4M113 超電導ディバイスとその製造方法技術 Patent Trends
The Theme Code "超電導ディバイスとその製造方法技術" had 52 patent application filings in the publication-lag-adjusted comparison period (2024-01-01 to 2024-10-31). This is a significantly decreased of -15 filings (-22.4%) over 67 they had in the same period of the previous year (2023-01-01 to 2023-10-31).
The highest number of filings in 2021 with 124 cases, and their lowest number in 2024 with 60 cases (years covered: 2021, 2022, 2023, 2024).
The mean of the number of filings over the last 4 years (2021 to 2024, 343 cases in total) is 85.8, and the median is 79.5. The coefficient of variation (standard deviation/mean) is 0.28, and filings have been large fluctuations.
| Index | Value |
|---|---|
| Average | 85.8 patents |
| Std Dev | 23.6 |
| COV | 0.28 |
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025).
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 9 cases | -85.0% |
| 2024 year | 60 cases | -27.71% |
| 2023 year | 83 cases | +9.21% |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 超電導ディバイスとその製造方法技術[4M113] for the period of the last 6 years (2020 to 2025). You can compare the information in this report with the trends in your competitors’ patent filings and technologies.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 超電導ディバイスとその製造方法技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, and their top coapplicants (joint research partners, alliance partners). It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 超電導ディバイスとその製造方法技術
- Search Set (Search Formula/Analysis Patents)
- Recent publications
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
超電導ディバイスとその製造方法技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 超電導ディバイスとその製造方法技術 over the last 6 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
Filing trend data
| Year | Cases |
|---|---|
| 2021 | 124 |
| 2022 | 76 |
| 2023 | 83 |
| 2024 | 60 |
| 2025 | 9 |
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 超電導ディバイスとその製造方法技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 超電導ディバイスとその製造方法技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 352 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
超電導ディバイスとその製造方法技術[4M113]
Recent publications
| Publication No. | Title | Bibliographic info | Theme |
|---|---|---|---|
| 1. JPA2026-142952 | 量子回路装置とその制御方法 | ・Applicant 日本電気株式会社 ・Filing date 2025-02-27 ・Publication date 2026-09-08 | 4M113 |
| 2. JPP7917022 | 量子ビット及び量子演算装置 | ・Applicant 富士通株式会社 ・Filing date 2021-11-26 ・Publication date 2026-09-08 | 4M113 |
| 3. JPA-HYO2026-530308 | 電気特性評価及びレーザアニーリングのための一体型電気及び光学装置 | ・Applicant インターナショナル・ビジネス・マシーンズ・コーポレーション ・Filing date 2024-08-05 ・Publication date 2026-09-08 | 4M113 |
| 4. JPA-HYO2026-530534 | 超伝導回路及びそれを備える信号処理ユニット | ・Applicant セミコンテクノロジーズオーイー ・Filing date 2024-09-06 ・Publication date 2026-09-08 | 4M113, 5J050 |
| 5. JPA2026-138852 | カプラ及び計算機 | ・Applicant 株式会社東芝 ・Filing date 2025-02-19 ・Publication date 2026-08-31 | 4M113 |
| 6. JPP7910623 | 積層構造体、量子ビットデバイス、積層構造体の製造方法及び量子ビットデバイスの製造方法 | ・Applicant 富士通株式会社 ・Filing date 2022-12-12 ・Publication date 2026-08-25 | 4M113 |
| 7. JPP7910669 | 量子デバイス及び量子デバイスの製造方法 | ・Applicant 富士通株式会社 ・Filing date 2023-03-09 ・Publication date 2026-08-25 | 4M113 |
| 8. JPA-HYO2026-527780 | 単一の選択ラインを有するジョセフソンマイクロ波スイッチ | ・Applicant ノースロップグラマンシステムズコーポレーション ・Filing date 2024-07-08 ・Publication date 2026-08-17 | 4M113, 5J050 |
| 9. JPA2026-131237 | 超伝導量子デバイスの製造方法 | ・Applicant 日本電気株式会社 ・Filing date 2025-02-03 ・Publication date 2026-08-14 | 3C081, 4M113 |
| 10. JPA-HYO2026-527537 | 常伝導金属基板を備えた固体冷却装置 | ・Applicant ノースロップグラマンシステムズコーポレーション ・Filing date 2024-07-02 ・Publication date 2026-08-14 | 4M113 |
| 11. JPA-HYO2026-527535 | 格子点接点を備えた固体冷却装置 | ・Applicant ノースロップグラマンシステムズコーポレーション ・Filing date 2024-06-27 ・Publication date 2026-08-14 | 4M113 |
| 12. JPA-HYO2026-527492 | 垂直差動超伝導量子ビットループを備えた集積回路及びその製造方法 | ・Applicant 1372934ビーシーリミテッド ・Filing date 2024-07-23 ・Publication date 2026-08-14 | 4M113 |
| 13. JPA2026-129786 | 位相モードビットアドレス可能な検知レジスタ | ・Applicant ノースロップグラマンシステムズコーポレーション ・Filing date 2023-03-31 ・Publication date 2026-08-12 | 2G132, 4M113, 5B074 |
| 14. JPA-HYO2026-527201 | 連続的な長ジョセフソン接合論理ゲートシステム | ・Applicant ノースロップグラマンシステムズコーポレーション ・Filing date 2024-06-11 ・Publication date 2026-08-12 | 4M113 |
| 15. JPA2026-128543 | 量子デバイス及び量子デバイスの製造方法 | ・Applicant 国立研究開発法人理化学研究所, 富士通株式会社 ・Filing date 2025-01-29 ・Publication date 2026-08-10 | 4M113 |
Same industry / competition company information (JP)
{'ja': '技術テーマ「超電導ディバイスとその製造方法技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 超電導ディバイスとその製造方法技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
Comparing the number of applications of each company, 富士通株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 25 cases, followed by 日本電気株式会社 with 23 cases.
| Name | Cases |
|---|---|
| 富士通株式会社 | 25 cases |
| 日本電気株式会社 | 23 cases |
| ノースロップグラマンシステムズコーポレーション | 15 cases |
| インターナショナル・ビジネス・マシーンズ・コーポレーション | 13 cases |
| アイキューエムクオンタムコンピューターズオーワイジェイ | 3 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
Comparing the number of applications of each company, インターナショナル・ビジネス・マシーンズ・コーポレーション has the highest number of joint applications in the last for the target period (2020 to 2025) with 94 cases, followed by 日本電気株式会社 with 70 cases.
| Name | Cases |
|---|---|
| インターナショナル・ビジネス・マシーンズ・コーポレーション | 94 cases |
| 日本電気株式会社 | 70 cases |
| 富士通株式会社 | 48 cases |
| ノースロップグラマンシステムズコーポレーション | 26 cases |
| マイクロソフトテクノロジーライセンシングエルエルシー | 18 cases |
| アイキューエムクオンタムコンピューターズオーワイジェイ | 16 cases |
Same industry / competition company JP patent filing ranking
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 6 companies in the same industry over the past 6 years.
Ranking data
| Name | Cases |
|---|---|
| インターナショナル・ビジネス・マシーンズ・コーポレーション | 94 |
| 日本電気株式会社 | 70 |
| 富士通株式会社 | 48 |
| ノースロップグラマンシステムズコーポレーション | 26 |
| マイクロソフトテクノロジーライセンシングエルエルシー | 18 |
| アイキューエムクオンタムコンピューターズオーワイジェイ | 16 |
Top company information (JP)
{'ja': '技術テーマ「超電導ディバイスとその製造方法技術」における上位出願人の特許情報を以下に示します。各企業の特許件数を比較することで、過去および現在の各社の技術テーマにおける研究開発状況や、技術テーマにおける各社の位置付けを確認できます。なお、特許は出願から公開までに一年半のタイムラグがあるため、一年半より直近の状況については分析できない点に注意する必要があります。', 'en': "The patent information of the higher applicant in the technical theme 超電導ディバイスとその製造方法技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme. Patents have a time lag of about 18 months from filing to publication."}
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
Trends in filing of joint patent applications in the last 3 years (2023 to 2025).
among the top coapplicants, 富士通株式会社 has the highest number of joint applications in the last in the last 3 years (2023 to 2025) with 25 cases, followed by 日本電気株式会社 with 23 cases.
| Name | Cases |
|---|---|
| 富士通株式会社 | 25 cases |
| 日本電気株式会社 | 23 cases |
| ノースロップグラマンシステムズコーポレーション | 15 cases |
Trends in filing of joint patent applications for the target period (2020 to 2025).
among the top coapplicants, 日本電気株式会社 has the highest number of joint applications in the last for the target period (2020 to 2025) with 70 cases, followed by 富士通株式会社 with 48 cases.
| Name | Cases |
|---|---|
| 日本電気株式会社 | 70 cases |
| 富士通株式会社 | 48 cases |
| ノースロップグラマンシステムズコーポレーション | 26 cases |
Top company JP patent filing ranking
Below is a ranking of the number of JP patent applications by 超電導ディバイスとその製造方法技術’s top 3 coapplicants over the last 6 years.
佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント
Ranking data
| Name | Cases |
|---|---|
| インターナショナル・ビジネス・マシーンズ・コーポレーション | 94 |
| 日本電気株式会社 | 70 |
| 富士通株式会社 | 48 |
Top company, Change in the Number of JP Patents
Below is a patent map showing the changes in the numbers of JP patent filings by 超電導ディバイスとその製造方法技術’s top 3 coapplicants over the last 6 years.
Ranking data
| Name | Cases |
|---|---|
| インターナショナル・ビジネス・マシーンズ・コーポレーション | 94 |
| 日本電気株式会社 | 70 |
| 富士通株式会社 | 48 |
Top company details
Trends in filing of joint patent applications with 富士通株式会社
超電導ディバイスとその製造方法技術 filed 48 joint applications with 富士通株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 45 cases in total) is 9.0, and the median is 7.0. The coefficient of variation (standard deviation/mean) is 0.7, and filings have been large fluctuations.
The number of filings has been decreasing for the publication-lag-adjusted last 3 years (2023 to 2025). The highest number of filings in 2024 with 17 cases, and their lowest number in 2020 with 0 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 9.0 patents |
| Std Dev | 6.5 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 3 cases | -82.4% |
| 2024 year | 17 cases | +240% |
| 2023 year | 5 cases | -68.8% |
Trends in filing of joint patent applications with 日本電気株式会社
超電導ディバイスとその製造方法技術 filed 70 joint applications with 日本電気株式会社 for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 68 cases in total) is 13.6, and the median is 11.0. The coefficient of variation (standard deviation/mean) is 0.5, and filings have been large fluctuations.
The highest number of filings in 2020 with 26 cases, and their lowest number in 2021 with 8 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 13.6 patents |
| Std Dev | 6.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 2 cases | -80.0% |
| 2024 year | 10 cases | -9.09% |
| 2023 year | 11 cases | -15.38% |
Trends in filing of joint patent applications with ノースロップグラマンシステムズコーポレーション
超電導ディバイスとその製造方法技術 filed 26 joint applications with ノースロップグラマンシステムズコーポレーション for the analysis period (2020 to 2025).
The mean of the number of filings over the last 5 years (2020 to 2024, 26 cases in total) is 5.2, and the median is 4.0. The coefficient of variation (standard deviation/mean) is 0.7, and filings have been large fluctuations.
Because some years show zero filings in the collected data, strong trend claims are avoided; see the yearly table. The highest number of filings in 2023 with 11 cases, and their lowest number in 2021 with 1 cases (years covered: 2020, 2021, 2022, 2023, 2024).
| Index | Value |
|---|---|
| Average | 5.2 patents |
| Std Dev | 3.8 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2025 year | 0 cases | -100% |
| 2024 year | 4 cases | -63.6% |
| 2023 year | 11 cases | +450% |
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佐藤総合特許事務所 代表弁理士
佐藤 寿のコメント