Last Updated: 2024/04/01

株式会社リコー (JP Patent Analysis Report)

The Applicant / Patent Holder "株式会社リコー" had 873 patent application filings in the most recent period (2022-01-01 to 2022-07-31). This is a small increased of +37 filings (4.4%) over 836 they had in the same period of the previous year (2021-01-01 to 2021-07-31).

The company had their highest number of filings in 2014 with 3,990 cases, and their lowest number in 2022 with 1,103 cases.

The mean of the number of filings over the last 5 years (2018 to 2023, 9,093 cases in total) is 1,516, and the median is 1,665. The coefficient of variation (standard deviation/mean) is 0.5, and there have been big fluctuations in the number of filings from year to year.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 1,516 patents
Std Dev 756
COV 0.5

Filing trends for the last 3 years
Year Cases YOY
2022 year 1,103 cases -21.83 %
2021 year 1,411 cases -26.47 %
2020 year 1,919 cases -13.98 %

This report provides the latest patent analysis information (the IP landscape, including a patent map) on the patent search results of the JP patent database for 株式会社リコー for the period of the last 10 years (2014-01-01 to 2024-03-31). You can compare the information in this report with the trends in your competitors’ patent filings and technologies, and use it to search for important patents.

This service provides, free of charge, a patent analysis report based on the latest patent data (Japanese, U.S., European, and PCT application publications) for use in patent searches, patent analysis, and IP landscaping. The service is offered by "Patent Integration" a firm specializing in patent search/patent analysis.

This report includes basic information to help you understand the IP strategy and management of 株式会社リコー, such as changes in the number of patents/patent applications they have filed, comparisons of the numbers of patents/patent applications filed by their peers and competitors, their top coapplicants (joint research partners, alliance partners), and their most important patents. It can be used in various intellectual property business operations such as IP landscaping, patent search/patent analysis, preparation of intellectual property business evaluation reports, selection of M&A candidates, and selection of alliance partners.

Article supervision: Patent attorney Yoshiyuki Ose
Article supervised by: Yoshiyuki Ose (Japanese Patent Attorney)    

He is a patent attorney at a patent office. He specializes in invention counseling, patent filing, and intellectual property strategies for start-up companies and new businesses in the fields of software, information technology and artificial intelligence. He runs a patent course for beginners on Udemy, an online course provider.

After studying physics at the University of Tokyo as a doctoral student, he was engaged in intellectual property analysis and technology trend research as an in-house patent attorney at a precision equipment manufacturer and at Toyota Central R&D Labs. Inc..

Introduction

The concept of the "IP landscape" (IPL) has been attracting attention recently.

An IP landscape is not limited to patent information, but also integrates and analyzes business information (e.g., non-patent information such as papers, news releases, stock information, and market information). Intellectual-property-based business management is realized through the analysis of intellectual property information applied to the formulation of management strategies and business strategies. This is a comprehensive approach that includes but not limited to planning of open and closed strategies, selecting M&A candidates, searching for alliance partners, and formulating intellectual property strategies, through the exploitation of intellectual property information.

IP landscaping usually includes patent search and patent analysis. In patent search and patent analysis, it is important to grasp the market position of each company and the overall technological trends and development trends for each technology. More specifically, it is important to understand what intellectual property your own company and other companies hold, what the strengths and weaknesses of other companies are, and how other companies are trying to exploit their intellectual property. In other words, it is important to understand both the business strategy and the intellectual property strategy of each company.

After reading this search report, you may be interested in more detailed patent searches and patent analysis. We offer a service called Patent Integration, which is an integrated patent search and patent analysis service. With reasonable pricing and a simple user interface such that even beginners can quickly search for and analyze patent information by company or technology from a web browser, please consider using it for detailed patent searches, patent analysis, and IP landscaping.

Patent Integration has a patent-landscaping function that can visually represent a set of tens of thousands of patents/patent applications. This allows you to convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

Foreign Patent Analysis Report

The following foreign patent analysis reports have been found for 株式会社リコー. The trends of patent filings of 株式会社リコー for each country can be found by clicking on the Applicant/Patent Holder name next to each country.

Patent Filing Trends in Each Country
Country Applicant / Patent Holder
JP 株式会社リコー
US RICOH COMPANY LTD
EP RICOH COMPANY LTD
PCT RICOH COMPANY LTD

株式会社リコー, Changes in the Number of JP Patents/Patent Applications

The changes in the number of patent filings of 株式会社リコー over the last 20 years (JP) are shown below.

The change in the number of patents/patent applications is the most basic index in patent analysis. By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology. It should be noted that since there is a one and a half year lag between the filing and the laying open of patent applications, it is not possible to analyze the situation more recently than one and half years prior to the present.

In this report, you can only see the change in the number of patents/patent applications by company or technology, whereas Patent Integration allows you to quickly compare the number of patent applications with your competitors in each technical field by cross-referencing with other keywords and patent classifications.

Counting of the Number of Cases using the Patent Mapping Function

By examining the change in the number of patents/patent applications, you can see the status of technological development and R&D focus for each company or technology.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Patent Landscape ({{ld.d.db_name | country_map: 'en'}})

Patent landscaping is a visualization of the distribution of patent filings (application focus areas) for each technical keyword. Mountains and islands indicated by heatmap contours represent clusters of patent applications filed, and red areas on the heatmap indicate many patent filings relating to the keyword.

The patent landscape for 株式会社リコー gives an intuitive understanding of what patent filings they have made and what technical position is to be established. By selecting filing year checkboxes and filtering, you can track their past filing trends (what technical area they have focused on).

By selecting applicant/patent holder checkboxes and filtering, you can visually grasp the technical areas of the filings for each applicant and the partnerships or alliances formed. Please use it as a guide for patent analysis and IP landscaping.

In addition, by visually representing the patent data in this manner, you can convincingly show the technical positions of your company and its competitors to your management and business strategists in order to formulate management strategies and business strategies.

In Patent Integration, you can check the specifics of a patent filing by clicking anywhere on the patent landscape screen. You can also quickly check the position of each applicant for each technical field by cross-referencing with other keywords and patent classifications. You can use it as a guide when considering hypotheses about each company's IP strategy on the IP Landscape. You can also use it for higher-grade intellectual property activities. It has reasonable pricing and a simple user interface that is easy for beginners to handle.

Visualization of Technical Position

The patent landscape allows you to analyze, without any hassle, what patent applications have been filed and what technical position is to be established.

Characteristic Terms (Importance)

The following is a list of words (characteristic terms) often used in 株式会社リコー patent applications. Characteristic terms with a higher importance are used in more patents/patent applications.

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Search Set (Analysis Object)

This patent analysis report was created for a patent search set of 22,130 cases retrieved by applying the following search formula and analysis period to the following patent database. Patent information such as a patent analysis result, a patent map, and a patent landscape can be freely used for patent searches, analysis, and work on intellectual property strategies, including IP landscaping.

Patent Database
JP Publications/Granted Patents
Patent Search Formula
Applicant / Patent Holder:
株式会社リコー
Patent Analysis Period
2014-01-01〜2024-03-31
Number of Objects
22,130 patents

Analysis results are determined on the basis of patent gazette data issued by the patent office in each country.

Same industry / competition company information (JP)

The number of patents and changes in the number of patents of other companies (competitors) in the same industry as 株式会社リコー are shown below.

Comparison of changes in the number of patents with peers and competitors is an important analytical index for understanding the intellectual property strategies of each company. By checking the transition of the number of patents for each company / competitor, you can check the status of focus on technology development and R&D for each company / technology.

It should be noted that patents have a time lag of one and a half years from filing to publication, so it is not possible to analyze the situation more recent than one and a half years.

If you want to find out more information, " Patent Integration , You can compare the number of patent applications with competitors in each technical field in a short time by multiplying with other keywords and patent classifications.Please use it for more detailed patent information analysis such as selection of M&A candidate destinations and alliance destinations.

Introduction of patent search function

Competitive analysis can be performed in a short time by using various search functions such as applicant, filing date, and similar patent search.

Trends in filing of joint patent applications in the last 3 years (2022 to 2024).

Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last in the last 3 years (2022 to 2024) with 3,911 cases, followed by セイコーエプソン株式会社 with 1,584 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).

Comparing the number of applications of each company, キヤノン株式会社 has the highest number of joint applications in the last for the target period (2014 to 2024) with 58,953 cases, followed by セイコーエプソン株式会社 with 24,230 cases.

Same industry / competition company, Change in the Number of JP Patents

Below is a patent map showing changes in the number of applications for JP patents of 11 companies in the same industry over the past 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top coapplicant information (JP)

The changes in the number of patents shared with 株式会社リコー’s top coapplicants are shown below.

By searching for the top coapplicants, you can discover what companies 株式会社リコー is partnered with to develop technologies and use this information for R&D and intellectual property strategies.

Also, by looking at the change in the number of filings, you can see what companies 株式会社リコー conducted joint research with in the past, and check the history of 株式会社リコー’s alliances, partnerships, and joint research and development.

If you want to search for more detailed information, you can use Patent Integration to quickly find out specifically what company they filed a joint application with and what invention it was for.

Search for Coapplicants

Patent integration allows you to find coapplicants in a short amount of time.

Trends in filing of joint patent applications for the target period (2014 to 2024).

Among the top coapplicants, 株式会社SCREENホールディングス has the highest number of joint applications in the last for the target period (2014 to 2024) with 15 cases.

Trends in filing of joint patent applications for the target period (2014 to 2024).
Name Cases
株式会社SCREENホールディングス 15 cases

Top coapplicant, Change in the Number of JP Patents

Below is a patent map showing the changes in the numbers of JP patent filings by 株式会社リコー’s top 6 coapplicants over the last 20 years.

You can select a graph type from the menu on the upper left. Data can be output as a file to the clipboard, or in CSV format or TSV format. You can also output graph images as files in the SVG, PNG, and JPG formats. For the terms of use when using the data, please see "About this Site."

Top coapplicant Details (JP)

Trends in filing of joint patent applications with 株式会社SCREENホールディングス

株式会社リコー filed 15 joint applications with 株式会社SCREENホールディングス for the analysis period (2014 to 2024).

The mean of the number of filings over the last 5 years (2018 to 2023, 2 cases in total) is 0.3, and the median is 0. The coefficient of variation (standard deviation/mean) is 2.2, and there have been very big fluctuations in the number of filings from year to year.

The company had their highest number of filings in 2014 with 11 cases, and their lowest number in 2022 with 0 cases.

Filing information for the last 5 years (2018 to 2023)
Index Value
Average 0.3 patents
Std Dev 0.7
COV 2.2
Filing trends for the last 3 years
Year Cases YOY
2018 year 2 cases 0
2017 year 2 cases -
2016 year 0 cases -

Information on important patents (JP)

The following shows JP patents held by 株式会社リコー that have had an invalidation trial against them demanded or an opposition filed against them by a third party, and 株式会社リコー’s JP patents/patent applications of high importance cited by Examiners in patent examination processes.

By noting the most important patents, you can obtain knowledge of the competitive business environment in which 株式会社リコー is placed (e.g., whether it is a fiercely competitive environment or an oligopolistic market and the like). In general, it can be understood that a company with a large number of demands for invalidation trials is developing their business in a business environment where IP disputes are common.

If you want to search for more detailed information, you can use Patent Integration to retrieve and download by company cited patents/patent applications or patents undergoing invalidation trials. You can quickly extract important patents from a patent set that includes multiple competitors by cross-referencing with other keywords and patent classifications. Please consider using it for searches for important patents/patent applications.

Search for Information on Important Patents

You can quickly search for important patents/patent applications, such as patents/patent applications that were cited many times and patents that have had invalidation trials demanded against them many times.

Glossary

Cited
Indicates that the patent/patent application has been cited (by Examiners) in notices of reasons for rejection in the examination process of other (Japanese, U.S., or European) patent applications. The higher the number of citations, the more important the patent/patent application is considered to be.
Request for invalidation trial
Indicates that a third party has requested a procedure to invalidate the patent. It is likely to affect the business of third parties and is considered to be of high importance.
Opposition
Indicates that a third party has filed a petition with the Patent Office to hear the validity of the patent again. Like the trial for invalidation, it is considered to be of high importance.
Information provision
Indicates that a third party has provided the Patent Office with useful information for examination for the patent filed. It is usually considered to be of high importance because it is done to prevent the patent from being granted.
Browsing request
Indicates that a third party has requested the Patent Office to view the patent bag (a set of documents exchanged between the Patent Office and the applicant). The bag is often checked prior to trial for invalidation, opposition, and provision of information, and is considered to be a highly important patent.

Oppositioned cases

List of latest Oppositioned patents

In the last 3 years (2021-04-01 ~ 2024-03-31), there were 23 patents Opposition from third parties. The average number of Opposition is 1.0 times. The most recently Opposition patent is 特許7331348 "樹脂粒子の製造方法" (Opposition day 2024-02-21) , next is 特許7316745 "三次元組織体" (Opposition day 2024-01-24) .

Most recent Opposition (2021-04-01 to 2024-03-31)
- No. Title Opposition days
1 特許7331348 樹脂粒子の製造方法 2024-02-21
2 特許7316745 三次元組織体 2024-01-24
3 特許7292607 加熱装置、定着装置及び画像形成装置 2023-11-30
4 特許7279506 熱可塑性樹脂粉末、立体造形用樹脂粉末、立体造形物の製造装置、及び立体造形物の製造方法 2023-11-22
5 特許7230354 立体造形用粉末、樹脂粉末、立体造形物の製造装置、及び立体造形物の製造方法 2023-09-01
6 特許7219416 加熱装置、定着装置及び画像形成装置 2023-08-07
7 特許7219415 加熱部材、ベルト加熱装置、定着装置及び画像形成装置 2023-08-07
8 特許7206762 電極及びその製造方法、電極素子、非水電解液蓄電素子 2023-07-12
9 特許7183641 立体造形用粒子、立体造形用粉末、立体造形物の製造装置、立体造形物の製造方法、立体造形用粉末の製造方法、及び粒子 2023-06-05
10 特許7167560 立体造形用樹脂粉末、立体造形物の製造装置、及び立体造形物の製造方法 2023-05-09

Show 5 patents  

Protested cases

List of latest Protested patents

In the last 3 years (2021-04-01 ~ 2024-03-31), there were 65 patents Protest from third parties. The average number of Protest is 1.3 times. The most recently Protest patent is 特開2022-083401 "発泡シート、製造物、成形体及び発泡シートの製造方法" (Protest day 2024-03-15) , next is 特開2021-017051 "印刷物の製造方法及び印刷物の製造装置、並びに印刷物" (Protest day 2024-02-27) .

Most recent Protest (2021-04-01 to 2024-03-31)
- No. Title Protest days
1 特開2022-083401 発泡シート、製造物、成形体及び発泡シートの製造方法 2024-03-15
2 特開2021-017051 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2024-02-27
3 特開2021-146676 液体吐出装置 2024-02-08
4 特開2023-043080 捺染・刺繍システム、捺染・刺繍装置、及び捺染・刺繍システムの刺繍調整方法 2024-02-01
5 特開2022-027146 発泡体、発泡シート、製造物、及び発泡体の製造方法 2024-01-19
6 特開2021-162809 トナー、現像剤及び画像形成装置 2024-01-12
7 特開2023-052912 感熱記録媒体、感熱記録液、及び物品 2024-01-09
8 特開2023-047540 液体吐出装置および刺繍システム 2023-11-28
9 特開2020-190724 トナー、トナー収容容器、現像剤、現像装置、プロセスカートリッジ、及び画像形成装置 2023-10-05
10 特許7470286 インク、インクセット、インク容器、記録方法、及び、記録装置 2023-09-27
11 特開2021-077341 情報処理装置、情報処理システム及び情報処理方法 2023-08-23
12 特開2021-017033 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2023-08-01
13 特許7451967 活性エネルギー線急速硬化型組成物、造形方法、及び造形装置 2023-07-18
14 特開2021-017032 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2023-05-29
15 特許7415450 現像剤、現像装置、プロセスカートリッジ及び画像形成装置 2023-05-16
16 特許7388029 インクセット、印刷方法、及び印刷装置 2023-04-19
17 特許7302177 硬化型クリアインク組成物、インクセット、収容容器、印刷方法、及び硬化物 2023-02-27
18 特開2020-124915 液体供給装置、液体吐出ユニット及び液体を吐出する装置 2023-01-30
19 特開2020-124914 液体供給装置、液体吐出ユニット及び液体を吐出する装置 2023-01-30
20 特許7367455 顔料分散組成物、硬化型組成物、収容容器、2次元又は3次元の像形成装置、2次元又は3次元の像形成方法、硬化物、及び加飾体 2023-01-27

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Protested

Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 168 patents/patent applications were protest more than once in the examination process of other patent applications. The mean of the number of protest is 1.3. The most protest patent is 特開2017-088805 "活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品" (5 times) , and the next most protest patent is 特開2017-008127 "活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品" (4 times) .

Top Patents/Patent Applications with the Highest Number of Protest over a Period of 10 Years (2014-04-01 ~ 2024-03-31)
- No. Title
1 特開2017-088805 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品 5 times
2 特開2017-008127 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品 4 times
3 特許6900630 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置並びに成形加工品 3 times
4 特開2017-019939 活性エネルギー線硬化性組成物、インク、組成物収容容器、像形成装置、像形成方法及び硬化物 3 times
5 特許7302177 硬化型クリアインク組成物、インクセット、収容容器、印刷方法、及び硬化物 3 times

Inspectioned cases

List of latest Inspectioned patents

In the last 3 years (2021-04-01 ~ 2024-03-31), there were 71 patents Inspection from third parties. The average number of Inspection is 1.4 times. The most recently Inspection patent is 特開2022-083401 "発泡シート、製造物、成形体及び発泡シートの製造方法" (Inspection day 2024-03-21) , next is 特開2021-017051 "印刷物の製造方法及び印刷物の製造装置、並びに印刷物" (Inspection day 2024-03-06) .

Most recent Inspection (2021-04-01 to 2024-03-31)
- No. Title Inspection days
1 特開2022-083401 発泡シート、製造物、成形体及び発泡シートの製造方法 2024-03-21
2 特開2021-017051 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2024-03-06
3 特開2021-146676 液体吐出装置 2024-02-29
4 特開2023-043080 捺染・刺繍システム、捺染・刺繍装置、及び捺染・刺繍システムの刺繍調整方法 2024-02-16
5 特開2021-162809 トナー、現像剤及び画像形成装置 2024-02-08
6 特開2022-027146 発泡体、発泡シート、製造物、及び発泡体の製造方法 2024-01-26
7 特開2023-052912 感熱記録媒体、感熱記録液、及び物品 2024-01-16
8 特開2023-047540 液体吐出装置および刺繍システム 2023-12-25
9 特開2020-190724 トナー、トナー収容容器、現像剤、現像装置、プロセスカートリッジ、及び画像形成装置 2023-10-13
10 特許7470286 インク、インクセット、インク容器、記録方法、及び、記録装置 2023-10-03
11 特開2021-077341 情報処理装置、情報処理システム及び情報処理方法 2023-09-14
12 特開2021-017033 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2023-08-14
13 特許7451967 活性エネルギー線急速硬化型組成物、造形方法、及び造形装置 2023-07-25
14 特開2021-017032 印刷物の製造方法及び印刷物の製造装置、並びに印刷物 2023-06-08
15 特許7415450 現像剤、現像装置、プロセスカートリッジ及び画像形成装置 2023-05-25
16 特許7388029 インクセット、印刷方法、及び印刷装置 2023-04-27
17 特許7302177 硬化型クリアインク組成物、インクセット、収容容器、印刷方法、及び硬化物 2023-03-02
18 特開2020-124915 液体供給装置、液体吐出ユニット及び液体を吐出する装置 2023-02-21
19 特開2020-124914 液体供給装置、液体吐出ユニット及び液体を吐出する装置 2023-02-21
20 特許7263741 感熱記録媒体、感熱記録液、及び物品 2023-02-17

Show 15 patents  

Top Patents/Patent Applications with the Highest Number of Inspectioned

Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 212 patents/patent applications were inspection more than once in the examination process of other patent applications. The mean of the number of inspection is 1.3. The most inspection patent is 特開2017-088805 "活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品" (6 times) , and the next most inspection patent is 特許6900630 "活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置並びに成形加工品" (4 times) .

Top Patents/Patent Applications with the Highest Number of Inspection over a Period of 10 Years (2014-04-01 ~ 2024-03-31)
- No. Title
1 特開2017-088805 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品 6 times
2 特許6900630 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置並びに成形加工品 4 times
3 特許7263741 感熱記録媒体、感熱記録液、及び物品 4 times
4 特許6593476 撮像装置 4 times
5 特開2017-008127 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、2次元又は3次元の像の形成方法及び形成装置、並びに成形加工品 4 times

Cited cases

Top Patents/Patent Applications with the Highest Number of Cited

Of the patent applications filed in the last 10 years (2014-04-01 to 2024-03-31), 7,570 patents/patent applications were cited more than once in the examination process of other patent applications. The mean of the number of cited is 2.8. The most cited patent is 特開2016-007800 "異常検知システム、電子機器、異常検知方法およびプログラム" (409 times) , and the next most cited patent is 特開2018-101242 "情報処理装置、情報処理方法及びプログラム。" (45 times) .

Top Patents/Patent Applications with the Highest Number of Cited over a Period of 10 Years (2014-04-01 ~ 2024-03-31)
- No. Title
1 特開2016-007800 異常検知システム、電子機器、異常検知方法およびプログラム 409 times
2 特開2018-101242 情報処理装置、情報処理方法及びプログラム。 45 times
3 特開2016-014564 撮像ユニット 37 times
4 特許6604539 搬送装置、画像形成装置 36 times
5 特許6900694 情報処理システム、端末装置、情報処理方法およびプログラム 34 times

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