Last Updated: 2024/03/04

ウェハ (JP Patent Analysis Report)

The Technical Field "ウェハ" had 544 patent application filings in the most recent period (2022-01-01 to 2022-06-30). This is a significantly decreased of -174 filings (-24.2%) over 718 they had in the same period of the previous year (2021-01-01 to 2021-06-30). This report also includes technical terms related to " ウェハー ", " ウェファー ", " ウェーハ ", " ウェーハー ", " ウエハ ", " ウエハー ", " ウエーハ ", " ウエーハー ", " ウエーファ ", " 素子ウエハ ", " 素子ウエハー " in the search set.

The company had their highest number of filings in 2016 with 2,014 cases, and their lowest number in 2022 with 847 cases.

The mean of the number of filings over the last 5 years (2018 to 2023, 7,468 cases in total) is 1,245, and the median is 1,373. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 1,245 patents
Std Dev 628
COV 0.5

Filing trends for the last 3 years
Year Cases YOY
2022 year 847 cases -37.3 %
2021 year 1,350 cases -3.30 %
2020 year 1,396 cases -23.80 %

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for ウェハ for the period of the last 10 years (2014-01-01 to 2024-02-29). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of ウェハ, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.

Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for ウェハ. The trends of patent filings of ウェハ for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder

ウェハ, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of ウェハ over the last 20 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.

Counting of the Number of Cases using the Patent Mapping Function

By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Search Set (Analysis Object)

This patent analysis report was created for a patent search set of 15,462 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Technical Field:
ウェハ
Patent Analysis Period
2014-01-01〜2024-02-29
Number of Objects
15,462 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Same industry / competition company information (JP)

The number of patents and changes in the number of patents of other companies (competitors) in the same industry as ウェハ are shown below.

Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.

It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.

If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.

Introduction of patent search function

Competitive analysis can be performed in a short time by using various search functions such as applicant, filing date, and similar patent search.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Comparing the number of applications of each company, 株式会社ディスコ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 185 cases, followed by 三菱電機株式会社 with 15 cases.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Name Cases
株式会社ディスコ 185 cases
三菱電機株式会社 15 cases
東京エレクトロン株式会社 11 cases
キヤノン株式会社 8 cases
株式会社東芝 5 cases
株式会社日立製作所 1 cases

Trends in filing of joint patent applications for the target period (2014 to 2024).

Comparing the number of applications of each company, 株式会社ディスコ has the highest number of joint applications in the last for the target period (2014 to 2024) with 2,690 cases, followed by 東京エレクトロン株式会社 with 775 cases.

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company information (JP)

The number of patents and changes in the number of patents of other companies (competitors) in the same industry as ウェハ are shown below.

Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.

It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.

If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.

Search for Coapplicants

Patent integration allows you to find coapplicants in a short amount of time.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Among the top coapplicants, 株式会社ディスコ has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 185 cases, followed by 三菱電機株式会社 with 15 cases.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).
Name Cases
株式会社ディスコ 185 cases
三菱電機株式会社 15 cases
東京エレクトロン株式会社 11 cases
株式会社東芝 5 cases
株式会社日立製作所 1 cases

Trends in filing of joint patent applications for the target period (2014 to 2024).

Among the top coapplicants, 株式会社ディスコ has the highest number of joint applications in the last for the target period (2014 to 2024) with 2,690 cases, followed by 東京エレクトロン株式会社 with 775 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).
Name Cases
株式会社ディスコ 2,690 cases
東京エレクトロン株式会社 775 cases
三菱電機株式会社 231 cases
株式会社ニコン 140 cases
株式会社東芝 90 cases
株式会社日立製作所 18 cases
日本電気株式会社 4 cases

Top company, Change in the Number of JP Patents

Below is a patent map showing the changes in the numbers of JP patent filings by ウェハ’s top 7 coapplicants over the last 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top company Details (JP)

Trends in filing of joint patent applications with 東京エレクトロン株式会社

ウェハ filed 775 joint applications with 東京エレクトロン株式会社 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 202 cases in total) is 33.7, and the median is 28.5. The coefficient of variation (standard deviation/mean) is 0.8, and there have been relatively large fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2014 with 158 cases, and their lowest number in 2022 with 10 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 33.7 patents
Std Dev 26.6
COV 0.8
Filing trends for the last 3 years
Year Cases YOY
2022 year 10 cases -56.5 %
2021 year 23 cases -32.4 %
2020 year 34 cases -38.2 %

Trends in filing of joint patent applications with 株式会社日立製作所

ウェハ filed 18 joint applications with 株式会社日立製作所 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 4 cases in total) is 0.7, and the median is 1.0. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2016 with 6 cases, and their lowest number in 2019 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 0.7 patents
Std Dev 0.5
COV 0.7
Filing trends for the last 3 years
Year Cases YOY
2022 year 1 cases 0
2021 year 1 cases 0
2020 year 1 cases -

Trends in filing of joint patent applications with 株式会社ディスコ

ウェハ filed 2,690 joint applications with 株式会社ディスコ for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 1,493 cases in total) is 249, and the median is 243. The coefficient of variation (standard deviation/mean) is 0.6, and there have been big fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2019 with 430 cases, and their lowest number in 2022 with 184 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 249 patents
Std Dev 142
COV 0.6
Filing trends for the last 3 years
Year Cases YOY
2022 year 184 cases -13.62 %
2021 year 213 cases -21.98 %
2020 year 273 cases -36.5 %

Trends in filing of joint patent applications with 株式会社東芝

ウェハ filed 90 joint applications with 株式会社東芝 for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 38 cases in total) is 6.3, and the median is 6.5. The coefficient of variation (standard deviation/mean) is 0.7, and there have been relatively large fluctuations in the number of filings from year to year.

The number of filings has been decreasing for the last 3 years (2020 to 2023). The company had their highest number of filings in 2014 with 28 cases, and their lowest number in 2018 with 3 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 6.3 patents
Std Dev 4.2
COV 0.7
Filing trends for the last 3 years
Year Cases YOY
2022 year 5 cases -44.4 %
2021 year 9 cases +12.50 %
2020 year 8 cases -38.5 %

Trends in filing of joint patent applications with 株式会社ニコン

ウェハ filed 140 joint applications with 株式会社ニコン for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 23 cases in total) is 3.8, and the median is 0.5. The coefficient of variation (standard deviation/mean) is 2.0, and there have been very big fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2014 with 37 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 3.8 patents
Std Dev 7.7
COV 2.0
Filing trends for the last 3 years
Year Cases YOY
2020 year 1 cases 0
2019 year 1 cases -95.2 %
2018 year 21 cases +50.0 %

Information on important patents (JP)

The following shows JP patents held by ウェハ that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and ウェハ’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.

By noting the most important patents, you can obtain knowledge of the competitive business environment in which ウェハ is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.

If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.

Search for Information on Important Patents

You can quickly search for important patents/patent applications, such as patents/patent applications that were cited many times and patents that have had invalidation trials demanded against them many times.

Glossary

Cited
Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
Request for invalidation trial
Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
Opposition
Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
Information provision
Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
Browsing request
Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.

Invalidationed Trial cases

List of latest Invalidationed Trial patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 3 patents Invalidation Trial from third parties. The average number of Invalidation Trial is 1.7 times. The most recently Invalidation Trial patent is 特許3935188 "レーザ加工装置" (Invalidation Trial day 2021-09-09) , next is 特許3867108 "レーザ加工装置" (Invalidation Trial day 2021-08-19) .

Most recent Invalidation Trial (2021-03-01 to 2024-02-29)
- No. Title Invalidation Trial days
1 特許3935188 レーザ加工装置 2021-09-09
2 特許3867108 レーザ加工装置 2021-08-19
3 特許6642841 こけら葺き状太陽電池モジュール 2021-03-10

Top Patents/Patent Applications with the Highest Number of Invalidationed Trial

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 2 patents/patent applications were invalidation trial more than once in the examination process of other patent applications. The mean of the number of invalidation trial is 1.0. The most invalidation trial patent is 特許6145808 "流体ヒータ" (1 times) , and the next most invalidation trial patent is 特許6642841 "こけら葺き状太陽電池モジュール" (1 times) .

Top Patents/Patent Applications with the Highest Number of Invalidation Trial over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許6145808 流体ヒータ 1 times
2 特許6642841 こけら葺き状太陽電池モジュール 1 times

Oppositioned cases

List of latest Oppositioned patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 19 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7307299 "静電チャック" (Opposition day 2024-01-11) , next is 特許7301472 "ウェーハの加工方法" (Opposition day 2023-12-22) .

Most recent Opposition (2021-03-01 to 2024-02-29)
- No. Title Opposition days
1 特許7307299 静電チャック 2024-01-11
2 特許7301472 ウェーハの加工方法 2023-12-22
3 特許7211147 シリカ粒子、シリカゾル、研磨組成物、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2023-07-21
4 特許7212321 レーザーマーク周辺の隆起を解消するための研磨用組成物 2023-07-14
5 特許7203260 静電チャック部材、静電チャック装置及び静電チャック部材の製造方法 2023-07-05
6 特許7146145 ワークハンドリングシートおよびデバイス製造方法 2023-03-31
7 特許7063334 半導体基板加熱用基板載置台および半導体基板加熱ヒータ 2022-11-02
8 特許7048395 均一性が改善されたケミカルメカニカルポリッシング層の作製方法 2022-10-05
9 特許7031141 半導体加工用テープ 2022-09-06
10 特許7063493 成膜用冶具及び気相成長装置 2022-08-30

Show 5 patents  

Protested cases

List of latest Protested patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 57 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2022-158499 "保持部材" (Protest day 2024-02-07) , next is 特表2023-533712 "酸化イットリウム系のコーティング及びバルク組成物" (Protest day 2024-01-31) .

Most recent Protest (2021-03-01 to 2024-02-29)
- No. Title Protest days
1 特開2022-158499 保持部材 2024-02-07
2 特表2023-533712 酸化イットリウム系のコーティング及びバルク組成物 2024-01-31
3 特開2022-109710 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-01-26
4 特開2022-109711 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-01-26
5 特開2021-116225 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-01-15
6 特開2023-118398 イオン注入装置、イオン注入方法 2023-12-11
7 特開2023-118399 イオン注入装置、イオン注入方法 2023-12-11
8 特開2021-197529 保持装置 2023-12-06
9 特開2022-124270 保持部材 2023-11-21
10 特表2023-532872 結合研磨物品及びそれを作製する方法 2023-11-20
11 特開2022-087595 半導体ウェハ搭載用基材、ダイシングテープ、及び、ダイシングダイボンドフィルム 2023-10-23
12 特開2023-058845 ウエハ載置台 2023-10-17
13 特開2022-188947 ウエハ載置台 2023-10-05
14 特開2022-110920 樹脂組成物及び樹脂組成物充填済みシリンジ 2023-10-04
15 特表2023-508820 コンポーネントハンドラ 2023-09-01
16 特開2022-099725 縦型熱処理炉用熱処理ボートおよび半導体ウェーハの熱処理方法 2023-08-30
17 特表2020-511383 高アスペクト比のガラスウエハ 2023-08-22
18 特開2023-040087 高アスペクト比のガラスウエハ 2023-08-22
19 特許7433857 試料保持具 2023-08-03
20 特表2023-511769 水溶性有機‐無機ハイブリッドマスク配合物及びその用途 2023-07-13

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Protested

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 109 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.2. The most protest patent is 特許7018168 "感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法" (4 times) , and the next most protest patent is 特許7237828 "エポキシ樹脂組成物、電子部品実装構造体およびその製造方法" (3 times) .

Top Patents/Patent Applications with the Highest Number of Protest over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許7018168 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 4 times
2 特許7237828 エポキシ樹脂組成物、電子部品実装構造体およびその製造方法 3 times
3 特許6636696 半導体ウエハのマウント方法および半導体ウエハのマウント装置 3 times
4 特許7070010 キャリアの製造方法および半導体ウェーハの研磨方法 3 times
5 特許7211147 シリカ粒子、シリカゾル、研磨組成物、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2 times

Inspectioned cases

List of latest Inspectioned patents

In the last 3 years (2021-03-01 ~ 2024-02-29), there were 104 patents Inspection from third parties. The average number of Inspection is 1.5 times. The most recently Inspection patent is 特開2022-109711 "シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法" (Inspection day 2024-02-26) , next is 特開2023-089291 "ビア付き基板及びビア付きシリコンウエハ" (Inspection day 2024-02-20) .

Most recent Inspection (2021-03-01 to 2024-02-29)
- No. Title Inspection days
1 特開2022-109711 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-02-26
2 特開2023-089291 ビア付き基板及びビア付きシリコンウエハ 2024-02-20
3 特開2022-109710 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-02-20
4 特表2023-533712 酸化イットリウム系のコーティング及びバルク組成物 2024-02-19
5 特開2022-158499 保持部材 2024-02-14
6 特開2021-116225 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法 2024-02-06
7 特許6148319 ポリシリコンドープ領域を有するバックコンタクト型太陽電池のトレンチプロセス及び構造 2024-01-30
8 特許5860101 ポリシリコンドープ領域を有するバックコンタクト型太陽電池のトレンチプロセス及び構造 2024-01-30
9 特開2023-118398 イオン注入装置、イオン注入方法 2024-01-10
10 特開2023-118399 イオン注入装置、イオン注入方法 2024-01-10
11 特表2023-527283 マルチスペクトルイメージングCMOSセンサー 2023-12-21
12 特開2021-197529 保持装置 2023-12-14
13 特表2023-532872 結合研磨物品及びそれを作製する方法 2023-12-08
14 特開2022-124270 保持部材 2023-11-29
15 特開2022-087595 半導体ウェハ搭載用基材、ダイシングテープ、及び、ダイシングダイボンドフィルム 2023-11-28
16 特開2022-110920 樹脂組成物及び樹脂組成物充填済みシリンジ 2023-11-06
17 特開2023-058845 ウエハ載置台 2023-10-24
18 特開2022-188947 ウエハ載置台 2023-10-10
19 特表2023-508820 コンポーネントハンドラ 2023-09-26
20 特表2020-511383 高アスペクト比のガラスウエハ 2023-09-13

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Inspectioned

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 259 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.2. The most inspection patent is 特許7018168 "感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法" (9 times) , and the next most inspection patent is 特許7190841 "SiCインゴットの製造方法及びSiCウェハの製造方法" (5 times) .

Top Patents/Patent Applications with the Highest Number of Inspection over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許7018168 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及びプリント配線板の製造方法 9 times
2 特許7190841 SiCインゴットの製造方法及びSiCウェハの製造方法 5 times
3 特許7237828 エポキシ樹脂組成物、電子部品実装構造体およびその製造方法 4 times
4 特許6904899 昇華による大径シリコンカーバイド結晶の製造方法及び関連する半導体SICウェハ 4 times
5 特開2016-026903 研磨物品及びその形成方法 4 times

Cited cases

Top Patents/Patent Applications with the Highest Number of Cited

Of the patent applications filed in the last 10 years (2014-03-01 to 2024-02-29), 4,088 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.9. The most cited patent is 特許6640780 "半導体装置の製造方法および半導体装置" (113 times) , and the next most cited patent is 特許5802323 "エッチング処理方法" (108 times) .

Top Patents/Patent Applications with the Highest Number of Cited over a Period of 10 Years (2014-03-01 ~ 2024-02-29)
- No. Title
1 特許6640780 半導体装置の製造方法および半導体装置 113 times
2 特許5802323 エッチング処理方法 108 times
3 特許6203152 半導体記憶装置の製造方法 84 times
4 特開2015-192100 発光素子および発光素子の製造方法 46 times
5 特許6466653 窒化物半導体発光素子、および窒化物半導体ウェーハ 42 times

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