レンズ以外の光学要素技術 (JP Patent Analysis Report)
The Theme Code "レンズ以外の光学要素技術" had 78 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -34 filings (-30.4%) over 112 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2016 with 998 cases, and their lowest number in 2022 with 381 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,972 cases in total) is 495, and the median is 488. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 495 patents |
| Std Dev | 207 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 381 cases | -14.96 % |
| 2021 year | 448 cases | -15.15 % |
| 2020 year | 528 cases | -19.39 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for レンズ以外の光学要素技術[2H042] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of レンズ以外の光学要素技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for レンズ以外の光学要素技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
レンズ以外の光学要素技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of レンズ以外の光学要素技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for レンズ以外の光学要素技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in レンズ以外の光学要素技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 6,709 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
レンズ以外の光学要素技術[2H042]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme レンズ以外の光学要素技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 日東電工株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 51 cases, followed by 大日本印刷株式会社 with 37 cases.
| Name | Cases |
|---|---|
| 日東電工株式会社 | 51 cases |
| 大日本印刷株式会社 | 37 cases |
| TOPPANホールディングス株式会社 | 20 cases |
| キヤノン株式会社 | 19 cases |
| セイコーエプソン株式会社 | 12 cases |
| 住友化学株式会社 | 12 cases |
| スリーエムイノベイティブプロパティズカンパニー | 8 cases |
| 富士フイルム株式会社 | 3 cases |
| 株式会社ニコン | 1 cases |
| ソニーグループ株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 730 cases, followed by スリーエムイノベイティブプロパティズカンパニー with 242 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 730 cases |
| スリーエムイノベイティブプロパティズカンパニー | 242 cases |
| キヤノン株式会社 | 209 cases |
| 富士フイルム株式会社 | 163 cases |
| 日東電工株式会社 | 160 cases |
| TOPPANホールディングス株式会社 | 120 cases |
| セイコーエプソン株式会社 | 109 cases |
| シャープ株式会社 | 77 cases |
| 住友化学株式会社 | 59 cases |
| ソニーグループ株式会社 | 41 cases |
| 株式会社ニコン | 30 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme レンズ以外の光学要素技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 大日本印刷株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 37 cases, followed by TOPPANホールディングス株式会社 with 20 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 37 cases |
| TOPPANホールディングス株式会社 | 20 cases |
| キヤノン株式会社 | 19 cases |
| セイコーエプソン株式会社 | 12 cases |
| スリーエムイノベイティブプロパティズカンパニー | 8 cases |
| 富士フイルム株式会社 | 3 cases |
| 株式会社ニコン | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 730 cases, followed by スリーエムイノベイティブプロパティズカンパニー with 242 cases.
| Name | Cases |
|---|---|
| 大日本印刷株式会社 | 730 cases |
| スリーエムイノベイティブプロパティズカンパニー | 242 cases |
| キヤノン株式会社 | 209 cases |
| 富士フイルム株式会社 | 163 cases |
| TOPPANホールディングス株式会社 | 120 cases |
| セイコーエプソン株式会社 | 109 cases |
| 株式会社ニコン | 30 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by レンズ以外の光学要素技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by レンズ以外の光学要素技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 大日本印刷株式会社
レンズ以外の光学要素技術 filed 730 joint applications with 大日本印刷株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 209 cases in total) is 34.8, and the median is 42.5. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 149 cases, and their lowest number in 2022 with 21 cases.
| Index | Value |
|---|---|
| Average | 34.8 patents |
| Std Dev | 11.7 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 21 cases | -51.2 % |
| 2021 year | 43 cases | +2.38 % |
| 2020 year | 42 cases | -2.33 % |
Trends in filing of joint patent applications with キヤノン株式会社
レンズ以外の光学要素技術 filed 209 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 108 cases in total) is 18.0, and the median is 20.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 40 cases, and their lowest number in 2017 with 15 cases.
| Index | Value |
|---|---|
| Average | 18.0 patents |
| Std Dev | 7.6 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 17 cases | -26.09 % |
| 2021 year | 23 cases | +15.00 % |
| 2020 year | 20 cases | -20.00 % |
Trends in filing of joint patent applications with TOPPANホールディングス株式会社
レンズ以外の光学要素技術 filed 120 joint applications with TOPPANホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 69 cases in total) is 11.5, and the median is 13.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 18 cases, and their lowest number in 2019 with 6 cases.
| Index | Value |
|---|---|
| Average | 11.5 patents |
| Std Dev | 5.9 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 18 cases | +63.6 % |
| 2021 year | 11 cases | -26.67 % |
| 2020 year | 15 cases | +150 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
レンズ以外の光学要素技術 filed 109 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 46 cases in total) is 7.7, and the median is 7.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2017 with 19 cases, and their lowest number in 2019 with 6 cases.
| Index | Value |
|---|---|
| Average | 7.7 patents |
| Std Dev | 3.8 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 11 cases | +57.1 % |
| 2021 year | 7 cases | -12.50 % |
| 2020 year | 8 cases | +33.3 % |
Trends in filing of joint patent applications with 富士フイルム株式会社
レンズ以外の光学要素技術 filed 163 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 64 cases in total) is 10.7, and the median is 11.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 32 cases, and their lowest number in 2022 with 1 cases.
| Index | Value |
|---|---|
| Average | 10.7 patents |
| Std Dev | 7.8 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | -92.9 % |
| 2021 year | 14 cases | +40.0 % |
| 2020 year | 10 cases | -23.08 % |
Information on important patents (JP)
The following shows JP patents held by レンズ以外の光学要素技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and レンズ以外の光学要素技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which レンズ以外の光学要素技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Invalidationed Trial cases
List of latest Invalidationed Trial patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 1 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 2.0 times. The most recently Invalidation Trial patent is 特許6440319 "図柄表示媒体" (Invalidation Trial day 2022-02-24) .
| - | No. | Title | Invalidation Trial days |
|---|---|---|---|
| 1 | 特許6440319 | 図柄表示媒体 | 2022-02-24 |
Top Patents/Patent Applications with the Highest Number of Invalidationed Trial
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 2.0. The most invalidation trial patent is 特許6440319 "図柄表示媒体" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6440319 | 図柄表示媒体 | 2 times |
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 18 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7442366 "放射冷却装置及び冷却方法" (Opposition day 2024-09-03) , next is 特許7349634 "照明装置" (Opposition day 2024-03-25) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7442366 | 放射冷却装置及び冷却方法 | 2024-09-03 |
| 2 | 特許7349634 | 照明装置 | 2024-03-25 |
| 3 | 特許7363968 | 黒色顔料分散体、黒色塗膜形成組成物、および塗工物 | 2024-03-14 |
| 4 | 特許7331830 | 光学フィルム、光学バリアフィルム、及びバックライトユニット | 2024-02-22 |
| 5 | 特許7293549 | 高ヘイズアンチグレアフィルムおよび高ヘイズアンチグレア反射防止フィルム | 2023-12-20 |
| 6 | 特許7293550 | 高ヘイズアンチグレアフィルムおよび高ヘイズアンチグレア反射防止フィルム | 2023-12-20 |
| 7 | 特許7225137 | 防眩フィルム | 2023-08-15 |
| 8 | 特許7225294 | 光学積層体及び表示装置 | 2023-07-14 |
| 9 | 特許7152129 | 偏光板及びこれを含む液晶表示装置 | 2023-04-10 |
| 10 | 特許7149630 | 樹脂リム一体型金属眼鏡フレーム | 2023-04-04 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 15 patents Protest from third parties. The average number of Protest is 1.9 times. The most recently Protest patent is 特表2020-522752 "多層光学フィルム及び薄い接着剤層を含む光学体" (Protest day 2024-10-21) , next is 特開2023-169188 "防眩フィルム並びにその製造方法及び用途" (Protest day 2024-10-17) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特表2020-522752 | 多層光学フィルム及び薄い接着剤層を含む光学体 | 2024-10-21 |
| 2 | 特開2023-169188 | 防眩フィルム並びにその製造方法及び用途 | 2024-10-17 |
| 3 | 特開2022-109436 | 光学フィルム巻回体、光学フィルム、光学部材、画像表示装置、光学フィルム巻回体の製造方法及び光学フィルム巻回体の品質検査方法 | 2024-07-24 |
| 4 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-05-27 |
| 5 | 特許7480618 | 積層体の製造方法 | 2024-02-26 |
| 6 | 特許7499102 | 防眩フィルム | 2022-06-29 |
| 7 | 特許7499103 | 防眩フィルム | 2022-06-29 |
| 8 | 特許7499101 | 防眩フィルム | 2022-06-29 |
| 9 | 特許7500322 | 防眩フィルム | 2022-06-29 |
| 10 | 特許7225294 | 光学積層体及び表示装置 | 2022-05-18 |
| 11 | 特許7087368 | 空中像表示装置 | 2022-03-04 |
| 12 | 特許7184510 | 調光フィルム用光透過性導電フィルム及び調光フィルム | 2022-02-16 |
| 13 | 特許7057487 | 光学装置および光学部材 | 2022-02-07 |
| 14 | 特許7129181 | ヘッドマウントディスプレイ用部材 | 2021-12-15 |
| 15 | 特許7011017 | 着色感光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、および、硬化膜の製造方法 | 2021-12-14 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 57 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.5. The most protest patent is 特開2017-016150 "アクリル系樹脂粒子、塗料組成物及び光学材料" (4 times) , and the next most protest patent is 特許6185537 "白色反射フィルムの製造方法" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2017-016150 | アクリル系樹脂粒子、塗料組成物及び光学材料 | 4 times |
| 2 | 特許6185537 | 白色反射フィルムの製造方法 | 4 times |
| 3 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 4 times |
| 4 | 特許6895443 | 光学カモフラージュフィルター | 3 times |
| 5 | 特許7057487 | 光学装置および光学部材 | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 35 patents Inspection from third parties. The average number of Inspection is 1.7 times. The most recently Inspection patent is 特開2022-105619 "反射性流動可能材料によって形成された反射性層を有する導波管" (Inspection day 2024-11-25) , next is 特開2023-108836 "硬化膜及び積層体、並びにこれらの製造方法" (Inspection day 2024-11-19) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2022-105619 | 反射性流動可能材料によって形成された反射性層を有する導波管 | 2024-11-25 |
| 2 | 特開2023-108836 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-11-19 |
| 3 | 特表2024-539528 | 凹多角形開口コーナーキューブプリズムおよびその方法 | 2024-10-25 |
| 4 | 特表2020-522752 | 多層光学フィルム及び薄い接着剤層を含む光学体 | 2024-10-22 |
| 5 | 特許7503408 | 放射冷却装置及び冷却方法 | 2024-08-29 |
| 6 | 特許7442366 | 放射冷却装置及び冷却方法 | 2024-08-29 |
| 7 | 特開2022-100691 | 硬化性組成物、偏光子保護フィルム及び偏光板 | 2024-08-07 |
| 8 | 特開2023-169188 | 防眩フィルム並びにその製造方法及び用途 | 2024-06-28 |
| 9 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 2024-06-10 |
| 10 | 特許7480618 | 積層体の製造方法 | 2024-03-08 |
| 11 | 特開2019-124930 | 透過材料照射 | 2024-03-06 |
| 12 | 特許7491172 | 金属遮光板 | 2023-07-31 |
| 13 | 特許7567423 | 金属遮光板の多面付形成体 | 2023-07-31 |
| 14 | 特許7559475 | 金属遮光板 | 2023-07-31 |
| 15 | 特許7516948 | 偽造防止媒体 | 2023-07-20 |
| 16 | 特許6721794 | 防眩フィルム | 2023-04-28 |
| 17 | 特許7338001 | 面光源装置および表示装置 | 2023-04-05 |
| 18 | 特許7182608 | 制御されたバックライト配光を行うハイブリッドレンズ | 2022-12-05 |
| 19 | 特許7500425 | 光学系 | 2022-11-01 |
| 20 | 特表2019-534478 | 走査反射器を用いた広い視野の表示のための方法およびシステム | 2022-10-27 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 126 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特開2017-016150 "アクリル系樹脂粒子、塗料組成物及び光学材料" (6 times) , and the next most inspection patent is 特開2022-025619 "硬化膜及び積層体、並びにこれらの製造方法" (5 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特開2017-016150 | アクリル系樹脂粒子、塗料組成物及び光学材料 | 6 times |
| 2 | 特開2022-025619 | 硬化膜及び積層体、並びにこれらの製造方法 | 5 times |
| 3 | 特許6895443 | 光学カモフラージュフィルター | 4 times |
| 4 | 特許6185537 | 白色反射フィルムの製造方法 | 4 times |
| 5 | 特開2016-069621 | 重合体粒子及びその用途 | 4 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 1,593 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.9. The most cited patent is 特許6734933 "構造化光投影のためのホログラフィック導波管装置" (65 times) , and the next most cited patent is 特許7152129 "偏光板及びこれを含む液晶表示装置" (31 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6734933 | 構造化光投影のためのホログラフィック導波管装置 | 65 times |
| 2 | 特許7152129 | 偏光板及びこれを含む液晶表示装置 | 31 times |
| 3 | 特許7115474 | 光学構造体 | 30 times |
| 4 | 特許6825198 | 防眩性光学積層体及び画像表示装置 | 29 times |
| 5 | 特許6774806 | 粘着シート | 28 times |
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