CVD技術 (JP Patent Analysis Report)
The Theme Code "CVD技術" had 209 patent application filings in the most recent period (2023-01-01 to 2023-04-30). This is a significantly decreased of -98 filings (-31.9%) over 307 they had in the same period of the previous year (2022-01-01 to 2022-04-30).
The highest number of filings in 2019 with 1,312 cases, and their lowest number in 2023 with 338 cases.
The mean of the number of filings over the last 5 years (2019 to 2024, 4,568 cases in total) is 761, and the median is 922. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 761 patents |
| Std Dev | 436 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 338 cases | -60.3 % |
| 2022 year | 851 cases | -14.21 % |
| 2021 year | 992 cases | -4.15 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for CVD技術[4K030] for the period of the last 10 years (2015-01-01 to 2024-12-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of CVD技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for CVD技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
CVD技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of CVD技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for CVD技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in CVD技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 9,553 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
CVD技術[4K030]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme CVD技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 79 cases, followed by 三菱マテリアル株式会社 with 4 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 79 cases |
| 三菱マテリアル株式会社 | 4 cases |
| 住友電気工業株式会社 | 2 cases |
| アプライドマテリアルズインコーポレイテッド | 1 cases |
| キヤノン株式会社 | 1 cases |
| 株式会社アルバック | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 1,570 cases, followed by アプライドマテリアルズインコーポレイテッド with 914 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 1,570 cases |
| アプライドマテリアルズインコーポレイテッド | 914 cases |
| 三菱マテリアル株式会社 | 182 cases |
| 住友電気工業株式会社 | 126 cases |
| 株式会社アルバック | 97 cases |
| 株式会社日立国際電気 | 72 cases |
| 株式会社東芝 | 51 cases |
| キヤノン株式会社 | 44 cases |
| パナソニックホールディングス株式会社 | 19 cases |
| シャープ株式会社 | 4 cases |
| 株式会社日立製作所 | 2 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme CVD技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 79 cases, followed by 三菱マテリアル株式会社 with 4 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 79 cases |
| 三菱マテリアル株式会社 | 4 cases |
| 住友電気工業株式会社 | 2 cases |
| アプライドマテリアルズインコーポレイテッド | 1 cases |
| キヤノン株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 1,570 cases, followed by アプライドマテリアルズインコーポレイテッド with 914 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 1,570 cases |
| アプライドマテリアルズインコーポレイテッド | 914 cases |
| 三菱マテリアル株式会社 | 182 cases |
| 住友電気工業株式会社 | 126 cases |
| 株式会社日立国際電気 | 72 cases |
| 株式会社東芝 | 51 cases |
| キヤノン株式会社 | 44 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by CVD技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by CVD技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 東京エレクトロン株式会社
CVD技術 filed 1,570 joint applications with 東京エレクトロン株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 894 cases in total) is 149, and the median is 187. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 233 cases, and their lowest number in 2023 with 75 cases.
| Index | Value |
|---|---|
| Average | 149 patents |
| Std Dev | 82.5 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 75 cases | -54.8 % |
| 2022 year | 166 cases | -20.19 % |
| 2021 year | 208 cases | 0 |
Trends in filing of joint patent applications with 株式会社日立国際電気
CVD技術 filed 72 joint applications with 株式会社日立国際電気 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 10 years (2014 to 2024, 177 cases in total) is 16.1, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.0, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 55 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 16.1 patents |
| Std Dev | 32.2 |
| COV | 2.0 |
| Year | Cases | YOY |
|---|---|---|
| 2018 year | 1 cases | 0 |
| 2017 year | 1 cases | -93.3 % |
| 2016 year | 15 cases | -72.7 % |
Trends in filing of joint patent applications with アプライドマテリアルズインコーポレイテッド
CVD技術 filed 914 joint applications with アプライドマテリアルズインコーポレイテッド for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 508 cases in total) is 84.7, and the median is 100. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 155 cases, and their lowest number in 2023 with 1 cases.
| Index | Value |
|---|---|
| Average | 84.7 patents |
| Std Dev | 63.7 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 1 cases | -99.1 % |
| 2022 year | 113 cases | -25.17 % |
| 2021 year | 151 cases | +71.6 % |
Trends in filing of joint patent applications with キヤノン株式会社
CVD技術 filed 44 joint applications with キヤノン株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 4 cases in total) is 0.7, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2018 with 17 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.7 patents |
| Std Dev | 0.7 |
| COV | 1.1 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 1 cases | - |
| 2022 year | 0 cases | -100 % |
| 2021 year | 1 cases | - |
Trends in filing of joint patent applications with 三菱マテリアル株式会社
CVD技術 filed 182 joint applications with 三菱マテリアル株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 77 cases in total) is 12.8, and the median is 14.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2021 to 2024). The highest number of filings in 2018 with 29 cases, and their lowest number in 2023 with 4 cases.
| Index | Value |
|---|---|
| Average | 12.8 patents |
| Std Dev | 8.4 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 4 cases | -73.3 % |
| 2022 year | 15 cases | +7.14 % |
| 2021 year | 14 cases | -39.1 % |
Information on important patents (JP)
The following shows JP patents held by CVD技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and CVD技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which CVD技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 12 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7432904 "酸化ガリウム半導体膜及び原料溶液" (Opposition day 2024-08-07) , next is 特許7394556 "載置台及び基板処理装置" (Opposition day 2024-06-07) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7432904 | 酸化ガリウム半導体膜及び原料溶液 | 2024-08-07 |
| 2 | 特許7394556 | 載置台及び基板処理装置 | 2024-06-07 |
| 3 | 特許7347709 | 静電チャック | 2024-03-19 |
| 4 | 特許7354125 | 金属基材上の硬質材料層 | 2024-03-15 |
| 5 | 特許7299891 | 改良型アンプル蒸発装置およびベッセル | 2023-12-27 |
| 6 | 特許7303207 | 金属基材上の硬質材料の層 | 2023-12-21 |
| 7 | 特許7154517 | イットリウム質保護膜およびその製造方法ならびに部材 | 2023-04-07 |
| 8 | 特許7130962 | 成膜方法及び成膜装置 | 2023-03-06 |
| 9 | 特許7063493 | 成膜用冶具及び気相成長装置 | 2022-08-30 |
| 10 | 特許7023445 | 成膜方法 | 2022-08-19 |
Protested cases
List of latest Protested patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 25 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2024-090654 "静電チャック部材及び静電チャック装置" (Protest day 2024-12-10) , next is 特開2023-002461 "基板処理装置及び静電チャック" (Protest day 2024-08-21) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2024-090654 | 静電チャック部材及び静電チャック装置 | 2024-12-10 |
| 2 | 特開2023-002461 | 基板処理装置及び静電チャック | 2024-08-21 |
| 3 | 特開2023-004738 | 基板載置台、基板処理装置及び基板載置台の製造方法 | 2024-07-11 |
| 4 | 特表2023-550013 | 共形性酸化ケイ素膜の堆積 | 2024-06-14 |
| 5 | 特開2021-172552 | 結晶膜 | 2024-06-07 |
| 6 | 特許7605941 | ステージ | 2024-04-25 |
| 7 | 特表2023-533712 | 酸化イットリウム系のコーティング及びバルク組成物 | 2024-01-31 |
| 8 | 特開2022-075025 | 静電チャック装置、静電チャック装置の製造方法 | 2024-01-30 |
| 9 | 特許7568489 | 焼結体、焼結体の製造方法、半導体製造装置及び半導体製造装置の製造方法 | 2024-01-12 |
| 10 | 特開2023-093304 | ＨＶＰＥ法によるＧａ２Ｏ３結晶膜の蒸着方法、蒸着装置、および、これを用いて得られたＧａ２Ｏ３結晶膜蒸着基板 | 2023-12-20 |
| 11 | 特許7508567 | トライボロジーシステム | 2023-12-18 |
| 12 | 特許7609968 | 低温応用例のための静電チャックアセンブリ | 2023-12-08 |
| 13 | 特許7428413 | 合成クォーツ製造方法 | 2023-09-07 |
| 14 | 特許7391296 | 成膜方法 | 2023-08-04 |
| 15 | 特許7420600 | 耐食性部材 | 2022-12-21 |
| 16 | 特許7473591 | 成膜装置及び成膜方法 | 2022-12-09 |
| 17 | 特許7181898 | 窒化アルミニウム焼結体およびこれを含む半導体製造装置用部材 | 2022-09-28 |
| 18 | 特許7394556 | 載置台及び基板処理装置 | 2022-09-20 |
| 19 | 特表2020-516774 | 滑り面を製作するための方法 | 2022-09-16 |
| 20 | 特開2019-119931 | 処理方法 | 2022-08-24 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 59 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許7181898 "窒化アルミニウム焼結体およびこれを含む半導体製造装置用部材" (5 times) , and the next most protest patent is 特許7149176 "ＣＶＤを用いたＴａＣコーティング層の製造方法及びそれを用いて製造したＴａＣの物性" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7181898 | 窒化アルミニウム焼結体およびこれを含む半導体製造装置用部材 | 5 times |
| 2 | 特許7149176 | ＣＶＤを用いたＴａＣコーティング層の製造方法及びそれを用いて製造したＴａＣの物性 | 4 times |
| 3 | 特許7060528 | 被覆切削工具 | 4 times |
| 4 | 特許7055761 | 被覆切削工具 | 4 times |
| 5 | 特表2020-516774 | 滑り面を製作するための方法 | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 35 patents Inspection from third parties. The average number of Inspection is 1.6 times. The most recently Inspection patent is 特開2024-090654 "静電チャック部材及び静電チャック装置" (Inspection day 2024-12-18) , next is 特表2024-544178 "可撓性材料に対する極薄機能性コーティングの堆積" (Inspection day 2024-12-12) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2024-090654 | 静電チャック部材及び静電チャック装置 | 2024-12-18 |
| 2 | 特表2024-544178 | 可撓性材料に対する極薄機能性コーティングの堆積 | 2024-12-12 |
| 3 | 特表2023-506526 | 薄膜堆積のための装置および方法 | 2024-12-12 |
| 4 | 特開2022-181713 | 製造装置 | 2024-10-22 |
| 5 | 特開2021-146478 | 耐欠損性にすぐれた表面被覆切削工具 | 2024-10-22 |
| 6 | 特開2023-002461 | 基板処理装置及び静電チャック | 2024-09-02 |
| 7 | 特開2021-172552 | 結晶膜 | 2024-08-09 |
| 8 | 特開2023-004738 | 基板載置台、基板処理装置及び基板載置台の製造方法 | 2024-07-16 |
| 9 | 特表2023-550013 | 共形性酸化ケイ素膜の堆積 | 2024-06-27 |
| 10 | 特許7605941 | ステージ | 2024-05-22 |
| 11 | 特開2006-261434 | シリコン酸化膜の形成方法 | 2024-04-01 |
| 12 | 特開2023-166458 | 太陽電池及びその製造方法 | 2024-02-21 |
| 13 | 特表2023-533712 | 酸化イットリウム系のコーティング及びバルク組成物 | 2024-02-19 |
| 14 | 特開2022-075025 | 静電チャック装置、静電チャック装置の製造方法 | 2024-02-08 |
| 15 | 特許7609968 | 低温応用例のための静電チャックアセンブリ | 2023-12-25 |
| 16 | 特許7428413 | 合成クォーツ製造方法 | 2023-10-29 |
| 17 | 特許7427848 | 多結晶ＳｉＣ成形体及びその製造方法 | 2023-10-18 |
| 18 | 特許7508567 | トライボロジーシステム | 2023-08-24 |
| 19 | 特許6801773 | 半導体製造装置用部材および半導体製造装置用部材を備えた半導体製造装置並びにディスプレイ製造装置 | 2023-06-29 |
| 20 | 特許7129587 | ウエハ支持台及びＲＦロッド | 2023-06-29 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 114 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.3. The most inspection patent is 特許7181898 "窒化アルミニウム焼結体およびこれを含む半導体製造装置用部材" (8 times) , and the next most inspection patent is 特許7155089 "多結晶ＳｉＣ成形体" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7181898 | 窒化アルミニウム焼結体およびこれを含む半導体製造装置用部材 | 8 times |
| 2 | 特許7155089 | 多結晶ＳｉＣ成形体 | 4 times |
| 3 | 特許7060528 | 被覆切削工具 | 4 times |
| 4 | 特許7055761 | 被覆切削工具 | 4 times |
| 5 | 特許6762484 | ＳｉＣエピタキシャルウェハ及びその製造方法 | 3 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 2,537 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.1. The most cited patent is 特許6095825 "基板処理装置および半導体装置の製造方法" (380 times) , and the next most cited patent is 特許6805244 "有機スズオキシドヒドロキシドのパターン形成組成物、前駆体およびパターン形成" (54 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6095825 | 基板処理装置および半導体装置の製造方法 | 380 times |
| 2 | 特許6805244 | 有機スズオキシドヒドロキシドのパターン形成組成物、前駆体およびパターン形成 | 54 times |
| 3 | 特許7281285 | 濃度制御装置、及び、ゼロ点調整方法、濃度制御装置用プログラム | 30 times |
| 4 | 特許6690282 | 炭化珪素エピタキシャル基板および炭化珪素半導体装置の製造方法 | 29 times |
| 5 | 特開2017-222928 | 表面処理による選択的堆積 | 29 times |
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