感光材料 (JP Patent Analysis Report)
The Technical Field "感光材料" had 5 patent application filings in the most recent period (2023-01-01 to 2023-02-28). This is a significantly increased of +2 filings (66.7%) over 3 they had in the same period of the previous year (2022-01-01 to 2022-02-28). This report also includes technical terms related to " 感光性材料 " in the search set.
The highest number of filings in 2015 with 60 cases, and their lowest number in 2022 with 25 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 166 cases in total) is 27.7, and the median is 28.5. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 27.7 patents |
| Std Dev | 8.8 |
| COV | 0.3 |
The number of filings has been decreasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 25 cases | -19.35 % |
| 2021 year | 31 cases | +19.23 % |
| 2020 year | 26 cases | -23.53 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 感光材料 for the period of the last 10 years (2014-01-01 to 2024-10-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 感光材料, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
感光材料, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 感光材料 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 366 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
感光材料
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 感光材料 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 5 cases, followed by 大日本印刷株式会社 with 4 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 5 cases |
| 大日本印刷株式会社 | 4 cases |
| 株式会社SCREENホールディングス | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 16 cases, followed by 株式会社SCREENホールディングス with 15 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 16 cases |
| 株式会社SCREENホールディングス | 15 cases |
| キヤノン株式会社 | 13 cases |
| 富士フイルム株式会社 | 9 cases |
| コニカミノルタ株式会社 | 5 cases |
| 三菱製紙株式会社 | 4 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 感光材料 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 9 cases, followed by コニカミノルタ株式会社 with 5 cases.
| Name | Cases |
|---|---|
| 富士フイルム株式会社 | 9 cases |
| コニカミノルタ株式会社 | 5 cases |
| 三菱製紙株式会社 | 4 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 感光材料’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 感光材料’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with コニカミノルタ株式会社
感光材料 filed 5 joint applications with コニカミノルタ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 10 years (2013 to 2023, 5 cases in total) is 0.5, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.0, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 3 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.5 patents |
| Std Dev | 0.9 |
| COV | 2.0 |
| Year | Cases | YOY |
|---|---|---|
| 2018 year | 1 cases | - |
| 2017 year | 0 cases | -100 % |
| 2016 year | 3 cases | +200 % |
Trends in filing of joint patent applications with 富士フイルム株式会社
感光材料 filed 9 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 5 cases in total) is 0.8, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.3, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2021 with 3 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.8 patents |
| Std Dev | 1.1 |
| COV | 1.3 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 3 cases | +200 % |
| 2020 year | 1 cases | 0 |
| 2019 year | 1 cases | - |
Trends in filing of joint patent applications with 三菱製紙株式会社
感光材料 filed 4 joint applications with 三菱製紙株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 10 years (2013 to 2023, 4 cases in total) is 0.4, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.8, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 2 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.4 patents |
| Std Dev | 0.6 |
| COV | 1.8 |
| Year | Cases | YOY |
|---|---|---|
| 2017 year | 2 cases | +100 % |
| 2016 year | 1 cases | - |
| 2015 year | 0 cases | -100 % |
Information on important patents (JP)
The following shows JP patents held by 感光材料 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 感光材料’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 感光材料 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Protested cases
List of latest Protested patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 1 patents Protest from third parties. The average number of Protest is 1.0 times. The most recently Protest patent is 特許7397270 "含フッ素重合体および表面処理剤" (Protest day 2022-06-06) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特許7397270 | 含フッ素重合体および表面処理剤 | 2022-06-06 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 3 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.0. The most protest patent is 特許7397270 "含フッ素重合体および表面処理剤" (1 times) , and the next most protest patent is 特開2017-187601 "スクリーンマスクの製造方法" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7397270 | 含フッ素重合体および表面処理剤 | 1 times |
| 2 | 特開2017-187601 | スクリーンマスクの製造方法 | 1 times |
| 3 | 特開2016-188923 | 露光装置及び露光方法 | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 4 patents Inspection from third parties. The average number of Inspection is 1.8 times. The most recently Inspection patent is 特許4401308 "露光装置" (Inspection day 2023-06-08) , next is 特許4244156 "投影露光装置" (Inspection day 2023-05-10) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特許4401308 | 露光装置 | 2023-06-08 |
| 2 | 特許4244156 | 投影露光装置 | 2023-05-10 |
| 3 | 特許4450739 | 露光装置 | 2023-05-10 |
| 4 | 特許7397270 | 含フッ素重合体および表面処理剤 | 2022-06-15 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 6 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.0. The most inspection patent is 特許7397270 "含フッ素重合体および表面処理剤" (1 times) , and the next most inspection patent is 特許7190113 "ホログラム素子、情報記録媒体、ラベル体、転写箔体、カード、ホログラムシート及びホログラム複製方法" (1 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7397270 | 含フッ素重合体および表面処理剤 | 1 times |
| 2 | 特許7190113 | ホログラム素子、情報記録媒体、ラベル体、転写箔体、カード、ホログラムシート及びホログラム複製方法 | 1 times |
| 3 | 特開2016-184455 | サスペンション用基板、サスペンション、素子付サスペンション、ハードディスクドライブ、およびサスペンション用基板の製造方法 | 1 times |
| 4 | 特開2017-187601 | スクリーンマスクの製造方法 | 1 times |
| 5 | 特表2018-517157 | ＬＥＤアレイの色変換構造 | 1 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 61 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.5. The most cited patent is 特許6560828 "基板上の感光性材料を除去するための方法" (10 times) , and the next most cited patent is 特開2016-084464 "硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法" (8 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6560828 | 基板上の感光性材料を除去するための方法 | 10 times |
| 2 | 特開2016-084464 | 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法 | 8 times |
| 3 | 特許6588719 | 感光性材料、ホログラフィック記録媒体およびホログラフィック記録方法 | 7 times |
| 4 | 特開2015-173253 | 半導体装置の製造方法 | 6 times |
| 5 | 特許6670138 | 光電変換装置およびその製造方法 | 6 times |
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