印刷方法技術 (JP Patent Analysis Report)
The Theme Code "印刷方法技術" had 40 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -23 filings (-36.5%) over 63 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2018 with 372 cases, and their lowest number in 2022 with 203 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 1,498 cases in total) is 250, and the median is 252. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 250 patents |
| Std Dev | 95.2 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 203 cases | -10.96 % |
| 2021 year | 228 cases | -17.69 % |
| 2020 year | 277 cases | -17.80 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 印刷方法技術[2H113] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 印刷方法技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 印刷方法技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
印刷方法技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 印刷方法技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 印刷方法技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 印刷方法技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 2,736 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
印刷方法技術[2H113]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 印刷方法技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 独立行政法人国立印刷局 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 38 cases, followed by ARTIENCE株式会社 with 34 cases.
| Name | Cases |
|---|---|
| 独立行政法人国立印刷局 | 38 cases |
| ARTIENCE株式会社 | 34 cases |
| TOPPANホールディングス株式会社 | 32 cases |
| 大日本印刷株式会社 | 13 cases |
| キヤノン株式会社 | 9 cases |
| 富士フイルム株式会社 | 4 cases |
| 株式会社リコー | 2 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 独立行政法人国立印刷局 has the highest number of joint applications in the last for the target period (2014 to 2024) with 245 cases, followed by TOPPANホールディングス株式会社 with 220 cases.
| Name | Cases |
|---|---|
| 独立行政法人国立印刷局 | 245 cases |
| TOPPANホールディングス株式会社 | 220 cases |
| カシオ計算機株式会社 | 193 cases |
| 大日本印刷株式会社 | 140 cases |
| ARTIENCE株式会社 | 107 cases |
| 富士フイルム株式会社 | 71 cases |
| 株式会社リコー | 27 cases |
| キヤノン株式会社 | 15 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 印刷方法技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 独立行政法人国立印刷局 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 38 cases, followed by ARTIENCE株式会社 with 34 cases.
| Name | Cases |
|---|---|
| 独立行政法人国立印刷局 | 38 cases |
| ARTIENCE株式会社 | 34 cases |
| TOPPANホールディングス株式会社 | 32 cases |
| 大日本印刷株式会社 | 13 cases |
| キヤノン株式会社 | 9 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 独立行政法人国立印刷局 has the highest number of joint applications in the last for the target period (2014 to 2024) with 245 cases, followed by TOPPANホールディングス株式会社 with 220 cases.
| Name | Cases |
|---|---|
| 独立行政法人国立印刷局 | 245 cases |
| TOPPANホールディングス株式会社 | 220 cases |
| カシオ計算機株式会社 | 193 cases |
| 大日本印刷株式会社 | 140 cases |
| ARTIENCE株式会社 | 107 cases |
| キヤノン株式会社 | 15 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 印刷方法技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 印刷方法技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 大日本印刷株式会社
印刷方法技術 filed 140 joint applications with 大日本印刷株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 74 cases in total) is 12.3, and the median is 9.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 23 cases, and their lowest number in 2022 with 9 cases.
| Index | Value |
|---|---|
| Average | 12.3 patents |
| Std Dev | 6.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 9 cases | -10.00 % |
| 2021 year | 10 cases | +11.11 % |
| 2020 year | 9 cases | -57.1 % |
Trends in filing of joint patent applications with TOPPANホールディングス株式会社
印刷方法技術 filed 220 joint applications with TOPPANホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 128 cases in total) is 21.3, and the median is 22.0. The coefficient of variation (standard deviation/mean) is 0.26, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2020 with 29 cases, and their lowest number in 2015 with 17 cases.
| Index | Value |
|---|---|
| Average | 21.3 patents |
| Std Dev | 5.5 |
| COV | 0.26 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 20 cases | +11.11 % |
| 2021 year | 18 cases | -37.9 % |
| 2020 year | 29 cases | +16.00 % |
Trends in filing of joint patent applications with 独立行政法人国立印刷局
印刷方法技術 filed 245 joint applications with 独立行政法人国立印刷局 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 124 cases in total) is 20.7, and the median is 20.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 37 cases, and their lowest number in 2021 with 18 cases.
| Index | Value |
|---|---|
| Average | 20.7 patents |
| Std Dev | 8.2 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 31 cases | +72.2 % |
| 2021 year | 18 cases | -5.26 % |
| 2020 year | 19 cases | -9.52 % |
Trends in filing of joint patent applications with ARTIENCE株式会社
印刷方法技術 filed 107 joint applications with ARTIENCE株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 80 cases in total) is 13.3, and the median is 12.0. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2022 with 21 cases, and their lowest number in 2015 with 3 cases.
| Index | Value |
|---|---|
| Average | 13.3 patents |
| Std Dev | 4.1 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 21 cases | +31.2 % |
| 2021 year | 16 cases | +33.3 % |
| 2020 year | 12 cases | +50.0 % |
Trends in filing of joint patent applications with キヤノン株式会社
印刷方法技術 filed 15 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 12 cases in total) is 2.0, and the median is 1.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2022 with 6 cases, and their lowest number in 2020 with 0 cases.
| Index | Value |
|---|---|
| Average | 2.0 patents |
| Std Dev | 2.2 |
| COV | 1.1 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 6 cases | +100 % |
| 2021 year | 3 cases | - |
| 2020 year | 0 cases | - |
Information on important patents (JP)
The following shows JP patents held by 印刷方法技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 印刷方法技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 印刷方法技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 10 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7441356 "水性インキ及び積層体" (Opposition day 2024-08-29) , next is 特許7390776 "缶の製造方法" (Opposition day 2024-05-31) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7441356 | 水性インキ及び積層体 | 2024-08-29 |
| 2 | 特許7390776 | 缶の製造方法 | 2024-05-31 |
| 3 | 特許7372177 | フィルム用グラビア印刷インキ組成物、印刷方法、印刷物及びラミネート積層体 | 2024-04-25 |
| 4 | 特許7258204 | 活性エネルギー線硬化型オフセットインキ、これを用いた印刷物、及び印刷物の製造方法 | 2023-10-14 |
| 5 | 特許7223314 | 化粧材 | 2023-08-10 |
| 6 | 特許7166312 | 缶体製造システム | 2023-04-21 |
| 7 | 特許7118394 | スクリーンマスクの製造方法 | 2023-02-15 |
| 8 | 特許7085942 | 偽造防止構造体、紙葉類、真偽識別装置、真偽識別方法及び紙葉類処理装置 | 2022-12-16 |
| 9 | 特許6904484 | フレキソ印刷版 | 2022-01-14 |
| 10 | 特許6900945 | 印刷物、印刷物の製造方法、画像形成装置及びプログラム | 2022-01-13 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 27 patents Protest from third parties. The average number of Protest is 1.6 times. The most recently Protest patent is 特開2023-031324 "収縮および非収縮ポリマーフィルム用水系インキ" (Protest day 2024-10-01) , next is 特表2023-507147 "隠蔽された磁気ストリップを含む電子ドキュメントを作成する方法、及びその方法により得られる電子ドキュメント" (Protest day 2024-07-04) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-031324 | 収縮および非収縮ポリマーフィルム用水系インキ | 2024-10-01 |
| 2 | 特表2023-507147 | 隠蔽された磁気ストリップを含む電子ドキュメントを作成する方法、及びその方法により得られる電子ドキュメント | 2024-07-04 |
| 3 | 特許7513342 | 裏刷りフィルム用水性フレキソ印刷インキ組成物 | 2024-05-09 |
| 4 | 特許7589450 | 化粧部材の製造方法及び化粧部材 | 2023-11-22 |
| 5 | 特許7505895 | フィルム用グラビア印刷インキ組成物、印刷方法、印刷物及びラミネート積層体 | 2023-11-13 |
| 6 | 特許7463198 | 平版オフセット印刷用活性エネルギー線硬化型インキ及びインキ硬化物の製造方法 | 2023-09-19 |
| 7 | 特許7407159 | 裏刷り用溶剤型グラビア印刷インキ組成物、印刷層、および積層体 | 2023-07-11 |
| 8 | 特許7327702 | 脱離可能な皮膜形成用組成物 | 2023-06-30 |
| 9 | 特許7288859 | 活性エネルギー線硬化型オフセット印刷用インキ組成物、並びにそれを用いた印刷物の製造方法及び印刷物の光沢を向上させる方法 | 2023-03-10 |
| 10 | 特開2021-070718 | 平版オフセット印刷用活性エネルギー線硬化型インキ、インキ硬化物の製造方法及び印刷物 | 2023-01-20 |
| 11 | 特開2022-140489 | 缶の製造方法 | 2022-12-19 |
| 12 | 特許7288753 | 活性エネルギー線硬化型オフセット印刷用インキ組成物、及びそれを用いた印刷物の製造方法 | 2022-12-16 |
| 13 | 特開2021-084313 | 食品用包装袋の印刷方法および食品用包装袋 | 2022-12-07 |
| 14 | 特開2022-066201 | リキッドインキ組成物 | 2022-11-02 |
| 15 | 特許7335614 | スクリーンマスク、スクリーンマスクの製造方法及び印刷物の製造方法 | 2022-10-28 |
| 16 | 特許7454762 | スクリーン印刷装置およびスクリーン印刷方法 | 2022-08-25 |
| 17 | 特許7225636 | 化粧材 | 2022-07-28 |
| 18 | 特許7358244 | 布帛用の樹脂凹版印刷版の製造方法および布帛印刷物の製造方法 | 2022-07-21 |
| 19 | 特開2019-171659 | 容器、容器の製造方法及び印刷装置 | 2022-07-08 |
| 20 | 特許7240678 | 光輝性動画模様 | 2022-06-06 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 67 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.4. The most protest patent is 特開2018-188417 "固体製剤の潜像印刷物及びその撮像方法" (4 times) , and the next most protest patent is 特開2018-188416 "固体製剤の潜像印刷物及びその撮像方法" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2018-188417 | 固体製剤の潜像印刷物及びその撮像方法 | 4 times |
| 2 | 特開2018-188416 | 固体製剤の潜像印刷物及びその撮像方法 | 4 times |
| 3 | 特許7390776 | 缶の製造方法 | 3 times |
| 4 | 特許6915546 | 平版印刷用インキを用いた印刷物の製造方法、および平版印刷用インキセット | 2 times |
| 5 | 特開2021-070718 | 平版オフセット印刷用活性エネルギー線硬化型インキ、インキ硬化物の製造方法及び印刷物 | 2 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 53 patents Inspection from third parties. The average number of Inspection is 1.6 times. The most recently Inspection patent is 特開2022-105619 "反射性流動可能材料によって形成された反射性層を有する導波管" (Inspection day 2024-11-25) , next is 特表2022-530916 "多層フィルムを含む印刷システムおよび方法" (Inspection day 2024-11-08) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-105619 | 反射性流動可能材料によって形成された反射性層を有する導波管 | 2024-11-25 |
| 2 | 特表2022-530916 | 多層フィルムを含む印刷システムおよび方法 | 2024-11-08 |
| 3 | 特開2023-031324 | 収縮および非収縮ポリマーフィルム用水系インキ | 2024-10-30 |
| 4 | 特表2023-507147 | 隠蔽された磁気ストリップを含む電子ドキュメントを作成する方法、及びその方法により得られる電子ドキュメント | 2024-07-10 |
| 5 | 特開2023-008156 | 印刷物封入体および封入物検知方法 | 2024-07-09 |
| 6 | 特許6443814 | グラビアインキ、それを用いた印刷物および積層体 | 2024-06-25 |
| 7 | 特許7513342 | 裏刷りフィルム用水性フレキソ印刷インキ組成物 | 2024-05-31 |
| 8 | 特許7407159 | 裏刷り用溶剤型グラビア印刷インキ組成物、印刷層、および積層体 | 2024-04-15 |
| 9 | 特許6458089 | 裏刷り用溶剤型グラビア印刷インキ組成物の製造方法および積層体の製造方法 | 2024-04-15 |
| 10 | 特許7593118 | 偽造防止媒体 | 2023-12-29 |
| 11 | 特開2022-141165 | 偽造防止媒体 | 2023-12-29 |
| 12 | 特許7589450 | 化粧部材の製造方法及び化粧部材 | 2023-11-27 |
| 13 | 特許7463198 | 平版オフセット印刷用活性エネルギー線硬化型インキ及びインキ硬化物の製造方法 | 2023-09-26 |
| 14 | 特許7600538 | コピー牽制印刷物 | 2023-09-14 |
| 15 | 特許7540165 | レーザー発色性カード | 2023-09-14 |
| 16 | 特許7537179 | 蛍光印刷物 | 2023-07-31 |
| 17 | 特開2022-047777 | 印刷物 | 2023-07-31 |
| 18 | 特開2022-060726 | 認証用印刷物と真贋判定方法 | 2023-07-31 |
| 19 | 特許7567340 | 感熱転写媒体および情報記録体 | 2023-07-31 |
| 20 | 特許7574601 | 金属光沢印刷物 | 2023-07-31 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 103 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.6. The most inspection patent is 特開2018-188417 "固体製剤の潜像印刷物及びその撮像方法" (4 times) , and the next most inspection patent is 特許7305358 "基材をエンボス加工するための方法および装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2018-188417 | 固体製剤の潜像印刷物及びその撮像方法 | 4 times |
| 2 | 特許7305358 | 基材をエンボス加工するための方法および装置 | 4 times |
| 3 | 特許6458089 | 裏刷り用溶剤型グラビア印刷インキ組成物の製造方法および積層体の製造方法 | 4 times |
| 4 | 特許7118394 | スクリーンマスクの製造方法 | 4 times |
| 5 | 特開2018-188416 | 固体製剤の潜像印刷物及びその撮像方法 | 4 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 657 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.3. The most cited patent is 特許6458089 "裏刷り用溶剤型グラビア印刷インキ組成物の製造方法および積層体の製造方法" (50 times) , and the next most cited patent is 特許6632251 "表刷り用グラビア印刷インキ組成物及びそれを印刷した表刷りグラビア印刷物" (19 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6458089 | 裏刷り用溶剤型グラビア印刷インキ組成物の製造方法および積層体の製造方法 | 50 times |
| 2 | 特許6632251 | 表刷り用グラビア印刷インキ組成物及びそれを印刷した表刷りグラビア印刷物 | 19 times |
| 3 | 特許6666265 | セキュリティ要素及びその製造の方法 | 15 times |
| 4 | 特開2020-075943 | インキ組成物、紫外線レーザマーキング用資材、レーザマーキングが施された資材の製造方法、包装物の製造方法、印字用ラベルが付された物品の製造方法およびレーザマーキング方法 | 14 times |
| 5 | 特許6476990 | 印刷版、印刷版の製造方法、機能性素子の製造方法および印刷装置 | 13 times |
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