光学的手段による材料の調査、分析技術 (JP Patent Analysis Report)
The Theme Code "光学的手段による材料の調査、分析技術" had 152 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -65 filings (-30.0%) over 217 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2015 with 1,283 cases, and their lowest number in 2022 with 683 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 5,042 cases in total) is 840, and the median is 868. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 840 patents |
| Std Dev | 315 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 683 cases | -17.01 % |
| 2021 year | 823 cases | -9.76 % |
| 2020 year | 912 cases | -24.57 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 光学的手段による材料の調査、分析技術[2G059] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 光学的手段による材料の調査、分析技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 光学的手段による材料の調査、分析技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
光学的手段による材料の調査、分析技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 光学的手段による材料の調査、分析技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 光学的手段による材料の調査、分析技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 光学的手段による材料の調査、分析技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,082 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
光学的手段による材料の調査、分析技術[2G059]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 光学的手段による材料の調査、分析技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 25 cases, followed by 株式会社東芝 with 25 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 25 cases |
| 株式会社東芝 | 25 cases |
| 横河電機株式会社 | 20 cases |
| 株式会社島津製作所 | 14 cases |
| 株式会社日立製作所 | 12 cases |
| 株式会社堀場製作所 | 5 cases |
| 富士フイルム株式会社 | 4 cases |
| 株式会社リコー | 3 cases |
| 日本電信電話株式会社 | 2 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 416 cases, followed by 株式会社島津製作所 with 211 cases.
| Name | Cases |
|---|---|
| キヤノン株式会社 | 416 cases |
| 株式会社島津製作所 | 211 cases |
| 株式会社東芝 | 133 cases |
| 株式会社リコー | 131 cases |
| 横河電機株式会社 | 95 cases |
| 株式会社堀場製作所 | 93 cases |
| 日本電信電話株式会社 | 93 cases |
| 富士フイルム株式会社 | 87 cases |
| 株式会社日立製作所 | 72 cases |
| オリンパス株式会社 | 60 cases |
| パナソニックホールディングス株式会社 | 15 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 光学的手段による材料の調査、分析技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 25 cases, followed by 株式会社東芝 with 25 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 416 cases, followed by 株式会社島津製作所 with 211 cases.
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 光学的手段による材料の調査、分析技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 光学的手段による材料の調査、分析技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社島津製作所
光学的手段による材料の調査、分析技術 filed 211 joint applications with 株式会社島津製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 101 cases in total) is 16.8, and the median is 15.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2019 with 37 cases, and their lowest number in 2022 with 10 cases.
| Index | Value |
|---|---|
| Average | 16.8 patents |
| Std Dev | 10.3 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 10 cases | -41.2 % |
| 2021 year | 17 cases | +21.43 % |
| 2020 year | 14 cases | -62.2 % |
Trends in filing of joint patent applications with キヤノン株式会社
光学的手段による材料の調査、分析技術 filed 416 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 159 cases in total) is 26.5, and the median is 26.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 91 cases, and their lowest number in 2018 with 15 cases.
| Index | Value |
|---|---|
| Average | 26.5 patents |
| Std Dev | 15.6 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 21 cases | -32.3 % |
| 2021 year | 31 cases | -11.43 % |
| 2020 year | 35 cases | -34.0 % |
Trends in filing of joint patent applications with 株式会社日立製作所
光学的手段による材料の調査、分析技術 filed 72 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 43 cases in total) is 7.2, and the median is 9.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 10 cases, and their lowest number in 2020 with 3 cases.
| Index | Value |
|---|---|
| Average | 7.2 patents |
| Std Dev | 3.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 10 cases | +25.00 % |
| 2021 year | 8 cases | +167 % |
| 2020 year | 3 cases | -70.0 % |
Trends in filing of joint patent applications with 富士フイルム株式会社
光学的手段による材料の調査、分析技術 filed 87 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 39 cases in total) is 6.5, and the median is 6.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 20 cases, and their lowest number in 2022 with 3 cases.
| Index | Value |
|---|---|
| Average | 6.5 patents |
| Std Dev | 4.0 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 3 cases | -50.0 % |
| 2021 year | 6 cases | 0 |
| 2020 year | 6 cases | -40.0 % |
Trends in filing of joint patent applications with 株式会社堀場製作所
光学的手段による材料の調査、分析技術 filed 93 joint applications with 株式会社堀場製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 52 cases in total) is 8.7, and the median is 6.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2019 with 19 cases, and their lowest number in 2021 with 4 cases.
| Index | Value |
|---|---|
| Average | 8.7 patents |
| Std Dev | 6.7 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 5 cases | +25.00 % |
| 2021 year | 4 cases | -50.0 % |
| 2020 year | 8 cases | -57.9 % |
Information on important patents (JP)
The following shows JP patents held by 光学的手段による材料の調査、分析技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 光学的手段による材料の調査、分析技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 光学的手段による材料の調査、分析技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 4 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7297204 "毛髪観察方法及び位相差顕微鏡システム" (Opposition day 2023-12-21) , next is 特許7185166 "品質判定装置" (Opposition day 2023-05-31) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7297204 | 毛髪観察方法及び位相差顕微鏡システム | 2023-12-21 |
| 2 | 特許7185166 | 品質判定装置 | 2023-05-31 |
| 3 | 特許7136209 | クロマトグラフィー用検出器 | 2023-03-10 |
| 4 | 特許7065755 | 物品検査装置 | 2022-10-12 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 37 patents Protest from third parties. The average number of Protest is 1.1 times. The most recently Protest patent is 特開2023-090208 "ラマン顕微鏡" (Protest day 2024-10-25) , next is 特開2023-090228 "ラマン顕微鏡" (Protest day 2024-10-25) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-090208 | ラマン顕微鏡 | 2024-10-25 |
| 2 | 特開2023-090228 | ラマン顕微鏡 | 2024-10-25 |
| 3 | 特開2023-142392 | 含水率計測装置及び含水率計測方法 | 2024-09-03 |
| 4 | 特許7602219 | 色調検査装置 | 2024-01-29 |
| 5 | 特開2023-125301 | 粒子の質量の非接触測定方法及び装置 | 2023-12-08 |
| 6 | 特開2022-099480 | 卵分類システム | 2023-11-27 |
| 7 | 特開2023-137889 | 穀物成分センサ及び穀物成分分析装置 | 2023-11-17 |
| 8 | 特開2023-143024 | 食品についての検査システム及び検査方法 | 2023-11-15 |
| 9 | 特開2023-018796 | 物品検査装置 | 2023-11-15 |
| 10 | 特開2021-187869 | ポリエステルフィルム、ポリエステルフィルムの製造方法、ポリエステルペレット、およびポリエステルペレットの製造方法 | 2023-11-09 |
| 11 | 特開2023-007457 | 葉緑素量学習推定システム、葉緑素量推定用モデル生成システム、葉緑素量推定システム、葉緑素量推定方法、およびコンピュータプログラム | 2023-11-08 |
| 12 | 特開2023-137890 | 粒状物成分測定方法及び粒状物成分測定装置 | 2023-10-20 |
| 13 | 特許7473331 | 評価方法及び製造方法 | 2023-10-06 |
| 14 | 特許7509544 | 皮膚への外的ダメージに対する防御効果の評価方法 | 2023-09-27 |
| 15 | 特開2023-114058 | 米含有タンパク質の定量方法 | 2023-09-08 |
| 16 | 特許7535031 | 近赤外光を用いた植物葉撮像装置、植物葉特定成分比率推定システム、植物葉特定成分推定方法及びプログラム | 2023-08-03 |
| 17 | 特許7443135 | 情報処理装置およびデータベース生成方法 | 2023-07-19 |
| 18 | 特許7497550 | 米の成分測定装置、コンバイン、及び米の成分測定方法 | 2023-06-30 |
| 19 | 特開2021-043188 | 測定システム及び遠心機 | 2023-05-26 |
| 20 | 特開2022-175745 | 物品検査装置 | 2023-04-10 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 87 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許6073406 "掃引信号源光学コヒーレンスドメイン反射率測定用の装置" (5 times) , and the next most protest patent is 特許6871673 "血液検体を判定するための方法、装置及びコンピュータプログラム、並びに血液検体分析装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6073406 | 掃引信号源光学コヒーレンスドメイン反射率測定用の装置 | 5 times |
| 2 | 特許6871673 | 血液検体を判定するための方法、装置及びコンピュータプログラム、並びに血液検体分析装置 | 4 times |
| 3 | 特許6705433 | 検知装置 | 2 times |
| 4 | 特許7127666 | 光コヒーレンストモグラフィ装置、および光コヒーレンストモグラフィ演算プログラム | 2 times |
| 5 | 特許6969164 | 評価装置、評価プログラム及び評価方法 | 2 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 52 patents Inspection from third parties. The average number of Inspection is 1.1 times. The most recently Inspection patent is 特開2023-090208 "ラマン顕微鏡" (Inspection day 2024-10-30) , next is 特開2023-090228 "ラマン顕微鏡" (Inspection day 2024-10-30) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2023-090208 | ラマン顕微鏡 | 2024-10-30 |
| 2 | 特開2023-090228 | ラマン顕微鏡 | 2024-10-30 |
| 3 | 特開2024-116129 | 細胞選別装置及び方法 | 2024-10-07 |
| 4 | 特開2024-025380 | 試験装置および試験方法 | 2024-06-14 |
| 5 | 特開2021-056137 | 皮膚の状態の推定装置 | 2024-02-21 |
| 6 | 特開2022-099480 | 卵分類システム | 2023-11-29 |
| 7 | 特開2023-137889 | 穀物成分センサ及び穀物成分分析装置 | 2023-11-27 |
| 8 | 特開2023-137890 | 粒状物成分測定方法及び粒状物成分測定装置 | 2023-11-27 |
| 9 | 特開2023-143024 | 食品についての検査システム及び検査方法 | 2023-11-24 |
| 10 | 特開2023-007457 | 葉緑素量学習推定システム、葉緑素量推定用モデル生成システム、葉緑素量推定システム、葉緑素量推定方法、およびコンピュータプログラム | 2023-11-14 |
| 11 | 特許7576827 | 非晶質炭素膜の細胞凝集機能を判定する検査方法。 | 2023-10-24 |
| 12 | 特許7509544 | 皮膚への外的ダメージに対する防御効果の評価方法 | 2023-10-06 |
| 13 | 特開2023-114058 | 米含有タンパク質の定量方法 | 2023-09-13 |
| 14 | 特許7394126 | ｉｎ ｖｉｖｏ全視野干渉顕微鏡を用いたイメージング方法およびシステム | 2023-08-25 |
| 15 | 特許7497550 | 米の成分測定装置、コンバイン、及び米の成分測定方法 | 2023-08-18 |
| 16 | 特許7587282 | 方法、プログラム及び情報処理装置 | 2023-08-16 |
| 17 | 特許7535031 | 近赤外光を用いた植物葉撮像装置、植物葉特定成分比率推定システム、植物葉特定成分推定方法及びプログラム | 2023-08-09 |
| 18 | 特許7443135 | 情報処理装置およびデータベース生成方法 | 2023-08-08 |
| 19 | 特許7579561 | 光学測定装置 | 2023-08-03 |
| 20 | 特許7577299 | 撮像装置および光デバイス | 2023-08-03 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 153 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6073406 "掃引信号源光学コヒーレンスドメイン反射率測定用の装置" (5 times) , and the next most inspection patent is 特許6705433 "検知装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6073406 | 掃引信号源光学コヒーレンスドメイン反射率測定用の装置 | 5 times |
| 2 | 特許6705433 | 検知装置 | 4 times |
| 3 | 特許7440877 | 卵分類装置、卵分類方法及びコンピュータプログラム | 4 times |
| 4 | 特許7127666 | 光コヒーレンストモグラフィ装置、および光コヒーレンストモグラフィ演算プログラム | 2 times |
| 5 | 特許6826496 | 光干渉ユニットおよび光干渉測定装置 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 2,234 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.6. The most cited patent is 特許7075787 "トラフィカビリティ推定装置およびプログラム" (48 times) , and the next most cited patent is 特許6507615 "光コヒーレンストモグラフィ装置、及びプログラム" (30 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許7075787 | トラフィカビリティ推定装置およびプログラム | 48 times |
| 2 | 特許6507615 | 光コヒーレンストモグラフィ装置、及びプログラム | 30 times |
| 3 | 特許7281285 | 濃度制御装置、及び、ゼロ点調整方法、濃度制御装置用プログラム | 30 times |
| 4 | 特許6786099 | 濃度測定装置 | 23 times |
| 5 | 特許6078928 | 偏光画像処理装置 | 22 times |
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