5J300 パルス発生器一般技術 Patent Trends
The Theme Code "パルス発生器一般技術" had 18 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a with an increasing trend transition of +2 filings (12.5%) over 16 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 37 cases, and their lowest number in 2023 with 19 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 103 cases in total) is 25.8, and the median is 23.5. The coefficient of variation (standard deviation/mean) is 0.27, and filings have been large fluctuations.
| Index | Value |
|---|---|
| Average | 25.8 patents |
| Std Dev | 6.8 |
| COV | 0.27 |
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025).
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 2 cases | -90.9% |
| 2024 year | 22 cases | +15.79% |
| 2023 year | 19 cases | -24.00% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for パルス発生器一般技術[5J300] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of パルス発生器一般技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
パルス発生器一般技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of パルス発生器一般技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
パルス発生器一般技術 JP patent filing trend (unit: cases)
| Year | Cases |
|---|---|
| 2021 | 37 |
| 2022 | 25 |
| 2023 | 19 |
| 2024 | 22 |
| 2025 | 2 |
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 105 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
パルス発生器一般技術[5J300]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA2026-131949 | 発振回路及び半導体装置 | ・Applicant エイブリック株式会社 ・Filing date 2025-02-04 ・Publication date 2026-08-17 | 5J300 |
| 2. JPA2026-109019 | フリップフロップ回路およびデータ転送回路 | ・Applicant 三菱電機株式会社 ・Filing date 2024-12-19 ・Publication date 2026-07-01 | 5J039, 5J300 |
| 3. JPA2026-106807 | 発振器 | ・Applicant ルネサスエレクトロニクス株式会社 ・Filing date 2024-12-18 ・Publication date 2026-06-30 | 5J300 |
| 4. JPA2026-097785 | プラズマ処理用途のためのパルス電圧源 | ・Applicant アプライドマテリアルズインコーポレイテッド ・Filing date 2023-01-03 ・Publication date 2026-06-16 | 2G084, 5F004, 5J300 |
| 5. JPA-HYO2026-516224 | 発振器装置および制御方法 | ・Applicant ダイオーズインコーポレイテッド ・Filing date 2024-05-20 ・Publication date 2026-05-20 | 5J081, 5J300 |
| 6. JPA2026-083421 | シュミット回路 | ・Applicant エイブリック株式会社 ・Filing date 2021-11-24 ・Publication date 2026-05-19 | 5J300 |
| 7. JPP7854298 | 半導体装置 | ・Applicant ヌヴォトンテクノロジージャパン株式会社 ・Filing date 2020-05-14 ・Publication date 2026-05-01 | 5F038, 5F048, 5J032, 5J300 |
| 8. JPA2026-068122 | マスタースレイブ型Ｄフリップフロップ | ・Applicant 近藤利夫 ・Filing date 2024-10-10 ・Publication date 2026-04-22 | 5J300 |
| 9. JPA2026-060722 | 発振回路 | ・Applicant ローム株式会社 ・Filing date 2024-09-27 ・Publication date 2026-04-08 | 5J300 |
| 10. JPA2026-047011 | 半導体装置 | ・Applicant ルネサスエレクトロニクス株式会社 ・Filing date 2024-12-19 ・Publication date 2026-03-13 | 5B015, 5F083, 5J300 |
| 11. JPA2026-047035 | 半導体装置 | ・Applicant ルネサスエレクトロニクス株式会社 ・Filing date 2025-01-29 ・Publication date 2026-03-13 | 5B015, 5J300 |
| 12. JPP7827721 | 電流センサ | ・Applicant ローム株式会社 ・Filing date 2022-04-08 ・Publication date 2026-03-10 | 2G025, 2G035, 5J055, 5J056, 5J300 |
| 13. JPA2026-032640 | 発振器 | ・Applicant ルネサスエレクトロニクス株式会社 ・Filing date 2024-08-14 ・Publication date 2026-02-27 | 5J300 |
| 14. JPA2026-029098 | 発振器 | ・Applicant 学校法人日本大学 ・Filing date 2024-08-08 ・Publication date 2026-02-20 | 5J300 |
| 15. JPP7702029 | クロック信号生成回路及びそのクロック信号生成方法, クロック信号生成回路及びそのクロック信号生成方法 | ・Applicant 南亜科技股ふん有限公司 ・Filing date 2024-09-11 ・Publication date 2026-02-04 | 5J300 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「パルス発生器一般技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme パルス発生器一般技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, ローム株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 14 cases, followed by 株式会社デンソー with 2 cases.
| Name | Cases |
|---|---|
| ローム株式会社 | 14 cases |
| 株式会社デンソー | 2 cases |
| エイブリック株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, ローム株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 24 cases, followed by ソニーセミコンダクタソリューションズ株式会社 with 7 cases.
| Name | Cases |
|---|---|
| ローム株式会社 | 24 cases |
| ソニーセミコンダクタソリューションズ株式会社 | 7 cases |
| 株式会社半導体エネルギー研究所 | 6 cases |
| エイブリック株式会社 | 6 cases |
| 国立研究開発法人科学技術振興機構 | 4 cases |
| 株式会社デンソー | 4 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Competitor filing ranking
| Name | Cases |
|---|---|
| ローム株式会社 | 24 |
| ソニーセミコンダクタソリューションズ株式会社 | 7 |
| 株式会社半導体エネルギー研究所 | 6 |
| エイブリック株式会社 | 6 |
| 国立研究開発法人科学技術振興機構 | 4 |
| 株式会社デンソー | 4 |
Top company information (JP)
{'ja': '技術テーマ「パルス発生器一般技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme パルス発生器一般技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, ローム株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 14 cases, followed by 株式会社デンソー with 2 cases.
| Name | Cases |
|---|---|
| ローム株式会社 | 14 cases |
| 株式会社デンソー | 2 cases |
| エイブリック株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, ローム株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 24 cases, followed by エイブリック株式会社 with 6 cases.
| Name | Cases |
|---|---|
| ローム株式会社 | 24 cases |
| エイブリック株式会社 | 6 cases |
| 株式会社デンソー | 4 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by パルス発生器一般技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業の長期推移をどう読むか
同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。
解説の続きを読む
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| ローム株式会社 | 24 |
| ソニーセミコンダクタソリューションズ株式会社 | 7 |
| 株式会社半導体エネルギー研究所 | 6 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by パルス発生器一般技術’s top 3 coapplicants over the last 6 years.
Top co-applicant filing ranking
| Name | Cases |
|---|---|
| ローム株式会社 | 24 |
| ソニーセミコンダクタソリューションズ株式会社 | 7 |
| 株式会社半導体エネルギー研究所 | 6 |
Top company details
Trends in filing of joint patent applications with ローム株式会社
パルス発生器一般技術 filed 24 joint applications with ローム株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 24 cases in total) is 4.8, and the median is 4.0. The coefficient of variation (standard deviation/mean) is 0.4, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2024 with 8 cases, and their lowest number in 2020 with 2 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 4.8 patents |
| Std Dev | 2.0 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 8 cases | +33.3% |
| 2023 year | 6 cases | +50.0% |
Trends in filing of joint patent applications with 株式会社デンソー
パルス発生器一般技術 filed 4 joint applications with 株式会社デンソー for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 4 cases in total) is 0.8, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 0.9, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2024 with 2 cases, and their lowest number in 2022 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 0.8 patents |
| Std Dev | 0.7 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 2 cases | - |
| 2023 year | 0 cases | - |
Trends in filing of joint patent applications with エイブリック株式会社
パルス発生器一般技術 filed 6 joint applications with エイブリック株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 5 cases in total) is 1.0, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.0, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2021 with 5 cases, and their lowest number in 2020 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 1.0 patents |
| Std Dev | 2.0 |
| COV | 2.0 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 1 cases | - |
| 2024 year | 0 cases | - |
| 2023 year | 0 cases | - |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
競合企業との比較のポイント
同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。
解説の続きを読む