プラズマ技術技術 (JP Patent Analysis Report)
The Theme Code "プラズマ技術技術" had 88 patent application filings in the most recent period (2023-01-01 to 2023-04-30). This is a significantly decreased of -85 filings (-49.1%) over 173 they had in the same period of the previous year (2022-01-01 to 2022-04-30).
The highest number of filings in 2018 with 702 cases, and their lowest number in 2023 with 145 cases.
The mean of the number of filings over the last 5 years (2019 to 2024, 2,450 cases in total) is 408, and the median is 508. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 408 patents |
| Std Dev | 243 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 145 cases | -70.7 % |
| 2022 year | 495 cases | -5.17 % |
| 2021 year | 522 cases | -11.22 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for プラズマ技術技術[2G084] for the period of the last 10 years (2015-01-01 to 2024-12-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of プラズマ技術技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for プラズマ技術技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
プラズマ技術技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of プラズマ技術技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for プラズマ技術技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in プラズマ技術技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 5,072 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
プラズマ技術技術[2G084]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme プラズマ技術技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 47 cases, followed by ラムリサーチコーポレーション with 1 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 47 cases |
| ラムリサーチコーポレーション | 1 cases |
| 株式会社日立ハイテク | 1 cases |
| 三菱重工業株式会社 | 1 cases |
| キヤノン株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
Comparing the number of applications of each company, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 1,116 cases, followed by アプライドマテリアルズインコーポレイテッド with 336 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 1,116 cases |
| アプライドマテリアルズインコーポレイテッド | 336 cases |
| ラムリサーチコーポレーション | 271 cases |
| 株式会社日立ハイテク | 176 cases |
| 株式会社アルバック | 75 cases |
| 株式会社東芝 | 42 cases |
| 積水化学工業株式会社 | 33 cases |
| キヤノン株式会社 | 21 cases |
| 株式会社日立製作所 | 8 cases |
| 三菱重工業株式会社 | 7 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme プラズマ技術技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 47 cases, followed by ラムリサーチコーポレーション with 1 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 47 cases |
| ラムリサーチコーポレーション | 1 cases |
| 株式会社日立ハイテク | 1 cases |
Trends in filing of joint patent applications for the target period (2015 to 2025).
among the top coapplicants, 東京エレクトロン株式会社 has the highest number of joint applications in the last for the target period (2015 to 2025) with 1,116 cases, followed by アプライドマテリアルズインコーポレイテッド with 336 cases.
| Name | Cases |
|---|---|
| 東京エレクトロン株式会社 | 1,116 cases |
| アプライドマテリアルズインコーポレイテッド | 336 cases |
| ラムリサーチコーポレーション | 271 cases |
| 株式会社日立ハイテク | 176 cases |
| 株式会社東芝 | 42 cases |
| 株式会社日立製作所 | 8 cases |
| パナソニックホールディングス株式会社 | 1 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by プラズマ技術技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by プラズマ技術技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 東京エレクトロン株式会社
プラズマ技術技術 filed 1,116 joint applications with 東京エレクトロン株式会社 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 650 cases in total) is 108, and the median is 128. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 182 cases, and their lowest number in 2023 with 47 cases.
| Index | Value |
|---|---|
| Average | 108 patents |
| Std Dev | 64.5 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 47 cases | -62.4 % |
| 2022 year | 125 cases | -4.58 % |
| 2021 year | 131 cases | -20.61 % |
Trends in filing of joint patent applications with 株式会社日立製作所
プラズマ技術技術 filed 8 joint applications with 株式会社日立製作所 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 8 cases in total) is 1.3, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 1.2, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2020 with 4 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.3 patents |
| Std Dev | 1.6 |
| COV | 1.2 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 3 cases | -25.00 % |
| 2020 year | 4 cases | +300 % |
| 2019 year | 1 cases | - |
Trends in filing of joint patent applications with アプライドマテリアルズインコーポレイテッド
プラズマ技術技術 filed 336 joint applications with アプライドマテリアルズインコーポレイテッド for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 173 cases in total) is 28.8, and the median is 34.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2019 with 61 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 28.8 patents |
| Std Dev | 22.2 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 43 cases | +22.86 % |
| 2021 year | 35 cases | +2.94 % |
| 2020 year | 34 cases | -44.3 % |
Trends in filing of joint patent applications with 株式会社東芝
プラズマ技術技術 filed 42 joint applications with 株式会社東芝 for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 14 cases in total) is 2.3, and the median is 1.5. The coefficient of variation (standard deviation/mean) is 1.1, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 13 cases, and their lowest number in 2023 with 0 cases.
| Index | Value |
|---|---|
| Average | 2.3 patents |
| Std Dev | 2.6 |
| COV | 1.1 |
| Year | Cases | YOY |
|---|---|---|
| 2021 year | 4 cases | +33.3 % |
| 2020 year | 3 cases | -57.1 % |
| 2019 year | 7 cases | +40.0 % |
Trends in filing of joint patent applications with ラムリサーチコーポレーション
プラズマ技術技術 filed 271 joint applications with ラムリサーチコーポレーション for the analysis period (2015 to 2025).
The mean of the number of filings over the last 5 years (2019 to 2024, 145 cases in total) is 24.2, and the median is 31.0. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2021 with 44 cases, and their lowest number in 2023 with 1 cases.
| Index | Value |
|---|---|
| Average | 24.2 patents |
| Std Dev | 17.3 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2023 year | 1 cases | -96.7 % |
| 2022 year | 30 cases | -31.8 % |
| 2021 year | 44 cases | +15.79 % |
Information on important patents (JP)
The following shows JP patents held by プラズマ技術技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and プラズマ技術技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which プラズマ技術技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 3 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7478059 "シリコンのドライエッチング方法" (Opposition day 2024-10-31) , next is 特許7450427 "基板支持器及びプラズマ処理装置" (Opposition day 2024-09-13) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7478059 | シリコンのドライエッチング方法 | 2024-10-31 |
| 2 | 特許7450427 | 基板支持器及びプラズマ処理装置 | 2024-09-13 |
| 3 | 特許6925814 | 樹脂および樹脂の製造方法 | 2022-02-24 |
Protested cases
List of latest Protested patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 8 patents Protest from third parties. The average number of Protest is 1.4 times. The most recently Protest patent is 特開2023-095644 "プラズマ処理装置、およびプラズマ処理装置の製造方法" (Protest day 2024-10-10) , next is 特開2022-094023 "プラズマ処理装置" (Protest day 2024-07-31) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-095644 | プラズマ処理装置、およびプラズマ処理装置の製造方法 | 2024-10-10 |
| 2 | 特開2022-094023 | プラズマ処理装置 | 2024-07-31 |
| 3 | 特開2023-116088 | 金属材料及びプラズマ発生装置 | 2024-07-10 |
| 4 | 特許7563843 | 載置台及び基板処理装置 | 2023-04-20 |
| 5 | 特許7534292 | Ｈｅ孔着火／アーク放電を防止する特徴を有する高出力静電チャック | 2023-02-27 |
| 6 | 特開2021-106077 | 高周波電源装置 | 2022-12-13 |
| 7 | 特許7349516 | 人工曝露のための装置における放射線源としてのプラズマランプ | 2022-09-26 |
| 8 | 特許7403215 | 基板支持体及び基板処理装置 | 2022-07-07 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 16 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許6605868 "コールドスプレー装置およびこれを用いた被膜形成方法" (2 times) , and the next most protest patent is 特許7403215 "基板支持体及び基板処理装置" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6605868 | コールドスプレー装置およびこれを用いた被膜形成方法 | 2 times |
| 2 | 特許7403215 | 基板支持体及び基板処理装置 | 2 times |
| 3 | 特開2022-094023 | プラズマ処理装置 | 2 times |
| 4 | 特許7349516 | 人工曝露のための装置における放射線源としてのプラズマランプ | 2 times |
| 5 | 特許6337354 | 微粒子製造装置及び微粒子製造方法 | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2022-01-01 ~ 2024-12-31), there were 13 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2022-094023 "プラズマ処理装置" (Inspection day 2024-08-08) , next is 特開2023-116088 "金属材料及びプラズマ発生装置" (Inspection day 2024-08-05) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-094023 | プラズマ処理装置 | 2024-08-08 |
| 2 | 特開2023-116088 | 金属材料及びプラズマ発生装置 | 2024-08-05 |
| 3 | 特許7541222 | プラズマ処理装置 | 2024-02-26 |
| 4 | 特開2024-167020 | プラズマ化ガス噴射装置 | 2024-02-26 |
| 5 | 特許7458107 | プラズマ処理装置 | 2023-11-02 |
| 6 | 特許6586259 | ウエハ支持台 | 2023-06-29 |
| 7 | 特許7563843 | 載置台及び基板処理装置 | 2023-04-27 |
| 8 | 特許7536451 | トランス結合容量性同調切り替えを用いたトランス結合プラズマパルス化のためのシステムおよび方法 | 2023-03-14 |
| 9 | 特開2021-106077 | 高周波電源装置 | 2023-01-11 |
| 10 | 特許7349516 | 人工曝露のための装置における放射線源としてのプラズマランプ | 2022-10-19 |
| 11 | 特許7263004 | 高能力での高品質球状粉末の生産のためのプラズマ装置 | 2022-10-03 |
| 12 | 特開2021-130871 | プラズマプルーム用のフィルタ | 2022-08-16 |
| 13 | 特許7403215 | 基板支持体及び基板処理装置 | 2022-07-12 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 43 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.1. The most inspection patent is 特許7263004 "高能力での高品質球状粉末の生産のためのプラズマ装置" (2 times) , and the next most inspection patent is 特許6605868 "コールドスプレー装置およびこれを用いた被膜形成方法" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7263004 | 高能力での高品質球状粉末の生産のためのプラズマ装置 | 2 times |
| 2 | 特許6605868 | コールドスプレー装置およびこれを用いた被膜形成方法 | 2 times |
| 3 | 特許6629748 | 細長い部材の形をした供給材料を噴霧化することによって粉末粒子を生成するための方法及び装置 | 2 times |
| 4 | 特許6579587 | プラズマ処理装置 | 2 times |
| 5 | 特開2022-094023 | プラズマ処理装置 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2015-01-01 to 2024-12-31), 1,277 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.8. The most cited patent is 特許6327295 "ドライエッチング方法" (33 times) , and the next most cited patent is 特許6512962 "プラズマ処理装置" (28 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6327295 | ドライエッチング方法 | 33 times |
| 2 | 特許6512962 | プラズマ処理装置 | 28 times |
| 3 | 特許6539113 | プラズマ処理装置およびプラズマ処理方法 | 26 times |
| 4 | 特許6852974 | エッジに限局されたイオン軌道制御及びプラズマ動作を通じた、最端エッジにおけるシース及びウエハのプロフィール調整 | 24 times |
| 5 | 特許6651375 | プラズマ装置 | 21 times |
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Please note that the various graphs are image data, but we cannot provide them in text data.Scope of coverage for each goal/target
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About the name collation and name control of applicants and right holders
- Company rankings are based on the results calculated by "Patent Integration", with Japanese organizations in Japanese and other companies in English (some are in Japanese).
- Company names may be the names of the companies at the time of application, but the results calculated by Patent Integration are used as is. Company names are used as they were at the time of application.
- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
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