光学フィルタ技術 (JP Patent Analysis Report)
The Theme Code "光学フィルタ技術" had 121 patent application filings in the most recent period (2023-01-01 to 2023-03-31). This is a significantly decreased of -47 filings (-28.0%) over 168 they had in the same period of the previous year (2022-01-01 to 2022-03-31).
The highest number of filings in 2017 with 1,446 cases, and their lowest number in 2022 with 604 cases.
The mean of the number of filings over the last 5 years (2018 to 2023, 4,994 cases in total) is 832, and the median is 810. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
| Index | Value |
|---|---|
| Average | 832 patents |
| Std Dev | 355 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 604 cases | -12.97 % |
| 2021 year | 694 cases | -25.05 % |
| 2020 year | 926 cases | -21.99 % |
This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 光学フィルタ技術[2H148] for the period of the last 10 years (2014-01-01 to 2024-11-30). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.
This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.
This report includes basic information to help you understand the IP strategy and management of 光学フィルタ技術, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.
- Table of Contents
- Foreign Patent Analysis Report
- Patent Filing Summary for 光学フィルタ技術
- Search Set (Search Formula/Analysis Patents)
- Related Patent Analysis Report
- Competitors Information
- Top company Information
- • Information on Important Patents
- Provision of patent information to the media
- About this Site
He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.
After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..
Introduction
The concept of the "IP landscape" (IPL) has been attracting attention recently.
An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.
IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.
After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.
Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
光学フィルタ技術, Changes in the Number of JP Patents/Patent Applications
The changes in the number of patent filings of 光学フィルタ技術 over the last 20 years (JP) are shown below.
The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.
In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.
Patent Landscape ({{ld.d.db_name | country_map: 'en'}})
Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.
The patent landscape for 光学フィルタ技術 gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).
By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.
In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.
In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.
Characteristic Terms (Importance)
The following is a list of words (characteristic terms) often used in 光学フィルタ技術 patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.
Search Set (Analysis Patents)
This patent analysis report was created for a patent search set of 10,097 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.
光学フィルタ技術[2H148]
Same industry / competition company information (JP)
The patent information of the higher applicant in the technical theme 光学フィルタ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Comparing the number of applications of each company, ARTIENCE株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 92 cases, followed by 住友化学株式会社 with 58 cases.
| Name | Cases |
|---|---|
| ARTIENCE株式会社 | 92 cases |
| 住友化学株式会社 | 58 cases |
| TOPPANホールディングス株式会社 | 43 cases |
| 東レ株式会社 | 30 cases |
| キヤノン株式会社 | 28 cases |
| セイコーエプソン株式会社 | 24 cases |
| JSR株式会社 | 16 cases |
| 富士フイルム株式会社 | 14 cases |
| 大日本印刷株式会社 | 12 cases |
| シャープ株式会社 | 1 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
Comparing the number of applications of each company, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 761 cases, followed by ARTIENCE株式会社 with 634 cases.
| Name | Cases |
|---|---|
| 富士フイルム株式会社 | 761 cases |
| ARTIENCE株式会社 | 634 cases |
| TOPPANホールディングス株式会社 | 444 cases |
| 大日本印刷株式会社 | 304 cases |
| 住友化学株式会社 | 287 cases |
| セイコーエプソン株式会社 | 241 cases |
| JSR株式会社 | 221 cases |
| 東レ株式会社 | 203 cases |
| キヤノン株式会社 | 192 cases |
| シャープ株式会社 | 98 cases |
Same industry / competition company, Change in the Number of JP Patents
Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.
Top company information (JP)
The patent information of the higher applicant in the technical theme 光学フィルタ技術 is shown below. By comparing the number of patents of each company, you can check the research and development status of each company's past and present technical themes and the position of each company in the technical theme.
Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
among the top coapplicants, ARTIENCE株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 92 cases, followed by TOPPANホールディングス株式会社 with 43 cases.
| Name | Cases |
|---|---|
| ARTIENCE株式会社 | 92 cases |
| TOPPANホールディングス株式会社 | 43 cases |
| 東レ株式会社 | 30 cases |
| キヤノン株式会社 | 28 cases |
| セイコーエプソン株式会社 | 24 cases |
| 富士フイルム株式会社 | 14 cases |
| 大日本印刷株式会社 | 12 cases |
Trends in filing of joint patent applications for the target period (2014 to 2024).
among the top coapplicants, 富士フイルム株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 761 cases, followed by ARTIENCE株式会社 with 634 cases.
| Name | Cases |
|---|---|
| 富士フイルム株式会社 | 761 cases |
| ARTIENCE株式会社 | 634 cases |
| TOPPANホールディングス株式会社 | 444 cases |
| 大日本印刷株式会社 | 304 cases |
| セイコーエプソン株式会社 | 241 cases |
| 東レ株式会社 | 203 cases |
| キヤノン株式会社 | 192 cases |
Top company, Change in the Number of JP Patents
Below is a ranking of the number of JP patent applications by 光学フィルタ技術’s top 7 coapplicants over the last 20 years.
Below is a patent map showing the changes in the numbers of JP patent filings by 光学フィルタ技術’s top 7 coapplicants over the last 20 years.
Top company Details (JP)
Trends in filing of joint patent applications with TOPPANホールディングス株式会社
光学フィルタ技術 filed 444 joint applications with TOPPANホールディングス株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 210 cases in total) is 35.0, and the median is 38.5. The coefficient of variation (standard deviation/mean) is 0.4, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2016 with 76 cases, and their lowest number in 2022 with 35 cases.
| Index | Value |
|---|---|
| Average | 35.0 patents |
| Std Dev | 12.8 |
| COV | 0.4 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 35 cases | -16.67 % |
| 2021 year | 42 cases | +13.51 % |
| 2020 year | 37 cases | -22.92 % |
Trends in filing of joint patent applications with セイコーエプソン株式会社
光学フィルタ技術 filed 241 joint applications with セイコーエプソン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 103 cases in total) is 17.2, and the median is 15.5. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2015 with 38 cases, and their lowest number in 2021 with 9 cases.
| Index | Value |
|---|---|
| Average | 17.2 patents |
| Std Dev | 7.9 |
| COV | 0.5 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 13 cases | +44.4 % |
| 2021 year | 9 cases | -50.0 % |
| 2020 year | 18 cases | -45.5 % |
Trends in filing of joint patent applications with 富士フイルム株式会社
光学フィルタ技術 filed 761 joint applications with 富士フイルム株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 340 cases in total) is 56.7, and the median is 66.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.
The highest number of filings in 2015 with 108 cases, and their lowest number in 2022 with 10 cases.
| Index | Value |
|---|---|
| Average | 56.7 patents |
| Std Dev | 37.8 |
| COV | 0.7 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 10 cases | -82.5 % |
| 2021 year | 57 cases | -25.00 % |
| 2020 year | 76 cases | -15.56 % |
Trends in filing of joint patent applications with 大日本印刷株式会社
光学フィルタ技術 filed 304 joint applications with 大日本印刷株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 104 cases in total) is 17.3, and the median is 17.5. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.
The highest number of filings in 2016 with 62 cases, and their lowest number in 2022 with 9 cases.
| Index | Value |
|---|---|
| Average | 17.3 patents |
| Std Dev | 10.0 |
| COV | 0.6 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 9 cases | -40.0 % |
| 2021 year | 15 cases | -25.00 % |
| 2020 year | 20 cases | -41.2 % |
Trends in filing of joint patent applications with キヤノン株式会社
光学フィルタ技術 filed 192 joint applications with キヤノン株式会社 for the analysis period (2014 to 2024).
The mean of the number of filings over the last 5 years (2018 to 2023, 119 cases in total) is 19.8, and the median is 20.5. The coefficient of variation (standard deviation/mean) is 0.3, and there have been big fluctuations in the number of filings from year to year.
The number of filings has been decreasing for the last 3 years (2020 to 2023). The highest number of filings in 2019 with 29 cases, and their lowest number in 2014 with 13 cases.
| Index | Value |
|---|---|
| Average | 19.8 patents |
| Std Dev | 6.5 |
| COV | 0.3 |
| Year | Cases | YOY |
|---|---|---|
| 2022 year | 20 cases | 0 |
| 2021 year | 20 cases | -4.76 % |
| 2020 year | 21 cases | -27.59 % |
Information on important patents (JP)
The following shows JP patents held by 光学フィルタ技術 that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 光学フィルタ技術’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.
By noting the most important patents, you can obtain knowledge of the competitive business environment in which 光学フィルタ技術 is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.
If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.
Glossary
- Cited
- Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
- Request for invalidation trial
- Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
- Opposition
- Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
- Information provision
- Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
- Browsing request
- Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.
Oppositioned cases
List of latest Oppositioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 32 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7457781 "感光性樹脂組成物、それを用いて製造された感光性樹脂膜およびカラーフィルタ" (Opposition day 2024-09-27) , next is 特許7423646 "硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子及び画像表示装置" (Opposition day 2024-07-29) .
| - | No. | Title | Opposition days |
|---|---|---|---|
| 1 | 特許7457781 | 感光性樹脂組成物、それを用いて製造された感光性樹脂膜およびカラーフィルタ | 2024-09-27 |
| 2 | 特許7423646 | 硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子及び画像表示装置 | 2024-07-29 |
| 3 | 特許7383231 | 剥離フィルム付き蛍光体保護フィルム | 2024-05-02 |
| 4 | 特許7334368 | フォトクロミック化合物、フォトクロミック組成物、フォトクロミック物品及び眼鏡 | 2024-02-26 |
| 5 | 特許7331998 | 光学フィルム、偏光板、および画像表示装置 | 2024-02-22 |
| 6 | 特許7290809 | フォトクロミック組成物、フォトクロミック物品及び眼鏡 | 2023-12-11 |
| 7 | 特許7274911 | 光学物品用コーティング組成物、眼鏡レンズ、眼鏡および眼鏡レンズの製造方法、ならびに光学物品および光学物品の製造方法 | 2023-11-13 |
| 8 | 特許7268700 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | 2023-11-08 |
| 9 | 特許7263153 | 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法 | 2023-10-24 |
| 10 | 特許7243073 | インク組成物及びその硬化物、光変換層、並びにカラーフィルタ | 2023-09-21 |
Protested cases
List of latest Protested patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 73 patents Protest from third parties. The average number of Protest is 1.5 times. The most recently Protest patent is 特開2023-044321 "加飾部材、加飾部材付き表示装置" (Protest day 2024-11-20) , next is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Protest day 2024-11-07) .
| - | No. | Title | Protest days |
|---|---|---|---|
| 1 | 特開2023-044321 | 加飾部材、加飾部材付き表示装置 | 2024-11-20 |
| 2 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-07 |
| 3 | 特開2024-128965 | マンガン酸化物、マンガン酸化物粒子、近赤外線透過材料、及び近赤外線透過膜 | 2024-10-11 |
| 4 | 特開2021-056509 | ブラックレジスト用感光性樹脂組成物、当該感光性樹脂組成物の製造方法およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置 | 2024-10-09 |
| 5 | 特開2022-166114 | 電子素子のための材料 | 2024-10-07 |
| 6 | 特開2022-172506 | カラーフィルタ用着色組成物、カラーフィルタ、液晶表示装置、および固体撮像素子 | 2024-06-12 |
| 7 | 特開2023-123378 | 着色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよびこれを含む固体撮像素子または表示装置 | 2024-06-07 |
| 8 | 特許7533221 | 波長変換シートの製造方法、蛍光体保護フィルム及び剥離フィルム付き波長変換シート | 2024-05-22 |
| 9 | 特開2022-034529 | 硬化性樹脂組成物および積層フィルム | 2024-05-21 |
| 10 | 特許7604192 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-03-18 |
| 11 | 特許7569209 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-03-18 |
| 12 | 特開2022-141747 | 着色組成物、着色硬化膜及び表示素子 | 2024-02-07 |
| 13 | 特許7555127 | 白色有機発光デバイス及びその製造方法 | 2024-01-05 |
| 14 | 特許7574619 | 感光性着色組成物、硬化膜、遮光フィルタ、カラーフィルタ、画像表示装置、固体撮像素子、及び赤外線センサ | 2023-12-27 |
| 15 | 特開2020-166156 | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター | 2023-12-19 |
| 16 | 特許7516477 | 光学フィルタの製造方法 | 2023-11-01 |
| 17 | 特許7536136 | 光学フィルターおよび撮像装置 | 2023-09-15 |
| 18 | 特開2022-103165 | カラーフィルタ用着色組成物、カラーフィルタ、および、液晶表示装置 | 2023-07-27 |
| 19 | 特許7429283 | 着色組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置 | 2023-07-27 |
| 20 | 特許7453744 | 組成物、フィルム、積層構造体、発光装置及びディスプレイ | 2023-07-19 |
Top Patents/Patent Applications with the Highest Number of Protested
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 190 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特許6824195 "着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置" (4 times) , and the next most protest patent is 特許7131907 "感光性着色組成物、硬化物、着色スペーサー、画像表示装置" (4 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6824195 | 着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 | 4 times |
| 2 | 特許7131907 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | 4 times |
| 3 | 特許7533221 | 波長変換シートの製造方法、蛍光体保護フィルム及び剥離フィルム付き波長変換シート | 4 times |
| 4 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 4 times |
| 5 | 特許7453744 | 組成物、フィルム、積層構造体、発光装置及びディスプレイ | 4 times |
Inspectioned cases
List of latest Inspectioned patents
In the last 3 years (2021-12-01 ~ 2024-11-30), there were 129 patents Inspection from third parties. The average number of Inspection is 1.4 times. The most recently Inspection patent is 特開2023-044321 "加飾部材、加飾部材付き表示装置" (Inspection day 2024-11-26) , next is 特開2022-113634 "フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置" (Inspection day 2024-11-14) .
| - | No. | Title | Inspection days |
|---|---|---|---|
| 1 | 特開2023-044321 | 加飾部材、加飾部材付き表示装置 | 2024-11-26 |
| 2 | 特開2022-113634 | フレキシブルディスプレイ用ポリエステルフィルム、フレキシブルディスプレイ用積層フィルム、フレキシブルディスプレイ及びフレキシブルディスプレイ装置 | 2024-11-14 |
| 3 | 特開2021-056509 | ブラックレジスト用感光性樹脂組成物、当該感光性樹脂組成物の製造方法およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置 | 2024-11-12 |
| 4 | 特表2023-544281 | ＩＲ信号透過領域を組み込んだデバイス | 2024-11-05 |
| 5 | 特表2023-547920 | ナノ粒子堆積層を有する光電子デバイス | 2024-10-24 |
| 6 | 特開2024-128965 | マンガン酸化物、マンガン酸化物粒子、近赤外線透過材料、及び近赤外線透過膜 | 2024-10-16 |
| 7 | 特開2022-166114 | 電子素子のための材料 | 2024-10-11 |
| 8 | 特表2023-545390 | 低い屈折率の被膜及び放射線修正層を含むデバイス | 2024-10-09 |
| 9 | 特開2022-060893 | オキシムエステル系化合物の製造方法及び感光性樹脂組成物の製造方法 | 2024-09-03 |
| 10 | 特開2022-172506 | カラーフィルタ用着色組成物、カラーフィルタ、液晶表示装置、および固体撮像素子 | 2024-07-02 |
| 11 | 特開2023-054570 | 表示装置 | 2024-07-01 |
| 12 | 特開2022-180399 | 多重スペクトルセンサの応答バランス取り | 2024-06-25 |
| 13 | 特表2022-500675 | ３次元撮像のための電気光学変調器およびその使用方法と製造方法 | 2024-06-18 |
| 14 | 特開2022-166089 | 誘導透過フィルタ | 2024-06-11 |
| 15 | 特開2022-034529 | 硬化性樹脂組成物および積層フィルム | 2024-05-29 |
| 16 | 特許7456563 | 光学フィルタ用ガラス及び光学フィルタ | 2024-05-20 |
| 17 | 特許7604192 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-04-09 |
| 18 | 特許7569209 | ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス | 2024-04-09 |
| 19 | 特開2023-129472 | 発光結晶及びその製造 | 2024-03-01 |
| 20 | 特開2023-083268 | ルミネッセントコンポーネント | 2024-03-01 |
Top Patents/Patent Applications with the Highest Number of Inspectioned
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 280 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.4. The most inspection patent is 特許6383755 "透明プラスチック基材及びプラスチックレンズ" (10 times) , and the next most inspection patent is 特許6860500 "感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置" (7 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6383755 | 透明プラスチック基材及びプラスチックレンズ | 10 times |
| 2 | 特許6860500 | 感放射線性樹脂組成物、硬化膜、パターン形成方法、固体撮像素子および画像表示装置 | 7 times |
| 3 | 特許6824195 | 着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置 | 6 times |
| 4 | 特許6294387 | 透明プラスチック基材及びプラスチックレンズ | 4 times |
| 5 | 特許7131907 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 | 4 times |
Cited cases
Top Patents/Patent Applications with the Highest Number of Cited
Of the patent applications filed in the last 10 years (2014-12-01 to 2024-11-30), 2,688 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 3.3. The most cited patent is 特許6546613 "異なる種類の撮像装置を有するモノリシックカメラアレイを用いた画像の撮像および処理" (101 times) , and the next most cited patent is 特許6863896 "導波路から異なる波長の光を出力する構造および方法" (63 times) .
| - | No. | Title | |
|---|---|---|---|
| 1 | 特許6546613 | 異なる種類の撮像装置を有するモノリシックカメラアレイを用いた画像の撮像および処理 | 101 times |
| 2 | 特許6863896 | 導波路から異なる波長の光を出力する構造および方法 | 63 times |
| 3 | 特許6984993 | 自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置 | 53 times |
| 4 | 特許6510113 | 光学部材用組成物、光学部材及び画像表示装置 | 41 times |
| 5 | 特許6498929 | 着色硬化性樹脂組成物 | 26 times |
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