半導体の洗浄、乾燥技術 (JP Patent Analysis Report)
The Theme Code "半導体の洗浄、乾燥技術" had 123 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -38 filings (-23.6%) over 161 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2018 with 583 cases, and their lowest number in 2020 with 495 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,952 cases in total) is 492, and the median is 530. The coefficient of variation (standard deviation/mean) is 0.24, and there have been small fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 492 patents |
| Std Dev | 118 |
| COV | 0.24 |
The number of filings has been increasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 577 cases | +9.28 % |
| 2021 year | 528 cases | +6.67 % |
| 2020 year | 495 cases | -6.95 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 半導体の洗浄、乾燥技術[5F157] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 半導体の洗浄、乾燥技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 半導体の洗浄、乾燥技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
半導体の洗浄、乾燥技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 半導体の洗浄、乾燥技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 半導体の洗浄、乾燥技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 半導体の洗浄、乾燥技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 5,011 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
半導体の洗浄、乾燥技術[5F157]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 半導体の洗浄、乾燥技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 株式会社SCREENホールディングス has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 283 cases, followed by 東京エレクトロン株式会社 with 78 cases.
| Name | Cases |
|---|---|
| 株式会社SCREENホールディングス | 283 cases |
| 東京エレクトロン株式会社 | 78 cases |
| 株式会社ディスコ | 74 cases |
| 株式会社荏原製作所 | 38 cases |
| 芝浦メカトロニクス株式会社 | 37 cases |
| 三菱電機株式会社 | 3 cases |
| 株式会社東芝 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 株式会社SCREENホールディングス has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,371 cases, followed by 東京エレクトロン株式会社 with 901 cases.
| Name | Cases |
|---|---|
| 株式会社SCREENホールディングス | 1,371 cases |
| 東京エレクトロン株式会社 | 901 cases |
| 株式会社荏原製作所 | 305 cases |
| 株式会社ディスコ | 267 cases |
| 芝浦メカトロニクス株式会社 | 185 cases |
| 株式会社東芝 | 23 cases |
| 三菱電機株式会社 | 23 cases |
| 株式会社日立製作所 | 2 cases |
| 日本電気株式会社 | 2 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 半導体の洗浄、乾燥技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 株式会社SCREENホールディングス has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 283 cases, followed by 東京エレクトロン株式会社 with 78 cases.
| Name | Cases |
|---|---|
| 株式会社SCREENホールディングス | 283 cases |
| 東京エレクトロン株式会社 | 78 cases |
| 株式会社荏原製作所 | 38 cases |
| 芝浦メカトロニクス株式会社 | 37 cases |
| 株式会社東芝 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 株式会社SCREENホールディングス has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,371 cases, followed by 東京エレクトロン株式会社 with 901 cases.
| Name | Cases |
|---|---|
| 株式会社SCREENホールディングス | 1,371 cases |
| 東京エレクトロン株式会社 | 901 cases |
| 株式会社荏原製作所 | 305 cases |
| 芝浦メカトロニクス株式会社 | 185 cases |
| 株式会社東芝 | 23 cases |
| 株式会社日立製作所 | 2 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 半導体の洗浄、乾燥技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 半導体の洗浄、乾燥技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社SCREENホールディングス
半導体の洗浄、乾燥技術 filed 1,371 joint applications with 株式会社SCREENホールディングス for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 818 cases in total) is 136, and the median is 132. The coefficient of variation (standard deviation/mean) is 0.29, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 201 cases, and their lowest number in 2019 with 106 cases.
| Index | Value |
|---|---|
| Average | 136 patents |
| Std Dev | 38.9 |
| COV | 0.29 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 201 cases | +45.7 % |
| 2021 year | 138 cases | +8.66 % |
| 2020 year | 127 cases | +19.81 % |
Trends in filing of joint patent applications with 東京エレクトロン株式会社
半導体の洗浄、乾燥技術 filed 901 joint applications with 東京エレクトロン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 479 cases in total) is 79.8, and the median is 87.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 114 cases, and their lowest number in 2022 with 49 cases.
| Index | Value |
|---|---|
| Average | 79.8 patents |
| Std Dev | 31.2 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 49 cases | -43.7 % |
| 2021 year | 87 cases | -1.14 % |
| 2020 year | 88 cases | -22.81 % |
Trends in filing of joint patent applications with 株式会社東芝
半導体の洗浄、乾燥技術 filed 23 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 4 cases in total) is 0.7, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 12 cases, and their lowest number in 2021 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.7 patents |
| Std Dev | 0.7 |
| COV | 1.1 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | - |
| 2021 year | 0 cases | -100 % |
| 2020 year | 1 cases | - |
Trends in filing of joint patent applications with 芝浦メカトロニクス株式会社
半導体の洗浄、乾燥技術 filed 185 joint applications with 芝浦メカトロニクス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 101 cases in total) is 16.8, and the median is 17.0. The coefficient of variation (standard deviation/mean) is 0.26, and there have been small fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 31 cases, and their lowest number in 2019 with 11 cases.
| Index | Value |
|---|---|
| Average | 16.8 patents |
| Std Dev | 4.5 |
| COV | 0.26 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 18 cases | -28.00 % |
| 2021 year | 25 cases | +92.3 % |
| 2020 year | 13 cases | +18.18 % |
Trends in filing of joint patent applications with 株式会社荏原製作所
半導体の洗浄、乾燥技術 filed 305 joint applications with 株式会社荏原製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 162 cases in total) is 27.0, and the median is 27.5. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 42 cases, and their lowest number in 2015 with 23 cases.
| Index | Value |
|---|---|
| Average | 27.0 patents |
| Std Dev | 9.0 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 27 cases | -3.57 % |
| 2021 year | 28 cases | +16.67 % |
| 2020 year | 24 cases | -36.8 % |
Information on important patents (JP)
The following shows JP patents held by 半導体の洗浄、乾燥技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 半導体の洗浄、乾燥技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 半導体の洗浄、乾燥技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 5 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7315648 "基板洗浄装置および基板洗浄方法ならびに基板洗浄装置用のロールスポンジ" (Opposition day 2024-01-24) , next is 特許7301055 "薬液、基板の処理方法" (Opposition day 2023-12-27) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7315648 | 基板洗浄装置および基板洗浄方法ならびに基板洗浄装置用のロールスポンジ | 2024-01-24 |
| 2 | 特許7301055 | 薬液、基板の処理方法 | 2023-12-27 |
| 3 | 特許7237435 | 洗浄剤組成物、基板の洗浄方法及び支持体又は基板の洗浄方法 | 2023-08-31 |
| 4 | 特許6939960 | ウェハ洗浄水供給装置 | 2022-03-11 |
| 5 | 特許6916306 | 薬液、基板の処理方法 | 2022-01-26 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 10 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2022-043812 "樹脂マスク剥離用洗浄剤組成物" (Protest day 2024-07-03) , next is 特許7480738 "シリコンウェーハの洗浄方法及び自然酸化膜付きシリコンウェーハの製造方法" (Protest day 2024-01-29) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-043812 | 樹脂マスク剥離用洗浄剤組成物 | 2024-07-03 |
| 2 | 特許7480738 | シリコンウェーハの洗浄方法及び自然酸化膜付きシリコンウェーハの製造方法 | 2024-01-29 |
| 3 | 特表2023-545035 | ポストＣＭＰ洗浄組成物 | 2024-01-11 |
| 4 | 特開2020-170841 | エッチング残渣の除去のためのクリーニング組成物 | 2023-10-20 |
| 5 | 特表2022-547985 | 一定でないノジュール密度を有するブラシ | 2023-08-08 |
| 6 | 特許7328840 | ガス溶解水製造装置及び方法 | 2023-06-12 |
| 7 | 特許7280158 | 表面処理組成物 | 2022-11-08 |
| 8 | 特許7315648 | 基板洗浄装置および基板洗浄方法ならびに基板洗浄装置用のロールスポンジ | 2022-10-20 |
| 9 | 特許7301055 | 薬液、基板の処理方法 | 2022-07-28 |
| 10 | 特開2021-097237 | 半導体製造用処理液が収容された収容容器 | 2022-07-15 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 20 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (4 times) , and the next most protest patent is 特許7328840 "ガス溶解水製造装置及び方法" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 4 times |
| 2 | 特許7328840 | ガス溶解水製造装置及び方法 | 2 times |
| 3 | 特許6845222 | 半導体製造用処理液、半導体製造用処理液が収容された収容容器、パターン形成方法及び電子デバイスの製造方法 | 2 times |
| 4 | 特許7480738 | シリコンウェーハの洗浄方法及び自然酸化膜付きシリコンウェーハの製造方法 | 2 times |
| 5 | 特開2021-097237 | 半導体製造用処理液が収容された収容容器 | 2 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 11 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特許7271993 "セリウム化合物除去用洗浄液、洗浄方法及び半導体ウェハの製造方法" (Inspection day 2024-10-29) , next is 特開2022-043812 "樹脂マスク剥離用洗浄剤組成物" (Inspection day 2024-07-05) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特許7271993 | セリウム化合物除去用洗浄液、洗浄方法及び半導体ウェハの製造方法 | 2024-10-29 |
| 2 | 特開2022-043812 | 樹脂マスク剥離用洗浄剤組成物 | 2024-07-05 |
| 3 | 特開2023-126087 | 基板処理装置、及び、半導体装置の製造方法 | 2024-03-18 |
| 4 | 特許7480738 | シリコンウェーハの洗浄方法及び自然酸化膜付きシリコンウェーハの製造方法 | 2024-02-26 |
| 5 | 特表2023-545035 | ポストＣＭＰ洗浄組成物 | 2024-02-13 |
| 6 | 特表2022-547985 | 一定でないノジュール密度を有するブラシ | 2023-08-16 |
| 7 | 特許7315648 | 基板洗浄装置および基板洗浄方法ならびに基板洗浄装置用のロールスポンジ | 2022-12-02 |
| 8 | 特許7301055 | 薬液、基板の処理方法 | 2022-08-26 |
| 9 | 特開2021-097237 | 半導体製造用処理液が収容された収容容器 | 2022-08-10 |
| 10 | 特許7328840 | ガス溶解水製造装置及び方法 | 2022-07-12 |
| 11 | 特許6634942 | 炭化珪素基板およびその製造方法 | 2022-07-06 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 45 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6904899 "昇華による大径シリコンカーバイド結晶の製造方法及び関連する半導体ＳＩＣウェハ" (4 times) , and the next most inspection patent is 再公表2017/169833 "半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法" (3 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6904899 | 昇華による大径シリコンカーバイド結晶の製造方法及び関連する半導体ＳＩＣウェハ | 4 times |
| 2 | 再公表2017/169833 | 半導体製造用処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法 | 3 times |
| 3 | 特許6408506 | 窒化チタンハードマスクの選択的除去及びエッチング残留物の除去 | 2 times |
| 4 | 特許5855310 | 基板処理装置、基板処理方法及び基板処理液 | 2 times |
| 5 | 特許7022100 | ポストエッチング残留物洗浄組成物及びその使用方法 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1,212 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.7. The most cited patent is 特許6738235 "基板処理装置、および基板処理方法" (23 times) , and the next most cited patent is 特許6371253 "基板洗浄システム、基板洗浄方法および記憶媒体" (21 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6738235 | 基板処理装置、および基板処理方法 | 23 times |
| 2 | 特許6371253 | 基板洗浄システム、基板洗浄方法および記憶媒体 | 21 times |
| 3 | 特許7170404 | 基板処理装置および基板処理方法 | 18 times |
| 4 | 特許6319193 | 基板処理装置及び基板処理方法 | 16 times |
| 5 | 特許6600470 | 洗浄装置及び洗浄方法 | 16 times |
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