The Theme Code "流体の使用によって特徴づけられた測定技術" had 0 patent filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31) in the collected data, versus 2 in the same period of the previous year (2023-01-01 to 2023-10-31). A zero count alone should not be read as withdrawal.
The highest number of filings in 2022 with 3 cases, and their lowest number in 2021 with 2 cases (years covered: 2021, 2022, 2023).
The mean of the number of filings over the last 3 years (2021 to 2023, 8 cases in total) is 2.7, and the median is 3.0. The coefficient of variation (standard deviation/mean) is 0.18, and filings have been moderate fluctuations.
| Index | Value |
|---|---|
| Average | 2.7 patents |
| Std Dev | 0.5 |
| COV | 0.18 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 3 cases | 0 |
| 2023 year | 3 cases | 0 |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 流体の使用によって特徴づけられた測定技術[2F066] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 流体の使用によって特徴づけられた測定技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
The changes in the number of patent filings of 流体の使用によって特徴づけられた測定技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
| Year | Cases |
|---|---|
| 2021 | 2 |
| 2022 | 3 |
| 2023 | 3 |
| 2025 | 3 |
This patent analysis report was created for a patent search set of 11 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA2026-144563 | 計測装置、位置決め装置、リソグラフィ装置、および物品製造方法 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-28 ・Publication date 2026-09-09 | 2F066, 2H197 |
| 2. JPA2026-142327 | 位置決め装置、露光装置、エアーセンサおよび物品製造方法。 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-26 ・Publication date 2026-09-07 | 2F066, 2F069, 2H197 |
| 3. JPA2026-142329 | 決定方法、リソグラフィ方法、物品製造方法、位置決め装置、およびリソグラフィ装置 | ・Applicant キヤノン株式会社 ・Filing date 2025-02-26 ・Publication date 2026-09-07 | 2F066, 2F069, 2H197 |
| 4. JPA2025-082547 | 管内径推定装置 | ・Applicant 学校法人中央大学 ・Filing date 2023-11-17 ・Publication date 2025-05-29 | 2F066, 2H040 |
| 5. JPA2024-168717 | 表面測定装置、加工装置及び表面測定方法 | ・Applicant 株式会社三井ハイテック ・Filing date 2023-05-24 ・Publication date 2024-12-05 | 2F066, 3C029 |
| 6. JPP7697698 | 空気マイクロメータの測定ヘッドおよび該測定ヘッドを備えた空気マイクロメータ, 空気マイクロメータの測定ヘッドおよび該測定ヘッドを備えた空気マイクロメータ | ・Applicant ダイセイ株式会社 ・Filing date 2023-01-06 ・Publication date 2024-07-19 | 2F066 |
| 7. JPP7831228 | 軸受装置, 軸受装置 | ・Applicant 日本精工株式会社 ・Filing date 2022-11-02 ・Publication date 2024-05-16 | 2F051, 2F066, 3J217, 3J701 |
| 8. JPP7904081 | リトラクト機構及びそれを備える寸法測定装置, リトラクト機構及びそれを備える寸法測定装置 | ・Applicant 株式会社東京精密 ・Filing date 2022-09-21 ・Publication date 2024-04-02 | 2F066 |
| 9. JPP7880126 | 空気マイクロメータ及び自動測定装置, 空気マイクロメータ及び自動測定装置 | ・Applicant 株式会社第一測範製作所 ・Filing date 2022-05-31 ・Publication date 2023-12-13 | 2F066 |
| 10. JPP7320567 | 高圧噴射ノズル噴射距離優劣予測方法およびそれに用いられる高圧噴射ノズル噴射距離優劣予測装置, 高圧噴射ノズル噴射距離優劣予測方法およびそれに用いられる高圧噴射ノズル噴射距離優劣予測装置 | ・Applicant 地下防水工業株式会社, 基盤技研株式会社, 株式会社トーメック ・Filing date 2021-07-27 ・Publication date 2023-02-08 | 2D040, 2F066 |
| 11. JPA2023-006435 | 内径測定装置及び内径測定方法 | ・Applicant 株式会社A-TECH ・Filing date 2021-06-30 ・Publication date 2023-01-18 | 2F066 |
| 12. JPP7331238 | 基板高さを測定する装置及び方法, 基板高さを測定する装置及び方法 | ・Applicant エーエスエムエルネザーランズビーブイ ・Filing date 2020-06-15 ・Publication date 2022-09-09 | 2F065, 2F066, 2H197 |
| 13. JPP7529530 | リニアゲージ, リニアゲージ | ・Applicant 株式会社ディスコ ・Filing date 2020-10-21 ・Publication date 2022-05-09 | 2F066 |
| 14. JPA2022-042644 | 内径寸法測定装置 | ・Applicant TPR工業株式会社, TPR株式会社 ・Filing date 2020-09-03 ・Publication date 2022-03-15 | 2F066 |
| 15. JPP6910668 | 内径測定装置及び内径測定方法, 内径測定装置及び内径測定方法 | ・Applicant 株式会社A-TECH ・Filing date 2020-06-29 ・Publication date 2022-01-17 | 2F066, 3C029, 3C707 |
{'ja': '技術テーマ「流体の使用によって特徴づけられた測定技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 流体の使用によって特徴づけられた測定技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 3 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 cases |
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 3 cases, followed by 株式会社東京精密 with 3 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 cases |
| 株式会社東京精密 | 3 cases |
| 株式会社A-TECH | 2 cases |
| TPR工業株式会社 | 1 cases |
| TPR株式会社 | 1 cases |
| エーエスエムエルネザーランズビーブイ | 1 cases |
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 |
| 株式会社東京精密 | 3 |
| 株式会社A-TECH | 2 |
| TPR工業株式会社 | 1 |
| TPR株式会社 | 1 |
| エーエスエムエルネザーランズビーブイ | 1 |
{'ja': '技術テーマ「流体の使用によって特徴づけられた測定技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 流体の使用によって特徴づけられた測定技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 3 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 cases |
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 3 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 cases |
Below is a ranking of the number of JP patent applications by 流体の使用によって特徴づけられた測定技術’s top 1 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 |
| 株式会社東京精密 | 3 |
| 株式会社A-TECH | 2 |
Below is a patent map showing the changes in the numbers of JP patent filings by 流体の使用によって特徴づけられた測定技術’s top 1 coapplicants over the last 6 years.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 3 |
| 株式会社東京精密 | 3 |
| 株式会社A-TECH | 2 |
流体の使用によって特徴づけられた測定技術 filed 3 joint applications with キヤノン株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 0 cases in total) is 0, and the median is 0. The coefficient of variation (standard deviation/mean) is 0, and filings have been stable.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2020 with 0 cases, and their lowest number in 2020 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 0 patents |
| Std Dev | 0 |
| COV | 0 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 3 cases | - |
| 2024 year | 0 cases | - |
| 2023 year | 0 cases | - |
"Patent Integration Report" is a web service provided by "Patent Integration Co., Ltd." operated by patent attorneys who are experts in intellectual property rights. Based on the latest patent data, this is one of the largest patent report services in Japan that provides information on technology trends in various companies and technology fields.
The purpose of this web service is to make intellectual property information familiar to many people, regardless of whether they have an interest in intellectual property rights, and to make use of it.
We actively provide various types of patent information that can be used in various media articles such as newspapers, magazines, and web media. Please feel free to contact us from "Inquiry form for details on the content of patent information that can be provided, conditions for provision, etc. Please contact us.
All rights related to the data, documents and charts belong to "an integrated patent search/analysis service provider, Patent Integration". Please specify the source “Patent Integration Report, URL: https://patent-i.com/report/en/" when inserting them into in-house materials, external report materials, etc., regardless of whether they are paid or free of charge.
Patent data is obtained by aggregating and analyzing the latest patent data issued by the Patent Offices of respective countries and jurisdictions and by WIPO. Although we take great care in publishing and analyzing the results, we do not guarantee the correctness of the data. We appreciate your understanding.
If you have any concerns about this service, please feel free to contact us.
Credit notation
・MeCab user dictionary for science technology term © National Bioscience Database Center licensed under CC Attribution-Share Alike 4.0 International
Patent Integration Co., Ltd. is committed to providing high-quality patent information based on the latest patent data on more than 45 million cases collected from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publication.
Patent Integration Co., Ltd. collects the patent data from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publications to provide it widely in the form of reports so that anyone can check patent information and patent trends with confidence.
Patent Integration Co., Ltd. is committed to various efforts to enhance the reliability of the information and to allow users to search patent information with confidence.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント