5F037 半導体装置の組立体技術 Patent Trends

Filings in comparison period
37cases
2024-01-01〜2024-10-31
Year-over-year
+12cases / 48.0%
2023-01-01〜2023-10-31
Annual average
31.5cases
2021〜2024 / COV 0.15

The Theme Code "半導体装置の組立体技術" had 37 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a significantly increased of +12 filings (48.0%) over 25 they had in the same period of the previous year (2023-01-01 to 2023-10-31).

The highest number of filings in 2024 with 38 cases, and their lowest number in 2023 with 26 cases (years covered: 2021, 2022, 2023, 2024).

The mean of the number of filings over the last 4 years (2021 to 2024, 126 cases in total) is 31.5, and the median is 31.0. The coefficient of variation (standard deviation/mean) is 0.15, and filings have been moderate fluctuations.

Filing information for the last 4 years (2021 to 2024)
Index Value
Average 31.5 patents
Std Dev 4.8
COV 0.15

The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025).

Filing trends for the last 3 years
Year Cases YOY
2025 year 2 cases -94.7%
2024 year 38 cases +46.2%
2023 year 26 cases -23.53%

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 半導体装置の組立体技術[5F037] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of 半導体装置の組立体技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for 半導体装置の組立体技術. The trends of patent filings of 半導体装置の組立体技術 for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder

半導体装置の組立体技術, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of 半導体装置の組立体技術 over the last 6 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."
半導体装置の組立体技術 JP patent filing trend (unit: cases)
Year Cases
2021 28
2022 34
2023 26
2024 38
2025 2

Search Set (Analysis Patents)

This patent analysis report was created for a patent search set of 128 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Theme Code:
半導体装置の組立体技術[5F037]
Patent Analysis Period
2020〜2025
Number of Patents
128 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Recent publications

Showing 1–15 of 157
Publication No.TitleBibliographic infoTheme
1. JPA2026-148523透明ディスプレイモジュール及びその製造方法Applicant 晶呈科技股分有限公司
Filing date 2026-03-04
Publication date 2026-09-17
3K013, 3K014, 5C094, 5F037, 5F142, +1 more
2. JPA-HYO2026-531598多孔質部分を備えるインターポーザに結合された集積デバイスApplicant クアルコムインコーポレイテッド
Filing date 2024-08-30
Publication date 2026-09-17
5F037
3. JPA-HYO2026-531142フォトニック集積回路を含むパッケージのための電気相互接続Applicant シシリーマージャーサブツーインコーポレイテッド
Filing date 2024-12-27
Publication date 2026-09-15
2K102, 5F033, 5F037, 5F038
4. JPA-HYO2026-530823電源モジュール、車載充電装置、一体型コントローラ、および車両Applicant ビーワイディーカンパニーリミテッド
Filing date 2024-08-13
Publication date 2026-09-10
5F037, 5H125, 5H730, 5H740
5. JPA-HYO2026-530336メモリ及び共有の書き込みポートを有する集積回路Applicant バーサムマテリアルズユーエスリミティドライアビリティカンパニー
Filing date 2024-08-08
Publication date 2026-09-08
5B160, 5F037, 5F083
6. JPA-HYO2026-530231パワー半導体モジュールパッケージ用の溶接アセンブリ及びその製造方法Applicant ザ・ユニバーシティ・オブ・ホンコン
Filing date 2024-07-23
Publication date 2026-09-07
5F037
7. JPA-HYO2026-530076磁気パッケージ内にインダクタを備える集積回路Applicant テキサスインスツルメンツインコーポレイテッド
Filing date 2024-08-28
Publication date 2026-09-03
4M109, 5E070, 5E336, 5F037
8. JPA2026-140809マイクロエレクトロニクスにおける信頼性向上及び歩留向上のための直接接合型スタック構造Applicant アデイアセミコンダクターボンディングテクノロジーズインコーポレイテッド
Filing date 2020-06-25
Publication date 2026-09-03
5F037, 5F144
9. JPA-HYO2026-529940埋め込み相互接続構造を有する集積デバイスApplicant クアルコムインコーポレイテッド
Filing date 2024-07-12
Publication date 2026-09-03
5E316, 5F037
10. JPA2026-140658半導体装置Applicant 方略電子股ふん有限公司
Filing date 2026-01-08
Publication date 2026-09-02
2H137, 2H147, 3K244, 5E338, 5F037
11. JPA2026-139817光半導体パッケージ及び光半導体パッケージの製造方法Applicant 浜松ホトニクス株式会社
Filing date 2021-12-13
Publication date 2026-09-01
4M118, 5F037, 5F149, 5F889
12. JPA2026-139737センサ、撮像システム、およびセンサを形成する方法Applicant ケーエルエーコーポレイション
Filing date 2022-06-14
Publication date 2026-09-01
2G051, 4M118, 5F037
13. JPA2026-139597半導体パッケージのストレイン制御装置、前記ストレイン制御装置を含む半導体パッケージおよび前記半導体パッケージを含む半導体モジュールApplicant エルエックスセミコンカンパニーリミティド
Filing date 2026-02-13
Publication date 2026-09-01
5F037, 5F136
14. JPA2026-139805積層体の作製方法、及び、積層体Applicant 株式会社レゾナック
Filing date 2021-12-08
Publication date 2026-09-01
5E314, 5F037, 5F061
15. JPA-HYO2026-529627ウェハスケールメモリ用のシステム、方法、及び装置Applicant バーサムマテリアルズユーエスリミティドライアビリティカンパニー
Filing date 2024-08-08
Publication date 2026-09-01
5F037, 5F083

Same industry / competition company information  (JP)

{'ja': '技術テーマ「半導体装置の組立体技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 半導体装置の組立体技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}

記事監修:佐藤 寿

佐藤総合特許事務所 代表弁理士

佐藤 寿のコメント

競合企業との比較のポイント

同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。

解説の続きを読む
また、競合企業の特許出願件数の増減傾向を知ることで、競合関係の変化や動向を把握することができます。例えば直近10年間の出願件数の順位と直近3年間の出願件数の順位とを比較することで、順位の上下による業界内でのポジショニングの変動を把握することができます。このような情報をもとに、知財戦略において最も重要な自社の出願戦略を見直すことができます。なお、パテントインテグレーションレポートでは、国内及び主要国の企業や注目技術分野などの出願件数上位1000件までのテーマでレポートを作成しているので、ここに挙がっていない関連する他の企業や技術分野と比較することで、より有益な示唆を得ることもできます。

Trends in filing of joint patent applications in the last 3 years (2023 to 2025).

Comparing the number of applications of each company, キオクシア株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 5 cases, followed by ヒタチ・エナジー・リミテッド with 5 cases.

Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Name Cases
キオクシア株式会社 5 cases
ヒタチ・エナジー・リミテッド 5 cases
三星電子株式会社 3 cases
富士電機株式会社 2 cases
ローム株式会社 2 cases
三菱電機株式会社 2 cases

Trends in filing of joint patent applications for the target period (2020 to 2025).

Comparing the number of applications of each company, キオクシア株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 17 cases, followed by 富士電機株式会社 with 13 cases.

Trends in filing of joint patent applications for the target period (2020 to 2025).
Name Cases
キオクシア株式会社 17 cases
富士電機株式会社 13 cases
ローム株式会社 11 cases
三菱電機株式会社 7 cases
ヒタチ・エナジー・リミテッド 6 cases
三星電子株式会社 4 cases

Same industry / competition company JP patent filing ranking

記事監修:佐藤 寿

佐藤総合特許事務所 代表弁理士

佐藤 寿のコメント

競合企業の長期推移をどう読むか

同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。

解説の続きを読む
これにより、例えば研究開発の活発化傾向・減退化傾向、突発的な開発集中時期等を特定することができ、自社の特許出願や知財戦略に対する見直しを行うことができます。また、競合企業の製品や技術開発の傾向を知ることで、自社の新規開発や商品開発の位置づけを把握することができます。なお、このグラフにおいても直近の期間については未公開の期間が存在する可能性があるために、未公開の期間に出願されると予測される出願件数を補って動向を把握する必要があります。

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.

Competitor filing ranking
Name Cases
キオクシア株式会社 17
富士電機株式会社 13
ローム株式会社 11
三菱電機株式会社 7
ヒタチ・エナジー・リミテッド 6
三星電子株式会社 4
You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company information  (JP)

{'ja': '技術テーマ「半導体装置の組立体技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 半導体装置の組立体技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}

記事監修:佐藤 寿

佐藤総合特許事務所 代表弁理士

佐藤 寿のコメント

競合企業との比較のポイント

同業や競合企業が特許に注力している分野を知ることで、自社の戦略や製品開発の方向性を把握することができます。

解説の続きを読む
また、競合企業の特許出願件数の増減傾向を知ることで、競合関係の変化や動向を把握することができます。例えば直近10年間の出願件数の順位と直近3年間の出願件数の順位とを比較することで、順位の上下による業界内でのポジショニングの変動を把握することができます。このような情報をもとに、知財戦略において最も重要な自社の出願戦略を見直すことができます。なお、パテントインテグレーションレポートでは、国内及び主要国の企業や注目技術分野などの出願件数上位1000件までのテーマでレポートを作成しているので、ここに挙がっていない関連する他の企業や技術分野と比較することで、より有益な示唆を得ることもできます。

Trends in filing of joint patent applications in the last 3 years (2023 to 2025).

among the top coapplicants, キオクシア株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 5 cases, followed by ヒタチ・エナジー・リミテッド with 5 cases.

Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Name Cases
キオクシア株式会社 5 cases
ヒタチ・エナジー・リミテッド 5 cases
三星電子株式会社 3 cases

Trends in filing of joint patent applications for the target period (2020 to 2025).

among the top coapplicants, キオクシア株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 17 cases, followed by ヒタチ・エナジー・リミテッド with 6 cases.

Trends in filing of joint patent applications for the target period (2020 to 2025).
Name Cases
キオクシア株式会社 17 cases
ヒタチ・エナジー・リミテッド 6 cases
三星電子株式会社 4 cases

Top company JP patent filing ranking

Below is a ranking of the number of JP patent applications by 半導体装置の組立体技術’s top 3 coapplicants over the last 6 years.

記事監修:佐藤 寿

佐藤総合特許事務所 代表弁理士

佐藤 寿のコメント

競合企業の長期推移をどう読むか

同業や競合企業の長期的な特許出願件数の推移から、長期トレンドと出願件数の山や谷を確認することができます。

解説の続きを読む
これにより、例えば研究開発の活発化傾向・減退化傾向、突発的な開発集中時期等を特定することができ、自社の特許出願や知財戦略に対する見直しを行うことができます。また、競合企業の製品や技術開発の傾向を知ることで、自社の新規開発や商品開発の位置づけを把握することができます。なお、このグラフにおいても直近の期間については未公開の期間が存在する可能性があるために、未公開の期間に出願されると予測される出願件数を補って動向を把握する必要があります。
Top co-applicant filing ranking
Name Cases
キオクシア株式会社 17
富士電機株式会社 13
ローム株式会社 11

Top company, Change in the Number of JP Patents

Below is a patent map showing the changes in the numbers of JP patent filings by 半導体装置の組立体技術’s top 3 coapplicants over the last 6 years.

Top co-applicant filing ranking
Name Cases
キオクシア株式会社 17
富士電機株式会社 13
ローム株式会社 11
You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company details

Trends in filing of joint patent applications with キオクシア株式会社

半導体装置の組立体技術 filed 17 joint applications with キオクシア株式会社 for the analysis period (2020 to 2025).

The mean of the number of filings over the last 5 years (2020 to 2024, 17 cases in total) is 3.4, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 0.6, and filings have been large fluctuations.

Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2020 with 5 cases, and their lowest number in 2024 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).

Filing information for the last 5 years (2020 to 2024)
Index Value
Average 3.4 patents
Std Dev 2.1
COV 0.6
Filing trends for the last 3 years
Year Cases YOY
2025 year 0 cases -
2024 year 0 cases -100%
2023 year 5 cases +150%

Trends in filing of joint patent applications with ヒタチ・エナジー・リミテッド

半導体装置の組立体技術 filed 6 joint applications with ヒタチ・エナジー・リミテッド for the analysis period (2020 to 2025).

The mean of the number of filings over the last 5 years (2020 to 2024, 6 cases in total) is 1.2, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 1.0, and filings have been large fluctuations.

Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2023 with 3 cases, and their lowest number in 2020 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).

Filing information for the last 5 years (2020 to 2024)
Index Value
Average 1.2 patents
Std Dev 1.2
COV 1.0
Filing trends for the last 3 years
Year Cases YOY
2025 year 0 cases -100%
2024 year 2 cases -33.3%
2023 year 3 cases +200%

Trends in filing of joint patent applications with 三星電子株式会社

半導体装置の組立体技術 filed 4 joint applications with 三星電子株式会社 for the analysis period (2020 to 2025).

The mean of the number of filings over the last 5 years (2020 to 2024, 4 cases in total) is 0.8, and the median is 0. The coefficient of variation (standard deviation/mean) is 1.5, and filings have been large fluctuations.

Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2023 with 3 cases, and their lowest number in 2020 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).

Filing information for the last 5 years (2020 to 2024)
Index Value
Average 0.8 patents
Std Dev 1.2
COV 1.5
Filing trends for the last 3 years
Year Cases YOY
2025 year 0 cases -
2024 year 0 cases -100%
2023 year 3 cases +200%

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