5C101 荷電粒子線装置技術 Patent Trends
The Theme Code "荷電粒子線装置技術" had 241 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a with an decreasing trend transition of -49 filings (-16.9%) over 290 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 456 cases, and their lowest number in 2024 with 277 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 1,474 cases in total) is 368, and the median is 370. The coefficient of variation (standard deviation/mean) is 0.18, and filings have been moderate fluctuations.
| Index | Value |
|---|---|
| Average | 368 patents |
| Std Dev | 65.0 |
| COV | 0.18 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 100 cases | -63.9% |
| 2024 year | 277 cases | -20.86% |
| 2023 year | 350 cases | -10.49% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 荷電粒子線装置技術[5C101] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 荷電粒子線装置技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
荷電粒子線装置技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 荷電粒子線装置技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
荷電粒子線装置技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 456 |
| 2022 | 391 |
| 2023 | 350 |
| 2024 | 277 |
| 2025 | 100 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 1,574 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
荷電粒子線装置技術[5C101]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA-HYO2026-532108 | デュアルカソード温度制御型マルチカソードイオン源 | ・Applicant アクセリステクノロジーズインコーポレイテッド ・Filing date 2024-09-11 ・Publication date 2026-09-25 | 5C101 |
| 2. JPA-HYO2026-532148 | 小さなフットプリントを有する高エネルギー注入装置 | ・Applicant アクセリステクノロジーズインコーポレイテッド ・Filing date 2024-09-17 ・Publication date 2026-09-25 | 5C101 |
| 3. JPA2026-148919 | イオン源およびイオン源の制御方法 | ・Applicant 株式会社日立製作所 ・Filing date 2025-03-10 ・Publication date 2026-09-25 | 2G084, 5C101 |
| 4. JPA-HYO2026-531903 | 画像アライメントのための定量的線形独立ベクトルベースの方法（ＱＬＩＶＢＭ） | ・Applicant ケーエルエーコーポレイション ・Filing date 2024-08-23 ・Publication date 2026-09-25 | 2G051, 4M106, 5C101, 5F131 |
| 5. JPA2026-149485 | 走査制御装置および半導体検出機器 | ・Applicant 東方晶源微電子科技(北京)股ふん有限公司 ・Filing date 2026-02-17 ・Publication date 2026-09-25 | 4M106, 5C101 |
| 6. JPA2026-146955 | マルチ電子ビーム照射装置、マルチ電子ビーム画像取得装置、及びマルチ電子ビーム描画装置 | ・Applicant 株式会社ニューフレアテクノロジー ・Filing date 2025-03-05 ・Publication date 2026-09-17 | 5C101 |
| 7. JPA2026-148113 | 電子源 | ・Applicant 株式会社東芝 ・Filing date 2025-03-07 ・Publication date 2026-09-17 | 5C101, 5F241 |
| 8. JPA2026-148509 | デュアルビームシステムのための適応照明 | ・Applicant エフイーアイカンパニ ・Filing date 2026-03-03 ・Publication date 2026-09-17 | 2H052, 5C101 |
| 9. JPA2026-147134 | 電子デバイス | ・Applicant 東芝デバイス&ストレージ株式会社, 株式会社東芝 ・Filing date 2025-03-05 ・Publication date 2026-09-17 | 5C101, 5F033 |
| 10. JPA2026-147305 | ファラデー装置、イオン注入装置 | ・Applicant 日新イオン機器株式会社 ・Filing date 2025-03-06 ・Publication date 2026-09-17 | 5C101 |
| 11. JPP7922264 | 荷電粒子ビーム装置、及び荷電粒子ビーム装置の制御方法 | ・Applicant 株式会社日立ハイテクアナリシス ・Filing date 2023-02-16 ・Publication date 2026-09-15 | 5C101 |
| 12. JPA-HYO2026-530681 | 電子ビーム装置、箔または格子レンズ、および電子ビーム装置を動作させる方法 | ・Applicant アイシーティーインテグレーテッドサーキットテスティングゲゼルシャフトフィーアハルプライタープリーフテヒニックエムベーハー ・Filing date 2024-08-08 ・Publication date 2026-09-10 | 5C101 |
| 13. JPA2026-144632 | 電子線源 | ・Applicant 国立大学法人千葉大学, 株式会社日本触媒 ・Filing date 2025-02-28 ・Publication date 2026-09-09 | 5C101 |
| 14. JPA2026-143174 | 試料解析方法および試料解析装置 | ・Applicant 日本製鉄株式会社, 高知県公立大学法人 ・Filing date 2025-02-27 ・Publication date 2026-09-08 | 2G050, 2G059, 2G084, 5C101 |
| 15. JPP7917698 | 複合ビーム装置 | ・Applicant 株式会社日立ハイテク ・Filing date 2023-02-27 ・Publication date 2026-09-08 | 5C101 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「荷電粒子線装置技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 荷電粒子線装置技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, エフイーアイカンパニ has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 122 cases, followed by 株式会社ニューフレアテクノロジー with 88 cases.
| Name | Cases |
|---|---|
| エフイーアイカンパニ | 122 cases |
| 株式会社ニューフレアテクノロジー | 88 cases |
| エーエスエムエルネザーランズビーブイ | 50 cases |
| 株式会社日立ハイテク | 45 cases |
| 日本電子株式会社 | 41 cases |
| アプライドマテリアルズインコーポレイテッド | 39 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, 株式会社日立ハイテク has the highest number of joint applications in the last for the target period (2020 to 2025) with 236 cases, followed by エフイーアイカンパニ with 228 cases.
| Name | Cases |
|---|---|
| 株式会社日立ハイテク | 236 cases |
| エフイーアイカンパニ | 228 cases |
| 株式会社ニューフレアテクノロジー | 182 cases |
| エーエスエムエルネザーランズビーブイ | 153 cases |
| 日本電子株式会社 | 151 cases |
| アプライドマテリアルズインコーポレイテッド | 107 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| 株式会社日立ハイテク | 236 |
| エフイーアイカンパニ | 228 |
| 株式会社ニューフレアテクノロジー | 182 |
| エーエスエムエルネザーランズビーブイ | 153 |
| 日本電子株式会社 | 151 |
| アプライドマテリアルズインコーポレイテッド | 107 |
Top company information (JP)
{'ja': '技術テーマ「荷電粒子線装置技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 荷電粒子線装置技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, エフイーアイカンパニ has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 122 cases, followed by 株式会社ニューフレアテクノロジー with 88 cases.
| Name | Cases |
|---|---|
| エフイーアイカンパニ | 122 cases |
| 株式会社ニューフレアテクノロジー | 88 cases |
| エーエスエムエルネザーランズビーブイ | 50 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, エフイーアイカンパニ has the highest number of joint applications in the last for the target period (2020 to 2025) with 228 cases, followed by 株式会社ニューフレアテクノロジー with 182 cases.
| Name | Cases |
|---|---|
| エフイーアイカンパニ | 228 cases |
| 株式会社ニューフレアテクノロジー | 182 cases |
| エーエスエムエルネザーランズビーブイ | 153 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by 荷電粒子線装置技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 株式会社日立ハイテク | 236 |
| エフイーアイカンパニ | 228 |
| 株式会社ニューフレアテクノロジー | 182 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by 荷電粒子線装置技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| 株式会社日立ハイテク | 236 |
| エフイーアイカンパニ | 228 |
| 株式会社ニューフレアテクノロジー | 182 |
Top company details
Trends in filing of joint patent applications with エフイーアイカンパニ
荷電粒子線装置技術 filed 228 joint applications with エフイーアイカンパニ for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 181 cases in total) is 36.2, and the median is 34.0. The coefficient of variation (standard deviation/mean) is 0.11, and filings have been moderate fluctuations.
The highest number of filings in 2022 with 41 cases, and their lowest number in 2021 with 31 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 36.2 patents |
| Std Dev | 4.1 |
| COV | 0.11 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 47 cases | +38.2% |
| 2024 year | 34 cases | -17.07% |
| 2023 year | 41 cases | 0 |
Trends in filing of joint patent applications with 株式会社ニューフレアテクノロジー
荷電粒子線装置技術 filed 182 joint applications with 株式会社ニューフレアテクノロジー for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 172 cases in total) is 34.4, and the median is 37.0. The coefficient of variation (standard deviation/mean) is 0.16, and filings have been moderate fluctuations.
The number of filings has been increasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 41 cases, and their lowest number in 2022 with 27 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 34.4 patents |
| Std Dev | 5.4 |
| COV | 0.16 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 10 cases | -75.6% |
| 2024 year | 41 cases | +10.81% |
| 2023 year | 37 cases | +37.0% |
Trends in filing of joint patent applications with エーエスエムエルネザーランズビーブイ
荷電粒子線装置技術 filed 153 joint applications with エーエスエムエルネザーランズビーブイ for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 153 cases in total) is 30.6, and the median is 27.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2021 with 52 cases, and their lowest number in 2024 with 13 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 30.6 patents |
| Std Dev | 13.2 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 13 cases | -64.9% |
| 2023 year | 37 cases | +37.0% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む