フォトリソグラフィー用材料技術 (JP Patent Analysis Report)
The Theme Code "フォトリソグラフィー用材料技術" had 181 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a with an increasing trend transition of +17 filings (10.4%) over 164 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2016 with 1,240 cases, and their lowest number in 2022 with 748 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 5,308 cases in total) is 885, and the median is 838. The coefficient of variation (standard deviation/mean) is 0.25, and there have been small fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 885 patents |
| Std Dev | 223 |
| COV | 0.25 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 748 cases | -0.80 % |
| 2021 year | 754 cases | -18.13 % |
| 2020 year | 921 cases | -19.49 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for フォトリソグラフィー用材料技術[2H225] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of フォトリソグラフィー用材料技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for フォトリソグラフィー用材料技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
フォトリソグラフィー用材料技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of フォトリソグラフィー用材料技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for フォトリソグラフィー用材料技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in フォトリソグラフィー用材料技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,157 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
フォトリソグラフィー用材料技術[2H225]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 453 cases, followed by 信越化学工業株式会社 with 162 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 453 cases |
| 信越化学工業株式会社 | 162 cases |
| 東京応化工業株式会社 | 103 cases |
| ARTIENCE株式会社 | 63 cases |
| 富士フイルム株式会社 | 48 cases |
| 東レ株式会社 | 46 cases |
| 住友ベークライト株式会社 | 39 cases |
| JSR株式会社 | 27 cases |
| 株式会社レゾナック | 25 cases |
| TOPPANホールディングス株式会社 | 7 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,301 cases, followed by 富士フイルム株式会社 with 1,256 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,301 cases |
| 富士フイルム株式会社 | 1,256 cases |
| 信越化学工業株式会社 | 594 cases |
| 東京応化工業株式会社 | 569 cases |
| JSR株式会社 | 564 cases |
| ARTIENCE株式会社 | 518 cases |
| 株式会社レゾナック | 436 cases |
| 東レ株式会社 | 341 cases |
| 住友ベークライト株式会社 | 228 cases |
| TOPPANホールディングス株式会社 | 81 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme フォトリソグラフィー用材料技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 453 cases, followed by 信越化学工業株式会社 with 162 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 453 cases |
| 信越化学工業株式会社 | 162 cases |
| 東京応化工業株式会社 | 103 cases |
| 富士フイルム株式会社 | 48 cases |
| JSR株式会社 | 27 cases |
| 株式会社レゾナック | 25 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 住友化学株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 1,301 cases, followed by 富士フイルム株式会社 with 1,256 cases.
| Name | Cases |
|---|---|
| 住友化学株式会社 | 1,301 cases |
| 富士フイルム株式会社 | 1,256 cases |
| 信越化学工業株式会社 | 594 cases |
| 東京応化工業株式会社 | 569 cases |
| JSR株式会社 | 564 cases |
| 株式会社レゾナック | 436 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by フォトリソグラフィー用材料技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by フォトリソグラフィー用材料技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 富士フイルム株式会社
フォトリソグラフィー用材料技術 filed 1,256 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 684 cases in total) is 114, and the median is 144. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 201 cases, and their lowest number in 2022 with 36 cases.
| Index | Value |
|---|---|
| Average | 114 patents |
| Std Dev | 67.0 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 36 cases | -75.0 % |
| 2021 year | 144 cases | -2.04 % |
| 2020 year | 147 cases | -26.87 % |
Trends in filing of joint patent applications with 住友化学株式会社
フォトリソグラフィー用材料技術 filed 1,301 joint applications with 住友化学株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 863 cases in total) is 144, and the median is 138. The coefficient of variation (standard deviation/mean) is 0.21, and there have been small fluctuations in the number of filings from year to year.
The highest number of filings in 2023 with 188 cases, and their lowest number in 2014 with 56 cases.
| Index | Value |
|---|---|
| Average | 144 patents |
| Std Dev | 30.7 |
| COV | 0.21 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 179 cases | +28.78 % |
| 2021 year | 139 cases | +2.21 % |
| 2020 year | 136 cases | +14.29 % |
Trends in filing of joint patent applications with JSR株式会社
フォトリソグラフィー用材料技術 filed 564 joint applications with JSR株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 179 cases in total) is 29.8, and the median is 26.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 130 cases, and their lowest number in 2022 with 12 cases.
| Index | Value |
|---|---|
| Average | 29.8 patents |
| Std Dev | 18.8 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 12 cases | -20.00 % |
| 2021 year | 15 cases | -62.5 % |
| 2020 year | 40 cases | +8.11 % |
Trends in filing of joint patent applications with 東京応化工業株式会社
フォトリソグラフィー用材料技術 filed 569 joint applications with 東京応化工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 321 cases in total) is 53.5, and the median is 56.0. The coefficient of variation (standard deviation/mean) is 0.25, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 72 cases, and their lowest number in 2014 with 35 cases.
| Index | Value |
|---|---|
| Average | 53.5 patents |
| Std Dev | 13.4 |
| COV | 0.25 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 68 cases | +65.9 % |
| 2021 year | 41 cases | -22.64 % |
| 2020 year | 53 cases | -22.06 % |
Trends in filing of joint patent applications with 信越化学工業株式会社
フォトリソグラフィー用材料技術 filed 594 joint applications with 信越化学工業株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 377 cases in total) is 62.8, and the median is 61.0. The coefficient of variation (standard deviation/mean) is 0.20, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 82 cases, and their lowest number in 2016 with 43 cases.
| Index | Value |
|---|---|
| Average | 62.8 patents |
| Std Dev | 12.5 |
| COV | 0.20 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 82 cases | +54.7 % |
| 2021 year | 53 cases | -15.87 % |
| 2020 year | 63 cases | +6.78 % |
Information on important patents (JP)
The following shows JP patents held by フォトリソグラフィー用材料技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and フォトリソグラフィー用材料技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which フォトリソグラフィー用材料技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 31 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7464493 "黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス" (Opposition day 2024-09-30) , next is 特許7457781 "感光性樹脂組成物、それを用いて製造された感光性樹脂膜およびカラーフィルタ" (Opposition day 2024-09-27) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7464493 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-09-30 |
| 2 | 特許7457781 | 感光性樹脂組成物、それを用いて製造された感光性樹脂膜およびカラーフィルタ | 2024-09-27 |
| 3 | 特許7462724 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 2024-09-10 |
| 4 | 特許7453260 | 硬化性樹脂組成物、樹脂膜、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス | 2024-09-09 |
| 5 | 特許7423646 | 硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子及び画像表示装置 | 2024-07-29 |
| 6 | 特許7366924 | フレキソ印刷版原版及びフレキソ印刷版 | 2024-02-27 |
| 7 | 特許7332982 | 炭素原子間の不飽和結合によるプラズマ硬化性化合物を含む段差基板被覆膜形成組成物 | 2024-02-22 |
| 8 | 特許7339103 | 硬化性樹脂組成物、ドライフィルム、硬化物、および、電子部品 | 2024-02-20 |
| 9 | 特許7306542 | 樹脂組成物、半導体用配線層積層体及び半導体装置 | 2023-12-27 |
| 10 | 特許7294146 | 着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明 | 2023-12-20 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 90 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2022-085860 "感光性組成物" (Protest day 2024-11-12) , next is 特開2024-111000 "感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルム" (Protest day 2024-11-01) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-085860 | 感光性組成物 | 2024-11-12 |
| 2 | 特開2024-111000 | 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルム | 2024-11-01 |
| 3 | 特開2021-056509 | ブラックレジスト用感光性樹脂組成物、当該感光性樹脂組成物の製造方法およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置 | 2024-10-09 |
| 4 | 特許7601043 | 感光性樹脂組成物 | 2024-08-23 |
| 5 | 特開2023-139165 | 有機金属フォトレジスト現像剤組成物及び処理方法 | 2024-07-12 |
| 6 | 特開2024-033515 | 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品 | 2024-07-10 |
| 7 | 特許7543741 | リソグラフィー用塗布膜形成組成物の製造方法 | 2024-06-13 |
| 8 | 特開2023-023224 | 感放射線性組成物、層間絶縁膜及びその製造方法、並びに表示素子 | 2024-06-12 |
| 9 | 特開2022-172506 | カラーフィルタ用着色組成物、カラーフィルタ、液晶表示装置、および固体撮像素子 | 2024-06-12 |
| 10 | 特許7586641 | 感光性組成物 | 2024-06-11 |
| 11 | 特開2023-123378 | 着色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよびこれを含む固体撮像素子または表示装置 | 2024-06-07 |
| 12 | 特許7534352 | レジスト組成物およびレジストパターン形成方法 | 2024-06-07 |
| 13 | 特許7603383 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2024-05-14 |
| 14 | 特許7558988 | 樹脂組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス | 2024-03-21 |
| 15 | 特許7604192 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-03-18 |
| 16 | 特許7569209 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-03-18 |
| 17 | 特許7576617 | 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス | 2024-03-06 |
| 18 | 特開2019-172975 | 樹脂組成物、樹脂シート、硬化膜 | 2024-03-05 |
| 19 | 特開2022-048206 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 2024-02-19 |
| 20 | 特許7464494 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-02-07 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 190 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特許7067470 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (5 times) , and the next most protest patent is 特開2019-172975 "樹脂組成物、樹脂シート、硬化膜" (5 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7067470 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 5 times |
| 2 | 特開2019-172975 | 樹脂組成物、樹脂シート、硬化膜 | 5 times |
| 3 | 特許7051818 | 感光性樹脂組成物 | 5 times |
| 4 | 特許7241695 | 感光性樹脂組成物、ドライフィルムレジスト及びそれらの硬化物 | 4 times |
| 5 | 特許7131907 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | 4 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 114 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2024-111000 "感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルム" (Inspection day 2024-11-20) , next is 特開2021-056509 "ブラックレジスト用感光性樹脂組成物、当該感光性樹脂組成物の製造方法およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置" (Inspection day 2024-11-12) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2024-111000 | 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法、並びに、ポリエチレンテレフタレートフィルム | 2024-11-20 |
| 2 | 特開2021-056509 | ブラックレジスト用感光性樹脂組成物、当該感光性樹脂組成物の製造方法およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置 | 2024-11-12 |
| 3 | 特許7601043 | 感光性樹脂組成物 | 2024-09-27 |
| 4 | 特開2022-060893 | オキシムエステル系化合物の製造方法及び感光性樹脂組成物の製造方法 | 2024-09-03 |
| 5 | 特許7603383 | ポジ型感光性樹脂組成物、パターニングされたレジスト膜の形成方法、及びパターニングされたレジスト膜 | 2024-08-23 |
| 6 | 特開2022-114818 | 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置 | 2024-08-20 |
| 7 | 特開2023-139165 | 有機金属フォトレジスト現像剤組成物及び処理方法 | 2024-08-08 |
| 8 | 特開2024-033515 | 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品 | 2024-08-02 |
| 9 | 特許7586641 | 感光性組成物 | 2024-07-31 |
| 10 | 特許7464494 | 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス | 2024-07-24 |
| 11 | 特表2021-534315 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング | 2024-07-19 |
| 12 | 特許7534352 | レジスト組成物およびレジストパターン形成方法 | 2024-07-08 |
| 13 | 特表2023-521230 | 炭素材料、金属有機化合物および溶媒を含んでなるスピンコーティング組成物、および基板の上方への金属酸化物膜の製造方法 | 2024-07-04 |
| 14 | 特開2024-032869 | 硬化膜の製造方法、およびその使用 | 2024-07-04 |
| 15 | 特開2022-172506 | カラーフィルタ用着色組成物、カラーフィルタ、液晶表示装置、および固体撮像素子 | 2024-07-02 |
| 16 | 特開2024-073474 | 多環芳香族含有ポリマーを含むレジスト下層膜形成用組成物 | 2024-06-20 |
| 17 | 特許7543741 | リソグラフィー用塗布膜形成組成物の製造方法 | 2024-06-18 |
| 18 | 特許7433394 | レジスト組成物、レジストパターン形成方法、化合物及び高分子化合物 | 2024-04-24 |
| 19 | 特許7604192 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-04-09 |
| 20 | 特許7569209 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-04-09 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 219 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.6. The most inspection patent is 特許7067470 "感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品" (11 times) , and the next most inspection patent is 特許7018168 "感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法" (9 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7067470 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 | 11 times |
| 2 | 特許7018168 | 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 | 9 times |
| 3 | 特開2015-146038 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物、感光性エレメント、タッチパネルの製造方法及び樹脂硬化膜 | 7 times |
| 4 | 特許6860500 | 感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置 | 7 times |
| 5 | 特許6551277 | 硬化膜付きタッチパネル用基材の製造方法、それに用いる感光性樹脂組成物、感光性エレメント及びタッチパネル | 6 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 2,540 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.1. The most cited patent is 特許6984993 "自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置" (53 times) , and the next most cited patent is 特許6784670 "有機金属溶液に基づいた高解像度パターニング組成物および対応する方法" (52 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6984993 | 自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置 | 53 times |
| 2 | 特許6784670 | 有機金属溶液に基づいた高解像度パターニング組成物および対応する方法 | 52 times |
| 3 | 特許6805244 | 有機スズオキシドヒドロキシドのパターン形成組成物、前駆体およびパターン形成 | 51 times |
| 4 | 特許6702264 | レジスト材料及びパターン形成方法 | 38 times |
| 5 | 特許6531723 | レジスト材料及びパターン形成方法 | 30 times |
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