荷電粒子線装置技術 (JP Patent Analysis Report)
The Theme Code "荷電粒子線装置技術" had 43 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -40 filings (-48.2%) over 83 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2014 with 538 cases, and their lowest number in 2022 with 315 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 2,212 cases in total) is 369, and the median is 408. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 369 patents |
| Std Dev | 127 |
| COV | 0.3 |
The number of filings has been decreasing for the last 3 years (2020 to 2023).
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 315 cases | -23.54 % |
| 2021 year | 412 cases | +2.23 % |
| 2020 year | 403 cases | -20.98 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 荷電粒子線装置技術[5C101] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 荷電粒子線装置技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 荷電粒子線装置技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
荷電粒子線装置技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 荷電粒子線装置技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 4,013 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
荷電粒子線装置技術[5C101]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 荷電粒子線装置技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, 日本電子株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 42 cases, followed by 株式会社ニューフレアテクノロジー with 41 cases.
| Name | Cases |
|---|---|
| 日本電子株式会社 | 42 cases |
| 株式会社ニューフレアテクノロジー | 41 cases |
| 株式会社日立ハイテク | 26 cases |
| 株式会社日立製作所 | 6 cases |
| 株式会社東芝 | 4 cases |
| 日新電機株式会社 | 2 cases |
| 三菱電機株式会社 | 2 cases |
| 株式会社島津製作所 | 1 cases |
| キヤノン株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 株式会社日立ハイテク has the highest number of joint applications in the last for the target period (2014 to 2024) with 626 cases, followed by 株式会社ニューフレアテクノロジー with 369 cases.
| Name | Cases |
|---|---|
| 株式会社日立ハイテク | 626 cases |
| 株式会社ニューフレアテクノロジー | 369 cases |
| 日本電子株式会社 | 331 cases |
| 株式会社日立製作所 | 69 cases |
| キヤノン株式会社 | 39 cases |
| 株式会社島津製作所 | 29 cases |
| 株式会社ニコン | 28 cases |
| 株式会社東芝 | 26 cases |
| 日新電機株式会社 | 14 cases |
| 三菱電機株式会社 | 14 cases |
| 富士通株式会社 | 12 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 荷電粒子線装置技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, 日本電子株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 42 cases, followed by 株式会社日立ハイテク with 26 cases.
| Name | Cases |
|---|---|
| 日本電子株式会社 | 42 cases |
| 株式会社日立ハイテク | 26 cases |
| 株式会社日立製作所 | 6 cases |
| 株式会社東芝 | 4 cases |
| 日新電機株式会社 | 2 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 株式会社日立ハイテク has the highest number of joint applications in the last for the target period (2014 to 2024) with 626 cases, followed by 日本電子株式会社 with 331 cases.
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 荷電粒子線装置技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 荷電粒子線装置技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with 株式会社日立製作所
荷電粒子線装置技術 filed 69 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 32 cases in total) is 5.3, and the median is 5.0. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2017 with 14 cases, and their lowest number in 2022 with 4 cases.
| Index | Value |
|---|---|
| Average | 5.3 patents |
| Std Dev | 2.4 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 4 cases | -20.00 % |
| 2021 year | 5 cases | -16.67 % |
| 2020 year | 6 cases | +20.00 % |
Trends in filing of joint patent applications with 日本電子株式会社
荷電粒子線装置技術 filed 331 joint applications with 日本電子株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 202 cases in total) is 33.7, and the median is 35.0. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2021 with 49 cases, and their lowest number in 2016 with 26 cases.
| Index | Value |
|---|---|
| Average | 33.7 patents |
| Std Dev | 13.6 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 33 cases | -32.7 % |
| 2021 year | 49 cases | +75.0 % |
| 2020 year | 28 cases | -24.32 % |
Trends in filing of joint patent applications with 株式会社日立ハイテク
荷電粒子線装置技術 filed 626 joint applications with 株式会社日立ハイテク for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 315 cases in total) is 52.5, and the median is 58.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 123 cases, and their lowest number in 2022 with 21 cases.
| Index | Value |
|---|---|
| Average | 52.5 patents |
| Std Dev | 31.9 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 21 cases | -53.3 % |
| 2021 year | 45 cases | -37.5 % |
| 2020 year | 72 cases | -24.21 % |
Trends in filing of joint patent applications with 株式会社東芝
荷電粒子線装置技術 filed 26 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 14 cases in total) is 2.3, and the median is 2.5. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2014 with 4 cases, and their lowest number in 2016 with 1 cases.
| Index | Value |
|---|---|
| Average | 2.3 patents |
| Std Dev | 0.7 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 2 cases | 0 |
| 2021 year | 2 cases | -33.3 % |
| 2020 year | 3 cases | 0 |
Trends in filing of joint patent applications with 日新電機株式会社
荷電粒子線装置技術 filed 14 joint applications with 日新電機株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 2 cases in total) is 0.3, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.2, and there have been very big fluctuations in the number of filings from year to year.
The highest number of filings in 2014 with 4 cases, and their lowest number in 2022 with 0 cases.
| Index | Value |
|---|---|
| Average | 0.3 patents |
| Std Dev | 0.7 |
| COV | 2.2 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 0 cases | - |
| 2021 year | 0 cases | - |
| 2020 year | 0 cases | - |
Information on important patents (JP)
The following shows JP patents held by 荷電粒子線装置技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 荷電粒子線装置技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 荷電粒子線装置技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 8 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特表2023-544172 "アルミニウムイオンを生成するために有用な方法およびシステム" (Protest day 2024-09-09) , next is 特開2023-118398 "イオン注入装置、イオン注入方法" (Protest day 2023-12-11) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特表2023-544172 | アルミニウムイオンを生成するために有用な方法およびシステム | 2024-09-09 |
| 2 | 特開2023-118398 | イオン注入装置、イオン注入方法 | 2023-12-11 |
| 3 | 特開2023-118399 | イオン注入装置、イオン注入方法 | 2023-12-11 |
| 4 | 特表2023-530881 | 改善されたシールディングを有するステップ付間接加熱カソード | 2023-10-27 |
| 5 | 特開2023-093552 | 電子エミッタ及びそれを製作する方法 | 2023-09-25 |
| 6 | 特表2022-514242 | 非タングステン材料を有するフッ素イオン注入システムおよび使用方法 | 2023-03-14 |
| 7 | 特表2022-514243 | フッ素イオン注入方法およびシステム | 2022-10-03 |
| 8 | 特許7177244 | 電子検出のためのセンサ | 2022-09-08 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 15 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特表2022-514242 "非タングステン材料を有するフッ素イオン注入システムおよび使用方法" (3 times) , and the next most protest patent is 特表2022-514243 "フッ素イオン注入方法およびシステム" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特表2022-514242 | 非タングステン材料を有するフッ素イオン注入システムおよび使用方法 | 3 times |
| 2 | 特表2022-514243 | フッ素イオン注入方法およびシステム | 2 times |
| 3 | 特表2023-544172 | アルミニウムイオンを生成するために有用な方法およびシステム | 2 times |
| 4 | 特許7033086 | アルミニウム原子イオンを生成するための固体ヨウ化アルミニウム（ＡＬＩ３）を用いた注入およびヨウ化アルミニウムとそれに関連付けられた副産物のインサイチュクリーニング | 1 times |
| 5 | 特許7383486 | イオン原料物質としてヨウ化アルミニウムを使用する場合の水素共ガス | 1 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 12 patents Inspection from third parties. The average number of Inspection is 1.3 times. The most recently Inspection patent is 特表2023-544172 "アルミニウムイオンを生成するために有用な方法およびシステム" (Inspection day 2024-10-03) , next is 特許7528011 "マルチビーム走査装置" (Inspection day 2024-03-18) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特表2023-544172 | アルミニウムイオンを生成するために有用な方法およびシステム | 2024-10-03 |
| 2 | 特許7528011 | マルチビーム走査装置 | 2024-03-18 |
| 3 | 特開2023-011409 | 解析方法 | 2024-03-18 |
| 4 | 特開2023-118398 | イオン注入装置、イオン注入方法 | 2024-01-10 |
| 5 | 特開2023-118399 | イオン注入装置、イオン注入方法 | 2024-01-10 |
| 6 | 特表2022-514242 | 非タングステン材料を有するフッ素イオン注入システムおよび使用方法 | 2023-04-10 |
| 7 | 特許7272641 | 電子放出素子及び電子顕微鏡 | 2023-01-16 |
| 8 | 特表2022-514243 | フッ素イオン注入方法およびシステム | 2022-11-08 |
| 9 | 特許7177244 | 電子検出のためのセンサ | 2022-09-12 |
| 10 | 特許7268003 | イオン注入のための装置、システムおよび方法 | 2022-06-20 |
| 11 | 特許7343445 | ビーム電流動作の広い範囲におけるイオンビームの制御 | 2022-05-19 |
| 12 | 特許7202292 | スキャン後の湾曲電極 | 2022-02-09 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 35 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.1. The most inspection patent is 特表2022-514242 "非タングステン材料を有するフッ素イオン注入システムおよび使用方法" (3 times) , and the next most inspection patent is 特表2022-514243 "フッ素イオン注入方法およびシステム" (2 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特表2022-514242 | 非タングステン材料を有するフッ素イオン注入システムおよび使用方法 | 3 times |
| 2 | 特表2022-514243 | フッ素イオン注入方法およびシステム | 2 times |
| 3 | 特表2023-544172 | アルミニウムイオンを生成するために有用な方法およびシステム | 2 times |
| 4 | 特許6051245 | 荷電粒子顕微鏡内で試料を検査する方法 | 2 times |
| 5 | 特許6141918 | 複数自由度ステージを含むテストアセンブリ | 1 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 758 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.2. The most cited patent is 特許6668278 "試料観察装置および試料観察方法" (21 times) , and the next most cited patent is 特許6550478 "マルチビーム装置、荷電粒子ビーム装置、ソース変換ユニット、ソース変換ユニットを構成する方法、仮想的マルチソースアレイを形成するための方法" (14 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6668278 | 試料観察装置および試料観察方法 | 21 times |
| 2 | 特許6550478 | マルチビーム装置、荷電粒子ビーム装置、ソース変換ユニット、ソース変換ユニットを構成する方法、仮想的マルチソースアレイを形成するための方法 | 14 times |
| 3 | 特許6684179 | 荷電粒子ビーム検査装置及び荷電粒子ビーム検査方法 | 14 times |
| 4 | 特許6769952 | プラズマ処理装置及びシステム及びイオンビームを制御する方法 | 14 times |
| 5 | 特許6549220 | 走査型電子顕微鏡および試料を検査およびレビューする方法 | 13 times |
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