偏光要素技術 (JP Patent Analysis Report)
The Theme Code "偏光要素技術" had 320 patent application filings in the most recent period (2022-01-01 to 2022-08-31). This is a significantly decreased of -106 filings (-24.9%) over 426 they had in the same period of the previous year (2021-01-01 to 2021-08-31).
The highest number of filings in 2016 with 1,388 cases, and their lowest number in 2022 with 391 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,190 cases in total) is 698, and the median is 697. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 698 patents |
| Std Dev | 406 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 391 cases | -38.0 % |
| 2021 year | 631 cases | -17.30 % |
| 2020 year | 763 cases | -32.5 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 偏光要素技術[2H149] for the period of the last 10 years (2014-01-01 to 2024-04-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 偏光要素技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 偏光要素技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
偏光要素技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 偏光要素技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 偏光要素技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 偏光要素技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 9,352 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
偏光要素技術[2H149]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 偏光要素技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 104 cases, followed by 住友化学株式会社 with 90 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 104 cases |
| 住友化学株式会社 | 90 cases |
| 富士フイルム株式会社 | 22 cases |
| 大日本印刷株式会社 | 12 cases |
| セイコーエプソン株式会社 | 6 cases |
| 日本ゼオン株式会社 | 6 cases |
| コニカミノルタ株式会社 | 4 cases |
| エルジー・ケム・リミテッド | 4 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,523 cases, followed by 住友化学株式会社 with 1,410 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 1,523 cases |
| 住友化学株式会社 | 1,410 cases |
| 富士フイルム株式会社 | 973 cases |
| 大日本印刷株式会社 | 483 cases |
| 日本ゼオン株式会社 | 340 cases |
| エルジー・ケム・リミテッド | 294 cases |
| コニカミノルタ株式会社 | 281 cases |
| セイコーエプソン株式会社 | 75 cases |
| TOPPANホールディングス株式会社 | 54 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 偏光要素技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 104 cases, followed by 住友化学株式会社 with 90 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 104 cases |
| 住友化学株式会社 | 90 cases |
| 富士フイルム株式会社 | 22 cases |
| 大日本印刷株式会社 | 12 cases |
| セイコーエプソン株式会社 | 6 cases |
| 日本ゼオン株式会社 | 6 cases |
| コニカミノルタ株式会社 | 4 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 日東電工株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,523 cases, followed by 住友化学株式会社 with 1,410 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 1,523 cases |
| 住友化学株式会社 | 1,410 cases |
| 富士フイルム株式会社 | 973 cases |
| 大日本印刷株式会社 | 483 cases |
| 日本ゼオン株式会社 | 340 cases |
| コニカミノルタ株式会社 | 281 cases |
| セイコーエプソン株式会社 | 75 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 偏光要素技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 偏光要素技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 富士フイルム株式会社
偏光要素技術 filed 973 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 435 cases in total) is 72.5, and the median is 77.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 167 cases, and their lowest number in 2022 with 19 cases.
| Index | Value |
|---|---|
| Average | 72.5 patents |
| Std Dev | 50.2 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 19 cases | -66.1 % |
| 2021 year | 56 cases | -43.4 % |
| 2020 year | 99 cases | -26.12 % |
Trends in filing of joint patent applications with 日東電工株式会社
偏光要素技術 filed 1,523 joint applications with 日東電工株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 853 cases in total) is 142, and the median is 160. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2019 with 236 cases, and their lowest number in 2022 with 99 cases.
| Index | Value |
|---|---|
| Average | 142 patents |
| Std Dev | 73.9 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 99 cases | -41.1 % |
| 2021 year | 168 cases | +9.80 % |
| 2020 year | 153 cases | -35.2 % |
Trends in filing of joint patent applications with 住友化学株式会社
偏光要素技術 filed 1,410 joint applications with 住友化学株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 766 cases in total) is 128, and the median is 140. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 215 cases, and their lowest number in 2022 with 74 cases.
| Index | Value |
|---|---|
| Average | 128 patents |
| Std Dev | 66.0 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 74 cases | -45.2 % |
| 2021 year | 135 cases | -7.53 % |
| 2020 year | 146 cases | -32.1 % |
Trends in filing of joint patent applications with 大日本印刷株式会社
偏光要素技術 filed 483 joint applications with 大日本印刷株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 128 cases in total) is 21.3, and the median is 16.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 103 cases, and their lowest number in 2022 with 12 cases.
| Index | Value |
|---|---|
| Average | 21.3 patents |
| Std Dev | 16.3 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 12 cases | -14.29 % |
| 2021 year | 14 cases | -22.22 % |
| 2020 year | 18 cases | -47.1 % |
Trends in filing of joint patent applications with コニカミノルタ株式会社
偏光要素技術 filed 281 joint applications with コニカミノルタ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 46 cases in total) is 7.7, and the median is 4.0. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 85 cases, and their lowest number in 2020 with 2 cases.
| Index | Value |
|---|---|
| Average | 7.7 patents |
| Std Dev | 8.2 |
| COV | 1.1 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 4 cases | 0 |
| 2021 year | 4 cases | +100 % |
| 2020 year | 2 cases | -91.7 % |
Information on important patents (JP)
The following shows JP patents held by 偏光要素技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 偏光要素技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 偏光要素技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.0 times. The most recently Invalidation Trial patent is 特許4974971 "熱可塑性樹脂組成物とそれを用いた樹脂成形品および偏光子保護フィルムならびに樹脂成形品の製造方法" (Invalidation Trial day 2023-07-27) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許4974971 | 熱可塑性樹脂組成物とそれを用いた樹脂成形品および偏光子保護フィルムならびに樹脂成形品の製造方法 | 2023-07-27 |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 41 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7351360 "保護フィルム" (Opposition day 2024-02-29) , next is 特許7339039 "長尺フィルム" (Opposition day 2024-02-26) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7351360 | 保護フィルム | 2024-02-29 |
| 2 | 特許7339039 | 長尺フィルム | 2024-02-26 |
| 3 | 特許7259452 | エレクトロルミネッセンス表示装置 | 2023-10-16 |
| 4 | 特許7259453 | 可撓性画像表示装置、及びそれに用いる円偏光板の製造方法 | 2023-10-16 |
| 5 | 特許7251941 | 光学フィルム | 2023-10-02 |
| 6 | 特許7241324 | 遮熱フィルム | 2023-09-13 |
| 7 | 特許7220311 | 表面処理フィルム | 2023-08-07 |
| 8 | 特許7216689 | 粘着剤層付光学フィルムおよび該粘着剤層付光学フィルムを含む画像表示装置 | 2023-07-21 |
| 9 | 特許7225294 | 光学積層体及び表示装置 | 2023-07-14 |
| 10 | 特許7203027 | フォルダブル円偏光板および表示装置 | 2023-07-11 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 99 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2022-146427 "光学積層体及び表示装置" (Protest day 2024-03-25) , next is 特開2022-149455 "光学フィルム" (Protest day 2024-02-26) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-146427 | 光学積層体及び表示装置 | 2024-03-25 |
| 2 | 特開2022-149455 | 光学フィルム | 2024-02-26 |
| 3 | 特表2022-500703 | 反射フィルムを含むガラスラミネート | 2024-02-26 |
| 4 | 特開2023-041698 | 光学積層体 | 2024-02-20 |
| 5 | 特開2022-095505 | 粘着剤組成物、粘着剤および粘着シート | 2024-02-14 |
| 6 | 特開2020-160428 | 粘着剤層付偏光フィルム、画像表示パネル及び画像表示装置 | 2023-12-26 |
| 7 | 特開2021-169185 | 積層体、積層体の製造方法、光学積層体およびフレキシブルディスプレイ | 2023-12-21 |
| 8 | 特開2023-087688 | 表面保護フィルム | 2023-12-08 |
| 9 | 特開2020-180237 | 硬化性組成物、硬化物層、光学積層体、及び画像表示装置 | 2023-11-18 |
| 10 | 特開2022-025942 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-25 |
| 11 | 特開2021-088667 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2023-10-24 |
| 12 | 特開2022-025943 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-18 |
| 13 | 特開2022-025941 | 偏光子保護用ポリエステルフィルム、および該ポリエステルフィルムを含む偏光板 | 2023-10-18 |
| 14 | 特表2022-505589 | 偏光板の製造方法 | 2023-10-11 |
| 15 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 2023-09-26 |
| 16 | 特開2021-195552 | フレキシブル画像表示装置内の積層体に用いる粘着シート、フレキシブル画像表示装置に用いる積層体、及びフレキシブル画像表示装置 | 2023-08-31 |
| 17 | 特開2019-206178 | 積層体、偏光子保護フィルム及び偏光板 | 2023-08-25 |
| 18 | 特許7441611 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2023-08-24 |
| 19 | 特許7441610 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2023-08-24 |
| 20 | 特開2022-021888 | 粘着シート、粘着剤付き偏光板、ならびに画像表示装置およびその製造方法 | 2023-08-10 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 330 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許6612191 "偏光板" (8 times) , and the next most protest patent is 再公表2015/098980 "光学用熱可塑性樹脂、および成形体" (7 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6612191 | 偏光板 | 8 times |
| 2 | 再公表2015/098980 | 光学用熱可塑性樹脂、および成形体 | 7 times |
| 3 | 特許6478883 | 液晶表示装置 | 4 times |
| 4 | 特許6932420 | フレキシブル画像表示装置用粘着剤組成物、フレキシブル画像表示装置用粘着剤層、フレキシブル画像表示装置用積層体、及び、フレキシブル画像表示装置 | 4 times |
| 5 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 4 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-05-01 ~ 2024-04-30), there were 150 patents Inspection from third parties. The average number of Inspection is 1.9 times. The most recently Inspection patent is 特開2022-095505 "粘着剤組成物、粘着剤および粘着シート" (Inspection day 2024-03-13) , next is 特開2023-041698 "光学積層体" (Inspection day 2024-03-12) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-095505 | 粘着剤組成物、粘着剤および粘着シート | 2024-03-13 |
| 2 | 特開2023-041698 | 光学積層体 | 2024-03-12 |
| 3 | 特開2022-149455 | 光学フィルム | 2024-03-06 |
| 4 | 特表2022-500703 | 反射フィルムを含むガラスラミネート | 2024-03-06 |
| 5 | 特開2021-169185 | 積層体、積層体の製造方法、光学積層体およびフレキシブルディスプレイ | 2024-01-23 |
| 6 | 特開2020-160428 | 粘着剤層付偏光フィルム、画像表示パネル及び画像表示装置 | 2024-01-23 |
| 7 | 特開2020-180237 | 硬化性組成物、硬化物層、光学積層体、及び画像表示装置 | 2024-01-19 |
| 8 | 特開2024-018516 | 偏光板及び画像表示装置 | 2023-12-26 |
| 9 | 特開2021-088667 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2023-10-31 |
| 10 | 特許7321463 | 反射防止フィルム、偏光板およびディスプレイ装置 | 2023-10-20 |
| 11 | 特許7351360 | 保護フィルム | 2023-10-19 |
| 12 | 特許6261700 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
| 13 | 特開2009-292869 | アクリルフィルム、その製造方法、偏光板、光学補償フィルム、反射防止フィルムおよび液晶表示装置 | 2023-10-17 |
| 14 | 特許6025927 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
| 15 | 特許6021686 | アクリルフィルムおよびその製造方法 | 2023-10-17 |
| 16 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 2023-10-05 |
| 17 | 特許7441611 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2023-09-27 |
| 18 | 特許7441610 | 位相差層付き偏光板および有機ＥＬ表示装置 | 2023-09-27 |
| 19 | 特開2022-133275 | 積層体および画像表示装置 | 2023-09-08 |
| 20 | 特開2019-206178 | 積層体、偏光子保護フィルム及び偏光板 | 2023-08-29 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 405 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.5. The most inspection patent is 特許6478883 "液晶表示装置" (12 times) , and the next most inspection patent is 特開2016-027405 "光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法" (10 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6478883 | 液晶表示装置 | 12 times |
| 2 | 特開2016-027405 | 光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法 | 10 times |
| 3 | 特許6612191 | 偏光板 | 9 times |
| 4 | 特許6696669 | 光学積層体及び表示装置 | 7 times |
| 5 | 特許6025927 | アクリルフィルムおよびその製造方法 | 6 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-05-01 to 2024-04-30), 2,595 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.7. The most cited patent is 特許6734933 "構造化光投影のためのホログラフィック導波管装置" (58 times) , and the next most cited patent is 特許6169530 "液晶表示装置" (52 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6734933 | 構造化光投影のためのホログラフィック導波管装置 | 58 times |
| 2 | 特許6169530 | 液晶表示装置 | 52 times |
| 3 | 特開2017-102443 | 光学積層体および該光学積層体を用いた有機エレクトロルミネセンス表示装置 | 50 times |
| 4 | 特許6726110 | 光学素子、及び回折光学素子 | 47 times |
| 5 | 特許6427340 | 光学異方性層とその製造方法、積層体とその製造方法、偏光板、液晶表示装置及び有機ＥＬ表示装置 | 43 times |
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