Last Updated: 2024/03/04

エレクトロルミネッセンス光源技術 (JP Patent Analysis Report)

The Theme Code "エレクトロルミネッセンス光源技術" had 515 patent application filings in the most recent period (2022-01-01 to 2022-06-30). This is a with an decreasing trend transition of -58 filings (-10.1%) over 573 they had in the same period of the previous year (2021-01-01 to 2021-06-30).

The company had their highest number of filings in 2014 with 3,459 cases, and their lowest number in 2022 with 830 cases.

The mean of the number of filings over the last 5 years (2018 to 2023, 8,209 cases in total) is 1,368, and the median is 1,259. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 1,368 patents
Std Dev 811
COV 0.6

Filing trends for the last 3 years
Year Cases YOY
2022 year 830 cases -29.06 %
2021 year 1,170 cases -13.20 %
2020 year 1,348 cases -32.9 %

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for エレクトロルミネッセンス光源技術[3K107] for the period of the last 10 years (2014-01-01 to 2024-02-29). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of エレクトロルミネッセンス光源技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.

Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for エレクトロルミネッセンス光源技術. The trends of patent filings of エレクトロルミネッセンス光源技術 for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder

エレクトロルミネッセンス光源技術, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of エレクトロルミネッセンス光源技術 over the last 20 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.

Counting of the Number of Cases using the Patent Mapping Function

By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Patent Landscape ({{ld.d.db_name | country_map: 'en'}})

Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.

The patent landscape for エレクトロルミネッセンス光源技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).

By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.

In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.

Visualization of Technical Position

The patent landscape allows you to analyze, without any hassle, what patent applications have been filed and what technical position is to be established.

Characteristic Terms (Importance)

The following is a list of words (characteristic terms) often used in エレクトロルミネッセンス光源技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.

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Search Set (Analysis Object)

This patent analysis report was created for a patent search set of 20,656 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Theme Code:
エレクトロルミネッセンス光源技術[3K107]
Patent Analysis Period
2014-01-01〜2024-02-29
Number of Objects
20,656 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Same industry / competition company information (JP)

The patent information of the higher applicant in the technical theme エレクトロルミネッセンス光源技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.

Introduction of patent search function

Competitive analysis can be performed in a short time by using various search functions such as applicant, filing date, and similar patent search.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Comparing the number of applications of each company, 株式会社ジャパンディスプレイ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 80 cases, followed by 株式会社半導体エネルギー研究所 with 77 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).

Comparing the number of applications of each company, 株式会社半導体エネルギー研究所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 3,866 cases, followed by 株式会社ジャパンディスプレイ with 1,157 cases.

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company information (JP)

The patent information of the higher applicant in the technical theme エレクトロルミネッセンス光源技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.

Search for Coapplicants

Patent integration allows you to find coapplicants in a short amount of time.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

among the top coapplicants, 株式会社ジャパンディスプレイ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 80 cases, followed by 株式会社半導体エネルギー研究所 with 77 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).

among the top coapplicants, 株式会社半導体エネルギー研究所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 3,866 cases, followed by 株式会社ジャパンディスプレイ with 1,157 cases.

Top company, Change in the Number of JP Patents

Below is a patent map showing the changes in the numbers of JP patent filings by エレクトロルミネッセンス光源技術’s top 7 coapplicants over the last 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company Details (JP)

Trends in filing of joint patent applications with 株式会社半導体エネルギー研究所

エレクトロルミネッセンス光源技術 filed 3,866 joint applications with 株式会社半導体エネルギー研究所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 875 cases in total) is 146, and the median is 44.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The company had their highest number of filings in 2016 with 810 cases, and their lowest number in 2021 with 16 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 146 patents
Std Dev 163
COV 1.1
Filing trends for the last 3 years
Year Cases YOY
2022 year 47 cases +194 %
2021 year 16 cases -61.9 %
2020 year 42 cases -86.1 %

Trends in filing of joint patent applications with セイコーエプソン株式会社

エレクトロルミネッセンス光源技術 filed 404 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 146 cases in total) is 24.3, and the median is 20.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2015 with 92 cases, and their lowest number in 2022 with 13 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 24.3 patents
Std Dev 16.9
COV 0.7
Filing trends for the last 3 years
Year Cases YOY
2022 year 13 cases -23.53 %
2021 year 17 cases -29.17 %
2020 year 24 cases -48.9 %

Trends in filing of joint patent applications with コニカミノルタ株式会社

エレクトロルミネッセンス光源技術 filed 703 joint applications with コニカミノルタ株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 84 cases in total) is 14.0, and the median is 5.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2014 with 239 cases, and their lowest number in 2022 with 2 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 14.0 patents
Std Dev 15.4
COV 1.1
Filing trends for the last 3 years
Year Cases YOY
2022 year 2 cases -50.0 %
2021 year 4 cases -42.9 %
2020 year 7 cases -81.1 %

Trends in filing of joint patent applications with ソニーグループ株式会社

エレクトロルミネッセンス光源技術 filed 123 joint applications with ソニーグループ株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 32 cases in total) is 5.3, and the median is 5.5. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The company had their highest number of filings in 2014 with 44 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 5.3 patents
Std Dev 4.7
COV 0.9
Filing trends for the last 3 years
Year Cases YOY
2021 year 2 cases -77.8 %
2020 year 9 cases -10.00 %
2019 year 10 cases -9.09 %

Trends in filing of joint patent applications with キヤノン株式会社

エレクトロルミネッセンス光源技術 filed 312 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 225 cases in total) is 37.5, and the median is 41.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The company had their highest number of filings in 2021 with 53 cases, and their lowest number in 2016 with 11 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 37.5 patents
Std Dev 14.3
COV 0.4
Filing trends for the last 3 years
Year Cases YOY
2022 year 39 cases -26.42 %
2021 year 53 cases +23.26 %
2020 year 43 cases +2.38 %

Information on important patents (JP)

The following shows JP patents held by エレクトロルミネッセンス光源技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and エレクトロルミネッセンス光源技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.

By noting the most important patents, you can obtain knowledge of the competitive business environment in which エレクトロルミネッセンス光源技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.

If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.

Search for Information on Important Patents

You can quickly search for important patents/patent applications, such as patents/patent applications that were cited many times and patents that have had invalidation trials demanded against them many times.

Glossary

Cited
Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
Request for invalidation trial
Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
Opposition
Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
Information provision
Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
Browsing request
Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.

Invalidationed Trial cases

List of latest Invalidationed Trial patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 8 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.2 times. The most recently Invalidation Trial patent is 特許7203763 "表示基板及びその製造方法、表示装置" (Invalidation Trial day 2023-07-31) , next is 特許6672194 "有機発光表示装置の画素配列構造" (Invalidation Trial day 2023-04-28) .

Most recent Invalidation Trial (2021-03-01 to 2024-02-29)
- No. Title Invalidation Trial days
1 特許7203763 表示基板及びその製造方法、表示装置 2023-07-31
2 特許6672194 有機発光表示装置の画素配列構造 2023-04-28
3 特許6748268 有機発光表示装置の画素配列構造 2023-04-28
4 特許6568156 発光素子、発光装置、照明装置および電子機器 2022-04-05
5 特許5420705 発光素子、発光装置、照明装置及び電子機器 2022-04-05
6 特許6734906 電子機器 2021-11-02
7 特許6323815 有機光電子素子およびこれを含む表示装置 2021-07-30
8 特許5935199 多環芳香族化合物 2021-05-07

Show 3 patents  

Top Patents/Patent Applications with the Highest Number of Invalidationed Trial

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 4 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.2. The most invalidation trial patent is 特許6568156 "発光素子、発光装置、照明装置および電子機器" (2 times) , and the next most invalidation trial patent is 特許6672194 "有機発光表示装置の画素配列構造" (1 times) .

Top Patents/Patent Applications with the Highest Number of Invalidation Trial over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許6568156 発光素子、発光装置、照明装置および電子機器 2 times
2 特許6672194 有機発光表示装置の画素配列構造 1 times
3 特許5935199 多環芳香族化合物 1 times
4 特許7203763 表示基板及びその製造方法、表示装置 1 times

Oppositioned cases

List of latest Oppositioned patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 47 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7294146 "着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明" (Opposition day 2023-12-20) , next is 特許7263153 "感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法" (Opposition day 2023-10-24) .

Most recent Opposition (2021-03-01 to 2024-02-29)
- No. Title Opposition days
1 特許7294146 着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明 2023-12-20
2 特許7263153 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法 2023-10-24
3 特許7259452 エレクトロルミネッセンス表示装置 2023-10-16
4 特許7259453 可撓性画像表示装置、及びそれに用いる円偏光板の製造方法 2023-10-16
5 特許7226459 メタルマスク基材、および、メタルマスクの製造方法 2023-08-18
6 特許7203027 フォルダブル円偏光板および表示装置 2023-07-11
7 特許7178509 積層体及び有機エレクトロルミネッセンス表示装置 2023-05-16
8 特許7173422 光学フィルム、偏光板、画像表示装置及び光学フィルムの選定方法 2023-05-15
9 特許7125683 蒸着マスクを製造するための金属板並びに蒸着マスク及び蒸着マスクの製造方法 2023-02-24
10 特許7120518 フォルダブルディスプレイ用保護フィルムおよびこれを含むフォルダブルディスプレイ装置 2023-02-17

Show 5 patents  

Protested cases

List of latest Protested patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 102 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2023-135668 "π共役系ポリマーの製造方法" (Protest day 2024-02-08) , next is 特開2022-059983 "黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス" (Protest day 2024-02-07) .

Most recent Protest (2021-03-01 to 2024-02-29)
- No. Title Protest days
1 特開2023-135668 π共役系ポリマーの製造方法 2024-02-08
2 特開2022-059983 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス 2024-02-07
3 特開2022-059982 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス 2024-02-07
4 特表2023-540317 無機ピクセル封入バリアを有するOLEDパネルを製造する方法 2024-02-07
5 特開2022-058493 蒸着用マスク及びこれを用いたOLEDパネル 2024-01-29
6 特開2023-029649 有機EL表示素子用封止剤 2024-01-26
7 特開2021-166285 有機エレクトロルミネセント化合物、複数のホスト材料、及びそれらを含む有機エレクトロルミネセントデバイス 2024-01-24
8 特表2022-503940 ヘテロ環化合物、これを含む有機発光素子、有機発光素子の有機物層用組成物および有機発光素子の製造方法 2024-01-24
9 特表2023-539094 有機光電子素子用化合物、有機光電子素子用組成物、有機光電子素子および表示装置 2024-01-18
10 特開2022-019638 有機エレクトロルミネセント化合物、それを含む複数のホスト材料及び有機エレクトロルミネセントデバイス 2024-01-18
11 特表2022-528689 白色有機発光デバイス及びその製造方法 2024-01-05
12 特許5688182 フレキシブル有機エレクトロルミネッセンスデバイス及びその製造方法 2024-01-05
13 特表2023-553379 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング 2024-01-05
14 再公表2019/203123 有機EL表示素子用封止剤及びトップエミッション型有機EL表示素子 2023-11-29
15 特開2020-056024 紫外線硬化性樹脂組成物、発光装置の製造方法及び発光装置 2023-11-17
16 特開2023-106457 有機光電子素子用有機アロイ、有機光電子素子および表示装置 2023-11-16
17 特開2023-112128 有機EL表示素子用封止剤 2023-11-14
18 特表2023-534498 新規な複素環式化合物及びそれを含む有機発光素子 2023-10-31
19 特開2021-068895 複数のホスト材料及びこれを含む有機エレクトロルミネセントデバイス 2023-10-31
20 特開2022-047977 紫外線硬化性樹脂組成物、光学部品、光学部品の製造方法、発光装置、及び発光装置の製造方法 2023-10-30

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Protested

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 235 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許7336412 "有機光電子素子用有機アロイ、有機光電子素子および表示装置" (5 times) , and the next most protest patent is 特許7051818 "感光性樹脂組成物" (5 times) .

Top Patents/Patent Applications with the Highest Number of Protest over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許7336412 有機光電子素子用有機アロイ、有機光電子素子および表示装置 5 times
2 特許7051818 感光性樹脂組成物 5 times
3 特許6932420 フレキシブル画像表示装置用粘着剤組成物、フレキシブル画像表示装置用粘着剤層、フレキシブル画像表示装置用積層体、及び、フレキシブル画像表示装置 4 times
4 特許6697359 フレキシブルディスプレイ用粘着剤、粘着シート、フレキシブル積層部材およびフレキシブルディスプレイ 3 times
5 特許6538637 リン光発光ダイオード中の単一トリフェニレン発色団 3 times

Inspectioned cases

List of latest Inspectioned patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 200 patents Inspection from third parties. The average number of Inspection is 1.5 times. The most recently Inspection patent is 特開2022-039781 "発光材料、有機無機ハイブリッド発光素子およびディスプレイ" (Inspection day 2024-02-27) , next is 特開2021-166285 "有機エレクトロルミネセント化合物、複数のホスト材料、及びそれらを含む有機エレクトロルミネセントデバイス" (Inspection day 2024-02-16) .

Most recent Inspection (2021-03-01 to 2024-02-29)
- No. Title Inspection days
1 特開2022-039781 発光材料、有機無機ハイブリッド発光素子およびディスプレイ 2024-02-27
2 特開2021-166285 有機エレクトロルミネセント化合物、複数のホスト材料、及びそれらを含む有機エレクトロルミネセントデバイス 2024-02-16
3 特開2023-135668 π共役系ポリマーの製造方法 2024-02-15
4 特表2023-540317 無機ピクセル封入バリアを有するOLEDパネルを製造する方法 2024-02-15
5 特許6702393 電気光学装置、および電気光学装置の製造方法 2024-02-06
6 特許6702394 電気光学装置、電気光学装置の製造方法、および電気光学装置製造用部材 2024-02-06
7 特表2022-528689 白色有機発光デバイス及びその製造方法 2024-02-05
8 特開2023-029649 有機EL表示素子用封止剤 2024-01-30
9 特開2022-019638 有機エレクトロルミネセント化合物、それを含む複数のホスト材料及び有機エレクトロルミネセントデバイス 2024-01-26
10 特表2023-553379 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング 2024-01-26
11 特表2023-539094 有機光電子素子用化合物、有機光電子素子用組成物、有機光電子素子および表示装置 2024-01-23
12 特許6851712 置換されたオレフィンの製造方法 2024-01-19
13 特表2023-534498 新規な複素環式化合物及びそれを含む有機発光素子 2024-01-10
14 特開2023-112128 有機EL表示素子用封止剤 2023-12-12
15 再公表2019/203123 有機EL表示素子用封止剤及びトップエミッション型有機EL表示素子 2023-12-05
16 特許7396900 表示基板、その表示方法、表示装置及び高精度メタルマスク 2023-11-24
17 特開2021-068895 複数のホスト材料及びこれを含む有機エレクトロルミネセントデバイス 2023-11-24
18 特開2022-047977 紫外線硬化性樹脂組成物、光学部品、光学部品の製造方法、発光装置、及び発光装置の製造方法 2023-11-24
19 特許7342026 画素配列構造、表示パネル及び表示装置 2023-11-24
20 特許5736071 半導体装置 2023-10-31

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Inspectioned

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 433 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.3. The most inspection patent is 特許6696669 "光学積層体及び表示装置" (7 times) , and the next most inspection patent is 特許6934299 "多成分ホスト材料及びそれを含む有機電界発光デバイス" (7 times) .

Top Patents/Patent Applications with the Highest Number of Inspection over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許6696669 光学積層体及び表示装置 7 times
2 特許6934299 多成分ホスト材料及びそれを含む有機電界発光デバイス 7 times
3 特許6432072 メタルマスク基材、および、メタルマスクの製造方法 6 times
4 特許7051818 感光性樹脂組成物 6 times
5 特許6782418 有機エレクトロニクス材料及びその利用 5 times

Cited cases

Top Patents/Patent Applications with the Highest Number of Cited

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 5,311 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.4. The most cited patent is 特許6804823 "白金錯体およびデバイス" (83 times) , and the next most cited patent is 特開2014-221807 "四配位白金錯体の合成およびそれらの発光デバイスへの応用" (73 times) .

Top Patents/Patent Applications with the Highest Number of Cited over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許6804823 白金錯体およびデバイス 83 times
2 特開2014-221807 四配位白金錯体の合成およびそれらの発光デバイスへの応用 73 times
3 特開2014-197181 表示装置 60 times
4 特許6603445 改変された発光スペクトルを有する蛍光性四座配位金属錯体 52 times
5 特開2017-102443 光学積層体および該光学積層体を用いた有機エレクトロルミネセンス表示装置 50 times

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