光学的手段による材料の調査の特殊な応用技術 (JP Patent Analysis Report)
The Theme Code "光学的手段による材料の調査の特殊な応用技術" had 177 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a slightly decreased of -1 filings (-0.6%) over 178 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2018 with 863 cases, and their lowest number in 2022 with 689 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,306 cases in total) is 718, and the median is 784. The coefficient of variation (standard deviation/mean) is 0.26, and there have been small fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 718 patents |
| Std Dev | 185 |
| COV | 0.26 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 689 cases | -10.98 % |
| 2021 year | 774 cases | -2.40 % |
| 2020 year | 793 cases | -8.00 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 光学的手段による材料の調査の特殊な応用技術[2G051] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 光学的手段による材料の調査の特殊な応用技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 光学的手段による材料の調査の特殊な応用技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
光学的手段による材料の調査の特殊な応用技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 光学的手段による材料の調査の特殊な応用技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 光学的手段による材料の調査の特殊な応用技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 光学的手段による材料の調査の特殊な応用技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 7,625 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
光学的手段による材料の調査の特殊な応用技術[2G051]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 光学的手段による材料の調査の特殊な応用技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 67 cases, followed by オムロン株式会社 with 25 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 275 cases, followed by オムロン株式会社 with 143 cases.
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 光学的手段による材料の調査の特殊な応用技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 株式会社東芝 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 22 cases, followed by 株式会社日立製作所 with 6 cases.
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 大日本印刷株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 116 cases, followed by 株式会社東芝 with 108 cases.
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 光学的手段による材料の調査の特殊な応用技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 光学的手段による材料の調査の特殊な応用技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社東芝
光学的手段による材料の調査の特殊な応用技術 filed 108 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 65 cases in total) is 10.8, and the median is 9.5. The coefficient of variation (standard deviation/mean) is 0.28, and there have been small fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2021 with 16 cases, and their lowest number in 2017 with 7 cases.
| Index | Value |
|---|---|
| Average | 10.8 patents |
| Std Dev | 3.1 |
| COV | 0.28 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 14 cases | -12.50 % |
| 2021 year | 16 cases | +77.8 % |
| 2020 year | 9 cases | +12.50 % |
Trends in filing of joint patent applications with 株式会社日立製作所
光学的手段による材料の調査の特殊な応用技術 filed 35 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 14 cases in total) is 2.3, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been increasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 7 cases, and their lowest number in 2020 with 1 cases.
| Index | Value |
|---|---|
| Average | 2.3 patents |
| Std Dev | 1.2 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 4 cases | +100 % |
| 2021 year | 2 cases | +100 % |
| 2020 year | 1 cases | -75.0 % |
Trends in filing of joint patent applications with 富士通株式会社
光学的手段による材料の調査の特殊な応用技術 filed 45 joint applications with 富士通株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 18 cases in total) is 3.0, and the median is 3.0. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 15 cases, and their lowest number in 2022 with 1 cases.
| Index | Value |
|---|---|
| Average | 3.0 patents |
| Std Dev | 2.4 |
| COV | 0.8 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | 0 |
| 2021 year | 1 cases | -80.0 % |
| 2020 year | 5 cases | 0 |
Trends in filing of joint patent applications with 株式会社日立ハイテク
光学的手段による材料の調査の特殊な応用技術 filed 42 joint applications with 株式会社日立ハイテク for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 14 cases in total) is 2.3, and the median is 2.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 22 cases, and their lowest number in 2017 with 0 cases.
| Index | Value |
|---|---|
| Average | 2.3 patents |
| Std Dev | 1.4 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 2 cases | -33.3 % |
| 2021 year | 3 cases | +200 % |
| 2020 year | 1 cases | 0 |
Trends in filing of joint patent applications with 株式会社ニコン
光学的手段による材料の調査の特殊な応用技術 filed 13 joint applications with 株式会社ニコン for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 6 cases in total) is 1.0, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 1.0, and there have been relatively large fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2017 with 4 cases, and their lowest number in 2021 with 0 cases.
| Index | Value |
|---|---|
| Average | 1.0 patents |
| Std Dev | 1.0 |
| COV | 1.0 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 1 cases | - |
| 2021 year | 0 cases | -100 % |
| 2020 year | 1 cases | -66.7 % |
Information on important patents (JP)
The following shows JP patents held by 光学的手段による材料の調査の特殊な応用技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 光学的手段による材料の調査の特殊な応用技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 光学的手段による材料の調査の特殊な応用技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 7 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7393313 "欠陥分類装置、欠陥分類方法及びプログラム" (Opposition day 2024-06-04) , next is 特許7312448 "目視支援装置" (Opposition day 2023-12-26) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7393313 | 欠陥分類装置、欠陥分類方法及びプログラム | 2024-06-04 |
| 2 | 特許7312448 | 目視支援装置 | 2023-12-26 |
| 3 | 特許7217570 | 情報処理システム及びプログラム、情報処理方法、サーバ | 2023-08-03 |
| 4 | 特許7156564 | 画像検査装置、画像検査システム、画像検査方法および画像検査プログラム | 2023-04-19 |
| 5 | 特許7065755 | 物品検査装置 | 2022-10-12 |
| 6 | 特許7029343 | 異物検出装置および異物検出方法 | 2022-09-05 |
| 7 | 特許6940215 | 検査装置及び検査装置の識別手段の学習方法 | 2022-02-14 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 58 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2022-108063 "粒状体検査装置" (Protest day 2024-10-30) , next is 特許7595547 "検査装置" (Protest day 2024-10-10) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2022-108063 | 粒状体検査装置 | 2024-10-30 |
| 2 | 特許7595547 | 検査装置 | 2024-10-10 |
| 3 | 特開2022-111395 | 物品検査装置 | 2024-07-31 |
| 4 | 特開2022-073649 | 判定装置、判定方法、プログラム及び回収装置 | 2024-07-30 |
| 5 | 特開2024-063953 | 識別装置、選別装置、及び識別方法 | 2024-07-29 |
| 6 | 特開2021-078082 | 情報処理装置及びその制御方法 | 2024-07-17 |
| 7 | 特開2023-184321 | 段ボールシートの欠陥検出方法 | 2024-07-16 |
| 8 | 特許7601327 | 検査装置 | 2024-04-12 |
| 9 | 特表2022-517067 | 非円形瞳を有する検査システム | 2024-04-08 |
| 10 | 特開2022-129667 | 莢果選別システム及び莢果選別装置 | 2024-03-27 |
| 11 | 特許7493443 | 色彩選別機 | 2024-03-19 |
| 12 | 特開2023-017169 | フィルム検査装置、フィルム検査方法及びプログラム | 2024-01-31 |
| 13 | 特開2023-137057 | 欠陥予測モデルの生成方法、びん外観検査方法、およびびん外観検査装置 | 2024-01-31 |
| 14 | 特開2022-151122 | 検査選別装置、検査装置及び選別装置 | 2024-01-29 |
| 15 | 特許7602219 | 色調検査装置 | 2024-01-29 |
| 16 | 特開2021-148719 | 検査システム、学習装置、学習プログラム、学習方法、検査装置、検査プログラム、検査方法 | 2023-12-14 |
| 17 | 特開2022-099480 | 卵分類システム | 2023-11-27 |
| 18 | 特開2023-143024 | 食品についての検査システム及び検査方法 | 2023-11-15 |
| 19 | 特開2023-018796 | 物品検査装置 | 2023-11-15 |
| 20 | 特開2021-187869 | ポリエステルフィルム、ポリエステルフィルムの製造方法、ポリエステルペレット、およびポリエステルペレットの製造方法 | 2023-11-09 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 122 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許6884936 "穀粒品質測定器" (5 times) , and the next most protest patent is 特開2022-108063 "粒状体検査装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6884936 | 穀粒品質測定器 | 5 times |
| 2 | 特開2022-108063 | 粒状体検査装置 | 4 times |
| 3 | 特許7170400 | 検査装置、検査方法、錠剤印刷装置および錠剤印刷方法 | 4 times |
| 4 | 特許6940215 | 検査装置及び検査装置の識別手段の学習方法 | 4 times |
| 5 | 特許7026309 | 光学式外観検査装置、及びこれを用いた光学式外観検査システム | 3 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 49 patents Inspection from third parties. The average number of Inspection is 1.2 times. The most recently Inspection patent is 特開2024-063953 "識別装置、選別装置、及び識別方法" (Inspection day 2024-08-28) , next is 特開2022-073649 "判定装置、判定方法、プログラム及び回収装置" (Inspection day 2024-08-26) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2024-063953 | 識別装置、選別装置、及び識別方法 | 2024-08-28 |
| 2 | 特開2022-073649 | 判定装置、判定方法、プログラム及び回収装置 | 2024-08-26 |
| 3 | 特開2023-184321 | 段ボールシートの欠陥検出方法 | 2024-08-19 |
| 4 | 特開2021-078082 | 情報処理装置及びその制御方法 | 2024-07-23 |
| 5 | 特許7393313 | 欠陥分類装置、欠陥分類方法及びプログラム | 2024-05-20 |
| 6 | 特開2023-137057 | 欠陥予測モデルの生成方法、びん外観検査方法、およびびん外観検査装置 | 2024-03-08 |
| 7 | 特開2023-017169 | フィルム検査装置、フィルム検査方法及びプログラム | 2024-02-22 |
| 8 | 特開2022-129667 | 莢果選別システム及び莢果選別装置 | 2024-02-15 |
| 9 | 特開2022-129668 | 莢果選別システム及び莢果選別装置 | 2024-02-15 |
| 10 | 特開2022-129666 | 莢果選別システム及び莢果選別装置 | 2024-02-15 |
| 11 | 特許5187851 | 検査装置および検査方法 | 2024-01-24 |
| 12 | 特開2021-148719 | 検査システム、学習装置、学習プログラム、学習方法、検査装置、検査プログラム、検査方法 | 2023-12-27 |
| 13 | 特開2022-099480 | 卵分類システム | 2023-11-29 |
| 14 | 特開2023-143024 | 食品についての検査システム及び検査方法 | 2023-11-24 |
| 15 | 特許7546356 | 検査装置、及び検査方法 | 2023-10-23 |
| 16 | 特許7365819 | 搬送装置及び画像検査装置 | 2023-08-24 |
| 17 | 特開2024-018963 | 欠陥を分析するための検査システム及び方法 | 2023-08-08 |
| 18 | 特開2022-151592 | 検査選別装置 | 2023-07-20 |
| 19 | 特許7531823 | 検査装置および検査方法 | 2023-06-13 |
| 20 | 特許7450032 | 衛生陶器の光学検査のための装置 | 2023-05-22 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 110 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許6705433 "検知装置" (4 times) , and the next most inspection patent is 特許6884936 "穀粒品質測定器" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6705433 | 検知装置 | 4 times |
| 2 | 特許6884936 | 穀粒品質測定器 | 4 times |
| 3 | 特許7170400 | 検査装置、検査方法、錠剤印刷装置および錠剤印刷方法 | 4 times |
| 4 | 特許7005930 | シート検査装置及び検査システム | 3 times |
| 5 | 特許6681128 | 選別装置 | 2 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 2,049 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.8. The most cited patent is 特許6263147 "浮上ロボットを用いた構造物検査装置" (41 times) , and the next most cited patent is 特許6906897 "亀裂検出装置及び亀裂検出方法" (36 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6263147 | 浮上ロボットを用いた構造物検査装置 | 41 times |
| 2 | 特許6906897 | 亀裂検出装置及び亀裂検出方法 | 36 times |
| 3 | 特許6833452 | 巡視点検システム、情報処理装置、巡視点検制御プログラム | 35 times |
| 4 | 特許6648971 | 構造物の点検装置 | 33 times |
| 5 | 特開2018-005640 | 分類器生成装置、画像検査装置、及び、プログラム | 32 times |
Providing patent information to the media (newspapers, magazines, etc.)
"Patent Integration Report" is a web service provided by "Patent Integration Co., Ltd." operated by patent attorneys who are experts in intellectual property rights. Based on the latest patent data, this is one of the largest patent report services in Japan that provides information on technology trends in various companies and technology fields.
The purpose of this web service is to make intellectual property information familiar to many people, regardless of whether they have an interest in intellectual property rights, and to make use of it.
We actively provide various types of patent information that can be used in various media articles such as newspapers, magazines, and web media. Please feel free to contact us from "Inquiry form for details on the content of patent information that can be provided, conditions for provision, etc. Please contact us.
About this Site
All rights related to the data, documents and charts belong to "an integrated patent search/analysis service provider, Patent Integration". Please specify the source “Patent Integration Report, URL: https://patent-i.com/report/en/" when inserting them into in-house materials, external report materials, etc., regardless of whether they are paid or free of charge.
Patent data is obtained by aggregating and analyzing the latest patent data issued by the Patent Offices of respective countries and jurisdictions and by WIPO. Although we take great care in publishing and analyzing the results, we do not guarantee the correctness of the data. We appreciate your understanding.
If you have any concerns about this service, please feel free to contact us.
All rights to the data, documents, figures and tables are reserved by e-Patent. When publishing internal documents, external reports, etc. (whether paid or free of charge), please use the following URL: https://e-patent.co.jp/.
Please note the following points for use.
e-Patent will not be liable for any damages or losses arising from the use of the global patent application status, ranking information, or population search formula in the "SDGs Global Company Ranking from a Patent Perspective". Items with ● in front of the target are not supported at this time (judged to be difficult to approach from the patent information analysis).
Citation of patent application status and ranking information
There is no problem to cite patent application status and ranking information, but please clearly indicate "Source: e-Patent Co.
Graphs are image data.
Please note that the various graphs are image data, but we cannot provide them in text data.Scope of coverage for each goal/target
- Based on the description of each goal and target of the SDGs, we have set the scope of technologies to be covered based on our and e-Patent's past experience, etc. (in some cases, the search is based on social issues themselves). Therefore, please note that there is a possibility that this "SDGs Global Company Ranking from Patent Perspective" may not cover 100%.
- A population search formula is clearly indicated for each goal/target (database: Patent Integration). You may use the population search formula as it is, or you may improve it by yourself.
- This search covers patents and utility models, including both published and registered patents (design and design patents are excluded). The unit of count is the number of applications, not the number of patent families.
About the name collation and name control of applicants and right holders
- Company rankings are based on the results calculated by "Patent Integration", with Japanese organizations in Japanese and other companies in English (some are in Japanese).
- Company names may be the names of the companies at the time of application, but the results calculated by Patent Integration are used as is. Company names are used as they were at the time of application.
- Because of the fluctuation in the names of companies (i.e., applicant/right holder names in the patent information), there are cases where the same company appears more than once in the top 10. The number of applications filed by the same company in the top 10 is the total number of applications filed by the company.
Credit notation
・MeCab user dictionary for science technology term © National Bioscience Database Center licensed under CC Attribution-Share Alike 4.0 International
Our Commitment to Safety and Security
Patent Integration Co., Ltd. is committed to providing high-quality patent information based on the latest patent data on more than 45 million cases collected from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publication. 
Patent Integration Co., Ltd. collects the patent data from the Patent Offices in Japan, the U.S., Europe, and Taiwan and from PCT publications to provide it widely in the form of reports so that anyone can check patent information and patent trends with confidence. 
Patent Integration Co., Ltd. is committed to various efforts to enhance the reliability of the information and to allow users to search patent information with confidence.