Last Updated: 2024/12/01

放射線を利用した材料分析技術 (JP Patent Analysis Report) (JP SDGs Patent Report)

The Theme Code "放射線を利用した材料分析技術" had 84 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a weakly transition of -7 filings (-7.7%) over 91 they had in the same period of the previous year (2022-01-01 to 2022-03-31).

The highest number of filings in 2018 with 583 cases, and their lowest number in 2022 with 309 cases.

The mean of the number of filings over the last 5 years (2018 to 2023, 2,373 cases in total) is 396, and the median is 400. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 396 patents
Std Dev 137
COV 0.3

Filing trends for the last 3 years
Year Cases YOY
2022 year 309 cases -21.77 %
2021 year 395 cases -2.23 %
2020 year 404 cases -22.16 %

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 放射線を利用した材料分析技術[2G001] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of 放射線を利用した材料分析技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.

Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

Foreign Patent Analysis Report

By clicking, you can check the patent application trends in each country of 放射線を利用した材料分析技術.

Patent Filing Trends in Each Country

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for 放射線を利用した材料分析技術. The trends of patent filings of 放射線を利用した材料分析技術 for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder

放射線を利用した材料分析技術, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of 放射線を利用した材料分析技術 over the last 20 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.

Counting of the Number of Cases using the Patent Mapping Function

By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Patent Landscape ({{ld.d.db_name | country_map: 'en'}})

Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.

The patent landscape for 放射線を利用した材料分析技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).

By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.

In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.

Visualization of Technical Position

The patent landscape allows you to analyze, without any hassle, what patent applications have been filed and what technical position is to be established.

Characteristic Terms (Importance)

The following is a list of words (characteristic terms) often used in 放射線を利用した材料分析技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.

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Search Set (Analysis Patents)

This patent analysis report was created for a patent search set of 4,345 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Theme Code:
放射線を利用した材料分析技術[2G001]
Patent Analysis Period
2014-01-01〜2024-11-30
Number of Patents
4,345 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Same industry / competition company information (JP)

The patent information of the higher applicant in the technical theme 放射線を利用した材料分析技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.

Introduction of patent search function

Competitive analysis can be performed in a short time by using various search functions such as applicant, filing date, and similar patent search.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Comparing the number of applications of each company, 株式会社リガク has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 24 cases, followed by 株式会社島津製作所 with 23 cases.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Name Cases
株式会社リガク 24 cases
株式会社島津製作所 23 cases
株式会社イシダ 20 cases
株式会社東芝 7 cases
日本電子株式会社 7 cases
キヤノン株式会社 4 cases
株式会社日立製作所 3 cases
株式会社日立ハイテク 2 cases

Trends in filing of joint patent applications for the target period (2014 to 2024).

Comparing the number of applications of each company, 株式会社島津製作所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 232 cases, followed by 株式会社リガク with 186 cases.

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company information (JP)

The patent information of the higher applicant in the technical theme 放射線を利用した材料分析技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.

Search for Coapplicants

Patent integration allows you to find coapplicants in a short amount of time.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

among the top coapplicants, 株式会社リガク has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 24 cases, followed by 株式会社島津製作所 with 23 cases.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Name Cases
株式会社リガク 24 cases
株式会社島津製作所 23 cases
株式会社東芝 7 cases
日本電子株式会社 7 cases
株式会社日立製作所 3 cases
株式会社日立ハイテク 2 cases

Trends in filing of joint patent applications for the target period (2014 to 2024).

among the top coapplicants, 株式会社島津製作所 has the highest number of joint applications in the last for the target period (2014 to 2024) with 232 cases, followed by 株式会社リガク with 186 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).
Name Cases
株式会社島津製作所 232 cases
株式会社リガク 186 cases
日本電子株式会社 101 cases
株式会社日立ハイテク 100 cases
株式会社東芝 60 cases
株式会社日立製作所 60 cases

Top company, Change in the Number of JP Patents

Below is a ranking of the number of JP patent applications by 放射線を利用した材料分析技術’s top 7 coapplicants over the last 20 years.

Below is a patent map showing the changes in the numbers of JP patent filings by 放射線を利用した材料分析技術’s top 7 coapplicants over the last 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company Details (JP)

Trends in filing of joint patent applications with 株式会社島津製作所

放射線を利用した材料分析技術 filed 232 joint applications with 株式会社島津製作所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 143 cases in total) is 23.8, and the median is 22.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.

The highest number of filings in 2019 with 39 cases, and their lowest number in 2014 with 11 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 23.8 patents
Std Dev 10.8
COV 0.5
Filing trends for the last 3 years
Year Cases YOY
2022 year 14 cases -36.4 %
2021 year 22 cases -4.35 %
2020 year 23 cases -41.0 %

Trends in filing of joint patent applications with 株式会社東芝

放射線を利用した材料分析技術 filed 60 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 29 cases in total) is 4.8, and the median is 4.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2020 with 10 cases, and their lowest number in 2021 with 3 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 4.8 patents
Std Dev 2.7
COV 0.6
Filing trends for the last 3 years
Year Cases YOY
2022 year 5 cases +66.7 %
2021 year 3 cases -70.0 %
2020 year 10 cases +233 %

Trends in filing of joint patent applications with 株式会社日立製作所

放射線を利用した材料分析技術 filed 60 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 27 cases in total) is 4.5, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.

The highest number of filings in 2017 with 11 cases, and their lowest number in 2022 with 3 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 4.5 patents
Std Dev 2.5
COV 0.6
Filing trends for the last 3 years
Year Cases YOY
2022 year 3 cases -50.0 %
2021 year 6 cases -25.00 %
2020 year 8 cases +60.0 %

Trends in filing of joint patent applications with 株式会社リガク

放射線を利用した材料分析技術 filed 186 joint applications with 株式会社リガク for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 121 cases in total) is 20.2, and the median is 20.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.

The highest number of filings in 2019 with 34 cases, and their lowest number in 2022 with 12 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 20.2 patents
Std Dev 7.7
COV 0.4
Filing trends for the last 3 years
Year Cases YOY
2022 year 12 cases -36.8 %
2021 year 19 cases -17.39 %
2020 year 23 cases -32.4 %

Trends in filing of joint patent applications with 日本電子株式会社

放射線を利用した材料分析技術 filed 101 joint applications with 日本電子株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 57 cases in total) is 9.5, and the median is 9.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2018 with 18 cases, and their lowest number in 2022 with 5 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 9.5 patents
Std Dev 5.6
COV 0.6
Filing trends for the last 3 years
Year Cases YOY
2022 year 5 cases -64.3 %
2021 year 14 cases +40.0 %
2020 year 10 cases +11.11 %

Information on important patents (JP)

The following shows JP patents held by 放射線を利用した材料分析技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 放射線を利用した材料分析技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.

By noting the most important patents, you can obtain knowledge of the competitive business environment in which 放射線を利用した材料分析技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.

If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.

Search for Information on Important Patents

You can quickly search for important patents/patent applications, such as patents/patent applications that were cited many times and patents that have had invalidation trials demanded against them many times.

Glossary

Cited
Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
Request for invalidation trial
Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
Opposition
Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
Information provision
Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
Browsing request
Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.

Oppositioned cases

List of latest Oppositioned patents

In the last 3 years (2021-12-01 ~ 2024-11-30), there were 10 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7412028 "検査選別装置及び選別装置" (Opposition day 2024-07-10) , next is 特許7330453 "X線検査システム、破袋システムおよび破砕システム" (Opposition day 2024-01-23) .

Most recent Opposition (2021-12-01 to 2024-11-30)
- No. Title Opposition days
1 特許7412028 検査選別装置及び選別装置 2024-07-10
2 特許7330453 X線検査システム、破袋システムおよび破砕システム 2024-01-23
3 特許7250330 検査装置及び学習装置 2023-09-28
4 特許7243940 X線透過部材 2023-09-20
5 特許7264917 X線導管の製造方法 2023-09-13
6 特許7197506 シリコンドリフト型放射線検出素子、シリコンドリフト型放射線検出器及び放射線検出装置 2023-06-26
7 特許7112179 半導体封止材用球状シリカ質粉末、およびその製造方法 2023-02-02
8 特許7079966 X線検出装置 2022-11-21
9 特許6979185 X線検査装置 2022-06-01
10 特許6937413 ガラス板合紙用木材パルプ及びその使用、ガラス板用合紙、それを用いた積層体、ガラス板の保護方法、並びにガラス板合紙用木材パルプ又はガラス板用合紙の検査方法 2022-03-18

Show 5 patents  

Protested cases

List of latest Protested patents

In the last 3 years (2021-12-01 ~ 2024-11-30), there were 18 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2022-046237 "検査装置、および、検査システム" (Protest day 2024-10-28) , next is 特開2022-161735 "X線回折測定装置及びX線回折測定ロボット" (Protest day 2024-09-04) .

Most recent Protest (2021-12-01 to 2024-11-30)
- No. Title Protest days
1 特開2022-046237 検査装置、および、検査システム 2024-10-28
2 特開2022-161735 X線回折測定装置及びX線回折測定ロボット 2024-09-04
3 特開2022-179012 金属疲労評価装置、該方法および該プログラム 2024-09-04
4 特開2022-058178 試料の製造方法、及び試料の観察方法 2024-05-15
5 特開2022-151122 検査選別装置、検査装置及び選別装置 2024-01-29
6 特開2023-153248 X線検査装置 2024-01-11
7 特開2019-164088 X線検査装置 2023-12-27
8 特許7373840 検査装置 2023-12-14
9 特開2023-137174 電磁波検査装置 2023-11-15
10 特開2023-137175 電磁波検査装置 2023-10-20
11 特開2023-056656 X線検査装置及びプログラム 2023-08-22
12 特開2022-151592 検査選別装置 2023-06-23
13 特許7500487 X線検査装置 2023-04-25
14 特開2020-046270 包装及び検査システム 2022-12-26
15 特開2020-183876 特徴点認識システムおよびワーク処理システム 2022-12-08
16 特許7112179 半導体封止材用球状シリカ質粉末、およびその製造方法 2022-05-17
17 特許7252938 収束X線イメージング形成装置及び方法 2022-04-11
18 特許7488692 核物質測定装置 2022-03-23

Show 13 patents  

Top Patents/Patent Applications with the Highest Number of Protested

Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 32 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許7112179 "半導体封止材用球状シリカ質粉末、およびその製造方法" (3 times) , and the next most protest patent is 特許6588332 "物品検査システム" (2 times) .

Top Patents/Patent Applications with the Highest Number of Protest over a Period of 10 Years (2014-12-01 ~ 2024-11-30)
- No. Title
1 特許7112179 半導体封止材用球状シリカ質粉末、およびその製造方法 3 times
2 特許6588332 物品検査システム 2 times
3 特開2019-164088 X線検査装置 2 times
4 特開2023-153248 X線検査装置 2 times
5 特開2022-151122 検査選別装置、検査装置及び選別装置 2 times

Inspectioned cases

List of latest Inspectioned patents

In the last 3 years (2021-12-01 ~ 2024-11-30), there were 23 patents Inspection from third parties. The average number of Inspection is 1.3 times. The most recently Inspection patent is 特開2022-046237 "検査装置、および、検査システム" (Inspection day 2024-11-13) , next is 特開2022-179012 "金属疲労評価装置、該方法および該プログラム" (Inspection day 2024-09-10) .

Most recent Inspection (2021-12-01 to 2024-11-30)
- No. Title Inspection days
1 特開2022-046237 検査装置、および、検査システム 2024-11-13
2 特開2022-179012 金属疲労評価装置、該方法および該プログラム 2024-09-10
3 特開2022-058178 試料の製造方法、及び試料の観察方法 2024-06-04
4 特許7476039 半導体装置の検査装置、及び、半導体装置の検査方法 2024-03-18
5 特開2023-011409 解析方法 2024-03-18
6 特開2023-069471 撮像装置、及び、画像生成方法 2024-03-18
7 特開2023-153248 X線検査装置 2024-01-23
8 特開2019-164088 X線検査装置 2024-01-16
9 特許7373840 検査装置 2023-12-22
10 特開2023-137174 電磁波検査装置 2023-11-27
11 特開2023-137175 電磁波検査装置 2023-10-24
12 特許7576827 非晶質炭素膜の細胞凝集機能を判定する検査方法。 2023-10-24
13 特開2023-056656 X線検査装置及びプログラム 2023-09-22
14 特開2022-151592 検査選別装置 2023-07-20
15 特開2020-046270 包装及び検査システム 2023-01-25
16 特開2020-183876 特徴点認識システムおよびワーク処理システム 2022-12-19
17 特許7198457 インテリアCT位相イメージングX線顕微鏡装置 2022-09-16
18 特許7079966 X線検出装置 2022-07-25
19 特許7112179 半導体封止材用球状シリカ質粉末、およびその製造方法 2022-05-26
20 特許7488692 核物質測定装置 2022-04-18

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Inspectioned

Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 52 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許7112179 "半導体封止材用球状シリカ質粉末、およびその製造方法" (3 times) , and the next most inspection patent is 特開2017-214590 "繊維強化樹脂材料、成形品、繊維強化樹脂材料の製造方法及び製造装置、並びに繊維束群の検査装置" (2 times) .

Top Patents/Patent Applications with the Highest Number of Inspection over a Period of 10 Years (2014-12-01 ~ 2024-11-30)
- No. Title
1 特許7112179 半導体封止材用球状シリカ質粉末、およびその製造方法 3 times
2 特開2017-214590 繊維強化樹脂材料、成形品、繊維強化樹脂材料の製造方法及び製造装置、並びに繊維束群の検査装置 2 times
3 再公表2017/006849 防汚性繊維構造物 2 times
4 特許6613637 高分子材料の内部構造の応答特性を評価する方法 2 times
5 特開2019-164088 X線検査装置 2 times

Cited cases

Top Patents/Patent Applications with the Highest Number of Cited

Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 995 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.3. The most cited patent is 特許7211722 "計測用X線CT装置" (24 times) , and the next most cited patent is 特許6668278 "試料観察装置および試料観察方法" (21 times) .

Top Patents/Patent Applications with the Highest Number of Cited over a Period of 10 Years (2014-12-01 ~ 2024-11-30)
- No. Title
1 特許7211722 計測用X線CT装置 24 times
2 特許6668278 試料観察装置および試料観察方法 21 times
3 特許6657664 化学状態測定方法 16 times
4 特許6602630 X線検査装置及びX線検査方法 15 times
5 特許6872700 カセット装填装置 14 times

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