The Theme Code "付属装置、全体制御技術" had 454 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a steady transition of +30 filings (7.1%) over 424 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2016 with 3,239 cases, and their lowest number in 2022 with 1,570 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 11,750 cases in total) is 1,958, and the median is 1,915. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
Index | Value |
---|---|
Average | 1,958 patents |
Std Dev | 707 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 1,570 cases | -9.82 % |
2021 year | 1,741 cases | -16.66 % |
2020 year | 2,089 cases | -22.02 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 付属装置、全体制御技術[2C061] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 付属装置、全体制御技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
The changes in the number of patent filings of 付属装置、全体制御技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 付属装置、全体制御技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
The following is a list of words (characteristic terms) often used in 付属装置、全体制御技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
This patent analysis report was created for a patent search set of 23,960 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
The patent information of the higher applicant in the technical theme 付属装置、全体制御技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 762 cases, followed by ブラザー工業株式会社 with 351 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 762 cases |
ブラザー工業株式会社 | 351 cases |
セイコーエプソン株式会社 | 227 cases |
京セラドキュメントソリューションズ株式会社 | 179 cases |
富士フイルムビジネスイノベーション株式会社 | 160 cases |
株式会社リコー | 158 cases |
コニカミノルタ株式会社 | 144 cases |
シャープ株式会社 | 131 cases |
東芝テック株式会社 | 29 cases |
日本電気株式会社 | 1 cases |
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 5,833 cases, followed by 京セラドキュメントソリューションズ株式会社 with 3,169 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 5,833 cases |
京セラドキュメントソリューションズ株式会社 | 3,169 cases |
コニカミノルタ株式会社 | 2,413 cases |
株式会社リコー | 2,410 cases |
ブラザー工業株式会社 | 2,253 cases |
セイコーエプソン株式会社 | 1,903 cases |
富士フイルムビジネスイノベーション株式会社 | 1,767 cases |
シャープ株式会社 | 918 cases |
東芝テック株式会社 | 393 cases |
日本電気株式会社 | 14 cases |
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
The patent information of the higher applicant in the technical theme 付属装置、全体制御技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 762 cases, followed by ブラザー工業株式会社 with 351 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 762 cases |
ブラザー工業株式会社 | 351 cases |
セイコーエプソン株式会社 | 227 cases |
京セラドキュメントソリューションズ株式会社 | 179 cases |
富士フイルムビジネスイノベーション株式会社 | 160 cases |
株式会社リコー | 158 cases |
コニカミノルタ株式会社 | 144 cases |
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 5,833 cases, followed by 京セラドキュメントソリューションズ株式会社 with 3,169 cases.
Name | Cases |
---|---|
キヤノン株式会社 | 5,833 cases |
京セラドキュメントソリューションズ株式会社 | 3,169 cases |
コニカミノルタ株式会社 | 2,413 cases |
株式会社リコー | 2,410 cases |
ブラザー工業株式会社 | 2,253 cases |
セイコーエプソン株式会社 | 1,903 cases |
富士フイルムビジネスイノベーション株式会社 | 1,767 cases |
Below is a ranking of the number of JP patent applications by 付属装置、全体制御技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 付属装置、全体制御技術’s top 7 coapplicants over the last 20 years.
付属装置、全体制御技術 filed 5,833 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 3,253 cases in total) is 542, and the median is 524. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2018 with 754 cases, and their lowest number in 2021 with 470 cases.
Index | Value |
---|---|
Average | 542 patents |
Std Dev | 166 |
COV | 0.3 |
Year | Cases | YOY |
---|---|---|
2022 year | 497 cases | +5.74 % |
2021 year | 470 cases | -14.86 % |
2020 year | 552 cases | -23.65 % |
付属装置、全体制御技術 filed 2,410 joint applications with 株式会社リコー for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 960 cases in total) is 160, and the median is 160. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 437 cases, and their lowest number in 2022 with 107 cases.
Index | Value |
---|---|
Average | 160 patents |
Std Dev | 74.0 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 107 cases | -8.55 % |
2021 year | 117 cases | -42.4 % |
2020 year | 203 cases | -9.78 % |
付属装置、全体制御技術 filed 1,903 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 860 cases in total) is 143, and the median is 149. The coefficient of variation (standard deviation/mean) is 0.22, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 288 cases, and their lowest number in 2018 with 131 cases.
Index | Value |
---|---|
Average | 143 patents |
Std Dev | 30.9 |
COV | 0.22 |
Year | Cases | YOY |
---|---|---|
2022 year | 143 cases | -14.37 % |
2021 year | 167 cases | +7.74 % |
2020 year | 155 cases | -13.89 % |
付属装置、全体制御技術 filed 3,169 joint applications with 京セラドキュメントソリューションズ株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 1,418 cases in total) is 236, and the median is 232. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 496 cases, and their lowest number in 2022 with 90 cases.
Index | Value |
---|---|
Average | 236 patents |
Std Dev | 128 |
COV | 0.5 |
Year | Cases | YOY |
---|---|---|
2022 year | 90 cases | -55.0 % |
2021 year | 200 cases | -24.53 % |
2020 year | 265 cases | -19.70 % |
付属装置、全体制御技術 filed 1,767 joint applications with 富士フイルムビジネスイノベーション株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 765 cases in total) is 128, and the median is 117. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 358 cases, and their lowest number in 2020 with 109 cases.
Index | Value |
---|---|
Average | 128 patents |
Std Dev | 54.1 |
COV | 0.4 |
Year | Cases | YOY |
---|---|---|
2022 year | 123 cases | +10.81 % |
2021 year | 111 cases | +1.83 % |
2020 year | 109 cases | -39.4 % |
The following shows JP patents held by 付属装置、全体制御技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 付属装置、全体制御技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 付属装置、全体制御技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許6055971 "画像形成装置" (1 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6055971 | 画像形成装置 | 1 times |
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 2 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7156564 "画像検査装置、画像検査システム、画像検査方法および画像検査プログラム" (Opposition day 2023-04-19) , next is 特許7031688 "画像検査システム、画像検査設定方法、および画像検査設定プログラム" (Opposition day 2022-09-08) .
- | No. | Title | Opposition days |
---|---|---|---|
1 | 特許7156564 | 画像検査装置、画像検査システム、画像検査方法および画像検査プログラム | 2023-04-19 |
2 | 特許7031688 | 画像検査システム、画像検査設定方法、および画像検査設定プログラム | 2022-09-08 |
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 6 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2021-078082 "情報処理装置及びその制御方法" (Protest day 2024-07-17) , next is 特許7468077 "印刷装置" (Protest day 2023-09-13) .
- | No. | Title | Protest days |
---|---|---|---|
1 | 特開2021-078082 | 情報処理装置及びその制御方法 | 2024-07-17 |
2 | 特許7468077 | 印刷装置 | 2023-09-13 |
3 | 特許7339654 | ラベル発行装置及びラベル発行予約システム | 2023-06-27 |
4 | 特開2021-091444 | ラベル発行装置 | 2023-05-19 |
5 | 特許7254354 | プリント装置を備えた製袋充填機 | 2022-12-07 |
6 | 特許7201060 | 記録装置 | 2022-01-27 |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 22 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許6639393 "削減された迷光のためにオフセット照明を出射する方法及びシステム" (2 times) , and the next most protest patent is 特許7339654 "ラベル発行装置及びラベル発行予約システム" (2 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6639393 | 削減された迷光のためにオフセット照明を出射する方法及びシステム | 2 times |
2 | 特許7339654 | ラベル発行装置及びラベル発行予約システム | 2 times |
3 | 特開2021-078082 | 情報処理装置及びその制御方法 | 2 times |
4 | 特許7254354 | プリント装置を備えた製袋充填機 | 2 times |
5 | 特許6789715 | 印刷装置 | 1 times |
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 12 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2021-078082 "情報処理装置及びその制御方法" (Inspection day 2024-07-23) , next is 特開2023-046855 "画像形成装置または画像形成装置の制御方法" (Inspection day 2024-04-02) .
- | No. | Title | Inspection days |
---|---|---|---|
1 | 特開2021-078082 | 情報処理装置及びその制御方法 | 2024-07-23 |
2 | 特開2023-046855 | 画像形成装置または画像形成装置の制御方法 | 2024-04-02 |
3 | 特許7468077 | 印刷装置 | 2023-10-13 |
4 | 特許7339654 | ラベル発行装置及びラベル発行予約システム | 2023-07-27 |
5 | 特許7497626 | 熱転写用インクリボン巻体の真偽判定方法 | 2023-07-20 |
6 | 特許7423465 | 多機能デバイスにおけるエネルギー使用を低減するための装置及び方法 | 2023-07-11 |
7 | 特許7416671 | 赤外線ボイドパンタグラフマークを使用した文書セキュリティの検証 | 2023-07-11 |
8 | 特開2021-091444 | ラベル発行装置 | 2023-06-26 |
9 | 特許7254354 | プリント装置を備えた製袋充填機 | 2022-12-15 |
10 | 特許6977680 | 画像検査装置、プログラム、画像検査方法、画像形成システム及び画像形成装置 | 2022-05-24 |
11 | 特許7121575 | 開閉装置 | 2022-04-27 |
12 | 特許7201060 | 記録装置 | 2022-02-10 |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 58 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6971912 "ダイレクトツーオブジェクトプリンタのための物体ホルダ" (2 times) , and the next most inspection patent is 特許6989447 "大印刷ジョブ及び小印刷ジョブの印刷物を分離するための方法及びシステム" (2 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許6971912 | ダイレクトツーオブジェクトプリンタのための物体ホルダ | 2 times |
2 | 特許6989447 | 大印刷ジョブ及び小印刷ジョブの印刷物を分離するための方法及びシステム | 2 times |
3 | 特許7051573 | インクジェットプリントシステム | 2 times |
4 | 特許6061000 | ログデータ保存方法 | 2 times |
5 | 特許6639393 | 削減された迷光のためにオフセット照明を出射する方法及びシステム | 2 times |
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 5,865 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.4. The most cited patent is 特許7336323 "表示制御装置および表示制御方法、プログラム" (58 times) , and the next most cited patent is 特許6819044 "画像記録装置、サーバ装置、および通信システム" (36 times) .
- | No. | Title | |
---|---|---|---|
1 | 特許7336323 | 表示制御装置および表示制御方法、プログラム | 58 times |
2 | 特許6819044 | 画像記録装置、サーバ装置、および通信システム | 36 times |
3 | 特許6631278 | ドライバプログラム、及びドライバプログラムとプリンタとのセット | 35 times |
4 | 特許7176399 | 用紙銘柄管理システム、画像形成装置、用紙銘柄管理方法およびプログラム | 35 times |
5 | 特許6504152 | 印刷装置 | 34 times |
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