光学要素の表面処理技術 (JP Patent Analysis Report)
The Theme Code "光学要素の表面処理技術" had 94 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a slightly increased of +2 filings (2.2%) over 92 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2014 with 543 cases, and their lowest number in 2022 with 293 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 1,959 cases in total) is 326, and the median is 330. The coefficient of variation (standard deviation/mean) is 0.27, and there have been small fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 326 patents |
| Std Dev | 88.7 |
| COV | 0.27 |
The number of filings has been decreasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 293 cases | -14.33 % |
| 2021 year | 342 cases | +7.21 % |
| 2020 year | 319 cases | -18.41 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 光学要素の表面処理技術[2K009] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 光学要素の表面処理技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 光学要素の表面処理技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
光学要素の表面処理技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 光学要素の表面処理技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 光学要素の表面処理技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 光学要素の表面処理技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 3,931 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
光学要素の表面処理技術[2K009]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 光学要素の表面処理技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 64 cases, followed by キヤノン株式会社 with 29 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 64 cases |
| キヤノン株式会社 | 29 cases |
| 住友化学株式会社 | 24 cases |
| 大日本印刷株式会社 | 23 cases |
| TOPPANホールディングス株式会社 | 18 cases |
| AGC株式会社 | 7 cases |
| 富士フイルム株式会社 | 4 cases |
| コニカミノルタ株式会社 | 2 cases |
| セイコーエプソン株式会社 | 1 cases |
| HOYA株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 269 cases, followed by 日東電工株式会社 with 267 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 269 cases |
| 日東電工株式会社 | 267 cases |
| 富士フイルム株式会社 | 233 cases |
| キヤノン株式会社 | 178 cases |
| 住友化学株式会社 | 103 cases |
| AGC株式会社 | 102 cases |
| TOPPANホールディングス株式会社 | 81 cases |
| コニカミノルタ株式会社 | 78 cases |
| セイコーエプソン株式会社 | 24 cases |
| HOYA株式会社 | 19 cases |
| 株式会社ニコン | 17 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 光学要素の表面処理技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 64 cases, followed by キヤノン株式会社 with 29 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 64 cases |
| キヤノン株式会社 | 29 cases |
| 大日本印刷株式会社 | 23 cases |
| TOPPANホールディングス株式会社 | 18 cases |
| 富士フイルム株式会社 | 4 cases |
| コニカミノルタ株式会社 | 2 cases |
| セイコーエプソン株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 269 cases, followed by 日東電工株式会社 with 267 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 269 cases |
| 日東電工株式会社 | 267 cases |
| 富士フイルム株式会社 | 233 cases |
| キヤノン株式会社 | 178 cases |
| TOPPANホールディングス株式会社 | 81 cases |
| コニカミノルタ株式会社 | 78 cases |
| セイコーエプソン株式会社 | 24 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 光学要素の表面処理技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 光学要素の表面処理技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 富士フイルム株式会社
光学要素の表面処理技術 filed 233 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 66 cases in total) is 11.0, and the median is 7.5. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 56 cases, and their lowest number in 2022 with 2 cases.
| Index | Value |
|---|---|
| Average | 11.0 patents |
| Std Dev | 9.9 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 2 cases | -75.0 % |
| 2021 year | 8 cases | +14.29 % |
| 2020 year | 7 cases | -58.8 % |
Trends in filing of joint patent applications with 大日本印刷株式会社
光学要素の表面処理技術 filed 269 joint applications with 大日本印刷株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 79 cases in total) is 13.2, and the median is 11.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 81 cases, and their lowest number in 2021 with 7 cases.
| Index | Value |
|---|---|
| Average | 13.2 patents |
| Std Dev | 6.8 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 17 cases | +143 % |
| 2021 year | 7 cases | -30.0 % |
| 2020 year | 10 cases | -23.08 % |
Trends in filing of joint patent applications with キヤノン株式会社
光学要素の表面処理技術 filed 178 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 87 cases in total) is 14.5, and the median is 14.0. The coefficient of variation (standard deviation/mean) is 0.28, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 28 cases, and their lowest number in 2021 with 12 cases.
| Index | Value |
|---|---|
| Average | 14.5 patents |
| Std Dev | 4.1 |
| COV | 0.28 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 19 cases | +58.3 % |
| 2021 year | 12 cases | -14.29 % |
| 2020 year | 14 cases | -30.0 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
光学要素の表面処理技術 filed 24 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 8 cases in total) is 1.3, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 6 cases, and their lowest number in 2021 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.3 patents |
| Std Dev | 1.2 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | - |
| 2021 year | 0 cases | -100 % |
| 2020 year | 1 cases | -66.7 % |
Trends in filing of joint patent applications with TOPPANホールディングス株式会社
光学要素の表面処理技術 filed 81 joint applications with TOPPANホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 42 cases in total) is 7.0, and the median is 3.0. The coefficient of variation (standard deviation/mean) is 0.9, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2021 with 17 cases, and their lowest number in 2020 with 1 cases.
| Index | Value |
|---|---|
| Average | 7.0 patents |
| Std Dev | 6.4 |
| COV | 0.9 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 15 cases | -11.76 % |
| 2021 year | 17 cases | +1,600 % |
| 2020 year | 1 cases | -66.7 % |
Information on important patents (JP)
The following shows JP patents held by 光学要素の表面処理技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 光学要素の表面処理技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 光学要素の表面処理技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 38 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7438110 "可撓性ハードコート" (Opposition day 2024-08-26) , next is 特許7419488 "複合フィルムおよびそれを含むディスプレイ装置" (Opposition day 2024-07-18) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7438110 | 可撓性ハードコート | 2024-08-26 |
| 2 | 特許7419488 | 複合フィルムおよびそれを含むディスプレイ装置 | 2024-07-18 |
| 3 | 特許7406485 | 無機酸化物微粒子分散液 | 2024-06-21 |
| 4 | 特許7366285 | フォルディング後の復元力に優れた光学フィルム及びこれを含む表示装置 | 2024-04-19 |
| 5 | 特許7321463 | 反射防止フィルム、偏光板およびディスプレイ装置 | 2024-02-02 |
| 6 | 特許7293550 | 高ヘイズアンチグレアフィルムおよび高ヘイズアンチグレア反射防止フィルム | 2023-12-20 |
| 7 | 特許7241324 | 遮熱フィルム | 2023-09-13 |
| 8 | 特許7220854 | 低屈折率層形成用塗液、低屈折率層、および反射防止フィルム | 2023-08-10 |
| 9 | 特許7219849 | 防汚層付き光学フィルム | 2023-07-24 |
| 10 | 特許7185101 | 防汚層付き光学フィルム | 2023-06-05 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 34 patents Protest from third parties. The average number of Protest is 1.6 times. The most recently Protest patent is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Protest day 2024-11-07) , next is 特開2024-050734 "積層体、偏光子保護フィルム及び偏光板" (Protest day 2024-11-07) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-07 |
| 2 | 特開2024-050734 | 積層体、偏光子保護フィルム及び偏光板 | 2024-11-07 |
| 3 | 特表2024-530146 | 多層構造を有する光学フィルム及びそれを含む表示装置 | 2024-11-06 |
| 4 | 特開2023-095601 | 成形用フィルム積層体、成形品、及び成形品の製造方法 | 2024-11-05 |
| 5 | 再公表2019/066080 | 光学フィルムおよび画像表示装置 | 2024-08-23 |
| 6 | 特開2023-096299 | 反射防止フィルム | 2024-08-20 |
| 7 | 特開2023-124219 | 機能性膜及び機能性膜の製造方法 | 2024-08-07 |
| 8 | 特開2022-085047 | 活性エネルギー線硬化性ハードコート剤、ハードコート層、光学部材および電子機器 | 2024-08-01 |
| 9 | 特開2022-039928 | ハードコート層付偏光板および該ハードコート層付偏光板を含む画像表示装置 | 2024-07-26 |
| 10 | 特開2022-109436 | 光学フィルム巻回体、光学フィルム、光学部材、画像表示装置、光学フィルム巻回体の製造方法及び光学フィルム巻回体の品質検査方法 | 2024-07-24 |
| 11 | 特開2022-077477 | ハードコート樹脂組成物及びハードコートフィルム | 2024-07-19 |
| 12 | 特開2022-025625 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-06-25 |
| 13 | 特開2022-025618 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-06-25 |
| 14 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-05-27 |
| 15 | 特許7557354 | 改質中空粒子及びその製造方法 | 2024-05-23 |
| 16 | 特開2022-034529 | 硬化性樹脂組成物および積層フィルム | 2024-05-21 |
| 17 | 特表2023-523851 | 可視領域及び近赤外領域において非常に低い反射率を有する光学物品 | 2024-04-10 |
| 18 | 特開2022-146427 | 光学積層体及び表示装置 | 2024-03-25 |
| 19 | 特許7494350 | 表面保護フィルム | 2023-12-08 |
| 20 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 2023-09-26 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 90 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.5. The most protest patent is 特許6958988 "硬化性組成物、積層体及び自動車ヘッドランプレンズ" (8 times) , and the next most protest patent is 特許6383755 "透明プラスチック基材及びプラスチックレンズ" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6958988 | 硬化性組成物、積層体及び自動車ヘッドランプレンズ | 8 times |
| 2 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 4 times |
| 3 | 特表2021-513116 | 偏光板、液晶パネルおよびディスプレイ装置 | 4 times |
| 4 | 特許7016604 | タッチパネル用積層体、折り畳み式画像表示装置 | 4 times |
| 5 | 特開2016-027405 | 光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法 | 4 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 43 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Inspection day 2024-11-14) , next is 特開2023-095601 "成形用フィルム積層体、成形品、及び成形品の製造方法" (Inspection day 2024-11-13) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-14 |
| 2 | 特開2023-095601 | 成形用フィルム積層体、成形品、及び成形品の製造方法 | 2024-11-13 |
| 3 | 特開2024-050734 | 積層体、偏光子保護フィルム及び偏光板 | 2024-11-12 |
| 4 | 特許7557354 | 改質中空粒子及びその製造方法 | 2024-09-18 |
| 5 | 特開2023-124219 | 機能性膜及び機能性膜の製造方法 | 2024-09-05 |
| 6 | 再公表2019/066080 | 光学フィルムおよび画像表示装置 | 2024-09-03 |
| 7 | 特開2023-096299 | 反射防止フィルム | 2024-08-27 |
| 8 | 特許7486878 | 反射防止フィルム、偏光板およびディスプレイ装置 | 2024-08-22 |
| 9 | 特開2022-025625 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-07-04 |
| 10 | 特開2022-025618 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-07-04 |
| 11 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-06-10 |
| 12 | 特許7596633 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2024-05-29 |
| 13 | 特開2022-034529 | 硬化性樹脂組成物および積層フィルム | 2024-05-29 |
| 14 | 特表2023-523851 | 可視領域及び近赤外領域において非常に低い反射率を有する光学物品 | 2024-05-09 |
| 15 | 特許7494350 | 表面保護フィルム | 2024-05-02 |
| 16 | 特開2022-146427 | 光学積層体及び表示装置 | 2024-04-03 |
| 17 | 特開2024-052849 | 積層体、偏光子保護フィルム及び偏光板 | 2024-03-15 |
| 18 | 特表2023-526710 | 固体ポリマー組成物、自立フィルム及び発光デバイス | 2024-03-01 |
| 19 | 特開2022-085047 | 活性エネルギー線硬化性ハードコート剤、ハードコート層、光学部材および電子機器 | 2023-11-14 |
| 20 | 特許7321463 | 反射防止フィルム、偏光板およびディスプレイ装置 | 2023-10-20 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 119 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.9. The most inspection patent is 特許6958988 "硬化性組成物、積層体及び自動車ヘッドランプレンズ" (26 times) , and the next most inspection patent is 特許7016604 "タッチパネル用積層体、折り畳み式画像表示装置" (13 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6958988 | 硬化性組成物、積層体及び自動車ヘッドランプレンズ | 26 times |
| 2 | 特許7016604 | タッチパネル用積層体、折り畳み式画像表示装置 | 13 times |
| 3 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 10 times |
| 4 | 特開2016-027405 | 光学積層体、偏光板、偏光板の製造方法、画像表示装置、画像表示装置の製造方法及び画像表示装置の視認性改善方法 | 10 times |
| 5 | 特許7016603 | タッチパネル用ハードコートフィルム、及び、折り畳み式画像表示装置 | 9 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 914 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.4. The most cited patent is 特許6510113 "光学部材用組成物、光学部材及び画像表示装置" (41 times) , and the next most cited patent is 特開2016-125063 "表示装置用ウィンドウフィルムおよびこれを含む表示装置" (32 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6510113 | 光学部材用組成物、光学部材及び画像表示装置 | 41 times |
| 2 | 特開2016-125063 | 表示装置用ウィンドウフィルムおよびこれを含む表示装置 | 32 times |
| 3 | 特許6825198 | 防眩性光学積層体及び画像表示装置 | 29 times |
| 4 | 特許6451279 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 | 26 times |
| 5 | 特開2018-072663 | 折りたたみ型ディスプレイ及び携帯端末機器 | 26 times |
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