株式会社半導体エネルギー研究所 (JP Patent Analysis Report)
The Applicant / Patent Holder "株式会社半導体エネルギー研究所" had 13 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a weakly transition of -1 filings (-7.1%) over 14 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2015 with 2,101 cases, and their lowest number in 2021 with 38 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,595 cases in total) is 432, and the median is 176. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 432 patents |
| Std Dev | 469 |
| COV | 1.1 |
The number of filings has been increasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 64 cases | +68.4 % |
| 2021 year | 38 cases | -86.1 % |
| 2020 year | 274 cases | -69.2 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 株式会社半導体エネルギー研究所 for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 株式会社半導体エネルギー研究所, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 株式会社半導体エネルギー研究所
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top coapplicant Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
Foreign Patent Analysis Report
The following foreign patent analysis reports have been found for 株式会社半導体エネルギー研究所. The trends of patent filings of 株式会社半導体エネルギー研究所 for each country can be found by clicking on the Applicant/Patent Holder name next to each country.
| Country | Applicant / Patent Holder |
|---|---|
| JP | 株式会社半導体エネルギー研究所 |
| US | SEMICONDUCTOR ENERGY LABORATORY CO LTD |
| EP | SEMICONDUCTOR ENERGY LABORATORY CO LTD |
| PCT | SEMICONDUCTOR ENERGY LABORATORY CO LTD |
株式会社半導体エネルギー研究所, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 株式会社半導体エネルギー研究所 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 株式会社半導体エネルギー研究所 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 株式会社半導体エネルギー研究所 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,366 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
株式会社半導体エネルギー研究所
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 株式会社半導体エネルギー研究所 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 株式会社豊田中央研究所 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 589 cases, followed by 国立研究開発法人産業技術総合研究所 with 468 cases.
| Name | Cases |
|---|---|
| 株式会社豊田中央研究所 | 589 cases |
| 国立研究開発法人産業技術総合研究所 | 468 cases |
| 住友電気工業株式会社 | 452 cases |
| 株式会社オートネットワーク技術研究所 | 450 cases |
| 住友電装株式会社 | 450 cases |
| トヨタ自動車株式会社 | 270 cases |
| 株式会社デンソー | 240 cases |
| 株式会社SOKEN | 218 cases |
| 株式会社半導体エネルギー研究所 | 159 cases |
| 公益財団法人鉄道総合技術研究所 | 97 cases |
| 国立研究開発法人理化学研究所 | 81 cases |
| 一般財団法人電力中央研究所 | 68 cases |
| 株式会社国際電気通信基礎技術研究所 | 64 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 株式会社半導体エネルギー研究所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 10,366 cases, followed by 住友電気工業株式会社 with 4,783 cases.
| Name | Cases |
|---|---|
| 株式会社半導体エネルギー研究所 | 10,366 cases |
| 住友電気工業株式会社 | 4,783 cases |
| 株式会社オートネットワーク技術研究所 | 4,764 cases |
| 住友電装株式会社 | 4,762 cases |
| 株式会社豊田中央研究所 | 4,570 cases |
| 国立研究開発法人産業技術総合研究所 | 4,438 cases |
| 株式会社SOKEN | 3,131 cases |
| 株式会社デンソー | 2,976 cases |
| トヨタ自動車株式会社 | 2,322 cases |
| 公益財団法人鉄道総合技術研究所 | 1,249 cases |
| 国立研究開発法人理化学研究所 | 1,000 cases |
| 一般財団法人電力中央研究所 | 573 cases |
| 株式会社国際電気通信基礎技術研究所 | 422 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 13 companies in the same industry over the past 20 years.
Top coapplicant information (JP)
The changes in the number of patents shared with 株式会社半導体エネルギー研究所’s top coapplicants are shown below.
By searching for the top coapplicants, you can discover what companies 株式会社半導体エネルギー研究所 is partnered with to develop technologies and use this information for R&D and intellectual property strategies.
Also, by looking at the change in the number of filings, you can see what companies 株式会社半導体エネルギー研究所 conducted joint research with in the past, and check the history of 株式会社半導体エネルギー研究所’s alliances, partnerships, and joint research and development.
If you want to search for more detailed information, you can use Patent Integration to quickly find out specifically what company they filed a joint application with and what invention it was for.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, シャープ株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 2 cases, followed by TDK株式会社 with 1 cases.
Top coapplicant, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 株式会社半導体エネルギー研究所’s top 6 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 株式会社半導体エネルギー研究所’s top 6 coapplicants over the last 20 years.
Top coapplicant Details (JP)
Information on important patents (JP)
The following shows JP patents held by 株式会社半導体エネルギー研究所 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 株式会社半導体エネルギー研究所’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 株式会社半導体エネルギー研究所 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 2 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 2.0 times. The most recently Invalidation Trial patent is 特許6568156 "発光素子、発光装置、照明装置および電子機器" (Invalidation Trial day 2022-04-05) , next is 特許5420705 "発光素子、発光装置、照明装置及び電子機器" (Invalidation Trial day 2022-04-05) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許6568156 | 発光素子、発光装置、照明装置および電子機器 | 2022-04-05 |
| 2 | 特許5420705 | 発光素子、発光装置、照明装置及び電子機器 | 2022-04-05 |
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 2 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.5. The most invalidation trial patent is 特許6568156 "発光素子、発光装置、照明装置および電子機器" (2 times) , and the next most invalidation trial patent is 特許6043457 "半導体装置" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6568156 | 発光素子、発光装置、照明装置および電子機器 | 2 times |
| 2 | 特許6043457 | 半導体装置 | 1 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 5 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7259100 "リチウムイオン蓄電池" (Opposition day 2023-10-17) , next is 特許7072551 "リチウムイオン二次電池" (Opposition day 2022-11-18) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7259100 | リチウムイオン蓄電池 | 2023-10-17 |
| 2 | 特許7072551 | リチウムイオン二次電池 | 2022-11-18 |
| 3 | 特許7011021 | リチウムイオン二次電池 | 2022-08-05 |
| 4 | 特許6916262 | 正極活物質の作製方法、及びリチウムイオン二次電池の作製方法 | 2022-02-07 |
| 5 | 特許6885724 | リチウムイオン二次電池及び正極活物質 | 2021-12-15 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 2 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特許6108858 "ｐ型半導体材料および半導体装置" (Protest day 2024-01-05) , next is 特許7187589 "発光素子および化合物" (Protest day 2021-12-14) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特許6108858 | ｐ型半導体材料および半導体装置 | 2024-01-05 |
| 2 | 特許7187589 | 発光素子および化合物 | 2021-12-14 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 9 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.0. The most protest patent is 特許5982522 "半導体装置" (1 times) , and the next most protest patent is 特許6246254 "酸化物半導体層、半導体装置" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許5982522 | 半導体装置 | 1 times |
| 2 | 特許6246254 | 酸化物半導体層、半導体装置 | 1 times |
| 3 | 特許6585268 | 発光装置 | 1 times |
| 4 | 特許6063498 | 半導体装置 | 1 times |
| 5 | 特開2015-172052 | 有機化合物 | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 29 patents Inspection from third parties. The average number of Inspection is 1.1 times. The most recently Inspection patent is 特許6736241 "電子機器、リチウムイオン二次電池、及びリチウムイオン二次電池の正極活物質" (Inspection day 2024-08-13) , next is 特許6736240 "電子機器、リチウムイオン二次電池、及びリチウムイオン二次電池の正極活物質" (Inspection day 2024-08-13) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特許6736241 | 電子機器、リチウムイオン二次電池、及びリチウムイオン二次電池の正極活物質 | 2024-08-13 |
| 2 | 特許6736240 | 電子機器、リチウムイオン二次電池、及びリチウムイオン二次電池の正極活物質 | 2024-08-13 |
| 3 | 特許6480536 | 半導体装置 | 2024-02-22 |
| 4 | 特許7123220 | 半導体装置 | 2024-02-21 |
| 5 | 特許6108858 | ｐ型半導体材料および半導体装置 | 2024-01-30 |
| 6 | 特許5736071 | 半導体装置 | 2023-10-31 |
| 7 | 特許7274625 | 半導体装置 | 2023-10-31 |
| 8 | 特許6771627 | 半導体装置 | 2023-10-31 |
| 9 | 特許7022804 | 半導体装置 | 2023-10-31 |
| 10 | 特許6829791 | 液晶表示装置 | 2023-10-31 |
| 11 | 特許7329647 | 液晶表示装置 | 2023-10-31 |
| 12 | 特開2015-109456 | 半導体装置 | 2023-10-31 |
| 13 | 特許6259948 | 半導体装置 | 2023-10-31 |
| 14 | 特開2009-049399 | 表示装置 | 2023-10-31 |
| 15 | 特開2017-223965 | 液晶表示装置 | 2023-10-31 |
| 16 | 特許6577107 | 半導体装置 | 2023-10-31 |
| 17 | 特許6528000 | 半導体装置 | 2023-10-31 |
| 18 | 特開2021-073524 | 表示装置 | 2023-10-31 |
| 19 | 特許6181109 | 液晶表示装置 | 2023-10-31 |
| 20 | 特許5679954 | 半導体装置 | 2023-10-31 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 67 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.3. The most inspection patent is 特許6568156 "発光素子、発光装置、照明装置および電子機器" (4 times) , and the next most inspection patent is 特許6043457 "半導体装置" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6568156 | 発光素子、発光装置、照明装置および電子機器 | 4 times |
| 2 | 特許6043457 | 半導体装置 | 3 times |
| 3 | 特許5986257 | 半導体装置、表示装置、表示モジュール及び電子機器 | 3 times |
| 4 | 特許6357130 | 発光装置の作製方法 | 2 times |
| 5 | 特許6364112 | 電子機器 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1,890 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 4.0. The most cited patent is 特許6674838 "電子装置" (88 times) , and the next most cited patent is 特許6478596 "表示装置の作製方法" (46 times) .
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- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
Credit notation
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