2022 with 1 cases.
Index | Value |
---|---|
Average | 5.0 patents |
Std Dev | 4.2 |
COV | 0.8 |
Year | Cases | YOY |
---|---|---|
2022 year | 1 cases | -50.0 % |
2021 year | 2 cases | -71.4 % |
2020 year | 7 cases | -22.22 % |
半導体レーザ技術 filed 353 joint applications with 住友電気工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 163 cases in total) is 27.2, and the median is 27.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 63 cases, and their lowest number in 2022 with 19 cases.
Index | Value |
---|---|
Average | 27.2 patents |
Std Dev | 10.6 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 19 cases | -17.39 % |
2021 year | 23 cases | -25.81 % |
2020 year | 31 cases | -26.19 % |
The following shows JP patents held by 半導体レーザ技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 半導体レーザ技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 半導体レーザ技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 3 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7470649 "半導体レーザ素子およびチップオンサブマウント" (Opposition day 2024-10-04) , next is 特許6905070 "光源装置および照明装置" (Opposition day 2022-01-20) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7470649 | 半導体レーザ素子およびチップオンサブマウント | 2024-10-04 |
2 | 特許6905070 | 光源装置および照明装置 | 2022-01-20 |
3 | 特許6895443 | 光学カモフラージュフィルター | 2021-12-24 |
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 1 patents Protest from third parties. The average number of Protest is 1.0 times. The most recently Protest patent is 特許7490719 "光子源及び光子源を作製する方法" (Protest day 2023-12-26) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特許7490719 | 光子源及び光子源を作製する方法 | 2023-12-26 |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 9 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許6895443 "光学カモフラージュフィルター" (3 times) , and the next most protest patent is 特開2020-077832 "半導体素子及び半導体レーザダイオード" (1 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6895443 | 光学カモフラージュフィルター | 3 times |
2 | 特開2020-077832 | 半導体素子及び半導体レーザダイオード | 1 times |
3 | 特開2017-139444 | 光源装置、光源装置の製造方法およびプロジェクター | 1 times |
4 | 特開2017-107071 | 波長変換部材及び波長変換素子、並びにそれらを用いた発光装置 | 1 times |
5 | 特許7136884 | 発光素子搭載用基板および発光装置 | 1 times |
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 6 patents Inspection from third parties. The average number of Inspection is 1.5 times. The most recently Inspection patent is 特表2022-523861 "支持板を使用して1つ以上の素子のバーを除去するための方法" (Inspection day 2024-06-13) , next is 特許7490719 "光子源及び光子源を作製する方法" (Inspection day 2024-01-24) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特表2022-523861 | 支持板を使用して1つ以上の素子のバーを除去するための方法 | 2024-06-13 |
2 | 特許7490719 | 光子源及び光子源を作製する方法 | 2024-01-24 |
3 | 特許7461294 | 透過型メタサーフェスレンズ統合 | 2023-07-03 |
4 | 特許5881222 | 窒化物半導体紫外線発光素子及び窒化物半導体紫外線発光素子の製造方法 | 2023-01-31 |
5 | 特開2023-089933 | 光出力信号制御を改善した光リンク | 2022-12-14 |
6 | 特許6895443 | 光学カモフラージュフィルター | 2022-06-22 |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 25 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6895443 "光学カモフラージュフィルター" (4 times) , and the next most inspection patent is 特許7136884 "発光素子搭載用基板および発光装置" (2 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6895443 | 光学カモフラージュフィルター | 4 times |
2 | 特許7136884 | 発光素子搭載用基板および発光装置 | 2 times |
3 | 特許7148276 | 発光素子搭載用パッケージおよび発光装置 | 2 times |
4 | 特許6412478 | 波長合成レーザシステム | 2 times |
5 | 特許6602479 | 光モジュール | 1 times |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1,624 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.9. The most cited patent is 特許6288132 "発光装置" (56 times) , and the next most cited patent is 特許6225976 "発光装置" (39 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6288132 | 発光装置 | 56 times |
2 | 特許6225976 | 発光装置 | 39 times |
3 | 特開2016-146417 | 半導体発光装置及びそれを用いた距離計測装置並びに距離計測装置の駆動方法 | 37 times |
4 | 特開2016-027613 | 波長変換部材及びそれを用いた発光装置 | 31 times |
5 | 特開2017-098362 | 光集積素子及び光通信装置 | 25 times |
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