反射面 (JP Patent Analysis Report)
The Technical Field "反射面" had 74 patent application filings in the most recent period (2023-01-01 to 2023-02-28). This is a significantly decreased of -21 filings (-22.1%) over 95 they had in the same period of the previous year (2022-01-01 to 2022-02-28).
The highest number of filings in 2014 with 1,381 cases, and their lowest number in 2022 with 650 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,569 cases in total) is 762, and the median is 810. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 762 patents |
| Std Dev | 295 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 650 cases | -12.99 % |
| 2021 year | 747 cases | -14.33 % |
| 2020 year | 872 cases | -6.03 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 反射面 for the period of the last 10 years (2014-01-01 to 2024-10-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 反射面, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
反射面, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 反射面 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 9,918 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
反射面
Related Patent Analysis Report
A patent aanlysis report on the following synonyms was found in the technical term "反射面".
- 反射面 (Main page / Including the following synonyms)
Same industry / competition company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 反射面 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 61 cases, followed by セイコーエプソン株式会社 with 33 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 61 cases |
| セイコーエプソン株式会社 | 33 cases |
| 株式会社小糸製作所 | 31 cases |
| スタンレー電気株式会社 | 24 cases |
| 株式会社リコー | 21 cases |
| 三菱電機株式会社 | 10 cases |
| シャープ株式会社 | 5 cases |
| 株式会社東芝 | 5 cases |
| 株式会社ニコン | 1 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 570 cases, followed by スタンレー電気株式会社 with 391 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 570 cases |
| スタンレー電気株式会社 | 391 cases |
| セイコーエプソン株式会社 | 307 cases |
| 株式会社リコー | 301 cases |
| 株式会社小糸製作所 | 284 cases |
| 三菱電機株式会社 | 208 cases |
| 株式会社ニコン | 163 cases |
| シャープ株式会社 | 104 cases |
| オリンパス株式会社 | 78 cases |
| 株式会社東芝 | 57 cases |
| パナソニックホールディングス株式会社 | 9 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 反射面 are shown below.
Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.
It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.
If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 61 cases, followed by セイコーエプソン株式会社 with 33 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 61 cases |
| セイコーエプソン株式会社 | 33 cases |
| スタンレー電気株式会社 | 24 cases |
| 株式会社リコー | 21 cases |
| 株式会社ニコン | 1 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 570 cases, followed by スタンレー電気株式会社 with 391 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 570 cases |
| スタンレー電気株式会社 | 391 cases |
| セイコーエプソン株式会社 | 307 cases |
| 株式会社リコー | 301 cases |
| 株式会社ニコン | 163 cases |
| オリンパス株式会社 | 78 cases |
| パナソニックホールディングス株式会社 | 9 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 反射面’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 反射面’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with キヤノン株式会社
反射面 filed 570 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 285 cases in total) is 47.5, and the median is 44.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 82 cases, and their lowest number in 2022 with 43 cases.
| Index | Value |
|---|---|
| Average | 47.5 patents |
| Std Dev | 18.3 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 43 cases | -2.27 % |
| 2021 year | 44 cases | -2.22 % |
| 2020 year | 45 cases | -22.41 % |
Trends in filing of joint patent applications with 株式会社リコー
反射面 filed 301 joint applications with 株式会社リコー for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 115 cases in total) is 19.2, and the median is 14.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 65 cases, and their lowest number in 2021 with 11 cases.
| Index | Value |
|---|---|
| Average | 19.2 patents |
| Std Dev | 12.5 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 16 cases | +45.5 % |
| 2021 year | 11 cases | -15.38 % |
| 2020 year | 13 cases | -69.8 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
反射面 filed 307 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 143 cases in total) is 23.8, and the median is 24.0. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 60 cases, and their lowest number in 2021 with 20 cases.
| Index | Value |
|---|---|
| Average | 23.8 patents |
| Std Dev | 8.1 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 22 cases | +10.00 % |
| 2021 year | 20 cases | -47.4 % |
| 2020 year | 38 cases | +46.2 % |
Trends in filing of joint patent applications with スタンレー電気株式会社
反射面 filed 391 joint applications with スタンレー電気株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 147 cases in total) is 24.5, and the median is 23.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 71 cases, and their lowest number in 2022 with 19 cases.
| Index | Value |
|---|---|
| Average | 24.5 patents |
| Std Dev | 12.2 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 19 cases | -40.6 % |
| 2021 year | 32 cases | +28.00 % |
| 2020 year | 25 cases | +19.05 % |
Trends in filing of joint patent applications with 株式会社ニコン
反射面 filed 163 joint applications with 株式会社ニコン for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 43 cases in total) is 7.2, and the median is 7.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 32 cases, and their lowest number in 2022 with 1 cases.
| Index | Value |
|---|---|
| Average | 7.2 patents |
| Std Dev | 6.5 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | -83.3 % |
| 2021 year | 6 cases | -25.00 % |
| 2020 year | 8 cases | 0 |
Information on important patents (JP)
The following shows JP patents held by 反射面 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 反射面’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 反射面 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 5 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7436371 "発光装置" (Opposition day 2024-08-13) , next is 特許7315650 "光学コリメータ" (Opposition day 2024-01-24) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7436371 | 発光装置 | 2024-08-13 |
| 2 | 特許7315650 | 光学コリメータ | 2024-01-24 |
| 3 | 特許7300598 | 照明器具用レンズおよび照明器具 | 2023-12-27 |
| 4 | 特許7076914 | 折返し光共振器 | 2022-11-22 |
| 5 | 特許7009108 | 水回り機器 | 2022-08-08 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 13 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2023-061350 "釣用のルアー" (Protest day 2024-04-22) , next is 特開2023-021904 "釣用のルアー" (Protest day 2024-04-22) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-061350 | 釣用のルアー | 2024-04-22 |
| 2 | 特開2023-021904 | 釣用のルアー | 2024-04-22 |
| 3 | 特開2023-033085 | 釣用のルアー | 2024-04-22 |
| 4 | 特開2024-014912 | 手乾燥装置 | 2024-02-29 |
| 5 | 特開2022-089626 | 干渉画像取得装置および干渉画像取得方法 | 2023-12-28 |
| 6 | 特開2022-184515 | 光走査装置、光走査装置の駆動方法、及び画像描画システム | 2023-12-15 |
| 7 | 特許7566459 | トイレキャビネット | 2023-07-20 |
| 8 | 特許7325383 | 物品検査装置 | 2022-11-22 |
| 9 | 特許7270582 | 分光測定装置 | 2022-11-18 |
| 10 | 特許7087368 | 空中像表示装置 | 2022-03-04 |
| 11 | 再公表2018/135231 | 異物検査装置、異物検査方法および製造装置 | 2022-02-01 |
| 12 | 特許5498618 | 照明器具 | 2022-01-21 |
| 13 | 特許7071191 | 粒状体選別装置 | 2022-01-06 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 27 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許7087368 "空中像表示装置" (3 times) , and the next most protest patent is 特許7071191 "粒状体選別装置" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7087368 | 空中像表示装置 | 3 times |
| 2 | 特許7071191 | 粒状体選別装置 | 3 times |
| 3 | 特開2018-065746 | ガラス積層体及び光学結像部材 | 2 times |
| 4 | 特許7566459 | トイレキャビネット | 2 times |
| 5 | 特許7009108 | 水回り機器 | 2 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-11-01 ~ 2024-10-31), there were 31 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2022-089626 "干渉画像取得装置および干渉画像取得方法" (Inspection day 2024-09-20) , next is 特開2023-155182 "試験装置" (Inspection day 2024-06-19) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-089626 | 干渉画像取得装置および干渉画像取得方法 | 2024-09-20 |
| 2 | 特開2023-155182 | 試験装置 | 2024-06-19 |
| 3 | 特表2022-500675 | ３次元撮像のための電気光学変調器およびその使用方法と製造方法 | 2024-06-18 |
| 4 | 特開2023-061350 | 釣用のルアー | 2024-05-21 |
| 5 | 特開2023-021904 | 釣用のルアー | 2024-05-21 |
| 6 | 特開2023-033085 | 釣用のルアー | 2024-05-21 |
| 7 | 特許5949975 | 投射光学系 | 2024-04-30 |
| 8 | 特許5939324 | 投射光学系 | 2024-04-30 |
| 9 | 特許5930101 | 投射光学系及びプロジェクター | 2024-04-30 |
| 10 | 特許5930085 | 投射光学系 | 2024-04-30 |
| 11 | 特許5930088 | 投射光学系 | 2024-04-30 |
| 12 | 特許5950000 | 投射光学系及びプロジェクター | 2024-04-30 |
| 13 | 特開2023-162175 | マイクロミラーデバイス | 2024-03-21 |
| 14 | 特開2024-014912 | 手乾燥装置 | 2024-03-06 |
| 15 | 特許7566459 | トイレキャビネット | 2024-02-27 |
| 16 | 特許7394126 | ｉｎ ｖｉｖｏ全視野干渉顕微鏡を用いたイメージング方法およびシステム | 2023-08-25 |
| 17 | 特許6575580 | 照明装置 | 2023-08-21 |
| 18 | 特許7487482 | カラーシフトデバイス | 2023-07-31 |
| 19 | 特許7468213 | カラーシフトデバイス | 2023-07-20 |
| 20 | 特許7325383 | 物品検査装置 | 2023-04-11 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 73 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.1. The most inspection patent is 特許6776392 "カメラ用レンズ駆動装置" (3 times) , and the next most inspection patent is 特許7566459 "トイレキャビネット" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6776392 | カメラ用レンズ駆動装置 | 3 times |
| 2 | 特許7566459 | トイレキャビネット | 3 times |
| 3 | 特開2018-065746 | ガラス積層体及び光学結像部材 | 2 times |
| 4 | 特許6225315 | 放電ランプ及び露光方法 | 2 times |
| 5 | 特許7009108 | 水回り機器 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-11-01 to 2024-10-31), 2,295 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.8. The most cited patent is 特開2018-101521 "導光板、面光源装置、表示装置及び電子機器" (66 times) , and the next most cited patent is 特開2017-138301 "レーザレーダ装置" (57 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2018-101521 | 導光板、面光源装置、表示装置及び電子機器 | 66 times |
| 2 | 特開2017-138301 | レーザレーダ装置 | 57 times |
| 3 | 特許6225976 | 発光装置 | 39 times |
| 4 | 特許6233442 | 光源ユニット、光源装置、及び画像表示装置 | 35 times |
| 5 | 特許6993251 | 投射光学系および画像表示装置 | 33 times |
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Graphs are image data.
Please note that the various graphs are image data, but we cannot provide them in text data.Scope of coverage for each goal/target
- Based on the description of each goal and target of the SDGs, we have set the scope of technologies to be covered based on our and e-Patent's past experience, etc. (in some cases, the search is based on social issues themselves). Therefore, please note that there is a possibility that this "SDGs Global Company Ranking from Patent Perspective" may not cover 100%.
- A population search formula is clearly indicated for each goal/target (database: Patent Integration). You may use the population search formula as it is, or you may improve it by yourself.
- This search covers patents and utility models, including both published and registered patents (design and design patents are excluded). The unit of count is the number of applications, not the number of patent families.
About the name collation and name control of applicants and right holders
- Company rankings are based on the results calculated by "Patent Integration", with Japanese organizations in Japanese and other companies in English (some are in Japanese).
- Company names may be the names of the companies at the time of application, but the results calculated by Patent Integration are used as is. Company names are used as they were at the time of application.
- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
Credit notation
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