写真製版における原稿準備・マスク技術 (JP Patent Analysis Report)
The Theme Code "写真製版における原稿準備・マスク技術" had 46 patent application filings in the most recent period (2023-01-01 to 2023-04-30). This is a significantly decreased of -19 filings (-29.2%) over 65 they had in the same period of the previous year (2022-01-01 to 2022-04-30).
The highest number of filings in 2015 with 320 cases, and their lowest number in 2023 with 85 cases.
The mean of the number of filings over the last 5 years (2019 to 2024, 883 cases in total) is 147, and the median is 182. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 147 patents |
| Std Dev | 68.1 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 85 cases | -54.3 % |
| 2022 year | 186 cases | -2.62 % |
| 2021 year | 191 cases | -11.98 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 写真製版における原稿準備・マスク技術[2H195] for the period of the last 10 years (2015-01-01 to 2024-12-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 写真製版における原稿準備・マスク技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 写真製版における原稿準備・マスク技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
写真製版における原稿準備・マスク技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 写真製版における原稿準備・マスク技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 写真製版における原稿準備・マスク技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 写真製版における原稿準備・マスク技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 2,002 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
写真製版における原稿準備・マスク技術[2H195]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 写真製版における原稿準備・マスク技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, HOYA株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 13 cases, followed by キヤノン株式会社 with 4 cases.
| Name | Cases |
|---|---|
| HOYA株式会社 | 13 cases |
| キヤノン株式会社 | 4 cases |
| 信越化学工業株式会社 | 4 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
Comparing the number of applications of each company, HOYA株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 390 cases, followed by 信越化学工業株式会社 with 193 cases.
| Name | Cases |
|---|---|
| HOYA株式会社 | 390 cases |
| 信越化学工業株式会社 | 193 cases |
| TOPPANホールディングス株式会社 | 73 cases |
| 大日本印刷株式会社 | 56 cases |
| 株式会社ニコン | 19 cases |
| キヤノン株式会社 | 18 cases |
| 富士通株式会社 | 5 cases |
| 株式会社東芝 | 3 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 写真製版における原稿準備・マスク技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, HOYA株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 13 cases.
| Name | Cases |
|---|---|
| HOYA株式会社 | 13 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
among the top coapplicants, HOYA株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 390 cases, followed by TOPPANホールディングス株式会社 with 73 cases.
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 写真製版における原稿準備・マスク技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 写真製版における原稿準備・マスク技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with HOYA株式会社
写真製版における原稿準備・マスク技術 filed 390 joint applications with HOYA株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 124 cases in total) is 20.7, and the median is 14.0. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2018 with 70 cases, and their lowest number in 2023 with 12 cases.
| Index | Value |
|---|---|
| Average | 20.7 patents |
| Std Dev | 15.4 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 12 cases | -25.00 % |
| 2022 year | 16 cases | +33.3 % |
| 2021 year | 12 cases | -72.1 % |
Trends in filing of joint patent applications with 株式会社東芝
写真製版における原稿準備・マスク技術 filed 3 joint applications with 株式会社東芝 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 10 years (2014 to 2024, 13 cases in total) is 1.2, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.5, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 3 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.2 patents |
| Std Dev | 2.9 |
| COV | 2.5 |
| Year | Cases | YOY |
|---|---|---|
| 2015 year | 3 cases | -70.0 % |
| 2014 year | 10 cases | - |
Trends in filing of joint patent applications with 大日本印刷株式会社
写真製版における原稿準備・マスク技術 filed 56 joint applications with 大日本印刷株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 8 cases in total) is 1.3, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.7, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 16 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.3 patents |
| Std Dev | 2.2 |
| COV | 1.7 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 2 cases | - |
| 2020 year | 0 cases | -100 % |
| 2019 year | 6 cases | -14.29 % |
Trends in filing of joint patent applications with TOPPANホールディングス株式会社
写真製版における原稿準備・マスク技術 filed 73 joint applications with TOPPANホールディングス株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 13 cases in total) is 2.2, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 1.0, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 31 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 2.2 patents |
| Std Dev | 2.2 |
| COV | 1.0 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 4 cases | 0 |
| 2020 year | 4 cases | -20.00 % |
| 2019 year | 5 cases | 0 |
Trends in filing of joint patent applications with 富士通株式会社
写真製版における原稿準備・マスク技術 filed 5 joint applications with 富士通株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 10 years (2014 to 2024, 6 cases in total) is 0.5, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.2, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 2 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.7 |
| COV | 1.2 |
| Year | Cases | YOY |
|---|---|---|
| 2020 year | 1 cases | - |
| 2019 year | 0 cases | -100 % |
| 2018 year | 1 cases | 0 |
Information on important patents (JP)
The following shows JP patents held by 写真製版における原稿準備・マスク技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 写真製版における原稿準備・マスク技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 写真製版における原稿準備・マスク技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 2 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7111566 "ペリクル枠及びペリクル" (Opposition day 2023-02-01) , next is 特許6954498 "ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法" (Opposition day 2022-04-25) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7111566 | ペリクル枠及びペリクル | 2023-02-01 |
| 2 | 特許6954498 | ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法 | 2022-04-25 |
Protested cases
List of latest Protested patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 2 patents Protest from third parties. The average number of Protest is 1.0 times. The most recently Protest patent is 特開2022-000709 "ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法" (Protest day 2024-12-27) , next is 特表2022-517067 "非円形瞳を有する検査システム" (Protest day 2024-04-08) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-000709 | ペリクルフレーム、ペリクル、ペリクル付露光原版及び露光方法、並びに半導体装置又は液晶表示板の製造方法 | 2024-12-27 |
| 2 | 特表2022-517067 | 非円形瞳を有する検査システム | 2024-04-08 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 11 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許6536192 "合成石英ガラス基板の製造方法" (3 times) , and the next most protest patent is 特許7181496 "ペリクル、ペリクル付フォトマスク、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6536192 | 合成石英ガラス基板の製造方法 | 3 times |
| 2 | 特許7181496 | ペリクル、ペリクル付フォトマスク、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法 | 2 times |
| 3 | 特許6781864 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 | 2 times |
| 4 | 再公表2018/016485 | フォトマスク、フォトマスク製造方法、及びフォトマスクを用いたカラーフィルタの製造方法 | 1 times |
| 5 | 特表2019-527382 | 合金吸収体を有する極紫外線マスクブランク、及びその製造方法 | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 4 patents Inspection from third parties. The average number of Inspection is 1.0 times. The most recently Inspection patent is 特許5605917 "フォトマスクの製造方法、パターン転写方法及びフラットパネルディスプレイの製造方法" (Inspection day 2024-08-12) , next is 特許5993386 "フォトマスク及びフラットパネルディスプレイの製造方法" (Inspection day 2024-08-12) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特許5605917 | フォトマスクの製造方法、パターン転写方法及びフラットパネルディスプレイの製造方法 | 2024-08-12 |
| 2 | 特許5993386 | フォトマスク及びフラットパネルディスプレイの製造方法 | 2024-08-12 |
| 3 | 特許7545791 | フォトマスクの製造方法 | 2024-07-12 |
| 4 | 特許7393573 | フォトマスクの製造方法 | 2023-11-28 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 16 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.5. The most inspection patent is 特許6781864 "ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法" (6 times) , and the next most inspection patent is 特許7181496 "ペリクル、ペリクル付フォトマスク、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6781864 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 | 6 times |
| 2 | 特許7181496 | ペリクル、ペリクル付フォトマスク、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法 | 2 times |
| 3 | 特許6536192 | 合成石英ガラス基板の製造方法 | 2 times |
| 4 | 特許6613029 | 異物検査装置、露光装置及びデバイス製造方法 | 2 times |
| 5 | 特表2019-527382 | 合金吸収体を有する極紫外線マスクブランク、及びその製造方法 | 1 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 631 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.0. The most cited patent is 特許7047046 "マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法" (41 times) , and the next most cited patent is 特開2017-083791 "ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法" (33 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7047046 | マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法 | 41 times |
| 2 | 特開2017-083791 | ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法 | 33 times |
| 3 | 特許6395320 | ペリクル | 26 times |
| 4 | 特許6636581 | 反射型マスクブランク、反射型マスクの製造方法、及び半導体装置の製造方法 | 24 times |
| 5 | 特許6370255 | ペリクル用フレーム及びそれを用いたペリクル | 23 times |
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Please note that the various graphs are image data, but we cannot provide them in text data.Scope of coverage for each goal/target
- Based on the description of each goal and target of the SDGs, we have set the scope of technologies to be covered based on our and e-Patent's past experience, etc. (in some cases, the search is based on social issues themselves). Therefore, please note that there is a possibility that this "SDGs Global Company Ranking from Patent Perspective" may not cover 100%.
- A population search formula is clearly indicated for each goal/target (database: Patent Integration). You may use the population search formula as it is, or you may improve it by yourself.
- This search covers patents and utility models, including both published and registered patents (design and design patents are excluded). The unit of count is the number of applications, not the number of patent families.
About the name collation and name control of applicants and right holders
- Company rankings are based on the results calculated by "Patent Integration", with Japanese organizations in Japanese and other companies in English (some are in Japanese).
- Company names may be the names of the companies at the time of application, but the results calculated by Patent Integration are used as is. Company names are used as they were at the time of application.
- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
Credit notation
・MeCab user dictionary for science technology term © National Bioscience Database Center licensed under CC Attribution-Share Alike 4.0 International
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