現像液 (JP Patent Analysis Report)
The Technical Field "現像液" had 395 patent application filings in the most recent period (2022-01-01 to 2022-07-31). This is a weakly transition of -21 filings (-5.0%) over 416 they had in the same period of the previous year (2021-01-01 to 2021-07-31). This report also includes technical terms related to " 現像剤 " in the search set.
The highest number of filings in 2015 with 1,811 cases, and their lowest number in 2022 with 565 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,229 cases in total) is 705, and the median is 722. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 705 patents |
| Std Dev | 344 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 565 cases | -19.52 % |
| 2021 year | 702 cases | -5.52 % |
| 2020 year | 743 cases | -29.64 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 現像液 for the period of the last 10 years (2014-01-01 to 2024-03-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 現像液, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
現像液, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 現像液 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,698 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
現像液
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 現像液 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 116 cases, followed by 富士フイルムビジネスイノベーション株式会社 with 111 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 116 cases |
| 富士フイルムビジネスイノベーション株式会社 | 111 cases |
| 京セラドキュメントソリューションズ株式会社 | 53 cases |
| 株式会社リコー | 49 cases |
| シャープ株式会社 | 28 cases |
| ブラザー工業株式会社 | 15 cases |
| 富士フイルム株式会社 | 11 cases |
| コニカミノルタ株式会社 | 2 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 2,368 cases, followed by 富士フイルムビジネスイノベーション株式会社 with 1,692 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 2,368 cases |
| 富士フイルムビジネスイノベーション株式会社 | 1,692 cases |
| 京セラドキュメントソリューションズ株式会社 | 966 cases |
| 株式会社リコー | 873 cases |
| ブラザー工業株式会社 | 588 cases |
| 富士フイルム株式会社 | 553 cases |
| コニカミノルタ株式会社 | 462 cases |
| シャープ株式会社 | 180 cases |
| 株式会社東芝 | 35 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 現像液 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 116 cases, followed by 富士フイルムビジネスイノベーション株式会社 with 111 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 116 cases |
| 富士フイルムビジネスイノベーション株式会社 | 111 cases |
| 京セラドキュメントソリューションズ株式会社 | 53 cases |
| 株式会社リコー | 49 cases |
| ブラザー工業株式会社 | 15 cases |
| コニカミノルタ株式会社 | 2 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 2,368 cases, followed by 富士フイルムビジネスイノベーション株式会社 with 1,692 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 2,368 cases |
| 富士フイルムビジネスイノベーション株式会社 | 1,692 cases |
| 京セラドキュメントソリューションズ株式会社 | 966 cases |
| 株式会社リコー | 873 cases |
| ブラザー工業株式会社 | 588 cases |
| コニカミノルタ株式会社 | 462 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 現像液’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 現像液’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with キヤノン株式会社
現像液 filed 2,368 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 1,006 cases in total) is 168, and the median is 156. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 368 cases, and their lowest number in 2022 with 107 cases.
| Index | Value |
|---|---|
| Average | 168 patents |
| Std Dev | 100 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 107 cases | -32.3 % |
| 2021 year | 158 cases | +1.94 % |
| 2020 year | 155 cases | -39.7 % |
Trends in filing of joint patent applications with 株式会社リコー
現像液 filed 873 joint applications with 株式会社リコー for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 279 cases in total) is 46.5, and the median is 50.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 220 cases, and their lowest number in 2022 with 44 cases.
| Index | Value |
|---|---|
| Average | 46.5 patents |
| Std Dev | 20.4 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 44 cases | -2.22 % |
| 2021 year | 45 cases | -18.18 % |
| 2020 year | 55 cases | -11.29 % |
Trends in filing of joint patent applications with 富士フイルムビジネスイノベーション株式会社
現像液 filed 1,692 joint applications with 富士フイルムビジネスイノベーション株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 543 cases in total) is 90.5, and the median is 114. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 340 cases, and their lowest number in 2020 with 49 cases.
| Index | Value |
|---|---|
| Average | 90.5 patents |
| Std Dev | 47.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 106 cases | -12.40 % |
| 2021 year | 121 cases | +147 % |
| 2020 year | 49 cases | -62.9 % |
Trends in filing of joint patent applications with コニカミノルタ株式会社
現像液 filed 462 joint applications with コニカミノルタ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 169 cases in total) is 28.2, and the median is 22.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 83 cases, and their lowest number in 2022 with 2 cases.
| Index | Value |
|---|---|
| Average | 28.2 patents |
| Std Dev | 26.2 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 2 cases | -83.3 % |
| 2021 year | 12 cases | -62.5 % |
| 2020 year | 32 cases | -39.6 % |
Trends in filing of joint patent applications with 京セラドキュメントソリューションズ株式会社
現像液 filed 966 joint applications with 京セラドキュメントソリューションズ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 368 cases in total) is 61.3, and the median is 69.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 158 cases, and their lowest number in 2022 with 52 cases.
| Index | Value |
|---|---|
| Average | 61.3 patents |
| Std Dev | 29.9 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 52 cases | -28.77 % |
| 2021 year | 73 cases | +12.31 % |
| 2020 year | 65 cases | -26.97 % |
Information on important patents (JP)
The following shows JP patents held by 現像液 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 現像液’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 現像液 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 3.0 times. The most recently Invalidation Trial patent is 特許4192197 "メタルマスク及びその製造方法" (Invalidation Trial day 2022-02-14) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許4192197 | メタルマスク及びその製造方法 | 2022-02-14 |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 14 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7335579 "電子写真現像剤用キャリア芯材とその製造方法、並びに該キャリア芯材を備えた電子写真現像剤用キャリアと現像剤" (Opposition day 2023-12-11) , next is 特許7108565 "導電性高分子組成物、被覆品、及びパターン形成方法" (Opposition day 2023-01-27) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7335579 | 電子写真現像剤用キャリア芯材とその製造方法、並びに該キャリア芯材を備えた電子写真現像剤用キャリアと現像剤 | 2023-12-11 |
| 2 | 特許7108565 | 導電性高分子組成物、被覆品、及びパターン形成方法 | 2023-01-27 |
| 3 | 特許7042892 | 中空パッケージの製造方法及び感光性組成物の提供方法 | 2022-07-11 |
| 4 | 特許6978051 | 電子写真現像剤用フェライトキャリア芯材、電子写真現像剤用キャリア及び現像剤 | 2022-06-06 |
| 5 | 特許6950147 | プロセスカートリッジ | 2022-04-13 |
| 6 | 特許6931707 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜の製造方法、パターン形成方法、及び電子デバイスの製造方法 | 2022-03-07 |
| 7 | 特許6929086 | キャリア芯材 | 2022-03-01 |
| 8 | 特許6924885 | キャリア芯材 | 2022-02-21 |
| 9 | 特許6904484 | フレキソ印刷版 | 2022-01-14 |
| 10 | 特許6884832 | 感光体カートリッジ及びプロセスカートリッジ | 2021-12-09 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 31 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2022-090791 "キャリア芯材" (Protest day 2024-03-19) , next is 特開2021-124631 "磁性キャリア及び二成分系現像剤" (Protest day 2024-02-29) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-090791 | キャリア芯材 | 2024-03-19 |
| 2 | 特開2021-124631 | 磁性キャリア及び二成分系現像剤 | 2024-02-29 |
| 3 | 特開2021-162809 | トナー、現像剤及び画像形成装置 | 2024-01-12 |
| 4 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2023-12-28 |
| 5 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-11 |
| 6 | 特開2022-183247 | 光学フィルタの製造方法 | 2023-11-01 |
| 7 | 特開2020-190724 | トナー、トナー収容容器、現像剤、現像装置、プロセスカートリッジ、及び画像形成装置 | 2023-10-05 |
| 8 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-08-09 |
| 9 | 特許7415450 | 現像剤、現像装置、プロセスカートリッジ及び画像形成装置 | 2023-05-16 |
| 10 | 特許7305946 | レジストパターン形成方法 | 2023-04-21 |
| 11 | 特許7335579 | 電子写真現像剤用キャリア芯材とその製造方法、並びに該キャリア芯材を備えた電子写真現像剤用キャリアと現像剤 | 2023-04-03 |
| 12 | 特許7299069 | カラーフィルター用顔料分散組成物及びカラーフィルター用顔料分散レジスト組成物 | 2023-02-06 |
| 13 | 特許7257732 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 2023-01-20 |
| 14 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2022-12-26 |
| 15 | 特許7392299 | 分散剤付着ポリテトラフルオロエチレン粒子、組成物、層状物、電子写真感光体、プロセスカートリッジ、および画像形成装置 | 2022-09-30 |
| 16 | 特許7171655 | 光酸発生剤を含む反射防止コーティング組成物を使用するパターンの形成方法 | 2022-07-27 |
| 17 | 特開2021-097237 | 半導体製造用処理液が収容された収容容器 | 2022-07-15 |
| 18 | 特開2022-013302 | 感光性組成物、硬化物、硬化膜の製造方法、及び樹脂 | 2022-05-17 |
| 19 | 特許7116529 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 2022-04-02 |
| 20 | 特許7116530 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 2022-04-02 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 151 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許7129142 "キャリア芯材" (5 times) , and the next most protest patent is 特許7257732 "キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤" (5 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7129142 | キャリア芯材 | 5 times |
| 2 | 特許7257732 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 5 times |
| 3 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 4 times |
| 4 | 特許7116529 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 3 times |
| 5 | 特許7116530 | キャリア芯材並びにこれを用いた電子写真現像用キャリア及び電子写真用現像剤 | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-04-01 ~ 2024-03-31), there were 27 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2021-124631 "磁性キャリア及び二成分系現像剤" (Inspection day 2024-03-05) , next is 特開2021-162809 "トナー、現像剤及び画像形成装置" (Inspection day 2024-02-08) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2021-124631 | 磁性キャリア及び二成分系現像剤 | 2024-03-05 |
| 2 | 特開2021-162809 | トナー、現像剤及び画像形成装置 | 2024-02-08 |
| 3 | 特開2023-172918 | オニウム塩化合物、ポリマー、レジスト組成物及びパターン形成方法 | 2024-02-05 |
| 4 | 特開2021-107912 | ＥＵＶリソグラフィ用途のための鎖切断レジスト組成物 | 2023-12-20 |
| 5 | 特開2022-183247 | 光学フィルタの製造方法 | 2023-11-09 |
| 6 | 特開2020-190724 | トナー、トナー収容容器、現像剤、現像装置、プロセスカートリッジ、及び画像形成装置 | 2023-10-13 |
| 7 | 特開2021-026229 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2023-09-12 |
| 8 | 特開2021-110806 | 自発光型感光性樹脂組成物、カラーフィルタ、及び画像表示装置 | 2023-08-09 |
| 9 | 特許7415450 | 現像剤、現像装置、プロセスカートリッジ及び画像形成装置 | 2023-05-25 |
| 10 | 特許7305946 | レジストパターン形成方法 | 2023-05-23 |
| 11 | 特許7335579 | 電子写真現像剤用キャリア芯材とその製造方法、並びに該キャリア芯材を備えた電子写真現像剤用キャリアと現像剤 | 2023-05-08 |
| 12 | 特許7357505 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むＥＵＶリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 | 2023-01-06 |
| 13 | 特許7392299 | 分散剤付着ポリテトラフルオロエチレン粒子、組成物、層状物、電子写真感光体、プロセスカートリッジ、および画像形成装置 | 2022-10-26 |
| 14 | 特開2021-097237 | 半導体製造用処理液が収容された収容容器 | 2022-08-10 |
| 15 | 特許7171655 | 光酸発生剤を含む反射防止コーティング組成物を使用するパターンの形成方法 | 2022-08-02 |
| 16 | 特開2022-013302 | 感光性組成物、硬化物、硬化膜の製造方法、及び樹脂 | 2022-06-08 |
| 17 | 特開2018-189932 | 画像形成装置 | 2022-05-12 |
| 18 | 特許7175592 | 静電荷像現像用トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置及び画像形成方法 | 2022-03-29 |
| 19 | 特許7106956 | 現像剤、現像剤の製造方法および画像形成装置 | 2022-02-10 |
| 20 | 特許7151289 | 静電荷像現像剤 | 2021-12-15 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 186 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (3 times) , and the next most inspection patent is 特許6503644 "二成分現像剤用キャリア、二成分現像剤、画像形成方法、及び、画像形成装置" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 3 times |
| 2 | 特許6503644 | 二成分現像剤用キャリア、二成分現像剤、画像形成方法、及び、画像形成装置 | 3 times |
| 3 | 特許6755075 | トナー、二成分現像剤、及びカラー画像形成装置 | 3 times |
| 4 | 特許7095956 | 印刷版用感光性樹脂版の製造方法 | 3 times |
| 5 | 特許6669742 | タッチパネル用水性樹脂組成物、転写フィルム及び硬化膜積層体、並びに樹脂パターンの製造方法及びタッチパネル表示装置 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 2,852 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.6. The most cited patent is 特許6590534 "プロセスカートリッジ及び画像形成装置" (53 times) , and the next most cited patent is 特許6269460 "画像形成装置" (43 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6590534 | プロセスカートリッジ及び画像形成装置 | 53 times |
| 2 | 特許6269460 | 画像形成装置 | 43 times |
| 3 | 特許6702264 | レジスト材料及びパターン形成方法 | 30 times |
| 4 | 特許6531723 | レジスト材料及びパターン形成方法 | 27 times |
| 5 | 特許6364361 | 光増感化学増幅型レジスト材料及びこれを用いたパターン形成方法、並びに、半導体デバイス、リソグラフィ用マスク及びナノインプリント用テンプレートの製造方法 | 26 times |
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