4C036 6員以上のNS含有複素環式化合物技術 Patent Trends
The mean of the number of filings over the last 1 years ( to , 0 cases in total) is 0, and the median is 0. The coefficient of variation (standard deviation/mean) is 0, and filings have been stable.
| Index | Value |
|---|---|
| Average | 0 patents |
| Std Dev | 0 |
| COV | 0 |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 6員以上のNS含有複素環式化合物技術[4C036] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 6員以上のNS含有複素環式化合物技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
6員以上のNS含有複素環式化合物技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 6員以上のNS含有複素環式化合物技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
6員以上のNS含有複素環式化合物技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 3 |
Patent Landscape
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 6員以上のNS含有複素環式化合物技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
Keywords (importance)
Top keywords frequently used in patent filings for 6員以上のNS含有複素環式化合物技術 are shown below.
Top keywords for 6員以上のNS含有複素環式化合物技術
| Keyword | Score |
|---|---|
| 化合 | 100.0 |
| 組成 | 79.32 |
| 塩 | 62.67 |
| 治療 | 46.96 |
| 疾患 | 44.9 |
| 修正 | 39.72 |
| 医薬 | 39.61 |
| 基 | 38.28 |
| 置換 | 30.49 |
| 阻害 | 29.11 |
| 活性 | 28.72 |
| 予防 | 28.62 |
| 有 | 28.12 |
| 処置 | 25.89 |
| 含有 | 22.05 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 3 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
6員以上のNS含有複素環式化合物技術[4C036]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA2024-079857 | 縮合複素環化合物含有組成物および有機材料含有組成物 | ・Applicant 日本ゼオン株式会社 ・Filing date 2021-02-26 ・Publication date 2024-06-12 | 4C036, 4H006, 4J002 |
| 2. JPA2023-182866 | クロスカップリング反応及びその反応を用いる製造方法 | ・Applicant 国立大学法人北海道大学 ・Filing date 2020-10-30 ・Publication date 2023-12-27 | 4C036, 4C056, 4C065, 4C071, 4C072, +5 more |
| 3. JPP7605621 | フェノチアジン誘導体化合物およびその製造法, フェノチアジン誘導体化合物およびその製造法 | ・Applicant ユニマテック株式会社 ・Filing date 2020-12-07 ・Publication date 2022-06-17 | 4C036, 4J100 |
| 4. JPP7715368 | ビニルビスフルオロアルカンスルホニルイミドの製造方法, ビニルビスフルオロアルカンスルホニルイミドの製造方法 | ・Applicant 国立大学法人山口大学 ・Filing date 2020-11-20 ・Publication date 2022-06-01 | 4C036, 4H006 |
| 5. JPA2022-007984 | ケトン若しくはオキシム化合物及び除草剤 | ・Applicant 日産化学株式会社 ・Filing date 2021-02-18 ・Publication date 2022-01-13 | 4C022, 4C031, 4C033, 4C036, 4C037, +6 more |
| 6. JPP7457577 | フェノチアジン系化合物及びそれを含む硬化性樹脂組成物, フェノチアジン系化合物及びそれを含む硬化性樹脂組成物 | ・Applicant 住友化学株式会社, 住華科技股フン有限公司, 東友ファインケム株式会社 ・Filing date 2020-05-27 ・Publication date 2021-12-13 | 2H148, 4C036 |
| 7. JPP7302537 | レジスト材料及びパターン形成方法, レジスト材料及びパターン形成方法 | ・Applicant 信越化学工業株式会社 ・Filing date 2020-06-25 ・Publication date 2021-10-28 | 2H197, 2H225, 4C036, 4C037, 4C091, +1 more |
| 8. JPA2021-163844 | 光検出素子、それを含むセンサ及び生体認証装置、並びに組成物及びインク | ・Applicant 住友化学株式会社 ・Filing date 2020-03-31 ・Publication date 2021-10-11 | 3K107, 4C036, 4C050, 4C071, 4C072, +3 more |
| 9. JPP7784232 | 染毛用染料、該染料を含有する染毛用組成物および該染料の製造方法, 染毛用染料、該染料を含有する染毛用組成物および該染料の製造方法 | ・Applicant 保土谷化学工業株式会社 ・Filing date 2021-02-15 ・Publication date 2021-09-13 | 4C033, 4C036, 4C055, 4C056, 4C062, +3 more |
| 10. JPP7683177 | 金錯体を含む抗癌剤及び化学放射線療法における放射線との併用剤, 金錯体を含む抗癌剤及び化学放射線療法における放射線との併用剤 | ・Applicant 合同会社エルム労働衛生科学, 学校法人関東学院 ・Filing date 2020-07-27 ・Publication date 2021-02-15 | 4B063, 4C036, 4C076, 4C086, 4H048 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「6員以上のNS含有複素環式化合物技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 6員以上のNS含有複素環式化合物技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 2 cases, followed by ユニマテック株式会社 with 1 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 2 cases |
| ユニマテック株式会社 | 1 cases |
| 住華科技股フン有限公司 | 1 cases |
| 保土谷化学工業株式会社 | 1 cases |
| 信越化学工業株式会社 | 1 cases |
| 合同会社エルム労働衛生科学 | 1 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 住友化学株式会社 | 2 |
| ユニマテック株式会社 | 1 |
| 住華科技股フン有限公司 | 1 |
| 保土谷化学工業株式会社 | 1 |
| 信越化学工業株式会社 | 1 |
| 合同会社エルム労働衛生科学 | 1 |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む